SlideShare a Scribd company logo
1 of 12
presents
industry’s first CMOS COMPATIBLE microphone
August 2020
Small Size / Minimal Packaging
2
MEMS microphone
0.5mm
Requires front and back chamber
Metal housing required
Wire bonding required
No front or back chamber
No need for metal housing
No need for wire bonding
Front Chamber
Back Chamber 1mm
Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
Improved SNR
3
Noise Sources:
• Electronic
 Limited by Electronic noise which can
be further improved
 Lower electronic noise → Higher
SNR
Noise Sources:
• Acoustic (due to air friction through vent holes)
• Electronic
 Limited by Acoustic noise!
MEMS microphone Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
0.5mm
Watertight & Ingress-proof
4
MEMS microphone
Vent holes
Perforated membrane & backplate
Prone to air friction noise
Open to water and ingress
contamination
No vent hole or perforations
No pressure compensation
No air flow
No acoustic noise
Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
Monolithic Structure
5
Sensor and Electronics
fabricated in CMOS foundry
(Requires some additional post-processing)
Sensor fabricated in MEMS
foundry, electronics fabricated in
CMOS foundry
MEMS microphone
XC06 Process
Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
Mic-in-CMOS Post-Processing
6
FabricateStructurein CMOS
ClearEtch Holes
Etch Gap
SealUnderVacuum
Proprietary & confidential Copyright 2020 Nanofone Ltd
Scalable for optimum performance
7
Matrix structureFixed size for each model
5 x 5 7 x 7 11 x 11
MEMS microphone
Larger area → More sensitivity
Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
On-Die EMI / EMC
8
A built-in Faraday cage using
CMOS metal layers
Metal cap required for EMI/EMC
protection
MEMS microphone Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
Production Cost Comparison
9
ASIC Die Cost
MEMS Die Cost
Wirebonding
Packaging Cost
Test & Calibration Cost
Yield Losses Cost
Monolithic Sensor & Electronics
No Wirebonding
Low Packaging Cost
Low Test & Calibration Cost
High Yield due to Simple Design
COSTS
MEMS
microphone Mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
10
 Small Size
 Watertight & Ingressproof
 SNR (Electronic Limited)
 CMOS compatible (Monolithic)
 Device ready in several post-processing steps
 Scalable
 On-Die EMI / EMC
 Minimal Packaging
 Reduced Fabrication Cost
Analytically Proven Optimum Solution
 Low Power Consumption via Electret-mic-in-CMOS
Proprietary & confidential Copyright 2020 Nanofone Ltd
Microphone-in-CMOS
IPR Protection
Proprietary & confidential Copyright 2020 Nanofone Ltd
is actively seeking
corporate research partners to further
develop its Mic-in-CMOS
Contact: Yavuz Ahıska
yahiska@nanofone.co.uk

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Nanofone2

  • 1. presents industry’s first CMOS COMPATIBLE microphone August 2020
  • 2. Small Size / Minimal Packaging 2 MEMS microphone 0.5mm Requires front and back chamber Metal housing required Wire bonding required No front or back chamber No need for metal housing No need for wire bonding Front Chamber Back Chamber 1mm Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 3. Improved SNR 3 Noise Sources: • Electronic  Limited by Electronic noise which can be further improved  Lower electronic noise → Higher SNR Noise Sources: • Acoustic (due to air friction through vent holes) • Electronic  Limited by Acoustic noise! MEMS microphone Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd 0.5mm
  • 4. Watertight & Ingress-proof 4 MEMS microphone Vent holes Perforated membrane & backplate Prone to air friction noise Open to water and ingress contamination No vent hole or perforations No pressure compensation No air flow No acoustic noise Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 5. Monolithic Structure 5 Sensor and Electronics fabricated in CMOS foundry (Requires some additional post-processing) Sensor fabricated in MEMS foundry, electronics fabricated in CMOS foundry MEMS microphone XC06 Process Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 6. Mic-in-CMOS Post-Processing 6 FabricateStructurein CMOS ClearEtch Holes Etch Gap SealUnderVacuum Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 7. Scalable for optimum performance 7 Matrix structureFixed size for each model 5 x 5 7 x 7 11 x 11 MEMS microphone Larger area → More sensitivity Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 8. On-Die EMI / EMC 8 A built-in Faraday cage using CMOS metal layers Metal cap required for EMI/EMC protection MEMS microphone Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 9. Production Cost Comparison 9 ASIC Die Cost MEMS Die Cost Wirebonding Packaging Cost Test & Calibration Cost Yield Losses Cost Monolithic Sensor & Electronics No Wirebonding Low Packaging Cost Low Test & Calibration Cost High Yield due to Simple Design COSTS MEMS microphone Mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 10. 10  Small Size  Watertight & Ingressproof  SNR (Electronic Limited)  CMOS compatible (Monolithic)  Device ready in several post-processing steps  Scalable  On-Die EMI / EMC  Minimal Packaging  Reduced Fabrication Cost Analytically Proven Optimum Solution  Low Power Consumption via Electret-mic-in-CMOS Proprietary & confidential Copyright 2020 Nanofone Ltd Microphone-in-CMOS
  • 11. IPR Protection Proprietary & confidential Copyright 2020 Nanofone Ltd
  • 12. is actively seeking corporate research partners to further develop its Mic-in-CMOS Contact: Yavuz Ahıska yahiska@nanofone.co.uk