Environment-Friendly Nanostructured Etching of Glasses Utilizing Vapor from Hot Electron-Activated Liquid Water at Room Temperature
1. Abstract of Applied Sciences and Engineering, 2015, Vol.3
DOI: 10.18488/journal.1001/2015.3/1001.3
3rd
International Scientific Conference on Applied
Sciences and Engineering
27-28 July, 2015
Lebua Hotels and Resorts, 1055 Silom Road, Bangrak, Bangkok
10500 Thailand
Conference Website: www.scihost.org
10
Paper ID: 08/15/3
rd
ISCASE
Environment-Friendly Nanostructured Etching of Glasses
Utilizing Vapor from Hot Electron-Activated Liquid Water at
Room Temperature
Hsiao-Chien Chen1
--- Fu-Der Mai2
--- Kuang-Hsuan Yang3
--- Hui-Yen Tsai4
--- Chih-Ping
Yang5 --- Chien-Chung Chen6
--- Chao-Hsuan Chen7
--- Yu-Chuan Liu8
1,4
Department of Biochemistry and Molecular Cell Biology, School of Medicine, College of Medicine,
Taipei Medical University, Taiwan
2,8
Department of Biochemistry and Molecular Cell Biology, School of Medicine, College of Medicine,
Taipei Medical University; Biomedical Mass Imaging Research Center, Taipei Medical University, Taiwan
3
Department of Materials Science and Engineering, Vanung University, Chung-Li City, Taiwan
5
Graduate Institute of Medical Science, College of Medicine, Taipei Medical University, Taiwan
6,7
Graduate Institute of Biomedical Materials and Tissue Engineering, College of Oral Medicine, Taipei
Medical University, Taiwan
Abstract
Dry plasma treatment and wet chemical corrosion are two of the most popularly
methods used for etching silicate glasses. However, the former is laborious; while the
latter is environment-unfriendly. In wet etching, environment-unfriendly etchants such
as NaOH, H2SO4 and HF were always used and energy-consumed heating process
was also reported. Here we report an innovative and facile strategy for etching silicate
glasses utilizing vapor from hot electron-activated (HEA) water at room temperature.
The activated pH-neutral water has a weakly hydrogen-bonded structure and is
stabilized by the decayed hot electron. The distinct structure, as compared to
conventional deionized (DI) water, makes it more vapor water molecules available.
Moreover, the activated water is electron-rich, which is responsible for facile fabrication
of glass nanostructures. After three hours exposure to vapor of activated water at room
temperature, the etched glass developed an evenly nanoscale-granulated surface
morphology. After etching the contact angle recorded on the nanostructured glass is
significantly increased. Compared to an obtained nanoscale-flat surface using vapor
from DI water, the resulting nanostructured glass exhibits excellent advantages in
applications for obtaining uniform signal intensity of surface-enhanced Raman
scattering and strong adhesion of deposited metal on it. Moreover, the proposed
strategy is effective for various silicate glasses, silicon wafers, and even metal films.
This innovative concept has emerged as a promising strategy on environment-friendly
nanostructured etching.