SlideShare a Scribd company logo
1 of 23
Pure Ozone Generator &
Process with POG
MEIDEN NANOPROCESS INNOVATIONS, INC.
1/13/2022
2/22
1. Features of Pure Ozone Generator (POG)
2. Working principle
3. Comparison with competing techniques
4. System Structure
5. Customer A (O source for Molecular Beam Epitaxy)
6. Customer B (In-situ mask/ reticle optics cleaning)
7. Customer C (Surface hydrophilization)
8. Pure Ozone deposited ALD (SiO2, TiO2, Al2O3)
9. Specifications (Batch Type)
Contents
3/22
1. Features of POG
1. Extremely high ozone concentration (>90%)
2. Extremely high purity (elimination of NOx, metal & organic
particle)
3. No damage (electrically neutral & thermal energy O* source)
4. High efficiency (minimize pre-decomposition of ozone)
5. Real-time fine control of flow rate and pressure of supplied ozone
6. High compatibility with low pressure processes (e.g. ALD, CVD,
MBE PVD, PLD)
7. Intuitive operation (easily interface with the process chamber)
8. Diverse lineup of products from R&D to mass production
9. Continuous safe handling of high volume liquid ozone (NPI original
hardware and software)
**AIST=The National Institute of Advanced
Industrial Science and Technology
4/22
2. Working Principle (Accumulation)
Evacuation
Cryocooler
Ozonator
Open Open
Cu block
(set around 90K)
Liquid O3
O2
O3/O2 mixture gas
Close
Open
Stainless-steel vessel
Liquefaction
O2
O3
Evacuation
Use of high purity O2 (semiconductor
grade) with 0.1wt % Ar is recommended
for ultra high purity demand
5/22
2. Working Principle (Supply)
Ozonator
O2
Close
Phase 2 (Supply)
Close
Close
Pure O3 gas
Impurity (e.g., NOx) free
80 100 120 140 160 180
温度 [K]
蒸気圧
[Pa]
O2
NO
O3
N2O
NO2
105
103
101
10-1
10-3
Temperature [K]
Cryocooler
Cu block
(set around 120K)
Stainless-steel vessel
Vapor
Pressure
[Pa]
Open
・Basically control O3 pressure at supply
・Keep liquid O3 at stand-by of supply
Supply
Accumulation
6/22
3. Comparison with competing techniques (O3)
Pure Ozone generator Competing Technology
(e.g., MKS)
Customer’s benefits
Ozone
Concentration
2,000g/Nm3
(more than 90wt.%)
210g/Nm3
(14wt.%)
- Lower temp process
- Compatible with low pressure
process such as MBE, sputter
and pulse laser deposition
Ozone gas flow rate Up to 0.5L/min
(5L/min when 10% duty (e.g.,
ALD process, standby as O3
vapor)
1 - 24L/min Flexible (e.g., step-by-step
time-variant) ozone supply
possible
Impurity Lower than 1 ppm
(distilled out)
0.1% level of NOx, H2O
included
No damage caused by impurity
and NOx-induced defects and
disorders
Controllability
(Repeatability)
Extremely high
(Mass flow + O3 vapor pressure)
High
(Mass flow)
Precise metal oxide
composition (stoichiometry)
control achieved
Safety Extremely high even in case of
mixing with other process gases
thanks to high purity of ozone
Mixing with other process
gases in high pressure may
cause explosive reaction
Applicable to various processes
7/22
4. System Structure
O2, Ar(N2)
O3/O2, Ar
N2
Pure O3
Ceramic Filter
Cryocooler
Dry
Pump
Vacuum for
thermal
insulation
Stainless-steel
enclosure
Copper Block
Liquid Ozone
Enclosure(negative pressure inside)
Vessel
Ozonator
Pump
O3 decomposer Check
Valve
N2
N.O.
O3 sensor
・Automatic operation by sequencer
・Continuous display of machine status
・Quick detection of failure and
necessity of maintenance
・Sensors, interlocks & emergency
operation at blackout
Flow
Meter
N.O.
O3 pressure, flow rate
O3 concentration,
Time profile
Machine Status
Remaining supply time
Copyright © MEIDEN NANOPROCESS INNOVATION, INC. All Rights Reserved.
NPG-200023-0 8/14
4.Safe Operation Area of Ozone gas
Throughout the operation time, ozone gas concentration and pressure are monitored
and controlled so as to keep them inside the red area above.(No need to care for users)
1atm
(100,000Pa)
0.1atm
(10,000Pa)
0.01atm
(1000Pa)
0% 10% 20% 30% 40% 50% 60% 70% 80% 90% 100%
Our Experiment
(Explosive decomposition of ozone)
0.44atm
Guaranteed by a manufacturer of Ozonators
SOA (Safe Operation Area) of O3/O2/N2 mixture gas
(in case without initiators such as UV light, electric
energy and co-existing organic particles)
Ozone Concentration [vol.%]
Total Pressure
SOA controlled by our Pure Ozone Generator
3atm, 20%
CONFIDENTIAL
8/22
9/22
5. Customer A (O source for Molecular Beam Epitaxy)
ZnO Sub
1. High Concentration (highly oxidation), 2. High Purity (NOx free), 3. Damage free
(replacement of plasma oxidation), 4. High Efficiency (minimize pre-decomposition of ozone),
5. Real-time fine control of flow rate and pressure of supplied ozone, 6. High compatibility
with low pressure processes, 7. Intuitive operation & easily interface with the process
chamber, 8. Affordable price for R&D (future mass production)
Customer’s Satisfactions
Sample Structure
Ti
2DE Gas Ni/Au Electrode
10/22
5. Data 1 of Customer A
O2 Plasma Pure Ozone
Depo Temp. = 880C Depo Temp. = 790C Depo Temp. = 750C
2m
MgZnO
ZnO buffer layer
ZnO substrate
・ POG can achieve a smooth
surface by MBE deposition at low
temperature and prevent
crystallization.
・ No metal (Mg) diffusion
ZnO Sub ZnOSub
11/22
Achieved the highest level of mobility in the world because of smooth surface and
elimination of impurities = 1.3x106 cm2 /Vs @n=8.3 x 1010 cm-2
T<100mK
T=500mK
Insufficient screening of
impurities within the
crystal structure
Increased interface
roughness or alloy
scattering induced by
random potential of Mg
content
In comparison to historic data,
the maximum  of films has
occurred at decreasing
densities with the employment
of Pure Ozone Gas .
Sci. Rep. 6, 26598; doi: 10.1038/srep26598 (2016)
5. Data 2 of Customer A
12/22
6. Customer B (In-situ mask/reticle optics cleaning)
Electron beam mask writer
O source
(Pure
Ozone Gas)
OH or H source
(e.g., C2H4 gas)
Silicon stencil
photo-mask
Vacuum (base: 10-8Pa)
Carbon, particles, NOx,
ions, electrons, UV, IR
Customer’s Satisfactions
6. Highly compatible with low pressure processes, 1. High Concentration (highly oxidation),
3. Damage free (no reflectivity change of mirror surface ), 2. High Purity (NOx free, no
corrosion), 4. High Efficiency (minimize pre-decomposition of ozone after 20 meter transfer),
8. Capability of 24/7/365 mass production
13/22
6. Customer B (Ozone Ethylene Radical “OER“Process)
Developed OER (Ozone Ethylene Radical) process to generate OH,O,H radicals
effectively at lower than 100ºC and applies OER to actual processes.
14/22
Mirror
* Material from EUVL symposium 2009 with Selete (Semiconductor Leading Edge Technologies, Inc.)
Substrate
[Mo/Si] layered
Mo
Si
Si (or Ru or TiO2/Nb2O5)
capping layer
Pure Ozone Gas
Graphite contamination
6. Customer B (low temperature & damage free process)
Carbon contamination can be removed without oxidation of mirror
substrate (metal cap & Si layers) and degradation of reflectivity of mirror.
15/22
More than
one month
duration of
hydrophilicity
No thermal
and physical
damage
Increased
permittivity of
the fiber
OER process
(40 min)
Results
7. Customer C (surface hydrophilization)
Hydrophilization on carbon fiber: Persistence of hydrophilicity (high surface energy)
16/22
Carrier
gas
(Ar)
Al2O3 film (25nm) on Si
deposited at Room temp.
Substrate (200mm)
Vacuum
C2H4
(option)
Precursor
Time
Flow rate
Pure O3
Pure O3
C2H4
Precursor
O+ OH radical
0
0
0
ALD mode CVD mode
Al2O3 (ALD)
SiO2 (CVD)
Substrate
Depth-profile-
optimized coating film
1-5 sec
0
Carrier gas
8. ALD process (Plasma-defect free oxides grown at <130C)
Developed low temperature
deposition process utilizing a
big advantage of Pure
Ozone gas.
・Low temp, low impurity, defect free
・High efficiency of gas usage
・On demand supply of ozone
・Multilayer (universal oxidation source)
TMA (Orthrus,
TDMAT, TDMAS)
17/22
10
-10
10
-8
10
-6
10
-4
10
-2
10
0
Leakage
current
density
(A/cm
-2
)
10
8
6
4
2
0
Applied electric field strength (MV/cm)
 7%O3 100%O3
30
o
C
100
o
C
150
o
C
(a)
Ar
Time
Pure O3
C2H4
TMA
(Al(CH3)3)
0
0
0
0
0.1sec
1cycle (12sec)
4sec
40nm
8. Superior dielectric Property
Flow rate
Better dielectric property
Copyright © MEIDEN NANOPROCESS INNOVATIONS, INC. All Rights Reserved.
18/45
Sharp interface
200nm
8. Sharp interface (<1nm) and small carbon impurity
SiO2
TiO2
SiO2
TiO2
SiO2
C impurity
free
Glass (SiO2) substrate
18/22
Copyright © MEIDEN NANOPROCESS INNOVATIONS, INC. All Rights Reserved.
8. Superior Coverage (Underlying morphology independent process)
~5 um
~200
um
Process conditions
Process temperature 120C
Substrate Si wafer (200mm)
Precursor gas Orthrus (From Air Liquide)
G.P.C. 0.24 nm/cycle
ALD one cycle 120 sec
Trench Surface Trench Bottom
Conformal deposition to 40:1 high-aspect ratio trench structure
SiO2
Si
SiO2
Si
19/22
20/22
8. High gas usage efficiency (environment friendly process)
Required
Ozone
Volume
for
1nm
Al
2
O
3
film
deposition
(cc)
NPI proprietary process (on demand supply: no ozone gas is disposed during the whole ALD process)
achieves higher efficiency of ozone usage than conventional low concentration O3 ALD process where
ozone gas flow needs to be kept besides the ozone pulses to outside the ALD chamber for repeatability.
*1 Chem. Mater., Vol. 18, No. 16, 2006 3765
*2 J. Phys. Chem. C 2008, 112, 19530–19539
Wafer size: 8inch (200mm)
Deposition temp. :120C
Our data
Efficient, Low process running cost
21/22
Item Specification
Size, Weight 900(W)900(D)1700(H) 470kg
Input Power 3-phase AC 200-230V, 30A 50/60Hz
Utility components Compressed dry air for ventilation, Nitrogen gas,
oxygen gas, cooling water
Max ozone storage
volume
8,000 cm3
(at 0deg.C 1atm gas phase)
O3 gas flow rate stability ±5%(Option ±1%) 20~200sccm
O3 concentration 90% or higher (at the outlet of our system)
O3 pressure 1,000Pa - 10,000Pa at the exit of the liquid O3 vessel
(Piping) Transfer distance
of O3 gas
<20m
Utility ratio 120min charging – 800min operation (@10sccm)
9. Specifications (Batch Type)
Refer to product brochures for specifications of continuous type
22/22
Conclusions: Pure Ozone as Oxidation Source for ALD
Pure Ozone
• Ozone ~100%, theoretically no impurity of metal and organic materials
• Generated high volume pure ozone safely (SEMI S2 compliant) only by Pure
Ozone Generator (POG)
 Widely used at semiconductor foundries in the world!
Expected effect from ALD with POG
A. Rapid reaction with precursor because no other interference gas for oxidation
like over 80% oxygen exists.
B. Possible to reduce pure ozone pressure to at least 1/5 compared to a
conventional ozone gas if ozone molecular numbers are identical.  This
prevents inactivity of ozone by thermal decomposition at high temperature
because it can reduce thermal conductivity of gas.
C. Possible to reduce impurity of metal and organic materials that causes defect
for ALD high-k films.
Suitable to oxidation source for high
temperature ALD process
Pure ozone generator & process with POG(english)

More Related Content

What's hot

Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdf
Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdfLaporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdf
Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdfAshabulKahfi52
 
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografi
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografiITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografi
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografiFransiska Puteri
 
Acara 2 LIPIDA DAN LIPASE
Acara 2 LIPIDA DAN LIPASEAcara 2 LIPIDA DAN LIPASE
Acara 2 LIPIDA DAN LIPASEUfi Ufy
 
SUPERHYDROPHOBIC WINDSHIELD
SUPERHYDROPHOBIC WINDSHIELDSUPERHYDROPHOBIC WINDSHIELD
SUPERHYDROPHOBIC WINDSHIELDPraveen Kumar B
 
steel bridge painting.ppt
steel bridge painting.pptsteel bridge painting.ppt
steel bridge painting.pptSonKumarPatel
 
Corrosion in pipeline
Corrosion in pipelineCorrosion in pipeline
Corrosion in pipelineDuy Vu
 
Thermal barrier coating seminar
Thermal barrier coating seminarThermal barrier coating seminar
Thermal barrier coating seminarDebendraMeher1
 
Corrosion Process and Control
Corrosion Process and ControlCorrosion Process and Control
Corrosion Process and ControlAnsar Lawi
 
Pelapisan Logam Pada Plastik
Pelapisan Logam Pada PlastikPelapisan Logam Pada Plastik
Pelapisan Logam Pada PlastikAbrianto Akuan
 
Polymer Extrusion problems & Defects
Polymer Extrusion problems & DefectsPolymer Extrusion problems & Defects
Polymer Extrusion problems & DefectsHany G. Amer
 
Cellulose acetate research
Cellulose acetate researchCellulose acetate research
Cellulose acetate researchMahammad Khadafi
 
Ground Penetrating Radar (GPR) | Military | UXO
Ground Penetrating Radar (GPR) | Military | UXOGround Penetrating Radar (GPR) | Military | UXO
Ground Penetrating Radar (GPR) | Military | UXOSensors & Software Inc.
 

What's hot (18)

Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdf
Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdfLaporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdf
Laporan Resmi Praktikum Penentuan Jenis Asam Amino dalam Sampel.pdf
 
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografi
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografiITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografi
ITP UNS SEMESTER 2 Laporan KimTik Acara 6 kromatografi
 
Acara 2 LIPIDA DAN LIPASE
Acara 2 LIPIDA DAN LIPASEAcara 2 LIPIDA DAN LIPASE
Acara 2 LIPIDA DAN LIPASE
 
Aramco approved vendor list 2015
Aramco approved vendor list 2015Aramco approved vendor list 2015
Aramco approved vendor list 2015
 
SUPERHYDROPHOBIC WINDSHIELD
SUPERHYDROPHOBIC WINDSHIELDSUPERHYDROPHOBIC WINDSHIELD
SUPERHYDROPHOBIC WINDSHIELD
 
Pemisahan
PemisahanPemisahan
Pemisahan
 
steel bridge painting.ppt
steel bridge painting.pptsteel bridge painting.ppt
steel bridge painting.ppt
 
Efek temperatur
Efek temperaturEfek temperatur
Efek temperatur
 
Corrosion in pipeline
Corrosion in pipelineCorrosion in pipeline
Corrosion in pipeline
 
Powder coating
Powder coatingPowder coating
Powder coating
 
Thermal barrier coating seminar
Thermal barrier coating seminarThermal barrier coating seminar
Thermal barrier coating seminar
 
Corrosion Process and Control
Corrosion Process and ControlCorrosion Process and Control
Corrosion Process and Control
 
Pelapisan Logam Pada Plastik
Pelapisan Logam Pada PlastikPelapisan Logam Pada Plastik
Pelapisan Logam Pada Plastik
 
Uji ruggedness
Uji ruggednessUji ruggedness
Uji ruggedness
 
Polymer Extrusion problems & Defects
Polymer Extrusion problems & DefectsPolymer Extrusion problems & Defects
Polymer Extrusion problems & Defects
 
Cellulose acetate research
Cellulose acetate researchCellulose acetate research
Cellulose acetate research
 
Ground Penetrating Radar (GPR) | Military | UXO
Ground Penetrating Radar (GPR) | Military | UXOGround Penetrating Radar (GPR) | Military | UXO
Ground Penetrating Radar (GPR) | Military | UXO
 
Karakterisasi bet
Karakterisasi betKarakterisasi bet
Karakterisasi bet
 

Similar to Pure ozone generator & process with POG(english)

PO-ALD_Technical review_MeidenNPI( in English)20221026.pdf
PO-ALD_Technical review_MeidenNPI( in English)20221026.pdfPO-ALD_Technical review_MeidenNPI( in English)20221026.pdf
PO-ALD_Technical review_MeidenNPI( in English)20221026.pdfssuser424fef1
 
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...ssuser424fef1
 
Technology of cleaning and destruction of a surface of semiconductor plates u...
Technology of cleaning and destruction of a surface of semiconductor plates u...Technology of cleaning and destruction of a surface of semiconductor plates u...
Technology of cleaning and destruction of a surface of semiconductor plates u...Максим Зарезов
 
Mattson-RTP-3000.pdf
Mattson-RTP-3000.pdfMattson-RTP-3000.pdf
Mattson-RTP-3000.pdfACAllen2
 
Membrana training
Membrana trainingMembrana training
Membrana trainingbzmiller
 
Atomic Layer Deposition: a process technology for transparent conducting oxides
Atomic Layer Deposition: a process technology for transparent conducting oxidesAtomic Layer Deposition: a process technology for transparent conducting oxides
Atomic Layer Deposition: a process technology for transparent conducting oxidescdtpv
 
GPO Application Dataset
GPO Application DatasetGPO Application Dataset
GPO Application Datasetjnic
 
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...Adriana de Araujo
 
Industrial Perspectives on Large-Area TCOs
Industrial Perspectives on Large-Area TCOsIndustrial Perspectives on Large-Area TCOs
Industrial Perspectives on Large-Area TCOscdtpv
 
Arezoodoktkonf2007
Arezoodoktkonf2007Arezoodoktkonf2007
Arezoodoktkonf2007atungler
 
Achievements In Industrial Ozone Bleaching Germer, Metais &amp; Hostachy
Achievements In Industrial Ozone Bleaching   Germer, Metais &amp; HostachyAchievements In Industrial Ozone Bleaching   Germer, Metais &amp; Hostachy
Achievements In Industrial Ozone Bleaching Germer, Metais &amp; HostachyJCHostachy
 
Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Conference Papers
 
Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Conference Papers
 
Turbin Blade Coating
Turbin Blade CoatingTurbin Blade Coating
Turbin Blade CoatingThu Nguyen
 
Paper id 41201605
Paper id 41201605Paper id 41201605
Paper id 41201605IJRAT
 
Monnet EL presentation 21 10 11.ppt
Monnet EL presentation 21 10 11.pptMonnet EL presentation 21 10 11.ppt
Monnet EL presentation 21 10 11.pptPraveenYadav102375
 

Similar to Pure ozone generator & process with POG(english) (20)

PO-ALD_Technical review_MeidenNPI( in English)20221026.pdf
PO-ALD_Technical review_MeidenNPI( in English)20221026.pdfPO-ALD_Technical review_MeidenNPI( in English)20221026.pdf
PO-ALD_Technical review_MeidenNPI( in English)20221026.pdf
 
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...
【Meiden NPI】Introduction of Pure ozone generator and related process_rev.._ (...
 
Technology of cleaning and destruction of a surface of semiconductor plates u...
Technology of cleaning and destruction of a surface of semiconductor plates u...Technology of cleaning and destruction of a surface of semiconductor plates u...
Technology of cleaning and destruction of a surface of semiconductor plates u...
 
Mattson-RTP-3000.pdf
Mattson-RTP-3000.pdfMattson-RTP-3000.pdf
Mattson-RTP-3000.pdf
 
Membrana training
Membrana trainingMembrana training
Membrana training
 
Atomic Layer Deposition: a process technology for transparent conducting oxides
Atomic Layer Deposition: a process technology for transparent conducting oxidesAtomic Layer Deposition: a process technology for transparent conducting oxides
Atomic Layer Deposition: a process technology for transparent conducting oxides
 
GPO Application Dataset
GPO Application DatasetGPO Application Dataset
GPO Application Dataset
 
AZO Thesis_Mohammad Shakil Khan
AZO Thesis_Mohammad Shakil KhanAZO Thesis_Mohammad Shakil Khan
AZO Thesis_Mohammad Shakil Khan
 
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...
ORGANIC COATINGS FOR CORROSION PROTECTION OF TRANSFORMERS IN UNDERGROUND CHAM...
 
Industrial Perspectives on Large-Area TCOs
Industrial Perspectives on Large-Area TCOsIndustrial Perspectives on Large-Area TCOs
Industrial Perspectives on Large-Area TCOs
 
Arezoodoktkonf2007
Arezoodoktkonf2007Arezoodoktkonf2007
Arezoodoktkonf2007
 
Achievements In Industrial Ozone Bleaching Germer, Metais &amp; Hostachy
Achievements In Industrial Ozone Bleaching   Germer, Metais &amp; HostachyAchievements In Industrial Ozone Bleaching   Germer, Metais &amp; Hostachy
Achievements In Industrial Ozone Bleaching Germer, Metais &amp; Hostachy
 
ALD Tutorial
ALD Tutorial ALD Tutorial
ALD Tutorial
 
ALD Tutorial
ALD TutorialALD Tutorial
ALD Tutorial
 
Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...
 
Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...Atomization of reduced graphene oxide ultra thin film for transparent electro...
Atomization of reduced graphene oxide ultra thin film for transparent electro...
 
Turbin Blade Coating
Turbin Blade CoatingTurbin Blade Coating
Turbin Blade Coating
 
Paper id 41201605
Paper id 41201605Paper id 41201605
Paper id 41201605
 
Ldb Convergenze Parallele_07
Ldb Convergenze Parallele_07Ldb Convergenze Parallele_07
Ldb Convergenze Parallele_07
 
Monnet EL presentation 21 10 11.ppt
Monnet EL presentation 21 10 11.pptMonnet EL presentation 21 10 11.ppt
Monnet EL presentation 21 10 11.ppt
 

Recently uploaded

Snow Chain-Integrated Tire for a Safe Drive on Winter Roads
Snow Chain-Integrated Tire for a Safe Drive on Winter RoadsSnow Chain-Integrated Tire for a Safe Drive on Winter Roads
Snow Chain-Integrated Tire for a Safe Drive on Winter RoadsHyundai Motor Group
 
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptx
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptxMaking_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptx
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptxnull - The Open Security Community
 
CloudStudio User manual (basic edition):
CloudStudio User manual (basic edition):CloudStudio User manual (basic edition):
CloudStudio User manual (basic edition):comworks
 
Benefits Of Flutter Compared To Other Frameworks
Benefits Of Flutter Compared To Other FrameworksBenefits Of Flutter Compared To Other Frameworks
Benefits Of Flutter Compared To Other FrameworksSoftradix Technologies
 
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)Bun (KitWorks Team Study 노별마루 발표 2024.4.22)
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)Wonjun Hwang
 
Bluetooth Controlled Car with Arduino.pdf
Bluetooth Controlled Car with Arduino.pdfBluetooth Controlled Car with Arduino.pdf
Bluetooth Controlled Car with Arduino.pdfngoud9212
 
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...Integration and Automation in Practice: CI/CD in Mule Integration and Automat...
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...Patryk Bandurski
 
Artificial intelligence in the post-deep learning era
Artificial intelligence in the post-deep learning eraArtificial intelligence in the post-deep learning era
Artificial intelligence in the post-deep learning eraDeakin University
 
APIForce Zurich 5 April Automation LPDG
APIForce Zurich 5 April  Automation LPDGAPIForce Zurich 5 April  Automation LPDG
APIForce Zurich 5 April Automation LPDGMarianaLemus7
 
Designing IA for AI - Information Architecture Conference 2024
Designing IA for AI - Information Architecture Conference 2024Designing IA for AI - Information Architecture Conference 2024
Designing IA for AI - Information Architecture Conference 2024Enterprise Knowledge
 
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024BookNet Canada
 
Swan(sea) Song – personal research during my six years at Swansea ... and bey...
Swan(sea) Song – personal research during my six years at Swansea ... and bey...Swan(sea) Song – personal research during my six years at Swansea ... and bey...
Swan(sea) Song – personal research during my six years at Swansea ... and bey...Alan Dix
 
Key Features Of Token Development (1).pptx
Key  Features Of Token  Development (1).pptxKey  Features Of Token  Development (1).pptx
Key Features Of Token Development (1).pptxLBM Solutions
 
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmatics
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmaticsKotlin Multiplatform & Compose Multiplatform - Starter kit for pragmatics
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmaticsAndrey Dotsenko
 
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024BookNet Canada
 
Human Factors of XR: Using Human Factors to Design XR Systems
Human Factors of XR: Using Human Factors to Design XR SystemsHuman Factors of XR: Using Human Factors to Design XR Systems
Human Factors of XR: Using Human Factors to Design XR SystemsMark Billinghurst
 
Unlocking the Potential of the Cloud for IBM Power Systems
Unlocking the Potential of the Cloud for IBM Power SystemsUnlocking the Potential of the Cloud for IBM Power Systems
Unlocking the Potential of the Cloud for IBM Power SystemsPrecisely
 
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024BookNet Canada
 

Recently uploaded (20)

Snow Chain-Integrated Tire for a Safe Drive on Winter Roads
Snow Chain-Integrated Tire for a Safe Drive on Winter RoadsSnow Chain-Integrated Tire for a Safe Drive on Winter Roads
Snow Chain-Integrated Tire for a Safe Drive on Winter Roads
 
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptx
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptxMaking_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptx
Making_way_through_DLL_hollowing_inspite_of_CFG_by_Debjeet Banerjee.pptx
 
DMCC Future of Trade Web3 - Special Edition
DMCC Future of Trade Web3 - Special EditionDMCC Future of Trade Web3 - Special Edition
DMCC Future of Trade Web3 - Special Edition
 
CloudStudio User manual (basic edition):
CloudStudio User manual (basic edition):CloudStudio User manual (basic edition):
CloudStudio User manual (basic edition):
 
Benefits Of Flutter Compared To Other Frameworks
Benefits Of Flutter Compared To Other FrameworksBenefits Of Flutter Compared To Other Frameworks
Benefits Of Flutter Compared To Other Frameworks
 
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)Bun (KitWorks Team Study 노별마루 발표 2024.4.22)
Bun (KitWorks Team Study 노별마루 발표 2024.4.22)
 
Bluetooth Controlled Car with Arduino.pdf
Bluetooth Controlled Car with Arduino.pdfBluetooth Controlled Car with Arduino.pdf
Bluetooth Controlled Car with Arduino.pdf
 
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...Integration and Automation in Practice: CI/CD in Mule Integration and Automat...
Integration and Automation in Practice: CI/CD in Mule Integration and Automat...
 
Artificial intelligence in the post-deep learning era
Artificial intelligence in the post-deep learning eraArtificial intelligence in the post-deep learning era
Artificial intelligence in the post-deep learning era
 
APIForce Zurich 5 April Automation LPDG
APIForce Zurich 5 April  Automation LPDGAPIForce Zurich 5 April  Automation LPDG
APIForce Zurich 5 April Automation LPDG
 
Designing IA for AI - Information Architecture Conference 2024
Designing IA for AI - Information Architecture Conference 2024Designing IA for AI - Information Architecture Conference 2024
Designing IA for AI - Information Architecture Conference 2024
 
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
#StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
 
Hot Sexy call girls in Panjabi Bagh 🔝 9953056974 🔝 Delhi escort Service
Hot Sexy call girls in Panjabi Bagh 🔝 9953056974 🔝 Delhi escort ServiceHot Sexy call girls in Panjabi Bagh 🔝 9953056974 🔝 Delhi escort Service
Hot Sexy call girls in Panjabi Bagh 🔝 9953056974 🔝 Delhi escort Service
 
Swan(sea) Song – personal research during my six years at Swansea ... and bey...
Swan(sea) Song – personal research during my six years at Swansea ... and bey...Swan(sea) Song – personal research during my six years at Swansea ... and bey...
Swan(sea) Song – personal research during my six years at Swansea ... and bey...
 
Key Features Of Token Development (1).pptx
Key  Features Of Token  Development (1).pptxKey  Features Of Token  Development (1).pptx
Key Features Of Token Development (1).pptx
 
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmatics
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmaticsKotlin Multiplatform & Compose Multiplatform - Starter kit for pragmatics
Kotlin Multiplatform & Compose Multiplatform - Starter kit for pragmatics
 
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024
Transcript: New from BookNet Canada for 2024: BNC BiblioShare - Tech Forum 2024
 
Human Factors of XR: Using Human Factors to Design XR Systems
Human Factors of XR: Using Human Factors to Design XR SystemsHuman Factors of XR: Using Human Factors to Design XR Systems
Human Factors of XR: Using Human Factors to Design XR Systems
 
Unlocking the Potential of the Cloud for IBM Power Systems
Unlocking the Potential of the Cloud for IBM Power SystemsUnlocking the Potential of the Cloud for IBM Power Systems
Unlocking the Potential of the Cloud for IBM Power Systems
 
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
Transcript: #StandardsGoals for 2024: What’s new for BISAC - Tech Forum 2024
 

Pure ozone generator & process with POG(english)

  • 1. Pure Ozone Generator & Process with POG MEIDEN NANOPROCESS INNOVATIONS, INC. 1/13/2022
  • 2. 2/22 1. Features of Pure Ozone Generator (POG) 2. Working principle 3. Comparison with competing techniques 4. System Structure 5. Customer A (O source for Molecular Beam Epitaxy) 6. Customer B (In-situ mask/ reticle optics cleaning) 7. Customer C (Surface hydrophilization) 8. Pure Ozone deposited ALD (SiO2, TiO2, Al2O3) 9. Specifications (Batch Type) Contents
  • 3. 3/22 1. Features of POG 1. Extremely high ozone concentration (>90%) 2. Extremely high purity (elimination of NOx, metal & organic particle) 3. No damage (electrically neutral & thermal energy O* source) 4. High efficiency (minimize pre-decomposition of ozone) 5. Real-time fine control of flow rate and pressure of supplied ozone 6. High compatibility with low pressure processes (e.g. ALD, CVD, MBE PVD, PLD) 7. Intuitive operation (easily interface with the process chamber) 8. Diverse lineup of products from R&D to mass production 9. Continuous safe handling of high volume liquid ozone (NPI original hardware and software) **AIST=The National Institute of Advanced Industrial Science and Technology
  • 4. 4/22 2. Working Principle (Accumulation) Evacuation Cryocooler Ozonator Open Open Cu block (set around 90K) Liquid O3 O2 O3/O2 mixture gas Close Open Stainless-steel vessel Liquefaction O2 O3 Evacuation Use of high purity O2 (semiconductor grade) with 0.1wt % Ar is recommended for ultra high purity demand
  • 5. 5/22 2. Working Principle (Supply) Ozonator O2 Close Phase 2 (Supply) Close Close Pure O3 gas Impurity (e.g., NOx) free 80 100 120 140 160 180 温度 [K] 蒸気圧 [Pa] O2 NO O3 N2O NO2 105 103 101 10-1 10-3 Temperature [K] Cryocooler Cu block (set around 120K) Stainless-steel vessel Vapor Pressure [Pa] Open ・Basically control O3 pressure at supply ・Keep liquid O3 at stand-by of supply Supply Accumulation
  • 6. 6/22 3. Comparison with competing techniques (O3) Pure Ozone generator Competing Technology (e.g., MKS) Customer’s benefits Ozone Concentration 2,000g/Nm3 (more than 90wt.%) 210g/Nm3 (14wt.%) - Lower temp process - Compatible with low pressure process such as MBE, sputter and pulse laser deposition Ozone gas flow rate Up to 0.5L/min (5L/min when 10% duty (e.g., ALD process, standby as O3 vapor) 1 - 24L/min Flexible (e.g., step-by-step time-variant) ozone supply possible Impurity Lower than 1 ppm (distilled out) 0.1% level of NOx, H2O included No damage caused by impurity and NOx-induced defects and disorders Controllability (Repeatability) Extremely high (Mass flow + O3 vapor pressure) High (Mass flow) Precise metal oxide composition (stoichiometry) control achieved Safety Extremely high even in case of mixing with other process gases thanks to high purity of ozone Mixing with other process gases in high pressure may cause explosive reaction Applicable to various processes
  • 7. 7/22 4. System Structure O2, Ar(N2) O3/O2, Ar N2 Pure O3 Ceramic Filter Cryocooler Dry Pump Vacuum for thermal insulation Stainless-steel enclosure Copper Block Liquid Ozone Enclosure(negative pressure inside) Vessel Ozonator Pump O3 decomposer Check Valve N2 N.O. O3 sensor ・Automatic operation by sequencer ・Continuous display of machine status ・Quick detection of failure and necessity of maintenance ・Sensors, interlocks & emergency operation at blackout Flow Meter N.O. O3 pressure, flow rate O3 concentration, Time profile Machine Status Remaining supply time
  • 8. Copyright © MEIDEN NANOPROCESS INNOVATION, INC. All Rights Reserved. NPG-200023-0 8/14 4.Safe Operation Area of Ozone gas Throughout the operation time, ozone gas concentration and pressure are monitored and controlled so as to keep them inside the red area above.(No need to care for users) 1atm (100,000Pa) 0.1atm (10,000Pa) 0.01atm (1000Pa) 0% 10% 20% 30% 40% 50% 60% 70% 80% 90% 100% Our Experiment (Explosive decomposition of ozone) 0.44atm Guaranteed by a manufacturer of Ozonators SOA (Safe Operation Area) of O3/O2/N2 mixture gas (in case without initiators such as UV light, electric energy and co-existing organic particles) Ozone Concentration [vol.%] Total Pressure SOA controlled by our Pure Ozone Generator 3atm, 20% CONFIDENTIAL 8/22
  • 9. 9/22 5. Customer A (O source for Molecular Beam Epitaxy) ZnO Sub 1. High Concentration (highly oxidation), 2. High Purity (NOx free), 3. Damage free (replacement of plasma oxidation), 4. High Efficiency (minimize pre-decomposition of ozone), 5. Real-time fine control of flow rate and pressure of supplied ozone, 6. High compatibility with low pressure processes, 7. Intuitive operation & easily interface with the process chamber, 8. Affordable price for R&D (future mass production) Customer’s Satisfactions Sample Structure Ti 2DE Gas Ni/Au Electrode
  • 10. 10/22 5. Data 1 of Customer A O2 Plasma Pure Ozone Depo Temp. = 880C Depo Temp. = 790C Depo Temp. = 750C 2m MgZnO ZnO buffer layer ZnO substrate ・ POG can achieve a smooth surface by MBE deposition at low temperature and prevent crystallization. ・ No metal (Mg) diffusion ZnO Sub ZnOSub
  • 11. 11/22 Achieved the highest level of mobility in the world because of smooth surface and elimination of impurities = 1.3x106 cm2 /Vs @n=8.3 x 1010 cm-2 T<100mK T=500mK Insufficient screening of impurities within the crystal structure Increased interface roughness or alloy scattering induced by random potential of Mg content In comparison to historic data, the maximum  of films has occurred at decreasing densities with the employment of Pure Ozone Gas . Sci. Rep. 6, 26598; doi: 10.1038/srep26598 (2016) 5. Data 2 of Customer A
  • 12. 12/22 6. Customer B (In-situ mask/reticle optics cleaning) Electron beam mask writer O source (Pure Ozone Gas) OH or H source (e.g., C2H4 gas) Silicon stencil photo-mask Vacuum (base: 10-8Pa) Carbon, particles, NOx, ions, electrons, UV, IR Customer’s Satisfactions 6. Highly compatible with low pressure processes, 1. High Concentration (highly oxidation), 3. Damage free (no reflectivity change of mirror surface ), 2. High Purity (NOx free, no corrosion), 4. High Efficiency (minimize pre-decomposition of ozone after 20 meter transfer), 8. Capability of 24/7/365 mass production
  • 13. 13/22 6. Customer B (Ozone Ethylene Radical “OER“Process) Developed OER (Ozone Ethylene Radical) process to generate OH,O,H radicals effectively at lower than 100ºC and applies OER to actual processes.
  • 14. 14/22 Mirror * Material from EUVL symposium 2009 with Selete (Semiconductor Leading Edge Technologies, Inc.) Substrate [Mo/Si] layered Mo Si Si (or Ru or TiO2/Nb2O5) capping layer Pure Ozone Gas Graphite contamination 6. Customer B (low temperature & damage free process) Carbon contamination can be removed without oxidation of mirror substrate (metal cap & Si layers) and degradation of reflectivity of mirror.
  • 15. 15/22 More than one month duration of hydrophilicity No thermal and physical damage Increased permittivity of the fiber OER process (40 min) Results 7. Customer C (surface hydrophilization) Hydrophilization on carbon fiber: Persistence of hydrophilicity (high surface energy)
  • 16. 16/22 Carrier gas (Ar) Al2O3 film (25nm) on Si deposited at Room temp. Substrate (200mm) Vacuum C2H4 (option) Precursor Time Flow rate Pure O3 Pure O3 C2H4 Precursor O+ OH radical 0 0 0 ALD mode CVD mode Al2O3 (ALD) SiO2 (CVD) Substrate Depth-profile- optimized coating film 1-5 sec 0 Carrier gas 8. ALD process (Plasma-defect free oxides grown at <130C) Developed low temperature deposition process utilizing a big advantage of Pure Ozone gas. ・Low temp, low impurity, defect free ・High efficiency of gas usage ・On demand supply of ozone ・Multilayer (universal oxidation source) TMA (Orthrus, TDMAT, TDMAS)
  • 17. 17/22 10 -10 10 -8 10 -6 10 -4 10 -2 10 0 Leakage current density (A/cm -2 ) 10 8 6 4 2 0 Applied electric field strength (MV/cm)  7%O3 100%O3 30 o C 100 o C 150 o C (a) Ar Time Pure O3 C2H4 TMA (Al(CH3)3) 0 0 0 0 0.1sec 1cycle (12sec) 4sec 40nm 8. Superior dielectric Property Flow rate Better dielectric property
  • 18. Copyright © MEIDEN NANOPROCESS INNOVATIONS, INC. All Rights Reserved. 18/45 Sharp interface 200nm 8. Sharp interface (<1nm) and small carbon impurity SiO2 TiO2 SiO2 TiO2 SiO2 C impurity free Glass (SiO2) substrate 18/22
  • 19. Copyright © MEIDEN NANOPROCESS INNOVATIONS, INC. All Rights Reserved. 8. Superior Coverage (Underlying morphology independent process) ~5 um ~200 um Process conditions Process temperature 120C Substrate Si wafer (200mm) Precursor gas Orthrus (From Air Liquide) G.P.C. 0.24 nm/cycle ALD one cycle 120 sec Trench Surface Trench Bottom Conformal deposition to 40:1 high-aspect ratio trench structure SiO2 Si SiO2 Si 19/22
  • 20. 20/22 8. High gas usage efficiency (environment friendly process) Required Ozone Volume for 1nm Al 2 O 3 film deposition (cc) NPI proprietary process (on demand supply: no ozone gas is disposed during the whole ALD process) achieves higher efficiency of ozone usage than conventional low concentration O3 ALD process where ozone gas flow needs to be kept besides the ozone pulses to outside the ALD chamber for repeatability. *1 Chem. Mater., Vol. 18, No. 16, 2006 3765 *2 J. Phys. Chem. C 2008, 112, 19530–19539 Wafer size: 8inch (200mm) Deposition temp. :120C Our data Efficient, Low process running cost
  • 21. 21/22 Item Specification Size, Weight 900(W)900(D)1700(H) 470kg Input Power 3-phase AC 200-230V, 30A 50/60Hz Utility components Compressed dry air for ventilation, Nitrogen gas, oxygen gas, cooling water Max ozone storage volume 8,000 cm3 (at 0deg.C 1atm gas phase) O3 gas flow rate stability ±5%(Option ±1%) 20~200sccm O3 concentration 90% or higher (at the outlet of our system) O3 pressure 1,000Pa - 10,000Pa at the exit of the liquid O3 vessel (Piping) Transfer distance of O3 gas <20m Utility ratio 120min charging – 800min operation (@10sccm) 9. Specifications (Batch Type) Refer to product brochures for specifications of continuous type
  • 22. 22/22 Conclusions: Pure Ozone as Oxidation Source for ALD Pure Ozone • Ozone ~100%, theoretically no impurity of metal and organic materials • Generated high volume pure ozone safely (SEMI S2 compliant) only by Pure Ozone Generator (POG)  Widely used at semiconductor foundries in the world! Expected effect from ALD with POG A. Rapid reaction with precursor because no other interference gas for oxidation like over 80% oxygen exists. B. Possible to reduce pure ozone pressure to at least 1/5 compared to a conventional ozone gas if ozone molecular numbers are identical.  This prevents inactivity of ozone by thermal decomposition at high temperature because it can reduce thermal conductivity of gas. C. Possible to reduce impurity of metal and organic materials that causes defect for ALD high-k films. Suitable to oxidation source for high temperature ALD process