Efficient charge transfer induced organic/inorganic based hybrid heterojunction of Ppy/GaN nanorods for high-performance self-powered UV photodetection
My research involves multiscale modeling, validation and analysis of experimental data to understand complex physical phenomenon in thin film nanoscale energetic materials.
Iwashita - Laminated conductor structure for rf in normal conducting casethinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Laminated Conductor Structure for RF in normal conducting case (Yoshihisa Iwashita - 20')
Speaker: Yoshihisa Iwashita - Kyoto University | Duration: 20 min.
Abstract
Laminated conductor structure for RF was proposed by A.M. Clogston in 1951.The motivation was to reduce the skin-effect loss caused by Joule heating.When the currents are well distributed to conductor foils that is thinner than the skin depth, the current density can be reduced and the power dissipation in the conductor can be reduced.This structure, however, has not been practically used, maybe because of some restrictions to apply. When we apply the similar layered structure for superconducting (sc.) surfaces, similar restriction may hit.Some thoughts that may be useful for sc. from the study on normal conducting case will be discussed.
Dr. Mitat A. Birkan presents an overview of his program, Space Propulsion and Power, at the AFOSR 2013 Spring Review. At this review, Program Officers from AFOSR Technical Divisions will present briefings that highlight basic research programs beneficial to the Air Force.
A Hybrid Model to Predict Electron and Ion Distributions in Entire Interelect...Fa-Gung Fan
Atmospheric direct current (dc) corona discharge
from thin wires or sharp needles has been widely used as an ion
source in many devices such as photocopiers, laser printers, and
electronic air cleaners. Existing numerical models to predict the
electron distribution in the corona plasma are based on charge
continuity equations and the simplified Boltzmann equation. In
this paper, negative dc corona discharges produced from a thin
wire in dry air are modeled using a hybrid model of modified
particle-in-cell plus Monte Carlo collision (PIC-MCC) and a
continuum approach. The PIC-MCC model predicts densities of
charge carriers and electron kinetic energy distributions in the
plasma region, while the continuum model predicts the densities of
charge carriers in the unipolar ion region. Results from the hybrid
model are compared with those from prior continuum models.
Superior to the prior continuum model, the hybrid model is able
to predict the voltage–current curve of corona discharges. The
PIC-MCC simulation results also suggest the validity of the local
approximation used to solve the Boltzmann equation in the prior
continuum model.
Efficient charge transfer induced organic/inorganic based hybrid heterojunction of Ppy/GaN nanorods for high-performance self-powered UV photodetection
My research involves multiscale modeling, validation and analysis of experimental data to understand complex physical phenomenon in thin film nanoscale energetic materials.
Iwashita - Laminated conductor structure for rf in normal conducting casethinfilmsworkshop
http://www.surfacetreatments.it/thinfilms
Laminated Conductor Structure for RF in normal conducting case (Yoshihisa Iwashita - 20')
Speaker: Yoshihisa Iwashita - Kyoto University | Duration: 20 min.
Abstract
Laminated conductor structure for RF was proposed by A.M. Clogston in 1951.The motivation was to reduce the skin-effect loss caused by Joule heating.When the currents are well distributed to conductor foils that is thinner than the skin depth, the current density can be reduced and the power dissipation in the conductor can be reduced.This structure, however, has not been practically used, maybe because of some restrictions to apply. When we apply the similar layered structure for superconducting (sc.) surfaces, similar restriction may hit.Some thoughts that may be useful for sc. from the study on normal conducting case will be discussed.
Dr. Mitat A. Birkan presents an overview of his program, Space Propulsion and Power, at the AFOSR 2013 Spring Review. At this review, Program Officers from AFOSR Technical Divisions will present briefings that highlight basic research programs beneficial to the Air Force.
A Hybrid Model to Predict Electron and Ion Distributions in Entire Interelect...Fa-Gung Fan
Atmospheric direct current (dc) corona discharge
from thin wires or sharp needles has been widely used as an ion
source in many devices such as photocopiers, laser printers, and
electronic air cleaners. Existing numerical models to predict the
electron distribution in the corona plasma are based on charge
continuity equations and the simplified Boltzmann equation. In
this paper, negative dc corona discharges produced from a thin
wire in dry air are modeled using a hybrid model of modified
particle-in-cell plus Monte Carlo collision (PIC-MCC) and a
continuum approach. The PIC-MCC model predicts densities of
charge carriers and electron kinetic energy distributions in the
plasma region, while the continuum model predicts the densities of
charge carriers in the unipolar ion region. Results from the hybrid
model are compared with those from prior continuum models.
Superior to the prior continuum model, the hybrid model is able
to predict the voltage–current curve of corona discharges. The
PIC-MCC simulation results also suggest the validity of the local
approximation used to solve the Boltzmann equation in the prior
continuum model.
Design of an Aerodynamic Lens for PM2.5 Chemical Composition AnalysisFa-Gung Fan
The Nanojet as an aerosol sample inlet, concentrator, and transfer line to the Jet Propulsion Laboratory (JPL) quadrupole ion trap (QIT) mass spectrometer (MS).
State of ICS and IoT Cyber Threat Landscape Report 2024 previewPrayukth K V
The IoT and OT threat landscape report has been prepared by the Threat Research Team at Sectrio using data from Sectrio, cyber threat intelligence farming facilities spread across over 85 cities around the world. In addition, Sectrio also runs AI-based advanced threat and payload engagement facilities that serve as sinks to attract and engage sophisticated threat actors, and newer malware including new variants and latent threats that are at an earlier stage of development.
The latest edition of the OT/ICS and IoT security Threat Landscape Report 2024 also covers:
State of global ICS asset and network exposure
Sectoral targets and attacks as well as the cost of ransom
Global APT activity, AI usage, actor and tactic profiles, and implications
Rise in volumes of AI-powered cyberattacks
Major cyber events in 2024
Malware and malicious payload trends
Cyberattack types and targets
Vulnerability exploit attempts on CVEs
Attacks on counties – USA
Expansion of bot farms – how, where, and why
In-depth analysis of the cyber threat landscape across North America, South America, Europe, APAC, and the Middle East
Why are attacks on smart factories rising?
Cyber risk predictions
Axis of attacks – Europe
Systemic attacks in the Middle East
Download the full report from here:
https://sectrio.com/resources/ot-threat-landscape-reports/sectrio-releases-ot-ics-and-iot-security-threat-landscape-report-2024/
JMeter webinar - integration with InfluxDB and GrafanaRTTS
Watch this recorded webinar about real-time monitoring of application performance. See how to integrate Apache JMeter, the open-source leader in performance testing, with InfluxDB, the open-source time-series database, and Grafana, the open-source analytics and visualization application.
In this webinar, we will review the benefits of leveraging InfluxDB and Grafana when executing load tests and demonstrate how these tools are used to visualize performance metrics.
Length: 30 minutes
Session Overview
-------------------------------------------
During this webinar, we will cover the following topics while demonstrating the integrations of JMeter, InfluxDB and Grafana:
- What out-of-the-box solutions are available for real-time monitoring JMeter tests?
- What are the benefits of integrating InfluxDB and Grafana into the load testing stack?
- Which features are provided by Grafana?
- Demonstration of InfluxDB and Grafana using a practice web application
To view the webinar recording, go to:
https://www.rttsweb.com/jmeter-integration-webinar
Essentials of Automations: Optimizing FME Workflows with ParametersSafe Software
Are you looking to streamline your workflows and boost your projects’ efficiency? Do you find yourself searching for ways to add flexibility and control over your FME workflows? If so, you’re in the right place.
Join us for an insightful dive into the world of FME parameters, a critical element in optimizing workflow efficiency. This webinar marks the beginning of our three-part “Essentials of Automation” series. This first webinar is designed to equip you with the knowledge and skills to utilize parameters effectively: enhancing the flexibility, maintainability, and user control of your FME projects.
Here’s what you’ll gain:
- Essentials of FME Parameters: Understand the pivotal role of parameters, including Reader/Writer, Transformer, User, and FME Flow categories. Discover how they are the key to unlocking automation and optimization within your workflows.
- Practical Applications in FME Form: Delve into key user parameter types including choice, connections, and file URLs. Allow users to control how a workflow runs, making your workflows more reusable. Learn to import values and deliver the best user experience for your workflows while enhancing accuracy.
- Optimization Strategies in FME Flow: Explore the creation and strategic deployment of parameters in FME Flow, including the use of deployment and geometry parameters, to maximize workflow efficiency.
- Pro Tips for Success: Gain insights on parameterizing connections and leveraging new features like Conditional Visibility for clarity and simplicity.
We’ll wrap up with a glimpse into future webinars, followed by a Q&A session to address your specific questions surrounding this topic.
Don’t miss this opportunity to elevate your FME expertise and drive your projects to new heights of efficiency.
Key Trends Shaping the Future of Infrastructure.pdfCheryl Hung
Keynote at DIGIT West Expo, Glasgow on 29 May 2024.
Cheryl Hung, ochery.com
Sr Director, Infrastructure Ecosystem, Arm.
The key trends across hardware, cloud and open-source; exploring how these areas are likely to mature and develop over the short and long-term, and then considering how organisations can position themselves to adapt and thrive.
Slack (or Teams) Automation for Bonterra Impact Management (fka Social Soluti...Jeffrey Haguewood
Sidekick Solutions uses Bonterra Impact Management (fka Social Solutions Apricot) and automation solutions to integrate data for business workflows.
We believe integration and automation are essential to user experience and the promise of efficient work through technology. Automation is the critical ingredient to realizing that full vision. We develop integration products and services for Bonterra Case Management software to support the deployment of automations for a variety of use cases.
This video focuses on the notifications, alerts, and approval requests using Slack for Bonterra Impact Management. The solutions covered in this webinar can also be deployed for Microsoft Teams.
Interested in deploying notification automations for Bonterra Impact Management? Contact us at sales@sidekicksolutionsllc.com to discuss next steps.
GDG Cloud Southlake #33: Boule & Rebala: Effective AppSec in SDLC using Deplo...James Anderson
Effective Application Security in Software Delivery lifecycle using Deployment Firewall and DBOM
The modern software delivery process (or the CI/CD process) includes many tools, distributed teams, open-source code, and cloud platforms. Constant focus on speed to release software to market, along with the traditional slow and manual security checks has caused gaps in continuous security as an important piece in the software supply chain. Today organizations feel more susceptible to external and internal cyber threats due to the vast attack surface in their applications supply chain and the lack of end-to-end governance and risk management.
The software team must secure its software delivery process to avoid vulnerability and security breaches. This needs to be achieved with existing tool chains and without extensive rework of the delivery processes. This talk will present strategies and techniques for providing visibility into the true risk of the existing vulnerabilities, preventing the introduction of security issues in the software, resolving vulnerabilities in production environments quickly, and capturing the deployment bill of materials (DBOM).
Speakers:
Bob Boule
Robert Boule is a technology enthusiast with PASSION for technology and making things work along with a knack for helping others understand how things work. He comes with around 20 years of solution engineering experience in application security, software continuous delivery, and SaaS platforms. He is known for his dynamic presentations in CI/CD and application security integrated in software delivery lifecycle.
Gopinath Rebala
Gopinath Rebala is the CTO of OpsMx, where he has overall responsibility for the machine learning and data processing architectures for Secure Software Delivery. Gopi also has a strong connection with our customers, leading design and architecture for strategic implementations. Gopi is a frequent speaker and well-known leader in continuous delivery and integrating security into software delivery.
Kubernetes & AI - Beauty and the Beast !?! @KCD Istanbul 2024Tobias Schneck
As AI technology is pushing into IT I was wondering myself, as an “infrastructure container kubernetes guy”, how get this fancy AI technology get managed from an infrastructure operational view? Is it possible to apply our lovely cloud native principals as well? What benefit’s both technologies could bring to each other?
Let me take this questions and provide you a short journey through existing deployment models and use cases for AI software. On practical examples, we discuss what cloud/on-premise strategy we may need for applying it to our own infrastructure to get it to work from an enterprise perspective. I want to give an overview about infrastructure requirements and technologies, what could be beneficial or limiting your AI use cases in an enterprise environment. An interactive Demo will give you some insides, what approaches I got already working for real.
Neuro-symbolic is not enough, we need neuro-*semantic*Frank van Harmelen
Neuro-symbolic (NeSy) AI is on the rise. However, simply machine learning on just any symbolic structure is not sufficient to really harvest the gains of NeSy. These will only be gained when the symbolic structures have an actual semantics. I give an operational definition of semantics as “predictable inference”.
All of this illustrated with link prediction over knowledge graphs, but the argument is general.
UiPath Test Automation using UiPath Test Suite series, part 4DianaGray10
Welcome to UiPath Test Automation using UiPath Test Suite series part 4. In this session, we will cover Test Manager overview along with SAP heatmap.
The UiPath Test Manager overview with SAP heatmap webinar offers a concise yet comprehensive exploration of the role of a Test Manager within SAP environments, coupled with the utilization of heatmaps for effective testing strategies.
Participants will gain insights into the responsibilities, challenges, and best practices associated with test management in SAP projects. Additionally, the webinar delves into the significance of heatmaps as a visual aid for identifying testing priorities, areas of risk, and resource allocation within SAP landscapes. Through this session, attendees can expect to enhance their understanding of test management principles while learning practical approaches to optimize testing processes in SAP environments using heatmap visualization techniques
What will you get from this session?
1. Insights into SAP testing best practices
2. Heatmap utilization for testing
3. Optimization of testing processes
4. Demo
Topics covered:
Execution from the test manager
Orchestrator execution result
Defect reporting
SAP heatmap example with demo
Speaker:
Deepak Rai, Automation Practice Lead, Boundaryless Group and UiPath MVP
Dev Dives: Train smarter, not harder – active learning and UiPath LLMs for do...UiPathCommunity
💥 Speed, accuracy, and scaling – discover the superpowers of GenAI in action with UiPath Document Understanding and Communications Mining™:
See how to accelerate model training and optimize model performance with active learning
Learn about the latest enhancements to out-of-the-box document processing – with little to no training required
Get an exclusive demo of the new family of UiPath LLMs – GenAI models specialized for processing different types of documents and messages
This is a hands-on session specifically designed for automation developers and AI enthusiasts seeking to enhance their knowledge in leveraging the latest intelligent document processing capabilities offered by UiPath.
Speakers:
👨🏫 Andras Palfi, Senior Product Manager, UiPath
👩🏫 Lenka Dulovicova, Product Program Manager, UiPath
GraphRAG is All You need? LLM & Knowledge GraphGuy Korland
Guy Korland, CEO and Co-founder of FalkorDB, will review two articles on the integration of language models with knowledge graphs.
1. Unifying Large Language Models and Knowledge Graphs: A Roadmap.
https://arxiv.org/abs/2306.08302
2. Microsoft Research's GraphRAG paper and a review paper on various uses of knowledge graphs:
https://www.microsoft.com/en-us/research/blog/graphrag-unlocking-llm-discovery-on-narrative-private-data/
Particle Transport, Deposition, and Removal in Xerography (Fa-Gung Fan)
1. Particle Transport, Deposition, and
Removal in Xerography
NSF CRCD Project Lecture
April 14, 2003
Fa-Gung Fan
Wilson Center for Research & Technology
Xerox Corporation
Webster, NY
http://chester.xerox.com/innovation/wcrt.html
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
2. Outline of the Lecture
General Overview of Xerography
Transport, Adhesion/Cohesion and Removal of Fine
Particles (Toner) in Xerography
Measuring Toner Charge --- Cage Blowoff, Charge Spectrograph
Electrostatic Adhesion, Detachment of Toner Particles
Measuring Toner Adhesion --- Atomic Force Microscopy (AFM),
Centrifuge Detachment, Electric Field Detachment
Measuring Cohesion --- Fluidized Bed
Modeling of Electrostatics in Subsystems
(in MAE Seminar 4:00-5:00pm today)
Q&A
Acknowledgements:
S. Chang, C. Duke, D. Hays
N. Goodman, H. Mizes
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
3. Xerographic Process
5
2 Fusing
Exposure
1 6
Cleaning
Charging
4
Transfer
Photoreceptor
SN
SN
Substrate
N
S N
Development
Paper
3
C. Duke, J. Noolandi, T. Thieret, “The surface
science of xerography,” Surface Science, 500, p.
1005, (2002)
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
4. Xerox Phaser 7700 Color Desktop Laser
Printer
22 prints/min, full-color
Xerography is a versatile technology that scales from desktop, to
office, to production machines; black-and-white, hightlight color,
and full color.
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
5. DocuColor 40 Pro Color Office
Multifunction Machine
40 prints/min, full-color
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
6. DocuTech 6180 Production Publisher
180 prints/min
Black-and-White
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
7. DocuColor iGen3 Digital Production Color
Press
100 prints/min, full-color
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
8. iGen3
Xerographic Unit
Finisher/Binder
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
9. Photoreceptor
A semiconductor whose
conductivity is a strong 0
0 5
Voltage on Surface (V)
function of light exposure.
_ _ _ _ _ _ _ _ _ _ _
_+_+
-1000
++ + + + + + ++ ++ + + +
Exposure (ergs/cm2)
Electron/hole pairs
• Requirements
– Insulator in the dark.
– Conductor when exposed to light
– Builds up enough voltage.
– Uniform properties
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
10. Charging Subsystem
HV Power HV Power HV Power
Supply (-) Supply (-) Supply (-)
Free ions are attracted Rapidly moving electrons Electrons continue to
to wire; Free electrons are and ions collide with air follow Electric Field lines
repelled. Counter-charges molecules, ionizing them to Photoreceptor until
build up on grounded surfaces. and creating a corona. uniform charge builds up
Positive Ions
Electrons
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
11. Imaging/Exposure
Traditional Analog Copier Laser Printer
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
12. Development
Photoreceptor Photoreceptor
Toner
Apply E
Field E
Development roll Development roll
Development
Photoreceptor
Roll
Charge particles
triboelectrically
Electric field moves
Mixing
Charging particles from developer
roll to photoreceptor
Triboelectrification of
toner particles and carrier
beads
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
13. Toner
• Charging
• Adhesion/cohesion
• Powder flow
• Rheology
5-10 microns
• Color - hue and density
• Pigment dispersion
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
14. Toned Carrier Bead
q ≅ 2 x 104 e
m ≅ 2 x 10-10 gm
q/m ≅ 16 µC/gm
20 µm
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
15. Transfer
Paper
Apply E Paper
Paper Field &
Separate E
Photoreceptor Photoreceptor
Photoreceptor
Electric field moves particles from
photoreceptor to paper or transparency
Detachment field must overcome toner
adhesion to photoreceptor
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
16. Fusing Subsystem
Permanently affix the image to the final substrate
paper of various roughnesses and surface treatment
transparency (plastic)
Apply heat and/or pressure
Hot Roll Fuser: Pressure Roll
Unfused toner Fused toner Paper
Elastomer Heat Roll
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
17. Cleaning and Erase
Removes unwanted residual toner and charge
from photoreceptor before next imaging cycle
Physical agitation removes toner (blade or brush)
Light neutralizes charge by making entire photoreceptor
conductive
Photoreceptor
_
_
_
_
_
Charge
Residual toner
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
18. Transport, Adhesion/Cohesion and Removal
of Fine Particles (Toner) in Xerography
Toner must flow smoothly
down dispenser
Toner must develop
onto roll uniformly
Toner must transfer from
roll to paper
paper
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
19. Toner Charge Measurements
Blowoff Tribo
Air
50
40
Q/M (µC/gm)
30
Blow toner
µ
from toned 20
beads in cage
10
Measure
charge & mass 0
difference 0 1 2 3 4
Calculate Toner Concentration (%)
average Q/M
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
20. Toner Charge Measurements
Charge Spectrograph
1.5
99%
95%
q/D (fC/µm)
1 90%
Air Flow
µ 80%
E Field 50%
0.5 Lycopodium
0
Inject toner
0 5 10 15 20 25 30 35
Displacement
∝ q/D -0.5 Diameter (µm)
µ
Measure
position &
size of
particles
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
21. Toner Adhesion Forces
Fa Particle adhesion
depends on:
++ + ++
+ Size, shape, &
roughness
+ Materials
+
+
+ + Flow agents
++ ++
Charge
Surface charge
Fad distribution on
particle
Detachment when Fa > Fad
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
22. Electrostatic Image Force Model
Q
Fa σ=
E R 4 π R2
Fi
Image Force Applied Force
Q2
Fi = − α Fa = β QE − γ π ε o R 2 E 2
16 π ε o R2
αQ
Ed ≅ ≈ 1 V / µm
β 16 π ε o R 2
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
23. Charge Patch Adhesion Model
Q = σ At
Fa
Ac
Ac
Fad f =
At
2
σ
F ad = − A c − W A c
2 εo
σ W
= −Qf
2ε +
o σ
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
24. Additives Control Adhesion
Changing type of additive modifies adhesion
Atomic Force Microscopy results
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
25. Atomic Force Microscopy (AFM)
Bring toner Push toner Retract toner until
near surface against surface probe releases
200 µm
20 µm
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
26. AFM
Measure Single Particle Adhesion
Laser
Photodetector
Particle
Cantilever
Piezoelectric:
moves up
and down
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
27. Centrifuge Detachment
Measure Many Particle Adhesion
Putt, putt, putt,... Vroom, vroom,... Whoosh,...
Observe Donor Plate after Each Spin
H. Mizes, “Adhesion of Small Particle”, Electro. Soc. Amer.
Univ. of Rochester, 6/23/95
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
28. Electric Field Detachment
Measure Many Particle Adhesion
transparent
conductive
electrodes
Donor Receiver
V
E. Eklund, W. Wayman, L. Brillson, D. Hays, 1994 IS&T Proc.,
10th Int. Cong. on Non-Impact Printing, 142-146
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
29. Electrical Field Detachment of
Charged Toner
Detachment Cell
Adhesion of Triboelectrically Charged Toner
1
Transferred Fraction
0.8
0.6
0.4
0.2
0
0 2 4 6 8 10 12 14 16 18
Detachment Field (V/µm)
µ
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
30. Toner Transferred
When FE > FAD
FE
-
-
Donor Surface
- -
FAD
E. Eklund, W. Wayman, L. Brillson, D. Hays, 1994 IS&T Proc.,
10th Int. Cong. on Non-Impact Printing, 142-146
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
31. Fluidized Bed
Measure Powder Cohesion
Stresses on the toner bed
τ σ
α α
h
σ
∆P
Tension Compression
σ = ρ (1−ε) gh cos α − ∆ P
(1−
Shear
τ = ρ (1−ε) gh sin α
(1−
P.K. Watson, “Yield Locus of Cohesive Granular Materials”, Workshop on
Dynamics of Granular Materials: Understanding & Control, Univ. of Chicago,
5/11/95
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003
32. 70
Te nsi on
60 C ompression Less Additives
τ , She ar Stre s s (N/m2 )
50
More Additives
40
30
20
10
0
-30 -20 -10 0 10 20 30 40 50 60 70
σ , Compre s s ive Stre s s (N/m2 )
Fa-Gung Fan, Xerox Corporation MAE Dept., Clarkson University, 4/14/2003