IDS company applications update

1. INTEGRATED DEPOSITION SOLUTIONS, Inc.
5901 Indian School Rd, NE, Albuquerque, NM, www.idsnm.com
INTRODUCTORY MEETING_MARCH 2018
 INTRODUCTION TO IDS
 RECENT PROGRESS
 NJ APPLICATIONS
 LAB TOUR AND PRINTING DEMO
MARCH 2018, ALBUQUERQUE, NM

2. IDS INTRODUCTION
IDS TEAM
Marcelino Essien, Ph.D., Physics
David Keicher, M.S., Electrical Engineering
Yun Li, Ph.D., Physics
David Bohling, Ph.D., Physical Chemistry
Fa-Gung Fan, Ph.D., Physics
Scott Johnston, Ph.D., Mechanical Engineering
Fernando Sanchez, B.S., Mechanical Engineering
Brandy Shaw, Administration
 Founded March 2013.
 Offeror of Direct Write Additive Manufacturing systems and subsystems for electronic printing
applications.
 Nanojet concept developed under license from Sandia National Labs (SNL License # 14-C02686).
 Two U.S. patent applications submitted to cover IDS Mycrojet IP.
 One PCT application to be submitted spring 2018.
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3.  SNL: Direct Write copper traces, UV polymer deposition, resistor printing
 AFRL: AJ/NJ Comparison/Characterization
 AFRL: Direct Write conductive traces on nonlinear surfaces
 Irvine Sensors: Redistribution circuitry
 Case Western Reserve University: implantable bioelectronics
 Neotech: Direct Write interconnects
 National University of Singapore
CUSTOMERS/COLLABORATORS
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4. IDS SHORT TERM GOALS
SUBSYSTEM BUILDING AND TESTING
1PRINT MODULE
Self-contained
Adaptable to existing platforms
Reduced cost (~70% reduction)
User friendly
PROCESS CONTROL
MODULE
Gas flow control
Process monitoring and control
Shutter control
PROCESS VISION MODULE
(optional)
Up to 200X zoom
Adjustable pitch, yaw, and zoom
Still image and video capture
INK CARTRIDGE
Interchangeable
1 to 3 ml ink volume
Resealable for ink
storage
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5. NANOJET SUBSYSTEM DEVELOPMENT
 Increased Ease of Use
 Minimum 8 hours MTTA
 Beta Testing – 5 Sites by July 2017
 Final Design Review – mid-June 2017
 Product Release – August - 2017
t=0 min t=60 min t=120 min t=180 min t=240 min
RESISTANCE AVE (ohms) 73
ST DEV (ohms) 5.1
RSD 7.0%
20
30
40
50
60
70
80
90
100
0 50 100 150 200 250
RESISTANCE(ohms)
TIME (minutes)
TRACE RESISTANCE VS TIME
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6. INTEGRATED DEPOSITION SOLUTIONS, Inc.
5901 Indian School Rd, NE, Albuquerque, NM, www.idsnm.com
NANOJET
TM
PRINTING
LINEAR TRACES INDUCTIVE COIL INTERDIGITATED PADS
Interconnects, sensors Power transfer I/O, capacitors
INK: UTDots Ag nanoparticle suspension
SUBSTRATE: glass
PROCESS: ambient direct write
AVERAGE LINE WIDTH: ~50 microns
COIL DIAMETER=20 mm
LINE WIDTH = 50 microns
GAP SPACING = 100 microns
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7. Print Examples
INTERCONNECTS
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8. Fabrication Of Primary Implanted Inductive Coil
Ink: UTDots Ag40
Substrate: Kapton
Print Speed: 3 mm/s
Line Width: ~ 40 microns
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R = 260 ohms
Vdc = 12 volts
I = 72 mA

9. IDS Nanojet System
 5-Axis robot
 Computer-interfaced motion and process control
 Process Vision
 Alignment Module
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10. 5-Axis System Build
 5-axis motion controller
 Commercially available robot
 150x150 mm XY footprint
 Supports multi-module printing
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11. SPIRAL PRINT, ADHESION TEST AND PATTERN CONTROL
2cm diameter printing, 207 Ohms before and
after three tape pulls
Line spacing is controllable, and no Ag transfer after
three tape pulls. Average space 460um with Std 7um.
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12. Line width is easily varied via process parameters (for resistance control)
LCP (n=1)
LCP (n=4)
REPEATABILITY
30
35
40
45
50
55
60
65
5 6 7 8 9 10 11
LINEWIDTH(microns)
Aerosol Flow Rate (ccm)
UTDots Ag 60
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13. ADHESION TESTING
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14. THANK
YOU
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