Field ion microscopy is a technique that allows atomic-scale imaging of metal surfaces. It works by applying a high voltage between a sharp metal tip sample and a detector, creating an electric field strong enough to ionize surface atoms. Atoms ionize in distinct patterns that can be imaged, allowing visualization of their positions. Field ion microscopy provides atomic resolution of sample surfaces and can be used to observe properties like surface orientation, curvature, defects and diffusion processes. It was invented in 1951 and represents an advance over other microscopes by achieving even higher magnification at the atomic scale.

1. Field Ion Microscopy
Presented by
Nishant Kumar Sony
16PH62R03

2. content
• Introduction
• Essential instrumentation and design
• Basic Principle
• Advantages
• Application

3. Introduction
• It is a type of microscope that can be used to
image the arrangement of atoms at the
surface of a sharp metal tip.
• First Field ion microscope (FIM) was invented
by Müller in 1951.
• FIM, provides atomic-resolution imaging of
the surface of a specimen.
• FIM is a projection type microscope.

4. Essential Instrumentation and Design

5. Basic principle
• FIM is differ considerably from those other of
optical and electron microscopy.
• Image is produce by the applying of high
voltage to the specimen with respect to the
channel plate screen.
• Required field strength at the sample surface
measure up to 50v/nm.
• Needle shape of specimen is prepared with
average radius of curvature 10-100nm.

6. • The electric field at the apex of the specimen is of
the order of 1010 V m–1.

7. Seeing Atom

10. Application
• Orientation
• Radios of curvature
• Shank angle
• Image compression factor
• Surface diffusion process

11. Refreances
• http://www.springer.com/978-1-4614-3435-1
• E.W. M€uller, J. Appl. Phys. 27(5), 474–476
(1956)
• E.W. M€uller, Phys. Rev. 102(3), 618–624
(1956)

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