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High Flow Filter for UPW Applications –  A Field Case Study Gary Van Schooneveld,  CT Associates Inc. Peter Nadolny, W.L. Gore and Associates, Inc November 12, 2008
[object Object],[object Object],[object Object],[object Object],Introduction
Presentation Outline ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object]
Case Study Filter Description ,[object Object],[object Object],[object Object],[object Object]
Screening Tests – Filter Rinse-up
Screening Tests – Filter Retention The test is a modified version of SEMATECH Provisional Test Method for Determining Particle Contribution and Retention by UPW Distribution System Components (1992). Technology Transfer Number 92010949B.
Filter Performance Comparisons Filters tested at 10 liters per minute flow rate. 300 x 10 6 100 x 10 6 3 x 10 6 Particles Released After Flow Stoppage (   50 nm) 2.6 psid 2.2 psid 0.7 psid Pressure Drop @ 10 LPM > 90% > 99.9% > 99.9% Filtration Efficiency – PSL Challenge (   50 nm) < 50 hours < 35 hours < 3 hours Non-Volatile Residue Rinse volume (0.1 ppb added) < 1 hour < 1 hour < 1 hour Resistivity Rinse Volume (0.1 M  -cm added) < 40 hours < 40 hours < 40 hours TOC Rinse Volume (0.1 ppb added) < 30 hours < 30 hours < 30 hours Particle Rinse Volume (1 count added    50 nm) Supplier B -  40 nm (PES) Supplier A - 20 nm (Polysulfone) GORE   20 nm High Flow Filter Attribute
High Purity Water System Schematic
High Purity Water System 18.1 M   - cm Resistivity 40 – 100 ppb Total Organic Carbon (TOC) < 1 count/mL    100 nm Particle Concentration Typical Performance Parameter
UPW System Schematic   (before case study filter installation)
Ultrahigh Purity Water System 20 Flow Rate (Lpm) 0.27 Operating Pressure (MPa) < 1 Non-Volatile Residue (ppb) 18.2 Resistivity (M   – cm) < 1 Total Organic Carbon (ppb) < 0.05 Particle Concentration (# /mL    100 nm Typical Performance Parameter
Case Study Details ,[object Object],[object Object],[object Object],[object Object]
UPW System Schematic (after case study filter installation)
Case Study Instrumentation Sentra 0 – 10 psi   P sensor Filter housing vent ports Pressure Drop Thornton Model 200CR End of loop Resistivity Fluid Measurement Technologies Model 7700 NRM End of loop Nonvolatile residue G.E. Sievers Model 500RL End of loop TOC PMS M50 Into test filter Particle concentration PMS UDI 50 (x2) End of loop Out of filter Particle concentration Instrument Location Property
Test Results
TOC Rinse-up
NVR Rinse-up
Resistivity Rinse-up
Particle rinse-up after filter installation –  first 100 hours
Particle rinse-up after filter installation (10 – 480 hours) ,[object Object],[object Object],[object Object]
Filter Rinse Measurements Flushing times required to achieve NVR and TOC cleanliness levels   Flushing times required to achieve inorganic cleanliness levels   Flushing times required to achieve particulate cleanliness levels
Performance Improvement – Particles
Performance Improvement – Pressure Loss
Particle levels 6 months after installation (exiting the filter) ,[object Object],[object Object],[object Object]
Filter Case Study Summary (1) ,[object Object],[object Object],[object Object],[object Object]
Filter Case Study Summary (2) ,[object Object],[object Object],[object Object],[object Object]

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High Flow Filter for UPW Applications – A Field Case Study

  • 1. High Flow Filter for UPW Applications – A Field Case Study Gary Van Schooneveld, CT Associates Inc. Peter Nadolny, W.L. Gore and Associates, Inc November 12, 2008
  • 2.
  • 3.
  • 4.
  • 5. Screening Tests – Filter Rinse-up
  • 6. Screening Tests – Filter Retention The test is a modified version of SEMATECH Provisional Test Method for Determining Particle Contribution and Retention by UPW Distribution System Components (1992). Technology Transfer Number 92010949B.
  • 7. Filter Performance Comparisons Filters tested at 10 liters per minute flow rate. 300 x 10 6 100 x 10 6 3 x 10 6 Particles Released After Flow Stoppage (  50 nm) 2.6 psid 2.2 psid 0.7 psid Pressure Drop @ 10 LPM > 90% > 99.9% > 99.9% Filtration Efficiency – PSL Challenge (  50 nm) < 50 hours < 35 hours < 3 hours Non-Volatile Residue Rinse volume (0.1 ppb added) < 1 hour < 1 hour < 1 hour Resistivity Rinse Volume (0.1 M  -cm added) < 40 hours < 40 hours < 40 hours TOC Rinse Volume (0.1 ppb added) < 30 hours < 30 hours < 30 hours Particle Rinse Volume (1 count added  50 nm) Supplier B - 40 nm (PES) Supplier A - 20 nm (Polysulfone) GORE  20 nm High Flow Filter Attribute
  • 8. High Purity Water System Schematic
  • 9. High Purity Water System 18.1 M  - cm Resistivity 40 – 100 ppb Total Organic Carbon (TOC) < 1 count/mL  100 nm Particle Concentration Typical Performance Parameter
  • 10. UPW System Schematic (before case study filter installation)
  • 11. Ultrahigh Purity Water System 20 Flow Rate (Lpm) 0.27 Operating Pressure (MPa) < 1 Non-Volatile Residue (ppb) 18.2 Resistivity (M  – cm) < 1 Total Organic Carbon (ppb) < 0.05 Particle Concentration (# /mL  100 nm Typical Performance Parameter
  • 12.
  • 13. UPW System Schematic (after case study filter installation)
  • 14. Case Study Instrumentation Sentra 0 – 10 psi  P sensor Filter housing vent ports Pressure Drop Thornton Model 200CR End of loop Resistivity Fluid Measurement Technologies Model 7700 NRM End of loop Nonvolatile residue G.E. Sievers Model 500RL End of loop TOC PMS M50 Into test filter Particle concentration PMS UDI 50 (x2) End of loop Out of filter Particle concentration Instrument Location Property
  • 19. Particle rinse-up after filter installation – first 100 hours
  • 20.
  • 21. Filter Rinse Measurements Flushing times required to achieve NVR and TOC cleanliness levels Flushing times required to achieve inorganic cleanliness levels Flushing times required to achieve particulate cleanliness levels
  • 24.
  • 25.
  • 26.