SOI
Silicon on Insulator
Technology
INTRODUCTION
SILICON: Silicon is a chemical element
that is present in sand and glass and which
is a best known semiconductor material in
electronic components.
INSULATOR: A material that does not
easily transmit energy such as electric
current or heat.
WHAT IS SILICON ON INSULATOR
• Silicon on insulator technology refers to the
use of layered silicon-insulator-silicon
substrate in place of conventional silicon
substrate in semiconductor manufacturing.
4
Allow continuous
miniaturization of MOSFET
device.
Improves bulk technology
by
Low parasitic capacitance and
Resistance to Latch-up
Compatible with existing
fabrication process
without
any special equipment or
retooling of an existing
factory
Capable of higher current
densities
than
obtained in equivalent bulk
devices.
Need for SOI Technology
• SOI-based devices differ from conventional silicon-
built devices in that the silicon junction is above an
electrical insulator, typically silicon dioxide or
sapphire
SOI Technology
• In a Silicon On Insulator (SOI) Fabrication
technology , Transistors are encapsulated in SiO2 on
all sides.
SOI Technology
• The choice of insulator depends largely
on intended application
• Sapphire is used for high-
performance radio frequency (RF)
and radiation-sensitive applications,
and
• Silicon dioxide is used for diminished
short channel effects in
microelectronics devices.
SOI Technology
ELTRAN (Epitaxial Layer TRANsfer)
SOS (Silicon on Sapphire)
SIMOX (Separation by IMplanted OXygen)
BESOI (Bond and Etch-back SOI)
Smart- Cut
SOI Technologies

Silicon on Insulator Introduction (Semiconductor Devices).pptx

  • 1.
  • 2.
    INTRODUCTION SILICON: Silicon isa chemical element that is present in sand and glass and which is a best known semiconductor material in electronic components. INSULATOR: A material that does not easily transmit energy such as electric current or heat.
  • 3.
    WHAT IS SILICONON INSULATOR • Silicon on insulator technology refers to the use of layered silicon-insulator-silicon substrate in place of conventional silicon substrate in semiconductor manufacturing.
  • 4.
    4 Allow continuous miniaturization ofMOSFET device. Improves bulk technology by Low parasitic capacitance and Resistance to Latch-up Compatible with existing fabrication process without any special equipment or retooling of an existing factory Capable of higher current densities than obtained in equivalent bulk devices. Need for SOI Technology
  • 5.
    • SOI-based devicesdiffer from conventional silicon- built devices in that the silicon junction is above an electrical insulator, typically silicon dioxide or sapphire SOI Technology
  • 6.
    • In aSilicon On Insulator (SOI) Fabrication technology , Transistors are encapsulated in SiO2 on all sides. SOI Technology
  • 7.
    • The choiceof insulator depends largely on intended application • Sapphire is used for high- performance radio frequency (RF) and radiation-sensitive applications, and • Silicon dioxide is used for diminished short channel effects in microelectronics devices. SOI Technology
  • 8.
    ELTRAN (Epitaxial LayerTRANsfer) SOS (Silicon on Sapphire) SIMOX (Separation by IMplanted OXygen) BESOI (Bond and Etch-back SOI) Smart- Cut SOI Technologies