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Metal-Molecule-GaAs Devices Using Redox-Active Self Assembled Monolayers 2007 ISDRS a Rand Jean,  b Bin Xi,  b Tong Ren and  a David B. Janes a School of Electrical & Computer Engineering, Purdue University b   Department of Chemistry, Purdue University
2007 ISDRS Intro. and Summary ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],1 ,[object Object]
2007 ISDRS Motivation for Redox-Active Structures 2 Metal Semiconductor Molecule Metal Molecule Semiconductor Metal Redox-Active Molecule Semiconductor ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],LUMO LUMO HOMO HOMO Ef Ef Ev Ec Ev Ec * Cyclic Voltammogram of Redox  active Molecule *
2007 ISDRS Device Fabrication 3 1. GaAs with ohmic back contact 2. SiO2 deposition and patterning 3. Molecular deposition 4. Au deposition and patterning Final measured structures Low energy, non destructive deposition of Au
Au Deposition Comparison 2007 ISDRS 4 ,[object Object],[object Object],[object Object],[object Object]
2007 ISDRS Molecules Deposited 5 H 1. 2. 3. ,[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],[object Object],S S S S S S S S S S Octadecanethiol (ODT) ,[object Object],[object Object],[object Object]
2007 ISDRS Molecules Deposited Cont’d 6 4. STM of Mixed Monolayer of  Ru complex in C11 alkanethiol matrix Amy Szuchmacher Blum, Tong Ren, et. al., JACS VOL. 127, NO. 28, 2005 ,[object Object],[object Object],[object Object]
2007 ISDRS 7 Ren  et. al.  J Orgn. Chem. 690, 4734, 2005. Energies of Molecular Levels (C-V) Cyclic voltammogram of Ru molecule E f(Au)  = 5.1 0.13 0.5 5.23 4.6 GV Analysis E vac Energy ( eV ) 0.13 0.5 4.97 5.6 E NHE = 4.43 E Ag / AgCl = 0.197  + - CV 0 ~ 4.63  0.4 0.4  2.0 5.0 4.2 2 .6 CV Analysis E HOMO E LUMO (1) E LUMO (2) E mol Au E F
2007 ISDRS I-V Characteristics 8 ,[object Object],[object Object]
2007 ISDRS Proposed Model 9 Metal Semiconductor Metal Semiconductor Molecule TFE TE TFE ODT Ligand Ru Ev Ef Ec Thermionic Emission Thermionic Field Emission φ 1 φ 2 Φ 1 >  Φ 2
2007 ISDRS 10 Thermionic &Thermionic-Field Emission comparison
2007 ISDRS Thermionic &Thermionic-Field Emission comparison Cont’d 11
Thermionic &Thermionic-Field Emission  comparison Cont’d 2007 ISDRS 12
Modeling Parameters 2007 ISDRS 13 ,[object Object],[object Object],0.759 0.755 0.635 0.490 0.794 Barrier Height (eV) 0.944 1.82 ODT 1.72 1.86 Mixed Monolayer 0.0334 3.36 Ligand 6.93 3.01 Ru complex 0.0374 2.05 Control Saturation Current Density (A/cm) n Mol. Layer
2007 ISDRS Conclusion 14 ,[object Object],[object Object],[object Object],[object Object],[object Object],Acknowledgements: Collaborators: Jiewen Ying, Bin Xi, Adina Scott and Patrick Carpenter Funding: NASA INAC and NSF NIRT

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Jean ISDRS 2007

  • 1. Metal-Molecule-GaAs Devices Using Redox-Active Self Assembled Monolayers 2007 ISDRS a Rand Jean, b Bin Xi, b Tong Ren and a David B. Janes a School of Electrical & Computer Engineering, Purdue University b Department of Chemistry, Purdue University
  • 2.
  • 3.
  • 4. 2007 ISDRS Device Fabrication 3 1. GaAs with ohmic back contact 2. SiO2 deposition and patterning 3. Molecular deposition 4. Au deposition and patterning Final measured structures Low energy, non destructive deposition of Au
  • 5.
  • 6.
  • 7.
  • 8. 2007 ISDRS 7 Ren et. al. J Orgn. Chem. 690, 4734, 2005. Energies of Molecular Levels (C-V) Cyclic voltammogram of Ru molecule E f(Au) = 5.1 0.13 0.5 5.23 4.6 GV Analysis E vac Energy ( eV ) 0.13 0.5 4.97 5.6 E NHE = 4.43 E Ag / AgCl = 0.197 + - CV 0 ~ 4.63 0.4 0.4 2.0 5.0 4.2 2 .6 CV Analysis E HOMO E LUMO (1) E LUMO (2) E mol Au E F
  • 9.
  • 10. 2007 ISDRS Proposed Model 9 Metal Semiconductor Metal Semiconductor Molecule TFE TE TFE ODT Ligand Ru Ev Ef Ec Thermionic Emission Thermionic Field Emission φ 1 φ 2 Φ 1 > Φ 2
  • 11. 2007 ISDRS 10 Thermionic &Thermionic-Field Emission comparison
  • 12. 2007 ISDRS Thermionic &Thermionic-Field Emission comparison Cont’d 11
  • 13. Thermionic &Thermionic-Field Emission comparison Cont’d 2007 ISDRS 12
  • 14.
  • 15.

Editor's Notes

  1. This summarizes investigations into the current-voltage characteristics of certain classes of organic molecules with emphasis on Ruthenium complex redox-active molecules.
  2. Summary of main points:
  3. What are MMS structures: Explain diagram on top left What are redox-active devices: Explain diagram on top middle and bottom Why are they important: Explain Top right.
  4. n+doped (2e18 cm^-3) GaAs single side polished with Au/Ti/Au/Ge/Ni at 4000/1000/2500/300/130 Å respectively ohmic back contact. S1805 light PR deposited and patterned. SiO2 deposition (1000Å). Lift-off by soaking in acetone overnight and 1.5 minutes in O2 atm in RIE to remove remnant PR epilayer. Molecular Deposition by soaking in solution of molecule for 24 hours. Solvent Cleaning to remove phys-absorbed molecules from the surface; 20 ultrasonication in the solvent (ethanol or tetrahydrofuran).
  5. Left: time of flight sims shows that Ar backfill when compared to other meathods have the least amount of metal penetration in the mol layer. Right: IV show that greater current density in mol layer with Ar backfill.
  6. All molecules deposited are asymmetric with dipole moments. ODT is a simple alkanethiol used frequently in SAMs with well known surface density properties and electrical characteristics, ie. leaky dielectric. It Has great surface coverage and thus we expect unpinning of Ef in GaAs which occurs when surface states are about 5e13 states/cm2/eV Ru complex family of molecules were designed to be a ‘molecular wires’ with energy levels accessible using modest biases (E-levels from 0.67-1.29 V). It has horrible surface coverage, so we should expect surface pinning, of Ef Ligand is short aromatic molecule initially used to prop up the larger bulkier Ru complex in a matrix. However the delocalized electron cloud around the benzene is suspected to Contribute in current conduction. Might be surface unpinning…..don;t know the coverage data on such mol
  7. Mixed Monolayer matrix. STM image and height of Ru complex above C11 matrix. In this experiment, the Ligand was used due to the similarity of the base of Ru complex to Ligand molecule. There might be surface unpinning due to coverage of both mol
  8. Most conductive is the Ru complex; least conductive is the control by 4 orders of magnitude. At 1 V the ODT and Mixed Monolayer are about the same conductivity, Followed by the Ligand and lastly the control.
  9. Initial understanding follows: Mol layer with lower dielectric constant has more voltage dropped across it Q/V = Ae/t as a result barrier hieght is reduced and TFE is encouraged. Ru complex shows different pattern, its horrendous coverage should not allow for much potential drop across it. Also ligand is shortest mol and coverage is better than Ru, direct tunneling is not the main explanation. However E-level assisted tunneling does explain.
  10. IV over range which excludes non ideal effects such as series resistance Recombination in first 0.1V can explain deviation from theory General agreement to theory TFE and TE is possible explanation and E-level assisted TFE in case of Ru
  11. Follows theory
  12. Mixed mono and ODT show least RG, possibility exist that good surface coverage of those mol could be removing dangling bonds which cause surface states
  13. Summary of theory and parameters High values of n indicates high recombination current and other non idealities. This could indicate the horrible surface coverage of the individual ligand and Ru complexes
  14. ODT is taken as example for non redox active mol Ru is redox active example.