Atomic Layer Deposition for next-generation optical coatings
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Atomic layer deposition (ALD) provides more conformal thin film coatings than traditional methods like PVD or CVD, enabling anti-reflective (ARC) coatings for increasingly complex optical components. ALD allows for greater anti-reflective performance across common wavelengths. Beneq is a leader in ALD, having developed the technology since 1984, and their batch ALD equipment can coat large optical components with highly uniform and conformal films. Beneq's gradient-index ALD ARC coatings provide omnidirectional performance across wide bandwidths with very low reflectance, making them ideal for applications like camera lenses.
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Atomic Layer Deposition for next-generation optical coatings
- 1. Atomic Layer Deposition for Next- Generation Optical Coatings Dr. John Rönn Application Manager – Optical Coatings Beneq – Advanced ALD LASER World of Photonics | 29.6.2023
- 2. 23.8.2023 Why use Atomic Layer Deposition (ALD)? ALD 100% PLD 70% CVD 40% PVD 20% Step Coverage 1. Optical components are becoming more complex → Need for more conformal coating methods 2. Traditional ARC methods offer limited performance at common wavelengths → Need for greater anti-reflective performance
- 3. 23.8.2023 Why use Atomic Layer Deposition (ALD)? Source: Weiss, T. & Ebert, W. Optik&Photonik 3/2017
- 4. 23.8.2023 8/23/2023 Beneq is the Home of ALD The world’s first industrial production using atomic layer deposition (ALD), since 1984. Headquarters and ALD fabrication in Espoo, Finland, with 40+ ALD systems for R&D and services. Rapid growth of more than 50% in headcount and revenue, year-on-year.
- 5. 23/08/2023 Beneq Batch ALD Equipment For large batches and large parts World’s largest ALD system for the biggest substrates P800 P1500 P400A Perfect balance of uniformity and throughput 10 m2 50 m2 >100 m2
- 6. 23.8.2023 What is atomic layer deposition (ALD)? A thin film deposition technique based on saturated surface reactions of the precursor and surface species Precursors are released on the surface alternatively Purge 2nd Reactant pulse Purge 1st Reactant pulse Substrate Start End
- 7. 23/08/2023 What is atomic layer deposition (ALD)?
- 8. 23/08/2023 Beneq ALD – Conformality
- 9. 23/08/2023 Nanoscale ↔ Macroscale Conformality with ALD Beneq Confidential ✓ Integrated structures ✓ 3D-shapes Nanoscale Macroscale ✓ Astronomical optics 100 nm 100 mm 100 cm
- 10. Beneq ALD: How Conformal is it? Film growth studies on 3D-macrostructures Setup: P400A, 2x Monitor Hemispherical Domes, 1x Dummy Dome Diameter of a single Dome: 150 mm 23.8.2023
- 11. Beneq ALD: How Conformal is it? 23.8.2023 Ta2O5 at 150 °C Units [nm] 50.35 51.02 51.2 49.94 50.33 50.18 50.29 50.52 49.82 50.70 49.84 50.35 50.33 49.82 49.82 49.62 49.86 50.11 49.09 50.29 Upper Shelf Middle Shelf Convex Side Concave Side
- 12. Beneq ALD: How Conformal is it? 23.8.2023 Ta2O5 at 150 °C • Range: 49.09 – 51.20 nm • Average: 50.2 nm • Upper dome n.u.: 1.26 % • Middle dome n.u.: 1.37 % • Batch n.u.: 2.10 %
- 13. 23/08/2023 ➢ Anti-Reflective Coating on Fused Silica • Ta2O5-SiO2 at 300 °C • 6 layers, ~265 nm • CX = Convex Side • CV = Concave Side 2 3 4 5 1 Beneq ALD: How Conformal is it?
- 14. 23/08/2023 ➢ Highly Reflective Coating on Fused Silica • TiO2-SiO2 at 280 °C • 16 layers, ~1165 nm • CX = Convex Side • CV = Concave Side 2 3 4 5 1 Beneq ALD: How Conformal is it?
- 15. 23/08/2023 Beneq ALD – Optical Performance
- 16. Beneq Gradient-Index ARC technology Example Application: Camera lenses • Require ARC with omnidirectional, wide bandwidth and very low reflectance to eliminate Ghost & Flare • Very challenging to obtain with traditional coating technologies (e.g., PVD) 23.8.2023
- 17. Beneq Gradient-Index ARC technology Example Application: Camera lenses • Require ARC with omnidirectional, wide bandwidth and very low reflectance to eliminate Ghost & Flare • Very challenging to obtain with traditional coating technologies (e.g., PVD) Solution: Gradient-index ALD-coating for ultra-low effective refractive index at air-ARC interface • Substrate can be glass, polymer or any other surface where ALD is applicable 23.8.2023
- 18. Beneq Gradient-Index ARC technology 23.8.2023 ➢ Composition can be changed to increase bandwidth/minimum reflectance ➢ Example from D263 borosilicate glass substrate Omnidirectional performance 𝝀 = 𝟒𝟎𝟎 − 𝟕𝟎𝟎 𝐧𝐦
- 19. Beneq Gradient-Index ARC technology 23.8.2023 “Invisible”: anti-reflection on D263-Glass coated with Beneq Gradient-index ALD-ARC
- 21. Contact Us 23.8.2023 ➢ Submit a request on the Beneq Website.
- 22. Thank you! LASER | 29.6.2023