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Jonas Sundqvist

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SiGe epitaxy on a 300 mm batch furnace
byJonas Sundqvist
 
Potential of an ALD compatible ferroelectric
byJonas Sundqvist
 
HIGH-K DEVICES BY ALD FOR SEMICONDUCTOR APPLICATIONS
byJonas Sundqvist
 
High-k für Alle - Beyond DRAM capacitors and HKMG
byJonas Sundqvist