Labelling Requirements and Label Claims for Dietary Supplements and Recommend...
TNPs
1. Tin Oxide Nanoparticles for
Electrochemical Studies of
Amyloid Peptides
ALEJANDRA M. DE JESUS SOTO
KENNY J. COLON COLON
RISE PROGRAM
2. Concepts:
• Nanoparticles
• Microscopic material that has physical
dimensions ranging between 1-100 nm
Otaño-Rivera W. 2014. Introducción a los
Conceptos de la Nanotecnología y su Importancia
Científica
• Amyloid Peptides:
• Molecular markers
• Diagnosis and prognosis of
Alzheimer’s disease
• Transcription factor
• Anti-microbial activity
• Kinase enzyme activator
http://nanogloss.com/wp-content/uploads/2009/08/white-light-
nanoparticles.jpg
Lin Liu. 2013. Electrochemical detection of β-amyloid peptides on electrode covered with N-
terminus-specific antibody based on electrocatalytic O2 reduction by Aβ(1-16)-heme-modified gold
nanoparticles
3. Why use nanoparticles?
• Higher surface area
• Higher sensitivity
• Low power consumption
• Development of better materials, devices and
systems
• Applications in biomedical, optical and
electronic fields
http://www.nap.edu/books/0309084547/xhtml/images/p2000a445g6001.jpg
Lin Liu. 2013. Electrochemical detection of β-amyloid peptides on electrode covered with N-terminus-specific antibody based on electrocatalytic O2 reduction by Aβ(1-16)-heme-modified
gold nanoparticles
4. Related studies
• Backgrounder on Nanoparticles and Amyloid Diseases
(Kulinowski, Unknown year of publication).
• Reviewed studies regarding amyloid peptides in ex-vivo
experimentations
• Blood and cerebral spinal fluid testing outside the body
• Nanoparticles bind to biomolecules to produce signals
• Inhibition or reduction of Amyloid protein fibril production with
nanoparticles
http://icon.rice.edu/resources.cfm?doc_id=10866
5. • Electrochemical detection of β-amyloid peptides on
electrode covered with N-terminus-specific antibody based
on electrocatalytic O2 reduction by Aβ(1-16)-heme-
modified gold nanoparticles (Liu, et al. 2013).
• Aβ(1-16)-heme-AuNPs detected Aβ testing it with cyclic
voltammetry.
• About 10 pM ofAβ was the detection limit of the Aβ(1-16)-heme-
AuNPs .
• Its results are comparable with the Surface Plasmon Resonance
(incidence of light on electrons of the substrate).
6. • Problem:
• Does the sputtering procedure helps to spread a
film ofTin oxide nanoparticles over a Silicium
substrate and a Carbon glass substrate?
• Hypothesis
• The sputtering procedure will deposit theTin
nanoparticles forming a film over an exposed area
of the Silicium substrate and on the Carbon glass
substrate.
7. Objectives:
• Demonstrate that the sputtering
technique is an alternative for the
development of thin film
formations.
• Compare the final products in
Silicium and Carbon glass
substrates for differences.
• Help improve the affinity ofTin
Oxide towards Amyloid Peptides by
studying sputtering.
http://www.intechopen.com/source/html/10517/media/image1.jpg
9. Procedure
(Magnetron Sputtering)
Substrate
(Anode)
Target
(Cathode)
Argon Plasma
(Ar+, Ar, e-, hυ)
Ar Ion
Sputtered particle
4. Electrons released during
Argon ionization are
accelerated to the substrate,
subsequently colliding with
additionalArgon atoms,
creating more ions and free
electrons in the process,
continuing the cycle.
1. Electrically neutralArgon
atoms are introduced into a
vacuum chamber.
2. DC (direct current)
voltage is placed
between the target and
substrate which ionizes
Argon atoms and
creates a plasma (glow
discharge)
3. These Argon ions
accelerate to the target.
Their collision with the
target ejects target
atoms, which travel to
the substrate and
eventually settle.
Ionized Argon
bombards a target,
releasing atoms which
form layers on a
substrate.
http://www.pfonline.com/articles/vacuum-deposition-processes
• Physical process
• In a vacuum chamber,
gas pressure is less
than the ambient
atmospheric pressure.
10. First Result
• Si substrate
• 1 min.
• 50W
• 160 ºC
• Bigger spheres due to
high temperature and
long period of exposure
11. Second Result
• SiOx substrate
• 20 s
• 50W
• Room temperature (21-23ºC)
• Uneven nanoparticles because of
low temperature.
12. Third Result
• Carbon glass substrate
• 10 s
• 50W
• 150 ºC
• Circular shaped
nanoparticles because
of balanced
adjustments of
temperature and time
exposure
13. Results in Comparison
• Si substrate
• 1 min.
• 50W
• 160 ºC
• SiOx substrate
• 20 s
• 50W
• Room temperature (21-23ºC)
• Carbon glass substrate
• 10 s
• 50W
• 150 ºC
14. Conclusions
• The sputtering system is a versatile technique for
depositing any solid material
• This procedure assures the deposition ofTin
nanoparticles film over the exposed area of the Silicium
substrate.
• Although the tested carbon glass substrate did not result
as figured, it was understood that the error was due to
maladjustments on temperature and time exposure.
15. Future Research
• Repeat the sputtering process on another glass Carbon substrate
using another adjustments on temperature and exposure time.
• After obtaining a potential pure substrate product with theTin oxide
nanoparticle layer:
• The product would be sent to Dr.Ana Guadalupes’ group at UPR-Río Piedras for
the testing part using Amyloid peptides.
• The electrochemical properties of the Amyloid peptides are studied doing cyclic
voltammetry in relation to theTin oxide nanoparticles and a Ferrocene
connector.
