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sales@semistarcorp.com www.semistarcorp.com
sales@semistarcorp.com www.semistarcorp.com
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Heatpulse 4100S Rapid Thermal Processor
Model:Heatpulse 4100S
Application: Rapid Thermal Process
Maker:AGAssociates
Type: Automatic Single wafer
Condition: Used. Refurbished
Specifications:Meet AGAssociates’ new Heatpulse 4100S specifications
Wafer size:3 to 6 inch capability. Customer will specify the wafer size
Temperature:400-1100 °C with ERP Pyrometer. Maximum 1250 °C(Not
recommend)
Gas lines:2 gas lines with 2 MFC. N2,O2 or Ar.
Oven Chamber:Stainless with Double O Ring for sensitive processes.
Price:Pls email us with your RFQ in detail. Appreciate your time.
Price Term:Exworks. Buyer is responsible for shipping. FOB/CIP is optional at extra cost.
Crating: Included
Payment Term: 50% against PO, 50% before shipping. Other payment terms are optional depending on
buyer’s credit.
Installation & Training if necessary:Optional at extra cost.
Lead time:8 to 12 weeks depending on PO time and 1st
payment.
Valid Time:Subject to prior sale without notice.
Warranty: 13 months Ex-works non-consumable parts warranty after shipping or 12 months after
acceptance. The shortest one.
Facility: Buyer’s responsibility.
sales@semistarcorp.com www.semistarcorp.com
sales@semistarcorp.com www.semistarcorp.com
2
2
Sales tax, custom duty and tariff if applicable: Buyer’s responsibility.
Options:Buyer will make choice before the PO.
1) TC for 200-400 °C
2) Susceptor load/unload station
3) Pre-Aligner
4) New Al chamber
5) 3/4/5/6 inch susceptors
6) Chiller for ERP Pyrometer
7) TC wafer for ERP Pyrometer calibration
8) Omega Meter for ERP Pyrometer calibration
9) 3rd
, 4th
MFC
10) Spare Parts:Isolated Quartz Tube, Quartz Tray, Lamps, PCBs, Robot, Controller, O Rings, Fuses
etc.
Description and Configuration:
The AG Associates Heatpulse4100S rapid thermal anneal system contains a subsystem for each of
the following:
• Electronics (including a dedicated microprocessor)
• Mass-flow-controlled gas handling
• Cooling
• ULPA filtration
• Mechanical assemblies
Software programs, called recipes, specify the details for each process. The 4100S system includes
a 3-1/2-inch floppy disk drive for process recipe storage. A three-axis industrial robot (Equipe
ATM-105 with ESC-100 or equivalent) automates processing by transporting wafers into and out
of the process chamber. It uses closed-loop feedback for precise motion control and accurate
positioning.
To provide cold-wall processing, wateris circulated through the process-chamberwalls. The quartz
isolation tube is cooled with nitrogen or compressed air.
Specifications:
Wafer sizes: 3/4/5/6 inch capability(standard).
sales@semistarcorp.com www.semistarcorp.com
sales@semistarcorp.com www.semistarcorp.com
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3
Ramp-up rate: Programmable, 1 – 180°C per second.
Steady-state duration: 1 – 600 seconds per step.
Ramp-down rate: Programmable, 1 – 180°C per second. Ramp-down rate is temperature and
radiation dependent, maximum 150°C per second.
Recommended steady-state temperature range:400 – 1200°C.
ERP temperature accuracy: +5°C to -9°C, when calibrated against an instrumented thermocouple
wafer (ITC).
Temperature repeatability: + 7°C or better at 1150°C wafer to wafer. (Repetition specifications are
based on a 100-wafer set.)
Temperature uniformity: + 10°C across an 6-inch wafer at 1150°C. (This is a 1-sigma deviation
from 100-angstrom oxide uniformity.) For a titanium silicidation process,no more than 1.5 percent
increase to uniformity during the first anneal at 650 – 700°C.
Physical Dimensions:
Width: 40 in. (102 cm)
Depth 42 in. (107 cm)
Height 82 in. (208 cm)
Weight:: 1800 lbs (816 kg)
Shipping weight:: 2000 lbs (907 kg)
Utility Requirements
Power / Water Type Refer to the Heatpulse® 4100 Facilities Manual.
Domestic: 208 VAC,60 Hz; 125 A maximum;3-phase plus ground and neutral
European: 400 VAC,50 Hz; 90 A maximum;3-phase plus ground and neutral
Japanese:200 VAC,50/60 Hz, 125 A maximum; 3-phase plus ground
The Heatpulse 4100 may be subject to the export control laws of the United States and other countries . Buyer will
comply with the restrictions ofthe laws and might need to sign the “Customer Statement” before PO. The trademarks
of the equipment and parts contained in this documents belonged to the Original Equipment Manufacturers.

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Heatpulse 4100S Rapid Thermal Processor

  • 1. sales@semistarcorp.com www.semistarcorp.com sales@semistarcorp.com www.semistarcorp.com 1 1 Heatpulse 4100S Rapid Thermal Processor Model:Heatpulse 4100S Application: Rapid Thermal Process Maker:AGAssociates Type: Automatic Single wafer Condition: Used. Refurbished Specifications:Meet AGAssociates’ new Heatpulse 4100S specifications Wafer size:3 to 6 inch capability. Customer will specify the wafer size Temperature:400-1100 °C with ERP Pyrometer. Maximum 1250 °C(Not recommend) Gas lines:2 gas lines with 2 MFC. N2,O2 or Ar. Oven Chamber:Stainless with Double O Ring for sensitive processes. Price:Pls email us with your RFQ in detail. Appreciate your time. Price Term:Exworks. Buyer is responsible for shipping. FOB/CIP is optional at extra cost. Crating: Included Payment Term: 50% against PO, 50% before shipping. Other payment terms are optional depending on buyer’s credit. Installation & Training if necessary:Optional at extra cost. Lead time:8 to 12 weeks depending on PO time and 1st payment. Valid Time:Subject to prior sale without notice. Warranty: 13 months Ex-works non-consumable parts warranty after shipping or 12 months after acceptance. The shortest one. Facility: Buyer’s responsibility.
  • 2. sales@semistarcorp.com www.semistarcorp.com sales@semistarcorp.com www.semistarcorp.com 2 2 Sales tax, custom duty and tariff if applicable: Buyer’s responsibility. Options:Buyer will make choice before the PO. 1) TC for 200-400 °C 2) Susceptor load/unload station 3) Pre-Aligner 4) New Al chamber 5) 3/4/5/6 inch susceptors 6) Chiller for ERP Pyrometer 7) TC wafer for ERP Pyrometer calibration 8) Omega Meter for ERP Pyrometer calibration 9) 3rd , 4th MFC 10) Spare Parts:Isolated Quartz Tube, Quartz Tray, Lamps, PCBs, Robot, Controller, O Rings, Fuses etc. Description and Configuration: The AG Associates Heatpulse4100S rapid thermal anneal system contains a subsystem for each of the following: • Electronics (including a dedicated microprocessor) • Mass-flow-controlled gas handling • Cooling • ULPA filtration • Mechanical assemblies Software programs, called recipes, specify the details for each process. The 4100S system includes a 3-1/2-inch floppy disk drive for process recipe storage. A three-axis industrial robot (Equipe ATM-105 with ESC-100 or equivalent) automates processing by transporting wafers into and out of the process chamber. It uses closed-loop feedback for precise motion control and accurate positioning. To provide cold-wall processing, wateris circulated through the process-chamberwalls. The quartz isolation tube is cooled with nitrogen or compressed air. Specifications: Wafer sizes: 3/4/5/6 inch capability(standard).
  • 3. sales@semistarcorp.com www.semistarcorp.com sales@semistarcorp.com www.semistarcorp.com 3 3 Ramp-up rate: Programmable, 1 – 180°C per second. Steady-state duration: 1 – 600 seconds per step. Ramp-down rate: Programmable, 1 – 180°C per second. Ramp-down rate is temperature and radiation dependent, maximum 150°C per second. Recommended steady-state temperature range:400 – 1200°C. ERP temperature accuracy: +5°C to -9°C, when calibrated against an instrumented thermocouple wafer (ITC). Temperature repeatability: + 7°C or better at 1150°C wafer to wafer. (Repetition specifications are based on a 100-wafer set.) Temperature uniformity: + 10°C across an 6-inch wafer at 1150°C. (This is a 1-sigma deviation from 100-angstrom oxide uniformity.) For a titanium silicidation process,no more than 1.5 percent increase to uniformity during the first anneal at 650 – 700°C. Physical Dimensions: Width: 40 in. (102 cm) Depth 42 in. (107 cm) Height 82 in. (208 cm) Weight:: 1800 lbs (816 kg) Shipping weight:: 2000 lbs (907 kg) Utility Requirements Power / Water Type Refer to the Heatpulse® 4100 Facilities Manual. Domestic: 208 VAC,60 Hz; 125 A maximum;3-phase plus ground and neutral European: 400 VAC,50 Hz; 90 A maximum;3-phase plus ground and neutral Japanese:200 VAC,50/60 Hz, 125 A maximum; 3-phase plus ground The Heatpulse 4100 may be subject to the export control laws of the United States and other countries . Buyer will comply with the restrictions ofthe laws and might need to sign the “Customer Statement” before PO. The trademarks of the equipment and parts contained in this documents belonged to the Original Equipment Manufacturers.