Chemical vapor deposition (CVD) is a technique for depositing thin polymer films through vapor phase polymerization. Oxidative CVD (oCVD) uses vaporized monomers and oxidizing agents to deposit conjugated polymer films through a step-growth polymerization mechanism. Key advantages of oCVD include depositing insoluble polymers, conformal coating of complex 3D structures, and grafting polymers directly to substrate surfaces. oCVD has been used to deposit semiconducting polymers for applications in organic photovoltaics, sensors, and other devices. The low temperature oCVD process is substrate independent and can coat delicate materials without damage.