Electrodeposition of Indium Sulfide (In2S3) Films on Molybdenum-coated Glass

1. Electrodeposition of Indium Sulfide (In2S3) Films
on Molybdenum-coated Glass
Maqsood Ali Mughal
2013 Spring Weekly Research Meeting
October 8th
, 2012
Electronics Lab LSW 156
Arkansas State University

2. Factors And Levels
Levels
A, Deposition
Voltage DV (V)
B, Deposition
Time DT
(min)
C, Composition of
Solution COS
D, Deposition
Temperature D
Temp(O
C)
1 -0.6 3 0.1M S 150
2 -0.7 6
0.1 MS, 0.1M
Na2S2O3.5H2O 160
3 -0.8 9 0.2M S 170

3. Experiment No. A B C D Trial 1 Trial 2 Trial 3
1 1 1 1 1 √ √ √
2 1 1 2 2 √ √ √
3 1 1 3 3 √ √ √
4 1 2 1 2 √ √ √
5 1 2 2 3 √ √ √
6 1 2 3 1 √ √ √
7 1 3 1 3 √ √ √
8 1 3 2 1 √ √ √
9 1 3 3 2 √ √ √
10 2 1 1 2 √ √ √
11 2 1 2 3 √ √ √
12 2 1 3 1 √ √ √
13 2 2 1 3 √ √ √
14 2 2 2 1 √ √ √
15 2 2 3 2 √ √ √
16 2 3 1 1 √ √ √
17 2 3 2 2 √ √ √
18 2 3 3 3 √ √ √
19 3 1 1 3 √ √ √
20 3 1 2 1 √ √ √
21 3 1 3 2 √ √ √
22 3 2 1 1 √ √ √
23 3 2 2 2 √ √ √
24 3 2 3 3 √ √ √
25 3 3 1 2 √ √ √
26 3 3 2 3 √ √ √
27 3 3 3 1 √ √ √
Total Number of Experiments
*For each experiment, I performed 3 trials in order to achieve precise results

4. Each sample was characterized to determine the S/In ratio by
EDS and crack density by Digital Image Analysis
EDS
•Films were scratched-off and collected in the powder form on an
aluminum stub.
Digital Image Analysis
•SEM images from each sample will be uploaded to the program,
“Fracture and Buckling Analysis” that is written in MATLAB to
calculate the crack density.
Characterization

5. Spectrum O C S Al In S/I
Atomic%
Spectrum
1
19.89 0 38.04 0 28.62 1.32914046
Spectrum
2
55.83 40.82 1.36771191
Spectrum
3
5.09 93.42 0.09 0.3 0
Mean 8.326 34.6267 31.32 0.1 23.1467 1.3531106
Max. 19.89 93.42 55.83 78.35 40.82
Min. 5.09 0 0.09 0 28.62
E7 (2)
SEM image of scratched off
film at 99x
E7 (2) SEM image at 3.0 kx
Energy Dispersive Spectroscopy EDS Analysis

6. Digital Image Analysis

7. Analysis of Experimental Data
• Once the experimental design has been determined and
the trials have been carried out, the measured
performance characteristic from each trial can be used
to analyze the relative effect of the different parameters
• Minitab will be used to perform statistical analysis

8. -0.6-0.7-0.8
0.744
0.732
0.720
0.708
0.696
0.684
0.672
0.660
963
321
0.744
0.732
0.720
0.708
0.696
0.684
0.672
0.660
170160150
Deposition Voltage (V)
MeanofMeans
Deposition Time (min)
Composition of Solution Deposition Temperature (oC)
Main Effects Plot for Means (Crack density & S/In Molar Ratio)
Data Means

9. -0.600-0.625-0.650-0.675-0.700-0.725-0.750-0.775-0.800-0.825
0.105
0.090
0.075
0.060
0.045
0.030
0.015
0.000
-0.015
-0.030
Deposition Voltage (V)
CrackDensity(/µm)
Plot of Crack Density (/µm) vs Deposition Voltage (V) with Fitted Line

10. -0.600-0.625-0.650-0.675-0.700-0.725-0.750-0.775-0.800-0.825
3.5
3.0
2.5
2.0
1.5
1.0
0.5
0.0
-0.5
-1.0
Deposition Voltage (V)
S/InMolarRatio
Plot of S/In Molar Ratio vs Deposition Voltage (V) with Fitted Line

11. Response Table for
Signal to Noise Ratios
Nominal is best
(10*Log10(Ybar**2/s**2))
Deposition
Deposition Deposition Composition Temperature
Level Voltage (V) Time (min) of Solution (o
C)
1 -2.011 -2.577 -2.466 -2.461
2 -2.458 -2.368 -2.319 -2.352
3 -2.704 -2.227 -2.387 -2.359
Delta 0.693 0.350 0.147 0.108
Rank 1 2 3 4