1. Wet etching is a material removal process that uses liquid chemicals or etchants to remove materials from a wafer through oxidation and dissolving of the oxidized material. 2. The process involves the diffusion of byproducts from the reacted surface. 3. Wet etching offers advantages such as being damage-free, simple, occurring at atmospheric environment, having low cost, and providing high selectivity and uniformity. However, it results in isotropic etching and lacks precision control.

1. Submitted By,
Md.Mizanur Rahman
ID.183001016
Department of EEE
Green University of Bangladesh
Submitted To,
DR. A. A. MOHAMMAD
MONZUR-UL-AKHIR
Assistant Professor
Department of EEE
Green University of
Bangladesh

4. OUTLINE:
What is Etching ?
Types of Etching
What is Wet Etching ?
What is Wet etching process?
Advantages of Wet Etching
Disadvantages of Wet Etching

5. What is Etching ?
 Simply removing unwanted
materials from the surface to form
a required pattern.

6. Types of Etching
 Wet Etching:
 Dry Etching(plasma
Etching):

7. What is Wet Etching ?
 Wet etching is a material removal process that
uses liquid chemicals or etchants to remove
materials from a wafer.

8. 1.Wet etching is a material removal
process that uses liquid chemicals
or etchants to remove materials
from a wafer.
2.This reaction entails the oxidation
of the material then dissolving the
oxidized material.
3.Diffusion of the byproducts in the
reaction from the reacted surface.
 What is wet etching
process?

9.  Advantages of Wet Etching
 Damage-free finish to wafer surface.
 Simple and direct etching process.
 Occur at atomaspheric environment.
 Cheaper cost.
 High etch selective.
 Good etch uniformity.

10.  Disadvantages of Wet Etching
 Isotropic etching.
 No control for precision etching.
 The resist cumming when the resist is
incompletely expoxd or insufficiently developed
and this residual resist act as etching mask .