1. OPTIC NANO Consult S.A.R.L provides a Scientific Support in Spectroscopic ellipsometry and
Polarimetry metrology collaborating with research institute, laboratories as well as foundries. The field
of our applications is mostly devoted for thin films and new materials for nanotechnologies. OPTIC
NANO Consult S.A.R.L, just began, in July 2011 when entering in the French commercial register. It’s
WebSite* also retrieves many useful general information’s and not only to registered visitors. Our
metrological expertise, is based from many years of practice in the field, as well as following the
continuously updated new development in the optical technics. Advanced measurements technologies
and metrological standardization practices (reference material artifacts, traceability, uncertainty
analysis, and report transparency), underpin the modern, science-based approach that we try to
share. Years of research experiences in the earlier CNET and successively STMicroelectronics,
CEA/LETI MINATEC CNRS as well as our relationship with the sharp-edged optical tool instrument
developers and providers in Europe (early SOPRA, Jobin Yvon, now HORIBA and SEMILAB) and J.
Woollam or recent Film Sense from B. Johs in the US give us a great flexibility in contacts. We share
our experience giving advice with the choice of the right tools. An example was the first capability to
analyze the transition edge of SiO2 using a homemade VUV ellipsometer (3eV to 9.5 eV) at a moment
when J. Woollam equivalent instrument was not yet commercialized, (see SiO2 2006 conference in
Italy). We are within European or national project as well. (ANR or IMPACT project). OPTICNANO aim
is to give expert attention within global research environment, i.e.., inside group like SERMA
Technologies, the LETI unique subsidiary metrology potential of MINATEC. Then one has a complete
set of tools for characterization analyses (TEM, SIMS...). The use of complementary techniques
affords answer to new products, materials and films investigations. This is mandatory when
challenging properties existing between competitors in confront of concurrency techniques.
Nevertheless, this consulting expertise start always with specific roadmap agreement preserving
confidentiality through distinctive kickoff-meetings and inside a non-disclosure NDA protocol. The
results is a low cost of R and D studies.
Present expertise interest in the SRT-i24 of EMPIR:
Modeling:
 http://www.opticnano.eu
 see F. Ferrieu poster in first nanocharm workshop in advanced Polarimetry Instrumentation
and corresponding paper published in EJAP (Journal. European Applied physics, (2010)).

2. Polarimetry has been applied for many years in rather different fields. In radar remote sensing
polarimetry, mathematical basis of depolarizing systems have been first developed. In the visible
range optics, standard attenuation and retardance decomposition is currently used in turbid organic
media. Optical entropy and depolarization formalism have been applied for many years in rather
different fields. In radar remote polarimetry, mathematical basis of depolarizing systems have been
first developed from S. Cloude and E. Pottier (ESA). The technic is also presently developed in
astronomy as used for solar physics and exo planet detections (Leiden Workshop NL in 24 March
2014 and ASTROPOL Grenoble 20-30 may 2014).
Exhaustive studies in the literature detail the Mueller matrices properties through
decomposition*.Today, spectroscopic polarimetry opens new fields of investigation for
nanotechnologies materials, photonics as well as for gratings and 3D structures analysis: the
computer codes as these we developed during the national consortium ANR08-NANO-020-03 should
be then adapted using also new algorithms. With this instrumentation progress, simulation remains a
key point to overpass as a challenge between future instruments. The theories for surfaces spectral
power density (PSD) and the random coupled wave approximation (RCWA) in periodic structures are
widely discussed in the literature. The implementation of some of these codes is mandatory for surface
analysis and lithography Scatterometry structures: grating and overlay. Optical measurements in multi
parameter metrology are key points when combining models and measurements. We have interest in
studying models for different structures dimension and overlay detections such as these used for
control of the lithographic process. Exhaustive studies in the literature already detail the Mueller
matrices properties through decomposition, optical entropy and depolarization formalism. In the visible
range optics, standard diattenuation and retardance decompositions are currently used in turbid
organic media by the LPICM group for medical applications. For nanotechnologies, the optical entropy
concept provides a very powerful analysis technique yielding important surface parameters such as
depolarization, correlation and roughness. Complementary applications exist in scatterometry for thin
periodic grating films with high capability polarimeters, such as the next generation of angle resolved
polarimeters instruments,
In the nanotechnology world, the optical entropy concept is an analysis technique yielding important
surface parameters such as depolarization, correlation and roughness. Complementary applications
 http://www.opticnano.eu
 see F. Ferrieu poster in first nanocharm workshop in advanced Polarimetry Instrumentation
and corresponding paper published in EJAP (Journal. European Applied physics, (2010)).

3. exist in scatterometry for thin periodic grating films. The next generation of angle resolved polarimeters
instruments from the LPICM opens new fields of investigation for nanotechnologies materials as well
as for gratings and photonics structures analysis. The implementation of new computer codes will be a
must for surface analysis and lithography, e.g. in scatterometry structures: grating overlay or double
patterning. Polarimetry of light scattered by surface roughness and textured films and periodic
structures in nanotechnologies is a challenge for Instrumentation and modeling. It implies also
dimensional metrology on complex 3D structures within present new 3D STANDFORD Lua codes or
the nodal finite elements Galerkin methods developed at the EPFL. We would participate in the
development and validation of these novel promising optical metrology approaches, i.e., scatterometry
for EUV as well as for IR, Mueller-Polarimetry. Extension of modelling and data analysis algorithms in
particular to 3D development of mathematical procedures for reliable determination of roughness
parameters and other systematic deviations (e.g. variations in multilayer substrates of EUV masks).
These known procedures have been now developed and are available, but they have also to be
significantly further improved to face the named challenges and expected methodical extensions (e. g.
in Mueller Polarimetry with enhanced structure complexity.
Instruments
We have demonstrated capabilities in the metrology for structures in the state of the art of optical
methods, like optical reflectometry, scatterometry or ellipsometry in the infrared (IR), visible (VIS) or
ultraviolet (UV/DUV) spectral range. In the case of IR, we supported the implementation of the LPICM
IR polarimeters in one of the lines at ESRF, (today unfortunately unrealizable and thus abandoned),
even though completely different from the only one instrument implemented at BESSY. Spectroscopic
ellipsometry or reflectometry are also used for characterizations of thin layers, layer structures and
optical material parameters (n&k, see EMPIR accuracy requests). With this instrumentation progress,
simulation remains a key point to overpass as a challenge between future instruments as that was
within the LTM IMPACT program todays under completion. However, for future applications with
complex layer structures, these methods have to be significantly improved. For ultrathin layers or very
small laterally structured features the optical material parameters can be often modified e. g. due to
quantum confinement as it has detected e.g. in the case of FDSOI, quantum dots and nanophase
materials (e.g. in HfO2). For new applications and clean room processing quality control, very accurate
 http://www.opticnano.eu
 see F. Ferrieu poster in first nanocharm workshop in advanced Polarimetry Instrumentation
and corresponding paper published in EJAP (Journal. European Applied physics, (2010)).

4. n&k metrology existing tools are not very suitable and enough accurate. Creation of IMT instruments
(integrated photonic metrology with for example micro-grid polarizer and LC phaser), is also our
concern as we already proposed, unfortunately unpublished but still remaining in the conference
proceeding abstracts booklet from the IECS in Kyoto (2013).
 http://www.opticnano.eu
 see F. Ferrieu poster in first nanocharm workshop in advanced Polarimetry Instrumentation
and corresponding paper published in EJAP (Journal. European Applied physics, (2010)).