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MOS AND CMOS
TECHNOLOGIES

       Dr. C. Saritha
   Lecturer in Electronics
 SSBN Degree & PG College
       ANANTAPUR
OVERVIEW:-
 Introduction.
 MOS (Metal-oxide semiconductor).
 CMOS (Complimentary metal- oxide
  semiconductor).
 Advantages.
 Characteristics.
INTRODUCTION:-

 The field-effect transistor    (FET)     is   a
  unipolar transistor.

 There are      two   types    of   field-effect
  transistors.

 There are junction field-effect transistor
  (JFET) and metal oxide semi-conductor
  (MOS).
 Metal gate has been replaced by
  polysilicon or poly in modern technologies.

 There are two types of MOS transistors:
 nMOS : Negatively doped silicon, rich in
  electrons.

 pMOS : Positively doped silicon, rich in
  holes.
 CMOS:- Both type of transistors are used
  to construct any gate.

 The former is used in linear circuits and the
  latter in digital circuits.

 MOS transistors can be fabricated less
  area than bipolar-transistors
Basic structure of MOS
       transistor
 P-channel MOS consists of a lightly doped
  substrate of n-type silicon material.

 Two regions are heavily doped by diffusion
  with p-type impurities to form the source
  and drain.

 The region between the two         p-type
  sections serves as the channel.
 As the magnitude of the gate negative
  voltage on the gate increases, the region
  below the gate accumulates more positive
  carriers.

 The conductivity increases, and current can
  flow source to drain.

 Provide a voltage difference between these
  two terminals.
 The mode of operation can be
  enhancement or depletion, depends on the
  state of the channel region at There are
  four basic MOS structures.

 The channel can be a p-type or n-type
  ,depending on whether the majority carriers
  are holes or electrons.

 The mode of operation can zero voltage.
 If the channel is initially doped lightly with
  p-type impurity, a conducting channel exits
  at zero gate voltage and the device is said
  to operate in the depletion mode.

 In this mode current flows unless the
  channel is depleted by an applied gate
  field.
 If the region beneath the gate is left initially
  uncharged, a channel must be indused by
  the gate field before current can flow.

 Thus, the channel current is enhanced by
  the gate voltage and such a device is said
  to operate in the enhancement mode.
 P-channel:-
 The source is the terminal through which
  the majority carriers enter the bar.

 The drain is the terminal through which
  majority carriers leave the bar.

 When the gate voltage is above threshold
  voltage (about -2v),no current flows in the
  channel.
 P-type carriers are positive and correspond
  to a positive current flow from source to
  drain.

 N-channel:-
 In the channel MOS, the source terminal is
  connected to the substrate and a positive
  voltage is applied to the drain terminal.
 When the gate voltage is below the
  threshold voltage (about 2v).

 N-type carriers flow from source to drain.

 N-type carriers are negative, which
  corresponds to a positive current flow from
  drain to source.
Graphical symbols for MOS
transistor:-
 The symbol for the enhancement type is
  the one with the broken-line connection
  between source and drain.

 Source to drain is the p-channel.

 And the drain to source is the n-channel.
N-channel MOS logic circuits
using NAND gate:
 Working:-

 NAND gate uses transistor in series.
 The inputs A and B both high for all
  transistors to conduct and cause the output
  go low.
 If either input is low ,the corresponding
  transistor is turned off and the output is
  high.
Advantages :-
 The enhancement type MOS devices
  have been used as micro-resistors in
  integrated microcircuits.

 It is easier to fabricate MOSFET.

 It is widely used than JFET.

 The enhancement type MOSFET finds
  wide application in digital circuitary.
Complimentary mos
 CMOS:-
 Complimentary MOS (CMOS) circuits take
  advantage of the fact that both p-channel
  and n-channel devices can be fabricated
  on the same substrate.

 CMOS circuits consist of both types of
  MOS devices, interconnected to form logic
  functions.
CMOS LOGIC CIRCUIT
USING NAND GATE:
 The output has low impudence to ground
  and produces a low state.

 If any input is low:

 The n-channel transistor is turn off and the
  associated p-channel transistor s is turned
  on.
 The output is coupled to VDD and goes to
  the high state.
 WORKING:-

 A two input NAND gate consists of two p-
  type units in parallel and two n-type units in
  series.

 If all inputs are high:-

 If all inputs are high,both p-channel
  transistors turn off and both n-channel
 Multiple- input NAND gates may be formed
  by placing equal number of p-type
  transistors and n-type transistors in parallel
  and series, respectively.
 CMOS CHARACTERISTICS:-

 Power dissipation is very low 0.01mw.
 The propagation delay time 5v ranges from
  5 to 20ns.
 Higher fan-out.
 Good noise immunity.
 The noise margin is usually about 40
  percent of the power supply voltage.
THANK YOU

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Mos and cmos technology

  • 1. MOS AND CMOS TECHNOLOGIES Dr. C. Saritha Lecturer in Electronics SSBN Degree & PG College ANANTAPUR
  • 2. OVERVIEW:-  Introduction.  MOS (Metal-oxide semiconductor).  CMOS (Complimentary metal- oxide semiconductor).  Advantages.  Characteristics.
  • 3. INTRODUCTION:-  The field-effect transistor (FET) is a unipolar transistor.  There are two types of field-effect transistors.  There are junction field-effect transistor (JFET) and metal oxide semi-conductor (MOS).
  • 4.  Metal gate has been replaced by polysilicon or poly in modern technologies.  There are two types of MOS transistors:  nMOS : Negatively doped silicon, rich in electrons.  pMOS : Positively doped silicon, rich in holes.
  • 5.  CMOS:- Both type of transistors are used to construct any gate.  The former is used in linear circuits and the latter in digital circuits.  MOS transistors can be fabricated less area than bipolar-transistors
  • 6. Basic structure of MOS transistor
  • 7.  P-channel MOS consists of a lightly doped substrate of n-type silicon material.  Two regions are heavily doped by diffusion with p-type impurities to form the source and drain.  The region between the two p-type sections serves as the channel.
  • 8.  As the magnitude of the gate negative voltage on the gate increases, the region below the gate accumulates more positive carriers.  The conductivity increases, and current can flow source to drain.  Provide a voltage difference between these two terminals.
  • 9.  The mode of operation can be enhancement or depletion, depends on the state of the channel region at There are four basic MOS structures.  The channel can be a p-type or n-type ,depending on whether the majority carriers are holes or electrons.  The mode of operation can zero voltage.
  • 10.  If the channel is initially doped lightly with p-type impurity, a conducting channel exits at zero gate voltage and the device is said to operate in the depletion mode.  In this mode current flows unless the channel is depleted by an applied gate field.
  • 11.  If the region beneath the gate is left initially uncharged, a channel must be indused by the gate field before current can flow.  Thus, the channel current is enhanced by the gate voltage and such a device is said to operate in the enhancement mode.
  • 12.  P-channel:-  The source is the terminal through which the majority carriers enter the bar.  The drain is the terminal through which majority carriers leave the bar.  When the gate voltage is above threshold voltage (about -2v),no current flows in the channel.
  • 13.  P-type carriers are positive and correspond to a positive current flow from source to drain.  N-channel:-  In the channel MOS, the source terminal is connected to the substrate and a positive voltage is applied to the drain terminal.
  • 14.  When the gate voltage is below the threshold voltage (about 2v).  N-type carriers flow from source to drain.  N-type carriers are negative, which corresponds to a positive current flow from drain to source.
  • 15. Graphical symbols for MOS transistor:-
  • 16.  The symbol for the enhancement type is the one with the broken-line connection between source and drain.  Source to drain is the p-channel.  And the drain to source is the n-channel.
  • 17. N-channel MOS logic circuits using NAND gate:
  • 18.  Working:-  NAND gate uses transistor in series.  The inputs A and B both high for all transistors to conduct and cause the output go low.  If either input is low ,the corresponding transistor is turned off and the output is high.
  • 19. Advantages :-  The enhancement type MOS devices have been used as micro-resistors in integrated microcircuits.  It is easier to fabricate MOSFET.  It is widely used than JFET.  The enhancement type MOSFET finds wide application in digital circuitary.
  • 20. Complimentary mos  CMOS:-  Complimentary MOS (CMOS) circuits take advantage of the fact that both p-channel and n-channel devices can be fabricated on the same substrate.  CMOS circuits consist of both types of MOS devices, interconnected to form logic functions.
  • 22.  The output has low impudence to ground and produces a low state.  If any input is low:  The n-channel transistor is turn off and the associated p-channel transistor s is turned on.  The output is coupled to VDD and goes to the high state.
  • 23.  WORKING:-  A two input NAND gate consists of two p- type units in parallel and two n-type units in series.  If all inputs are high:-  If all inputs are high,both p-channel transistors turn off and both n-channel
  • 24.  Multiple- input NAND gates may be formed by placing equal number of p-type transistors and n-type transistors in parallel and series, respectively.
  • 25.  CMOS CHARACTERISTICS:-  Power dissipation is very low 0.01mw.  The propagation delay time 5v ranges from 5 to 20ns.  Higher fan-out.  Good noise immunity.  The noise margin is usually about 40 percent of the power supply voltage.