A guide to exposure determination and the impact of artwork
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An overview of how exposure and the artwork process can affect the durability and the quality of the image that you are printing. Presented by William Shorter.
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Claudio Gallicchio is an Assistant Professor at the Department of Computer Science of the University of Pisa, Italy. His research involves merging concepts from Deep Learning, Dynamical Systems, and Randomized Neural Systems, and he has co-authored over 100 scientific publications on the subject. He is the founder of the IEEE CIS Task Force on Reservoir Computing, and the co-founder and chair of the IEEE Task Force on Randomization-based Neural Networks and Learning Systems. He is an associate editor of IEEE Transactions on Neural Networks and Learning Systems (TNNLS).
Collapsing Narratives: Exploring Non-Linearity • a micro report by Rosie Wells
Insight: In a landscape where traditional narrative structures are giving way to fragmented and non-linear forms of storytelling, there lies immense potential for creativity and exploration.
'Collapsing Narratives: Exploring Non-Linearity' is a micro report from Rosie Wells.
Rosie Wells is an Arts & Cultural Strategist uniquely positioned at the intersection of grassroots and mainstream storytelling.
Their work is focused on developing meaningful and lasting connections that can drive social change.
Please download this presentation to enjoy the hyperlinks!
ASONAM2023_presection_slide_track-recommendation.pdf
Presented at the 2023 IEEE/ACM International Conference on
Advances in Social Networks Analysis and Mining.
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This presentation by Thibault Schrepel, Associate Professor of Law at Vrije Universiteit Amsterdam University, was made during the discussion “Artificial Intelligence, Data and Competition” held at the 143rd meeting of the OECD Competition Committee on 12 June 2024. More papers and presentations on the topic can be found at oe.cd/aicomp.
This presentation was uploaded with the author’s consent.
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This presentation was uploaded with the author’s consent.
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This presentation was uploaded with the author’s consent.
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This presentation was uploaded with the author’s consent.Pro-competitive Industrial Policy – LANE – June 2024 OECD discussion
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This presentation was uploaded with the author’s consent.
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This presentation by OECD, OECD Secretariat, was made during the discussion “Pro-competitive Industrial Policy” held at the 143rd meeting of the OECD Competition Committee on 12 June 2024. More papers and presentations on the topic can be found at oe.cd/pcip.
This presentation was uploaded with the author’s consent.
Competition and Regulation in Professions and Occupations – OECD – June 2024 ...
Competition and Regulation in Professions and Occupations – OECD – June 2024 ...OECD Directorate for Financial and Enterprise Affairs
This presentation by OECD, OECD Secretariat, was made during the discussion “Competition and Regulation in Professions and Occupations” held at the 77th meeting of the OECD Working Party No. 2 on Competition and Regulation on 10 June 2024. More papers and presentations on the topic can be found at oe.cd/crps.
This presentation was uploaded with the author’s consent.
The Intersection between Competition and Data Privacy – OECD – June 2024 OECD...
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This presentation was uploaded with the author’s consent.
XP 2024 presentation: A New Look to Leadership
Presentation slides from XP2024 conference, Bolzano IT. The slides describe a new view to leadership and combines it with anthro-complexity (aka cynefin).
原版制作贝德福特大学毕业证（bedfordhire毕业证）硕士文凭原版一模一样
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本公司拥有海外各大学样板无数，能完美还原海外各大学 Bachelor Diploma degree, Master Degree Diploma
1:1完美还原海外各大学毕业材料上的工艺：水印，阴影底纹，钢印LOGO烫金烫银，LOGO烫金烫银复合重叠。文字图案浮雕、激光镭射、紫外荧光、温感、复印防伪等防伪工艺。材料咨询办理、认证咨询办理请加学历顾问Q/微741003700
留信网认证的作用:
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2:同时对留学生所学专业登记给予评定
3:国家专业人才认证中心颁发入库证书
4:这个认证书并且可以归档倒地方
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6:个人职称评审加20分
7:个人信誉贷款加10分
8:在国家人才网主办的国家网络招聘大会中纳入资料，供国家高端企业选择人才
2024-05-30_meetup_devops_aix-marseille.pdf
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A guide to exposure determination and the impact of artwork
- 1. A guide to exposure determination and the impact of artwork William Shorter CPS Technical Sales Executive/Product Manager
- 2. Objective of this screen printing workshop
- 3. Factors to consider with exposure systems • The quality of the UV light. – Wave length: • Diazo • Photopolymer – Avoid Infra Red • The power of the light. – Distance
- 4. Factors to consider with exposure systems • The power of the light. – Distance 1.2m
- 5. Factors to consider with exposure systems • Distance from the stencil. – 1m = 30 seconds. – 2m = 900 seconds. • Angle of the light. – Diagonal of the screen. Increase in exposure time
- 6. Factors to consider with exposure systems • Mesh Colour White Mesh Yellow Meshvs Faster Slower
- 7. Factors to consider with exposure systems • Vacuum – Good seal – Don’t use white card at the back • Integrator or time?
- 8. Factors to consider with your artwork • Quite simply, you can produce bad prints from good artwork, but you cannot produce good prints from bad artwork.
- 9. Factors to consider with your artwork • Opaqueness of ink jet media. • Must absorb UV light in the region of 350-420 nanometers. • Don’t overload ink jet positives with ink. • The smallest dot or line you can print is controlled by the mesh thread width.
- 10. Factors that affect durability • Optimum Exposure – An Exposure Calculator or step wedge is an important calibration tool. – Full exposure is when all the diazo has cross linked. • Indicated by colour change. – Brown to purple – Green to blue
- 11. Factors that affect durability on the press 25%Optimum Exposure 50% Optimum Exposure 75% Optimum Exposure 100% Optimum Exposure
- 12. • Masks and positives with poor masking ability will result in you needing to under expose the stencil film or emulsion, compromising the durability and finished print quality.
- 13. CPS Ltd Chemicals Products and Services www.cps.eu cps@cps.eu T: 01235 773240 F: 01235 771196 Tell Us What You Think
- 14. Reproduction of any material whether by photocopying or storing in any medium by electronic means or otherwise is prohibited without prior written consent of MacDermid Autotype Ltd. See legal disclaimer notice on www.cps.eu © 2015. All rights reserved