2. MOOR’S LAW
• 1965 – 1975 first edition Theory
• Review in 1975 until now
• 6m from 1976 to 7nm in 2019
2
3. HISTORY
• 20nm Feature size challenge in integration
• DIBL, Constriction Doping, Vth, Quantionic reactions, …
• FINFET Theory, Revolution in Structure of Planar Transistors
• HU & King-Liu & BOKO from Berkeley California firs theorist of FINFET 3
4. MOSFET SHORT CHANNEL EFFECTS
• Cg-s & Cg-d & Cg-ch
• Punch – Through & Doping
• DIBL Effect
• Surface Current Effect
4
5. SOI MOSFET STRUCTURE
• Using SOI Wafer
• Advantage :
• Reduce the parasitic junction
capacitance
• Lower power
• Disadvantage :
• Difficulty in manufacturing
• Self-heating problem
5
6. FINFET THEORY & STRUCTURE
• Offer in 1999 - 2000
• Without doping
• Improve channel control
• Decrease channel length
• Increase L/W parameter
6
9. ADVANTAGE
FINFET ADVANTAGES
• Solve disadvantage parameter in MOSFETs.
• Feature sizes - Possible to lower 7nm.
• Much lower power consumption allows high integration levels. (150%)
• Operating speed - Often in excess of 30% faster.
• Static leakage current-Typically reduced by up to 90%
9
10. SAMSUNG FOUNDRY'S NEW TRANSISTOR
7nm Samsung Technology :
• GEAT-ALL-AROUND FET TRANSISTOR (GAAFET)
• MULTI-BRIDGE-CHANNEL FET TRANSISTOR (MBCFET)
10