This document discusses surface engineering using ion implantation of materials. It begins with an introduction to ion implantation, which involves directing energetic ions onto a material's surface, where they penetrate and come to rest below the surface. Ion implantation can be used to alter near-surface composition and structure, as well as mechanical, chemical, and other properties. Some advantages are controlled doping and low temperature processing, while disadvantages include high costs. Examples are provided where ion implantation was used to modify properties of materials like increased hardness of alumina and creation of nanometer iron particles in sapphire. Analyzing techniques like RBS, TEM, and PL are discussed.

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SURFACE ENGINEERING BY ION IMPLANTATION OF MATERIALSSURFACE ENGINEERING BY ION IMPLANTATION OF MATERIALS
Younes Sina a,*
, Carl J. McHargue b,**
a
Material Science and Engineering Dep., The University of Tennessee, Knoxville, TN 37996-0759, USA
b
Center for Materials Processing, The University of Tennessee, Knoxville, USA, TN 37996-0759,
INTRODUCTION
ION IMPLANTATION CAN BE USED TO
ANALYZING TECHNIQUES
ADVANTAGES AND DISADVANTAGES
OF ION IMPLANTATION
MODIFICATION OF STRUCTURE
REFERENCES
ABSTRACT
CONTACT
Younes Sina
The University of Tennessee, Knoxville,
Material Science and Engineering Department
Email: ysina@utk.edu
Phone:865-258 1964
Website:http://www.younessina.blogspot.com
Ion implantation consists of directing an
energetic ion onto surface of a target
material. The ions penetrate through
the target and gradually loss their
energy and finally come to rest many
atomic layers below the surface. Ion
implantation technique is being
investigated as a general method for
altering the near-surface properties of
metals, ceramics, and polymers.
Ion implantation is an attractive technique for
altering the near-surface properties of a wide
range of materials. Any element can be injected
into a solid forming usually a non-equilibrium
compositions and structures that can not be
achieved by conventional processing methods.
•Alter near-surface composition to produce both
equilibrium and non-equilibrium compositions
•Change crystalline structure
•Change mechanical properties
•Change chemical reactivity
•Produce nanophases
•Pattern substrates
Some of ion implantation applications are
summarized in the following table:
Mechanical Chemical Electromagnetic
Wear Corrosion superconductivity
Friction Oxidation Photoconductivity
Hardness Catalysis Resistivity
Fatigue Electrochemical Magnetic properties
Plasticity Reflectivity
Ductility Dielectric properties
Adhesion
Ion implantation technique allows some of ions
penetrate into the surface of a material (including
metals, ceramics, and polymers) producing a non-
equilibrium structure. Forming of amorphous structures,
supersaturated solutions and metastable compounds
may modify some of the material properties.
The University of Tennessee, Knoxville
Advantages of Ion Implantation:
• Controlled doping
• Depth of penetration can be controlled by
controlling energy of the
ion beam
• Concentration higher than solid solubility possible
• Reactive ions can also be implanted
• Implantation of different ions
• Low temperature process
Disadvantages of Ion Implantation:
• Costly accelerator for ion implantation
• Low throughput of the implanter
Hip Implant
90% of hip replacements are implanted with nitrogen
Hip Implant
90% of hip replacements are implanted with nitrogen
Nanoindentation-Al2O3
Implanted crystalline samples: hardness ~1.3 × unimplanted
Implanted amorphous samples: hardness ~0.5×unimplanted
Nanoindentation-Al2O3
Implanted crystalline samples: hardness ~1.3 × unimplanted
Implanted amorphous samples: hardness ~0.5×unimplanted
Accelerator for ion implantationAccelerator for ion implantation
The most important analyzing methods to study ion
implanted materials are Rutherford Backscattering
(RBS), Transmission Electron Microscopy (TEM),
and Photoluminescence Spectroscopy (PL).
Nanometer Iron Particles
• Sapphire implanted with 1×1017
Fe/cm2
(160 keV)at RT
• 1-3 nm pure bcc iron single crystals
Nanometer Iron Particles
• Sapphire implanted with 1×1017
Fe/cm2
(160 keV)at RT
• 1-3 nm pure bcc iron single crystals
Interaction of Ions with TargetInteraction of Ions with Target
1. Materials Science Reports, Ion Implantation and
Annealing of Crystalline Oxides, C.W. White, C.J.
McHargue, P.S. Sklad, L.A. Boatner, and G.C. Farlow
2. Surface Engineering of Metals: principles, equipment,
technologies, By Tadeusz Burakowski, Tadeusz
Wierzchoń
IONIMPLANTAION PROCESS