This document discusses a study on selective adsorption of atomic hydrogen on a hexagonal boron nitride (h-BN) thin film. Various characterization techniques were used, including time-of-flight mass spectrometry (TOF), near-edge X-ray absorption fine structure (NEXAFS) spectroscopy, X-ray photoelectron spectroscopy (XPS), and photon stimulated ion desorption (PSID). The results from NEXAFS, XPS and PSID imply that atomic deuterium adsorption occurs preferentially on boron sites over nitrogen sites in the h-BN film. Density functional theory calculations provide further evidence that hydrogen atoms prefer to adsorb on boron sites due to favorable frontier orbital interactions