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ALD 2018 Tutorial ALD precursors for semiconductor and its development challenges
The document discusses the challenges in developing atomic layer deposition (ALD) precursors for semiconductor manufacturing, highlighting the need for more chemists given increased demand. It outlines historical context, various precursor development challenges, and the complexities in achieving successful precursor integration within the manufacturing processes. The conclusion emphasizes the importance of collaboration among stakeholders and developing innovative strategies to address the shortages in precursor chemists and related R&D efforts.
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ALD 2018 Tutorial ALD precursors for semiconductor and its development challenges
- 1. Overview of ALDPrecursors for Semiconductor Manufacturing and Its Development Challenges Wonyong Koh linkedin.com/in/wonyong-koh-5652844
- 2. ALD 2018 Tutorial Agenda •Big Picture • Brief History of ALD/CVD Precursors • Precursor Development Challenges: More precursors by no more chemists • Summary 2
- 3. ALD 2018 Tutorial Disclaimer •The opinions expressed in this presentation and on the following slides are solely those of the presenter. 3
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- 5. ALD 2018 Tutorial “Futureain't what it used to be” (due to ALD) 5
- 6. ALD 2018 Tutorial ALot More ALD Precursors To Be Used for A Lot More Semiconductor Devices 6An Steegen, ITF 2017 JAPAN
- 7. ALD 2018 Tutorial MaterialsInnovation Move Moore and More Chips 7 Smaller, Faster Semiconductor Devices by Materials Innovation http://www.semi.org/en/node/55021
- 8. ALD 2018 Tutorial SemiconductorMemory (NAND & DRAM) Devices Drive Precursor Usages 8 SMC 2017, Linx Consulting
- 9. ALD 2018 Tutorial Agenda •Big Picture • Brief History of ALD/CVD Precursors • Precursor Development Challenges: More precursors by no more chemists • Summary 9
- 10. ALD 2018 Tutorial Metal-OrganicCVD Precursor R&D In ‘90s Compared to Inorganic Precursors: TiCl4, WF6, …
- 11. ALD 2018 Tutorial CuCVD Precursors were Hot in ’90s Since IBM Announced Cu Chip in 1997 • Cu CVD was tested by many device makers other than IBM, however, electroplating (IBM’s choice) has been used to manufacture Cu chips.
- 12. ALD 2018 Tutorial MetalOxide Precursors R&D in ’90s
- 13. ALD 2018 Tutorial ManyPrecursors Developed, However, Not Used for Semiconductor Manufacturing (1) • Ba, Sr, Ta, Nb precursors for high-k dielectric, ferroelectric oxide, etc. – Metal β-diketonates (Most are solid.) – Metal alkoxides • CupraSelect® for Cu metal CVD – (hfac)Cu(vtms)
- 14. ALD 2018 Tutorial ManyPrecursors Developed, However, Not Used for Semiconductor Manufacturing (2) • Al precursors for Al metal CVD 1. H3Al·NMe3 (solid) 2. H3Al·NMe2Et(liquid) 3. H3Al·(NMP) (liquid) Thermal Stability is less than manufacturable.
- 15. ALD 2018 Tutorial ManyPrecursors Developed, However, Not Used for Semiconductor Manufacturing (3) 15 “YET”
- 16. ALD 2018 Tutorial SuccessStories Seldom Happen (1) 1st ALD Precursor for DRAM • Trimethylaluminum (TMA) for Al2O3 ALD film for DRAM high-k dielectric layer + O3 Al2O3 film 16
- 17. ALD 2018 Tutorial SuccessStories Seldom Happen (2) 2nd & 3rd ALD Precursors for DRAM • Tetrakis(ethylmethylamido)hafnium (TEMAH) for HfO2 and tetrakis(ethylmethylamido)zirconium (TEMAZ) for ZrO2 ALD film for DRAM high-k dielectric layer + O3 ZrO2 film 17
- 18. ALD 2018 Tutorial SuccessStories Seldom Happen (3) More Recent Successes (not exhaustive) 18
- 19. ALD 2018 Tutorial Agenda •Big Picture • Brief History of ALD/CVD Precursors • Precursor Development Challenges: More precursors by no more chemists • Summary 19
- 20. ALD 2018 Tutorial Semiconductorindustry keep asking new ALD/CVD precursors. (Selective deposition was newly added to the list.) M. McSwiney et al. ALD 2013 Workshop 20
- 21. ALD 2018 Tutorial Precursorsmeeting all these requirements are easy to order, however, difficult to deliver! M. McSwiney et al. ALD 2013 Workshop 21
- 22. ALD 2018 Tutorial MANYPrecursor Candidates with Various Metals and Ligands Limited, still vast possible combinations of metals & ligands! One good precursor out of HOW MANY candidates? 22
- 23. ALD 2018 Tutorial Drugvs. Precursor Development 1 Successful Precursor Unit Process Development Process Integration Precursor Discovery & Development-Timeline A few compounds a dozen or so compounds Hundreds of compounds Precursor Discovery 23
- 24. ALD 2018 Tutorial PrecursorMakers Have Limited Control One drug company drives the whole process (except the initial discovery stage). 1 Successful Precursor Process Integration Unit Process Development Precursor Discovery Under a Precursor Maker’s Control Under a Equipment Maker’s Control Under a Device Maker’s Control What is needed is not the precursor, but film or process result. 24
- 25. ALD 2018 Tutorial MurkyUntil Volume Manufacturing • The ALD process result must be reproducible using many precursor lots and using suitable process parameters of an ALD tool. • The ALD process is put into a device maker’s toolbox to be an option for process integration. • A precursor maker has to wait until device makers start to use a precursor for volume manufacturing. 25
- 26. ALD 2018 Tutorial MoreInnovation Needs More People! • Computation and machine learning can not yet solve most chemistry/material science problems. (It may change in not far future.) • Semiconductor material innovation needs more ALD precursors, and thus more chemists/material scientists (for now). • There are unexpected chemistry about ALD precursor development, which can be found only by people, not by machines (for now). 26
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- 28. ALD 2018 Tutorial AnUnexpected Precursor Chemistry (1) • CoCl2 + 2 Li Co(iPr-DAD)2 (liquid) gives GC result as: (paramagnetic with no NMR signal) 28 99.6% iPr-DAD = add 2 iPr-DAD (Different reaction sequence of the same raw materials) • 2 iPr-DAD + 2 Li ? (distillable liquid) gives GC result as: (paramagnetic with no NMR signal) add CoCl2
- 29. ALD 2018 Tutorial AnUnexpected Precursor Chemistry (2) 29 (Different reaction sequence of the same raw materials) • 2 iPr-DAD + 2 Li ? (liquid) gives GC result of a whole mess add CoCl2 iPr-DAD =
- 30. ALD 2018 Tutorial Whereto Generate New ALD Precursors? (Who Will Hire Precursor Chemists?) • Device makers has difficult to use new precursors due to stricter chemical safety regulation (no more precursor chemists with device makers). • Some precursor makers moved out of the business (no more precursor chemists with precursor makers). • Only a few academic groups are working on new ALD precursor development (no more precursor chemists in academia). • Where are precursor chemists who will generate new ideas and new ALD precursors (more precursor chemists with equipment makers)? 30
- 31. ALD 2018 Tutorial OriginalDrug Is NOT the Only Drug Business 31
- 32. ALD 2018 Tutorial Originalvs. Generic Drug Business Model Original Drug Generic Drug High risk, high return Low risk, low return R&D intensive Manufacturing competency Little competition by IP protection Competition by price Drug price ⨠ manufacturing cost Drug price > manufacturing cost 32
- 33. ALD 2018 Tutorial Originalvs. Generic Precursors Who will develop original precursors, if they can be copied easily by generic makers? 33
- 34. ALD 2018 Tutorial ChallengesTo Precursor Makers • No direct access to actual process (which are under equipment and device makers’ control) Unable to determine which precursor is the best. Difficult to expect when a precursor is put into volume production. • Less chance of academic collaboration Only a few academic groups are working on precursor R&D worldwide now. • Very low Success Rate Few successful precursors out of vast number of candidates. • Increasing cost for chemical safety There needs to be a way to share the burden. • Little room for IP protection – It is obvious now to form a metal-containing film using a volatile metal- containing molecule. – Product (new precursor molecule) patents are preferable. Method (process) patents are less useful. 34
- 35. ALD 2018 Tutorial Conundrum: Business Model • A LOT MORE semiconductor devices will be needed for self-driving cars, IoT devices, etc., which collect, process, transmit, and store data. • A LOT MORE precursors will be used, therefore. • Will the precursor market diverge? – Generic precursors market – High-value original precursors market (for advanced devices) • Can semiconductor industry achieve both? – Generic precursor supply at low cost – High-value original precursor supply when needed 35
- 36. ALD 2018 Tutorial Originalvs. Generic Precursor Business Model Original Precursor Generic Precursor High risk (O) high return (?) Low risk, low return R&D intensive Manufacturing competency Little competition by IP protection (?) Competition by price and quality price ⨠ manufacturing cost (?) price > manufacturing cost Need to hire many research chemists/material scientists No need of many research chemists/material scientists Confidential 36
- 37. ALD 2018 Tutorial Summary •Hard problems can be solved only through collaboration of semiconductor precursor, equipment, and device makers. • There needs to be a way to share burden among participants. • Semiconductor industry needs to find a way to make more chemists to work on hard problems. 37