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Analog IC Design
BITS Pilani
Pilani Campus ANU GUPTAp
BITS PilaniBITS Pilani
Pilani Campus
Analog Layout Techniques
Organisation
• Design rules, Schematic to layout, vice versa,
• cross-sectional diagram, big layouts
• Matched componentsp
 Over-etching errors
unit components designunit components design
design using non unit component
 Boundary condition matching Boundary condition matching
Common centroid layout, parasitic cap estimation
BITS Pilani, Pilani Campus
Scalable design rules-----same set can be used for next
tech generation by changing λ. Worst case values of
spacings, widths etc. are used , so can’t be an optimized
set. e. g. MOSIS design rulesg g
Absolute design rules----optimized set but same set can’t
be used for next tech gen. Entire new set is to be
created.
BITS Pilani, Pilani Campus
Tanner
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
4 NAND GATES4 NAND GATES
CADENCE
MOS LAYOUT
λ
λ 2λ
2λ
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
λ
5λ
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Junction cap-
single transistorsingle transistor
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Other layouts of MOS
Annular transistor
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Elongated annular
transistor
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Dense MOS layouts
metal1metal1
metal2
B t t i t
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Waffle transistor Bent transistor
Compute w/L?
Circuit And Layout
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Try more examples
How to reduce parasitic
capacitances?
Careful layout by junction sharing
CAPACITOR LAYOUTS
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
RESISTOR LAYOUT
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Matching Issues
Large device => many small unit devicesg y
Same boundary conditions for devices
BITS Pilani, Pilani Campus
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Overetching –
MOS dimensions
(W/L)u = 8um/2um= 4 desired
MOS dimensions
After over etching ---
(W/L)u = 7um/1um= 7; 0.5um= ∆e
LL
∆e
Poly layer
w Over etched Poly layer
BITS Pilani, Pilani Campus
Absolute dimension of MOS
Remedy---use Unit components w=L
(W/L)u = 10um/10um, RATIO=1
Remedy---use Unit components w=L
After fab. (W/L)u  8um/8um, RATIO=1
Conclusion—Abs. dimensions change, ratio does not
changechange
BITS Pilani, Pilani Campus
Ratio of matched devices
• (W/L)1 = 2, (W/L)2 = 8, ratio= 4
Ratio of matched devices
( )1 , ( )2 ,
• We take unit device (W/L)u = 10um/10um
• After fab. (W/L)u  8um/8um( )u
(W/L)2 8(W/L)u
4
( )2 ( )u
(W/L)1 2(W/L)u
= =4
Thus, ratio remains same, if same unit
device is used
Application of technique
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS PilaniBITS Pilani
Pilani Campus
Layout of CAPACITORSLayout of CAPACITORS
CAPACITOR LAYOUTS
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Over-Etching
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Let
C1/ C2 = 3.4 = 2+1.4
= [6/3] + [1.4/1][6/3] [1.4/1]
[6/3]---can be implemented by using unit[6/3]---can be implemented by using unit
capacitors
[1 4/1]---we require non unit capacitor[1.4/1]---we require non unit capacitor
Mismatch can occur due to second term
BITS Pilani, Pilani Campus
No mismatch conditionNo mismatch condition
• We should design non unit cap Such thatWe should design non unit cap. Such that
ratio (1.4) remains constant even after
overetchingoveretching
H t d i ?• How to design?
• What is the condition?
Condition
= c1
c2c
εr1= εr2
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Non unit sized cap dim.
estimation
= 1 4
estimation
= 1.4
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS PilaniBITS Pilani
Pilani Campus
Boundary condition matchingBoundary condition matching
Common centroid layout
What if unit devices change randomly?g y
Since one device is facing larger change in dimension,g g g
maintaining constant ratio would be difficult.
So We should have same change in all unit devices how?So, We should have same change in all unit devices. how?
Inter-digitization
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Reduce mismatches
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
D DD
S
SS
S S
Bulk (backgate contact)
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
RESISTOR LAYOUT
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Big Resistor
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BIG RESISTOR (unit components)
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Multi fingered
Common Centroid layoutCommon Centroid layout
Parasitic cap. calculation of
MOS device
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
20λ 6λ 6λ 6λ
5λ 5λ
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
Fingered layout
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
View of fingered layout
BITS Pilani, Deemed to be University under Section 3 of UGC Act, 1956
BITS PilaniBITS Pilani
Pilani Campus
ENDEND

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Aicd cmos layouts 4