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Parisa Ashori / International Journal of Engineering Research and Applications
(IJERA) ISSN: 2248-9622 www.ijera.com
Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649
2646 | P a g e
Monte Carlo Calculation of Electron Transport in GaAs and
GaSb
1
Parisa Ashori and 2
Farideh Rafegh Vand
1
Physics Department, Payame Nour University of Mashhad, Mashhad, Iran
2
Chemistry Department, Payame Nour University of Robat Karim (Parand), Robat Karim, Iran
Abstract
Electron transport properties in GaSb
and GaAs are calculated for different
temperature, doping dependencies at high electric
field applications. The calculations are performed
using a three valleys ensemble Monte Carlo model
that includes numerical formulations of the
phonon scattering rates and ionized impurity
scattering rates. For two materials, we find that
electron velocity overshoot only occurs when the
electric field in increased to a value above a
certain critical field .This critical field is strongly
dependent on the material parameters. Results
from the two materials are finally compared. The
agreement with the available experimental data is
found to be satisfactory.
Keywords-: Monte Carlo method; ionized
impurity scattering; overshoot velocity.
I. INTRODUCTION
GaSb and GaAs semiconductors are
becoming of increasing importance in many emerging
optoelectronic and electronic device applications.
Among these applications are ultraviolet
photodetectors, blue and UV light emitters, and high
frequency, high power electronic devices. As an aid
to the device-related work, the transport coefficients
of the materials need careful investigation. Transport
properties of electrons in GaSb and GaN
semiconductors can be conveniently derived by direct
solution of the Boltzmann equation [1]. Previous
applications of this technique were directed toward
calculations of drift mobility in ideally pure
semiconductors. There is also considerable interest in
accurate descriptions of impure crystals, from both
the experimental and the theoretical points of view. In
the former case, foe example, one may take
advantage of the sensitivity of mobility to ionized
impurities in analyses of impurity content. In the
latter case, highly doped materials allow one to probe
regions of the conduction band in the neighborhood
of the Fermi level, well above the band edge.
Obviously, accurate calculations in conjunction with
experimental data are helpful in exposing weaknesses
of the theoretical model, particularly with regard to
electron scattering by ionized impurities at low
temperatures [2]. The purpose of the present paper is
to calculate electron drift velocity for various
temperatures and ionized-impurity concentrations.
The formulation itself applies only to the central 
valley conduction band and the two nearest valleys.
We have also consider band nonparabolicity,
admixture of p-type valence-band wave functions,
degeneracy of the electron distribution to any
arbitrary degree, and the screening effects of free
carriers on the scattering probabilities [3]. All the
relevant scattering mechanisms, including the two-
mode nature of the polar optic phonon scattering, are
taken into account [4].
In this communication, we present Monte Carlo
calculations of steady-state electron transport
conditions in GaSb and GaAs [5]. We demonstrate
the effect of injection energy and electric field on the
electron transport properties.
This paper is organized as follows. Details of the
employed simulation model is presented in section 2
and the results of steady-state electron transport
properties carried out on GaSb and GaAs structures
are interpreted in section 3.
Another advantage of GaSb is that it provides for
type II band alignment in super lattices and quantum
wells when used in conjunction with the InAs system.
Such structures are being recognized as promising
candidates for mid-infrared lasers due to the inherent
suppression of internal electron-hole recombination.
The Auger rates have also been shown to be greatly
reduced in the GaSb based super lattices. Furthermore,
as the GaSb/InAs share no common cation or anion,
one can fabricate either an InSb-like or a GaAs-like
interface simply by changing the growth sequence.
Different vibrational properties are expected to result
[7-9], and the electronic properties of the confined
carrier gas are correspondingly affected.
II. MODEL DETAILS
In order to calculate the electron drift
velocity for large electric fields, consideration of
conduction band satellite valleys is necessary. The
first-principles band structure of zincblende GaSb and
GaAs predicts a direct band gap located at the  point
and lowest energy conduction band satellite valleys at
the X point and at the L point. In our Monte Carlo
simulation, the  valley, the three equivalent X
valleys, the four equivalent L valleys, are represented
by ellipsoidal, nonparabolic dispersion relationships of
the following form [6],
*
22
2
)](1)[(
m
k
kEkE i

  (1)
Parisa Ashori / International Journal of Engineering Research and Applications
(IJERA) ISSN: 2248-9622 www.ijera.com
Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649
2647 | P a g e
where m* is effective mass at the band edge and i is
the non-parabolicity coefficient of the i-th valley. The
band structure and material parameters necessary for
calculating the scattering probabilities used in the
present Monte Carlo simulation are given in table 1.
Scattering mechanisms included in the simulation are
acoustic deformation potential scattering (treated
either as an elastic process or as an inelastic process)
and pizoelectric scattering (which is found to be
negligible in the temperature range discussed here).
Furthermore, longitudinal optical phonon scattering,
nonequivalent and, where applicable, equivalent
intervalley scattering events are taken into account
among all valley types with the transfers assumed to
be governed by the same deformation potential fields
and the same phonon frequencies. Degeneracy effects
are expected to be negligible over almostall of the
temperature and electron concentration ranges of
interest here and, hence, are not considered in the
calculation.
Table 1. Important parameters used in our calculations
for GaSb and GaAs [7-9].
In our model at the start of each simulation, ten
thousand electron particles are distributed in
momentum space according to a Maxwell-Boltzmann
distribution function. These particles are propagated
classically between collisions according to their
velocity, effective mass and the prevailing field. The
selection of the propagation time, scattering
mechanism and other related quantities is achieved by
generating random numbers and using this numbers to
select, for example, a scattering mechanism. In the
case of the ellipsoidal, non-parabolic conduction
valley model, the usual Herring-Vogt transformation
matrices are used to map carrier momenta into
spherical valleys when particles are drifted or
scattered. Steady-state results of high field transport
studies have been obtained for lattice temperatures up
to 600 K, in order to gain some insight into the hot
carrier transport and the energy distribution function
that would be generated in the gate-drain region of a
power field effect transistor.
III. RESULTS
Electron drift velocity as a function of
electric field is important in determining the
performance of high-speed and microwave
semiconductor devices. Here we show the results of
temperature dependence of the steady-state velocity-
field characteristics and valley occupancy in bulk
GaSb and GaAs materials.
Figure 1 shows the simulated velocity-field
characteristics at 300 K, with a background doping
concentration of 1017
cm-3
, and with the electric field
applied along one of the cubic axes.
0 2 4 6 8 10
0.0
0.4
0.8
1.2
1.6
2.0
2.4
GaSb
GaAs
Driftvelocity(*10
5
m/s)
Electric field (kV/m )
Fig 1. Calculated steady-state electron drift velocity
in bulk zincblende GaSb and GaAs using non-
parabolic band models.
Similar to the experimental results the simulations
suggest that the peak drift velocity for zincblende
GaAs is 2.2105
ms-1
while that for GaSb is about
1.2105
ms-1
. At higher electric fields, intervalley
optical phonon emission dominates, causing the drift
velocity to saturate at around 0.7105
ms-1
for GaSb
and 1.7105
ms-1
for GaAs. The calculated high field
electron drift velocity apparent from figure 1 is
fractionally lower than those that have been simulated
by experimental works which assumed an effective
mass in the upper valleys equal to the free electron
mass. The threshold field for the onset of significant
scattering into satellite conduction band valleys is a
function of the intervalley separation and the density
of electronic states in the satellite valleys. The
importance of electron intervalley transfer at high
electric fields can be clearly seen in figure 2. In this
figure the fractional valley occupancies for different
materials is plotted. It is obvious that the inclusion of
satellite valleys in the simulations is important.
Significant electron transfer to the upper valleys only
begins to occur when the field strength is very close to
the threshold value. At the threshold field the electron
valley occupancies at room temperature for , L and
X are about %85, %13 and %2, respectively.
Figure 3 shows the calculated electron drift velocity as
a function of electric field strength for temperatures of
300, 450 and 600 K.
Parameter GaSb GaAs
Band-gap (eV)
Electron effective mass (m* )
Nonparabolicity (eV-1
)
Static relative permitivity 0
Optical relative permitivity 
Density (kgm-3
)
Sound velocity (ms-1
)
Deformation potential (eV)
Piezoelectric constant (Cm-2
)
Optical phonon energy (eV)
0.726
0.041
0.5
15.7
14.4
5610
6070
8.9
0.08
0.029
1.42
0.063
0.61
12.5
8.7
5370
5500
8.8
0.05
0.02
Parisa Ashori / International Journal of Engineering Research and Applications
(IJERA) ISSN: 2248-9622 www.ijera.com
Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649
2648 | P a g e
0 1000 2000 3000
0.00
0.20
0.40
0.60
0.80
1.00
0 1000 2000 3000
L-valley
X-valley
Gamma-valley
Valleyoccupancyratio(%)
Electric Field (kV/m )
L-valley
X-valley
Gamma-valley
GaAs GaSb
Electric Field (kV/m)
Fig 2. Fractional occupation of the central and
satellite valleys in GaSb and GaAs as a function of
applied electric field using the non-parabolic band
model.
The decrease in drift mobility with temperature at
low fields is due to increased intravalley polar optical
phonon scattering whereas the decrease in velocity at
higher fields is due to increased intra and intervalley
scattering. It can be seen from the figure that the peak
velocity also decreases and moves to higher electric
field as the temperature is increased. This is due to the
general increase of total scattering rate with
temperature, which suppresses the electron energy and
reduces the population of the satellite valleys. This
latter effect is apparent from the fact that the electron
population in the central -valley increases with
temperature as shown in figure 2.
0 10 20 30 40
0.0
0.5
1.0
1.5
2.0
2.5
GaSbGaAs
Electric field (kV/cm)
600 K
450 K
300 K
Electric field (kV/cm)
Driftvelocity(*10
5
ms
-1
)
0 10 20 30 40 50
600 K
300 K
450 K
Fig 3. Calculated electron steady-state drift velocity in
bulk GaAs and GaSb as a function of applied electric
field at various lattice temperatures and assuming a
donor concentration of 1017
cm-3
. The peak drift
velocity decreases while the threshold field increases by
same percent as the lattice temperature increases from
300 to 600 K.
Figure 4 shows how the electron occupancy ratios
changes with temperature for electrons in the most
populated  and L valleys. There are significant
statistical fluctuations in the results for the electrons in
the L valleys for fields around 500 kVm-1
, which are
caused by the relatively small number of electron
particles occupying the valleys just above the
threshold for intervalley transfer. Nevertheless it can
be seen that the number of electrons decreases as the
temperature increases for both valleys. Comparison of
the temperature dependence of the valleys occupancy
in GaAs and GaSb materials show that the change in
peak velocity of GaAs from 300 K to 600 K is a
reduction of about %45 whereas for GaSb it is about
%25. The reason can be explained in terms of the
energy band structure. In particular, the different
electron effective mass within the central valley. This
is important because electrons which are near a valley
minimum have small kinetic energies and are
therefore strongly scattered. It is apparent that
intervalley transfer is substantially larger in InAs over
the range of applied electric fields shown, due to the
combined effect of a lower  effective mass, lower
satellite valley separation energy, and slightly lower
phonon scattering rate within the  valley.
Therefore, the electron velocity in GaAs is less
sensitive to temperature than in GaSb, so GaAs
devices are expected be more tolerant to self-heating
and high ambient temperature.
0 10 20 30 40 50
0.0
0.2
0.4
0.6
0.8
1.0
GaSbGaAs
Electric field (kV/cm)
 Valley
L Valley
300 K
600 K
300 K
Electric field (kV/cm)
ElectronOccupancyratio(%)
0 10 20 30 40 50
0.0
0.2
0.4
0.6
0.8
1.0
300 K
600 K
300 K
Fig 4. Temperature dependence of the valley
occupancy in the  and L valleys of GaAs and GaSb
materials as a function of applied electric field.
Figure 5 shows how the velocity-field characteristic
of GaAs and GaSb materials change with impurity
concentration at 300 K. It is clear that with increasing
donor concentration, there are reduction in the
average peak drift velocity and the threshold field
because of increasing scattering rate events. The
results show the trend expected from increased
Parisa Ashori / International Journal of Engineering Research and Applications
(IJERA) ISSN: 2248-9622 www.ijera.com
Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649
2649 | P a g e
ionized impurity scattering is in good general
agreement with recent calculations by other workers.
0 10 20 30 40
0.0
0.5
1.0
1.5
2.0
2.5
GaSbGaAs
Electric field (kV/cm)
10
18
10
17
10
16
Electric field (kV/cm)
Driftvelocity(*10
5
ms
-1
)
0 10 20 30 40
10
18
10
17
10
16
Fig 5. Calculated electron steady-state drift velocity
in bulk GaAs and GaSb as a function of applied
electric field at various donor concentration up to 1018
cm-3
at room temperature.
REFERENCES
[1] G. W. Turner, S. J. Eglash and A. J. Strauss,"
Comparison of High Field Staedy State and
Transient Electron Transport in Wurtzite GaN,
AlN and InN",J. Vac. Sci. Technol. B, 11,
(1993), pp. 864-870.
[2] J. E. Maslar, W. S. Hurst and C. A. Wang,
"The Effect of Strain Rate Variations on the
Microstructure and Hot Deformation
Behaviour of AA2024 Aluminium Alloy",
Appl. Spectrosc., 61, (2007), pp.1093-1098.
[3] H. S. Bennett, H. Hung and A. Heckert,
"Calculation of Electron Hall Mobility in
GaSb, GaAs and GaN Using an Iterative
Method", J. Appl. Phys., 98, (2005), pp.
103705-103709.
[4] J. R. Meyer, C. A. Hoffman, F. J. Bartoli and
L. R. Ram-Mohan," Comparison of Steady-
State and Transient Electron Transport in InAs,
InP and GaAs", Appl., Lett., 67, (1995), pp.
2756-2762.
[14] H. Xie, W. I. Wang, J. R. Meyer and L. R.
Ram-Mohan, "Comparison of High and Low
Field Electron Transport in AlGaN, AlN and
GaN", Appl. Phys. Lett., 65, (1994), pp.2048-
2052.
[5] H. Arimoto, N. Miura, J. R. Nichola, N. J.
Mason and P. J. Walker, "Comparison of Low
Field Electron Transport in SiC and GaN
Structures for High-Power and high
Temperature Device Modeling", Phys. Rev. B.,
58, (1998), pp. 4560-4566.
[6] N. Bouarissa, A. Zaoui, J. P. Dufour, M.
Certier and H. Aourag, "Discretization Method
of Hydrodynamic for simulation of GaN
MESFETs", Mater. Sci. Eng. B, 47, (1997),
pp.1-7.
[7] T. Wang, F. Kieseling and A. Forchel,
"Potential Performance of SiC and GaN Based
Metal Semiconductor Field Effect
Transistors", Phys. Rev. B, 58, (1998),
pp.3594-3599.
[8] H. Arabshahi, "Comparison of SiC and ZnO
Field Effect Transistors for High Power
Applications", Modern Physics Letters B, 20,
(2006), pp.787-793.
[9] H. Arabshahi, "The Frequency Response and
Effect of Trap Parameters on The
Charactersitics of GaN MESFETs", The
Journal of Damghan University of Basic
Sciences,1, (2007), pp.45-49.

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Pb3426462649

  • 1. Parisa Ashori / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649 2646 | P a g e Monte Carlo Calculation of Electron Transport in GaAs and GaSb 1 Parisa Ashori and 2 Farideh Rafegh Vand 1 Physics Department, Payame Nour University of Mashhad, Mashhad, Iran 2 Chemistry Department, Payame Nour University of Robat Karim (Parand), Robat Karim, Iran Abstract Electron transport properties in GaSb and GaAs are calculated for different temperature, doping dependencies at high electric field applications. The calculations are performed using a three valleys ensemble Monte Carlo model that includes numerical formulations of the phonon scattering rates and ionized impurity scattering rates. For two materials, we find that electron velocity overshoot only occurs when the electric field in increased to a value above a certain critical field .This critical field is strongly dependent on the material parameters. Results from the two materials are finally compared. The agreement with the available experimental data is found to be satisfactory. Keywords-: Monte Carlo method; ionized impurity scattering; overshoot velocity. I. INTRODUCTION GaSb and GaAs semiconductors are becoming of increasing importance in many emerging optoelectronic and electronic device applications. Among these applications are ultraviolet photodetectors, blue and UV light emitters, and high frequency, high power electronic devices. As an aid to the device-related work, the transport coefficients of the materials need careful investigation. Transport properties of electrons in GaSb and GaN semiconductors can be conveniently derived by direct solution of the Boltzmann equation [1]. Previous applications of this technique were directed toward calculations of drift mobility in ideally pure semiconductors. There is also considerable interest in accurate descriptions of impure crystals, from both the experimental and the theoretical points of view. In the former case, foe example, one may take advantage of the sensitivity of mobility to ionized impurities in analyses of impurity content. In the latter case, highly doped materials allow one to probe regions of the conduction band in the neighborhood of the Fermi level, well above the band edge. Obviously, accurate calculations in conjunction with experimental data are helpful in exposing weaknesses of the theoretical model, particularly with regard to electron scattering by ionized impurities at low temperatures [2]. The purpose of the present paper is to calculate electron drift velocity for various temperatures and ionized-impurity concentrations. The formulation itself applies only to the central  valley conduction band and the two nearest valleys. We have also consider band nonparabolicity, admixture of p-type valence-band wave functions, degeneracy of the electron distribution to any arbitrary degree, and the screening effects of free carriers on the scattering probabilities [3]. All the relevant scattering mechanisms, including the two- mode nature of the polar optic phonon scattering, are taken into account [4]. In this communication, we present Monte Carlo calculations of steady-state electron transport conditions in GaSb and GaAs [5]. We demonstrate the effect of injection energy and electric field on the electron transport properties. This paper is organized as follows. Details of the employed simulation model is presented in section 2 and the results of steady-state electron transport properties carried out on GaSb and GaAs structures are interpreted in section 3. Another advantage of GaSb is that it provides for type II band alignment in super lattices and quantum wells when used in conjunction with the InAs system. Such structures are being recognized as promising candidates for mid-infrared lasers due to the inherent suppression of internal electron-hole recombination. The Auger rates have also been shown to be greatly reduced in the GaSb based super lattices. Furthermore, as the GaSb/InAs share no common cation or anion, one can fabricate either an InSb-like or a GaAs-like interface simply by changing the growth sequence. Different vibrational properties are expected to result [7-9], and the electronic properties of the confined carrier gas are correspondingly affected. II. MODEL DETAILS In order to calculate the electron drift velocity for large electric fields, consideration of conduction band satellite valleys is necessary. The first-principles band structure of zincblende GaSb and GaAs predicts a direct band gap located at the  point and lowest energy conduction band satellite valleys at the X point and at the L point. In our Monte Carlo simulation, the  valley, the three equivalent X valleys, the four equivalent L valleys, are represented by ellipsoidal, nonparabolic dispersion relationships of the following form [6], * 22 2 )](1)[( m k kEkE i    (1)
  • 2. Parisa Ashori / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649 2647 | P a g e where m* is effective mass at the band edge and i is the non-parabolicity coefficient of the i-th valley. The band structure and material parameters necessary for calculating the scattering probabilities used in the present Monte Carlo simulation are given in table 1. Scattering mechanisms included in the simulation are acoustic deformation potential scattering (treated either as an elastic process or as an inelastic process) and pizoelectric scattering (which is found to be negligible in the temperature range discussed here). Furthermore, longitudinal optical phonon scattering, nonequivalent and, where applicable, equivalent intervalley scattering events are taken into account among all valley types with the transfers assumed to be governed by the same deformation potential fields and the same phonon frequencies. Degeneracy effects are expected to be negligible over almostall of the temperature and electron concentration ranges of interest here and, hence, are not considered in the calculation. Table 1. Important parameters used in our calculations for GaSb and GaAs [7-9]. In our model at the start of each simulation, ten thousand electron particles are distributed in momentum space according to a Maxwell-Boltzmann distribution function. These particles are propagated classically between collisions according to their velocity, effective mass and the prevailing field. The selection of the propagation time, scattering mechanism and other related quantities is achieved by generating random numbers and using this numbers to select, for example, a scattering mechanism. In the case of the ellipsoidal, non-parabolic conduction valley model, the usual Herring-Vogt transformation matrices are used to map carrier momenta into spherical valleys when particles are drifted or scattered. Steady-state results of high field transport studies have been obtained for lattice temperatures up to 600 K, in order to gain some insight into the hot carrier transport and the energy distribution function that would be generated in the gate-drain region of a power field effect transistor. III. RESULTS Electron drift velocity as a function of electric field is important in determining the performance of high-speed and microwave semiconductor devices. Here we show the results of temperature dependence of the steady-state velocity- field characteristics and valley occupancy in bulk GaSb and GaAs materials. Figure 1 shows the simulated velocity-field characteristics at 300 K, with a background doping concentration of 1017 cm-3 , and with the electric field applied along one of the cubic axes. 0 2 4 6 8 10 0.0 0.4 0.8 1.2 1.6 2.0 2.4 GaSb GaAs Driftvelocity(*10 5 m/s) Electric field (kV/m ) Fig 1. Calculated steady-state electron drift velocity in bulk zincblende GaSb and GaAs using non- parabolic band models. Similar to the experimental results the simulations suggest that the peak drift velocity for zincblende GaAs is 2.2105 ms-1 while that for GaSb is about 1.2105 ms-1 . At higher electric fields, intervalley optical phonon emission dominates, causing the drift velocity to saturate at around 0.7105 ms-1 for GaSb and 1.7105 ms-1 for GaAs. The calculated high field electron drift velocity apparent from figure 1 is fractionally lower than those that have been simulated by experimental works which assumed an effective mass in the upper valleys equal to the free electron mass. The threshold field for the onset of significant scattering into satellite conduction band valleys is a function of the intervalley separation and the density of electronic states in the satellite valleys. The importance of electron intervalley transfer at high electric fields can be clearly seen in figure 2. In this figure the fractional valley occupancies for different materials is plotted. It is obvious that the inclusion of satellite valleys in the simulations is important. Significant electron transfer to the upper valleys only begins to occur when the field strength is very close to the threshold value. At the threshold field the electron valley occupancies at room temperature for , L and X are about %85, %13 and %2, respectively. Figure 3 shows the calculated electron drift velocity as a function of electric field strength for temperatures of 300, 450 and 600 K. Parameter GaSb GaAs Band-gap (eV) Electron effective mass (m* ) Nonparabolicity (eV-1 ) Static relative permitivity 0 Optical relative permitivity  Density (kgm-3 ) Sound velocity (ms-1 ) Deformation potential (eV) Piezoelectric constant (Cm-2 ) Optical phonon energy (eV) 0.726 0.041 0.5 15.7 14.4 5610 6070 8.9 0.08 0.029 1.42 0.063 0.61 12.5 8.7 5370 5500 8.8 0.05 0.02
  • 3. Parisa Ashori / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649 2648 | P a g e 0 1000 2000 3000 0.00 0.20 0.40 0.60 0.80 1.00 0 1000 2000 3000 L-valley X-valley Gamma-valley Valleyoccupancyratio(%) Electric Field (kV/m ) L-valley X-valley Gamma-valley GaAs GaSb Electric Field (kV/m) Fig 2. Fractional occupation of the central and satellite valleys in GaSb and GaAs as a function of applied electric field using the non-parabolic band model. The decrease in drift mobility with temperature at low fields is due to increased intravalley polar optical phonon scattering whereas the decrease in velocity at higher fields is due to increased intra and intervalley scattering. It can be seen from the figure that the peak velocity also decreases and moves to higher electric field as the temperature is increased. This is due to the general increase of total scattering rate with temperature, which suppresses the electron energy and reduces the population of the satellite valleys. This latter effect is apparent from the fact that the electron population in the central -valley increases with temperature as shown in figure 2. 0 10 20 30 40 0.0 0.5 1.0 1.5 2.0 2.5 GaSbGaAs Electric field (kV/cm) 600 K 450 K 300 K Electric field (kV/cm) Driftvelocity(*10 5 ms -1 ) 0 10 20 30 40 50 600 K 300 K 450 K Fig 3. Calculated electron steady-state drift velocity in bulk GaAs and GaSb as a function of applied electric field at various lattice temperatures and assuming a donor concentration of 1017 cm-3 . The peak drift velocity decreases while the threshold field increases by same percent as the lattice temperature increases from 300 to 600 K. Figure 4 shows how the electron occupancy ratios changes with temperature for electrons in the most populated  and L valleys. There are significant statistical fluctuations in the results for the electrons in the L valleys for fields around 500 kVm-1 , which are caused by the relatively small number of electron particles occupying the valleys just above the threshold for intervalley transfer. Nevertheless it can be seen that the number of electrons decreases as the temperature increases for both valleys. Comparison of the temperature dependence of the valleys occupancy in GaAs and GaSb materials show that the change in peak velocity of GaAs from 300 K to 600 K is a reduction of about %45 whereas for GaSb it is about %25. The reason can be explained in terms of the energy band structure. In particular, the different electron effective mass within the central valley. This is important because electrons which are near a valley minimum have small kinetic energies and are therefore strongly scattered. It is apparent that intervalley transfer is substantially larger in InAs over the range of applied electric fields shown, due to the combined effect of a lower  effective mass, lower satellite valley separation energy, and slightly lower phonon scattering rate within the  valley. Therefore, the electron velocity in GaAs is less sensitive to temperature than in GaSb, so GaAs devices are expected be more tolerant to self-heating and high ambient temperature. 0 10 20 30 40 50 0.0 0.2 0.4 0.6 0.8 1.0 GaSbGaAs Electric field (kV/cm)  Valley L Valley 300 K 600 K 300 K Electric field (kV/cm) ElectronOccupancyratio(%) 0 10 20 30 40 50 0.0 0.2 0.4 0.6 0.8 1.0 300 K 600 K 300 K Fig 4. Temperature dependence of the valley occupancy in the  and L valleys of GaAs and GaSb materials as a function of applied electric field. Figure 5 shows how the velocity-field characteristic of GaAs and GaSb materials change with impurity concentration at 300 K. It is clear that with increasing donor concentration, there are reduction in the average peak drift velocity and the threshold field because of increasing scattering rate events. The results show the trend expected from increased
  • 4. Parisa Ashori / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 3, Issue 4, Jul-Aug 2013, pp.2646-2649 2649 | P a g e ionized impurity scattering is in good general agreement with recent calculations by other workers. 0 10 20 30 40 0.0 0.5 1.0 1.5 2.0 2.5 GaSbGaAs Electric field (kV/cm) 10 18 10 17 10 16 Electric field (kV/cm) Driftvelocity(*10 5 ms -1 ) 0 10 20 30 40 10 18 10 17 10 16 Fig 5. Calculated electron steady-state drift velocity in bulk GaAs and GaSb as a function of applied electric field at various donor concentration up to 1018 cm-3 at room temperature. REFERENCES [1] G. W. Turner, S. J. Eglash and A. J. Strauss," Comparison of High Field Staedy State and Transient Electron Transport in Wurtzite GaN, AlN and InN",J. Vac. Sci. Technol. B, 11, (1993), pp. 864-870. [2] J. E. Maslar, W. S. Hurst and C. A. Wang, "The Effect of Strain Rate Variations on the Microstructure and Hot Deformation Behaviour of AA2024 Aluminium Alloy", Appl. Spectrosc., 61, (2007), pp.1093-1098. [3] H. S. Bennett, H. Hung and A. Heckert, "Calculation of Electron Hall Mobility in GaSb, GaAs and GaN Using an Iterative Method", J. Appl. Phys., 98, (2005), pp. 103705-103709. [4] J. R. Meyer, C. A. Hoffman, F. J. Bartoli and L. R. Ram-Mohan," Comparison of Steady- State and Transient Electron Transport in InAs, InP and GaAs", Appl., Lett., 67, (1995), pp. 2756-2762. [14] H. Xie, W. I. Wang, J. R. Meyer and L. R. Ram-Mohan, "Comparison of High and Low Field Electron Transport in AlGaN, AlN and GaN", Appl. Phys. Lett., 65, (1994), pp.2048- 2052. [5] H. Arimoto, N. Miura, J. R. Nichola, N. J. Mason and P. J. Walker, "Comparison of Low Field Electron Transport in SiC and GaN Structures for High-Power and high Temperature Device Modeling", Phys. Rev. B., 58, (1998), pp. 4560-4566. [6] N. Bouarissa, A. Zaoui, J. P. Dufour, M. Certier and H. Aourag, "Discretization Method of Hydrodynamic for simulation of GaN MESFETs", Mater. Sci. Eng. B, 47, (1997), pp.1-7. [7] T. Wang, F. Kieseling and A. Forchel, "Potential Performance of SiC and GaN Based Metal Semiconductor Field Effect Transistors", Phys. Rev. B, 58, (1998), pp.3594-3599. [8] H. Arabshahi, "Comparison of SiC and ZnO Field Effect Transistors for High Power Applications", Modern Physics Letters B, 20, (2006), pp.787-793. [9] H. Arabshahi, "The Frequency Response and Effect of Trap Parameters on The Charactersitics of GaN MESFETs", The Journal of Damghan University of Basic Sciences,1, (2007), pp.45-49.