The document discusses aluminum sputtering targets. It provides information on the material properties and composition of aluminum including its atomic weight, number, color, thermal conductivity and melting point. It then discusses that aluminum sputtering targets are made of high purity aluminum and are widely used in industries like aerospace, automotive lighting, OLED and optics. The targets have a minimum purity of 99.99% and are analyzed using techniques like GDMS and LECO to test for metallic and gas elements. Aluminum sputtering targets are manufactured through processes like melting, zone melting, casting, grain refinement and cleaning.

1. Aluminum Sputtering Target
Material Type Aluminum
Symbol Al
Atomic Weight 26.9815386
Atomic Number 13
Color/Appearance Silvery, Metallic
Thermal Conductivity 235 W/m.K
Melting Point (°C) 660
Coefficient of Thermal Expansion 23.1 x 10-6/K
Theoretical Density (g/cc) 2.7
Z Ratio 1.08
Sputter DC
Max Power Density*
(Watts/Square Inch)
150
Type of Bond Indium, Elastomer
Comments Alloys W/Mo/Ta. Flash evap or use BN crucible.

2. General of Aluminum
Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils,
cars, street lights, and the popular aluminum foil food packaging. Although it is not a
strong material, it is a good conductor of heat and electricity and is able to form an
oxide layer that is resistant to corrosion. When evaporated in a vacuum, aluminum
layers form a reflective coating found on telescopes, automotive headlamps, mirrors,
packages, and toys. Aluminum sputtering target is widely used in the aerospace,
automotive lighting, OLED, and optical industries. Some high purity aluminum targets
are used in semiconductor chip, flat panel display, solar cell industries.
Material Notes of Aluminum Sputtering Targets
Purity: 99.99-99.9995%;
Target type: Planar & Rotary sputtering targets
Circular: Diameter <= 16inch, Thickness >= 1mm;
Block: Length <= 48inch, Width <= 15.75inch, Thickness >= 1mm.
Analysis of Aluminum Sputtering Targets
AEM Deposition high purity Aluminum sputtering tragets,which makes
your films possess an outstanding level of electrical conductivity
and minimized particle formation during the PVD process. And we
usually use two Analytical methods to test our products:
1. Metallic elements were analyzed using GDMS.
2. Gas elements were analyzed using LECO.
Other Infomation of Aluminum Sputtering Targets
Applications
• Electronics
• Semiconductor
• Flat panel displays
Features
• Competitive pricing
• High purity
• Grain refined, engineered microstructure
( the average grain size < 300 um)
• Semiconductor grade
Manufacturing Process
• Melting
zone melting
• Analysis
Options
• 99.99% minimum purity
• Aluminum alloys sputtering targets

3. GDMS,ICP-OES
• Analysis
Casting & Grain refinement
• Cleaning and final packaging-Cleaned for
use in vacuum
Protection from environmental
contaminants
Protection during shipment
Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12,
In2O3/Al2O3/ZnO, Al/Si/Cu, Al/Cu, CuAlO2,
AlN, Ni3/Al, Fe/Al, Al/Sc
• Smaller sizes also available for R&D
applications
• Sputtering target bonding service
Source: https://www.aemdeposition.com/pure-metal-targets/aluminum-sputtering-
targets.html