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B i t e w D i n k e
H u g o F e r r e r
E n e e 4 1 6
D r . G h o d s s i
LIGA Lithography
Definition of LIGA
 LIGA is a German acronym that stands for
Lithographie, Galvanoformung and Abformung.
 When translated it means lithography, electroplating
and molding.
Background
 LIGA is a three stage micromachining technology
used to manufacture high aspect ratio
microstructures.
 Originally LIGA technology was researched in
Germany in order to be used for the separation of
uranium isotopes.
 Henry Guckel of the University of Wisconsin brought
LIGA technology to the USA.
Background
 Two main types of LIGA Technology: X-ray LIGA
and Extreme Ultraviolet (EUV) LIGA.
 X-ray LIGA can fabricate with great precision high
aspect ratio microstructures.
 EUV LIGA can fabricate lower quality
microstructures.
LIGA Process
 LIGA is a hybrid fabrication technique
 The LIGA Process
 Lithography
 Electron beam lithography
 Focused ion beam lithography
 Optical and exciter laser lithography
 Deep X-ray lithography using synchrotron radiation
 Electroplating
 metalized layer (seed layer)
 Molding
 Machining process to remove overplated metal region
Function of LIGA
 To produce high aspect ratio
 To manufacture 3-D microstructures from a wide variety of materials
Figure1: 3-D microstructure
Lithography
 Deep X-ray lithography
 Historically chosen as a source for LIGA process
 superior to optical lithography
 Utilize short wavelength
 very large depth of focus
 Synchrotron Light Source maintains energy anywhere from 106to 109 eV
• Figure2: Synchrotron Light Source setup
Deep X-ray Lithography techniques
 Step 1:
-Deposition of Adhesion
-Seed layer
 Step 2:
-resist coating
 Step 3:
-expose the PMMA resist
Step 4:
-development of the exposed resist
Electroplating and Micro molding techniques
 Electroplating is a process to fill in the
voids between the polymeric features.
 Step 5:
-metal plating
 Step 6:
-removal of the remaining resist
Molding is process of machining the
overplated region filling the
microstructure
 Step 7:
-filling and ejection the
microstructure
MORE about LIGA Technology
Fig. Outline of the LIGA technology. (a) Photoresist
patterning, (b) electroplating of metal, (c) resist removal,
and (d) molded plastic components.
Advantages & Disadvantage
 Large structural height
and sidewall properties.
 Thickness ranging from
100-1000 μm.
 Spatial resolution.
 High aspect ratios.
 EUV LIGA is a cheaper
alternative.
 X-ray LIGA is expensive
due to the equipment
required.
 Slow process.
 Complicated process.
 Difficulty transitioning
from research to
production.
Applications
 MEMS Components
 Sensors
 Actuators
 Trajectory Sensing Devices
 Mass Spectrometers
 Microoptical Components
Questions ?
References
 C. K. Malek. V. Saile. (2004). Applications of LIGA Technology to Precision Manufacturing of
High-aspect-ratio Micro-components and -systems: a Review. Microelectronics Journal
[Online]. Available:
http://www.sciencedirect.com/science?_ob=MiamiImageURL&_cid=271437&_user=9
61305&_pii=S0026269203002957&_check=y&_origin=&_coverDate=29-Feb-
2004&view=c&wchp=dGLbVlk-
zSkWz&_valck=1&md5=82bfcbfb24453b7ea7383a12725e6a32&ie=/sdarticle
 J. Zhang. (2002, December). LIGA MOLD INSERT FABRICATION USING SU-8
PHOTORESIST. etd.lsu.edu [Online]. Available:
http://etd.lsu.edu/docs/available/etd-1108102-101121/unrestricted/Zhang_thesis.pdf
 O. O. Sandoval Gonzalez. A Fabrication Technology for High –Aspect Ratio
Microstructures. Sandoval-Gonzalez [Online]. Available:
http://www.sandoval-gonzalez.com/10_liga.pdf
 V. Saile. (2009). Introduction: LIGA and Its Application. Verlag GmbH & Co.[Online].
Available:
http://www.wiley-vch.de/books/sample/3527316981_c01.pdf

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LIGA Presentation.pdf

  • 1. B y : B i t e w D i n k e H u g o F e r r e r E n e e 4 1 6 D r . G h o d s s i LIGA Lithography
  • 2. Definition of LIGA  LIGA is a German acronym that stands for Lithographie, Galvanoformung and Abformung.  When translated it means lithography, electroplating and molding.
  • 3. Background  LIGA is a three stage micromachining technology used to manufacture high aspect ratio microstructures.  Originally LIGA technology was researched in Germany in order to be used for the separation of uranium isotopes.  Henry Guckel of the University of Wisconsin brought LIGA technology to the USA.
  • 4. Background  Two main types of LIGA Technology: X-ray LIGA and Extreme Ultraviolet (EUV) LIGA.  X-ray LIGA can fabricate with great precision high aspect ratio microstructures.  EUV LIGA can fabricate lower quality microstructures.
  • 5. LIGA Process  LIGA is a hybrid fabrication technique  The LIGA Process  Lithography  Electron beam lithography  Focused ion beam lithography  Optical and exciter laser lithography  Deep X-ray lithography using synchrotron radiation  Electroplating  metalized layer (seed layer)  Molding  Machining process to remove overplated metal region
  • 6. Function of LIGA  To produce high aspect ratio  To manufacture 3-D microstructures from a wide variety of materials Figure1: 3-D microstructure
  • 7. Lithography  Deep X-ray lithography  Historically chosen as a source for LIGA process  superior to optical lithography  Utilize short wavelength  very large depth of focus  Synchrotron Light Source maintains energy anywhere from 106to 109 eV • Figure2: Synchrotron Light Source setup
  • 8. Deep X-ray Lithography techniques  Step 1: -Deposition of Adhesion -Seed layer  Step 2: -resist coating  Step 3: -expose the PMMA resist Step 4: -development of the exposed resist
  • 9. Electroplating and Micro molding techniques  Electroplating is a process to fill in the voids between the polymeric features.  Step 5: -metal plating  Step 6: -removal of the remaining resist Molding is process of machining the overplated region filling the microstructure  Step 7: -filling and ejection the microstructure
  • 10. MORE about LIGA Technology Fig. Outline of the LIGA technology. (a) Photoresist patterning, (b) electroplating of metal, (c) resist removal, and (d) molded plastic components.
  • 11. Advantages & Disadvantage  Large structural height and sidewall properties.  Thickness ranging from 100-1000 μm.  Spatial resolution.  High aspect ratios.  EUV LIGA is a cheaper alternative.  X-ray LIGA is expensive due to the equipment required.  Slow process.  Complicated process.  Difficulty transitioning from research to production.
  • 12. Applications  MEMS Components  Sensors  Actuators  Trajectory Sensing Devices  Mass Spectrometers  Microoptical Components
  • 14. References  C. K. Malek. V. Saile. (2004). Applications of LIGA Technology to Precision Manufacturing of High-aspect-ratio Micro-components and -systems: a Review. Microelectronics Journal [Online]. Available: http://www.sciencedirect.com/science?_ob=MiamiImageURL&_cid=271437&_user=9 61305&_pii=S0026269203002957&_check=y&_origin=&_coverDate=29-Feb- 2004&view=c&wchp=dGLbVlk- zSkWz&_valck=1&md5=82bfcbfb24453b7ea7383a12725e6a32&ie=/sdarticle  J. Zhang. (2002, December). LIGA MOLD INSERT FABRICATION USING SU-8 PHOTORESIST. etd.lsu.edu [Online]. Available: http://etd.lsu.edu/docs/available/etd-1108102-101121/unrestricted/Zhang_thesis.pdf  O. O. Sandoval Gonzalez. A Fabrication Technology for High –Aspect Ratio Microstructures. Sandoval-Gonzalez [Online]. Available: http://www.sandoval-gonzalez.com/10_liga.pdf  V. Saile. (2009). Introduction: LIGA and Its Application. Verlag GmbH & Co.[Online]. Available: http://www.wiley-vch.de/books/sample/3527316981_c01.pdf