Nano Surface Generation: Introduction
• Definition: Creation/modification of surfaces
with features in 1–100 nm scale
• Importance in optics, electronics, biomedical,
and energy sectors
• High surface-to-volume ratio leads to unique
physical and chemical properties
Principles of Nano Surface Engineering
• Manipulation of surface energy and atomic-
level roughness
• Top-down vs Bottom-up approaches for nano-
scale fabrication
• Role of characterization: AFM, SEM, TEM for
nanoscale verification
Applications of Nano Surface Generation
• Superhydrophobic coatings for self-cleaning
surfaces
• Low-friction tribological coatings for
aerospace components
• Photonic crystals and anti-reflective layers in
optics
• Bio-compatible surfaces for implants and drug
delivery
Types of Nano Surface Generation:
Mechanical/Physical
• Ultra-precision machining: diamond turning,
nano grinding
• Laser texturing with femtosecond lasers for
LIPSS
• Focused Ion Beam (FIB) milling for sub-10 nm
patterning
Types: Chemical & Electrochemical Methods
• Atomic Layer Deposition (ALD) for angstrom-
level thin films
• Chemical Vapor Deposition (CVD) for
conformal coatings
• Electrochemical polishing for atomic flatness
on metals
Types: Lithographic Techniques
• Photolithography and Electron Beam
Lithography (EBL)
• Nanoimprint Lithography for low-cost, high-
volume patterning
Ductile Mode of Machining: Concept
• Material removal in a plastic/ductile state
rather than brittle fracture
• Critical depth of cut determines ductile vs
brittle removal
Mechanism of Ductile Mode
• High compressive stresses and localized
heating promote plastic flow
• Tool penetrates below critical depth,
suppressing crack formation
• Material flows plastically to form a continuous
chip
Conditions Favoring Ductile Mode
• Depth of cut < critical depth
• small rake angle
• High cutting speed to generate localized
heating
• Temperature control to lower yield strength
Applications of Ductile Mode Machining
• Optical components: lenses and mirrors
• Microfluidic devices and MEMS structures
• Ultra-precision finishing of semiconductor
wafers
Diamond Turning: Introduction
• Ultra-precision machining using single-crystal
diamond tools
• Achieves nanometer-level accuracy and
optical surface finish
• Critical for freeform optics and semiconductor
components
Machine Architecture
• Air-bearing spindle for near-zero runout
• Hydrostatic slideways for vibration isolation
• Laser interferometers for nanometer
positioning feedback
Diamond Turning
Applications of Diamond Turning
• Optical components: IR lenses, telescope
mirrors
• Semiconductor wafers and micro-optical
devices
• Medical implants requiring ultra-smooth
surfaces

Unit - 4 Nano surface generation PE.pptx

  • 1.
    Nano Surface Generation:Introduction • Definition: Creation/modification of surfaces with features in 1–100 nm scale • Importance in optics, electronics, biomedical, and energy sectors • High surface-to-volume ratio leads to unique physical and chemical properties
  • 2.
    Principles of NanoSurface Engineering • Manipulation of surface energy and atomic- level roughness • Top-down vs Bottom-up approaches for nano- scale fabrication • Role of characterization: AFM, SEM, TEM for nanoscale verification
  • 3.
    Applications of NanoSurface Generation • Superhydrophobic coatings for self-cleaning surfaces • Low-friction tribological coatings for aerospace components • Photonic crystals and anti-reflective layers in optics • Bio-compatible surfaces for implants and drug delivery
  • 4.
    Types of NanoSurface Generation: Mechanical/Physical • Ultra-precision machining: diamond turning, nano grinding • Laser texturing with femtosecond lasers for LIPSS • Focused Ion Beam (FIB) milling for sub-10 nm patterning
  • 5.
    Types: Chemical &Electrochemical Methods • Atomic Layer Deposition (ALD) for angstrom- level thin films • Chemical Vapor Deposition (CVD) for conformal coatings • Electrochemical polishing for atomic flatness on metals
  • 6.
    Types: Lithographic Techniques •Photolithography and Electron Beam Lithography (EBL) • Nanoimprint Lithography for low-cost, high- volume patterning
  • 7.
    Ductile Mode ofMachining: Concept • Material removal in a plastic/ductile state rather than brittle fracture • Critical depth of cut determines ductile vs brittle removal
  • 8.
    Mechanism of DuctileMode • High compressive stresses and localized heating promote plastic flow • Tool penetrates below critical depth, suppressing crack formation • Material flows plastically to form a continuous chip
  • 9.
    Conditions Favoring DuctileMode • Depth of cut < critical depth • small rake angle • High cutting speed to generate localized heating • Temperature control to lower yield strength
  • 10.
    Applications of DuctileMode Machining • Optical components: lenses and mirrors • Microfluidic devices and MEMS structures • Ultra-precision finishing of semiconductor wafers
  • 11.
    Diamond Turning: Introduction •Ultra-precision machining using single-crystal diamond tools • Achieves nanometer-level accuracy and optical surface finish • Critical for freeform optics and semiconductor components
  • 12.
    Machine Architecture • Air-bearingspindle for near-zero runout • Hydrostatic slideways for vibration isolation • Laser interferometers for nanometer positioning feedback
  • 13.
  • 14.
    Applications of DiamondTurning • Optical components: IR lenses, telescope mirrors • Semiconductor wafers and micro-optical devices • Medical implants requiring ultra-smooth surfaces

Editor's Notes

  • #1 Explain the definition with examples like smartphone display coatings and MEMS devices.