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Understanding photomask data
- 1. Understanding Photomask Data Sizing Sizing Sizing
- 2. In , is the such as text and graphics. Posi7ve Space Nega7ve Space HelloWorld!
- 3. Posi7ve Space is a vase
- 5. In , a binary photomask will have two tones: 1) the tone inside the closed geometry and 2) the tone outside the closed geometry. Inside the geometry Outside the geometry One tone will be clear ( ), the other opaque (dark).
- 6. The posi7ve space is clear Clear geometry / Dark field The nega7ve space is clear Dark geometry / Clear field Two Possible Mask Tones
- 7. The on the photoblank is exposed to light in the shape of the mask design paNern. For , the resist exposed to light becomes soluble and easily removed, allowing the chrome to be etched with . For , the exposed resist becomes insoluble, allowing the chrome to be etched .
- 8. Mask data is This image is wriNen in the chrome surface of the mask. The mask is used in the exposure tool. The designer draws the physical layout of how the device should appear on the wafer. (mirrored) The design paNern must be mirrored to write the mask . Same orienta7on
- 9. Mask Titles are Mask 7tles are typically (mirrored) when viewed in the maskshop. These same mask 7tles will be (not mirrored) when viewed in the wafer fab. Right-‐Reading Text
- 10. Common usage of the terms “ ” and “ ”
- 11. is the process of conver7ng complex polygons in the design data into simpler shapes in a raster or vector format used by the mask writers.
- 12. -‐ During mask fabrica7on, the clear area a wriNen a liNle smaller than it was designed. This is known as sizing or biasing the data. The sized data is pushed back to the original size when the chrome is etched.
- 13. Fractured, Mirrored Unfractured, Unmirrored , OASIS Data, Calma GDS-‐II Stream Data, CalTech Intermediate Format (CIF) Data, DXF Data, Applicon Data, Gerber Data, IPC2581, RS274X, STL Data, ODB++ Data, BMP Data, TIFF Data, ASCII Data, Mentor Boardsta7on Data, Cadence Allegro Data, EGS Data, ME-‐10 Data, STL Data, IGES Data, ADS Data Sizing No Sizing , MEBES, MEBES Mode5, Micronic MIC, Toshiba NuFlare VSB11/12, Heidelberg LIC, JEOL 52, Hitachi HL, Raith EBPG, Varian ALF, Leica ZBA, Leica JES, MANN 3000/3600, Electromask
- 14. the easy way to make a mask www.photomaskportal.com