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Electron sources and guns
for TEMs
Different sources
• Electron source affects image quality
• Best available sources need to be used
• Two types of sources
• Thermionic
• Modern sources are lantanum hexaboride LaB6 crystals, older are tungsten filaments
• Field-emission (FE) sources
• Fine tungsten needles
• Carbon nanotubes are researched as alternative
• Most advanced TEMs use FE sources, but most use still thermionic
sources
Principles of electron sources
• Thermionic sources produces electrons when heated
• FE sources produce electrons when large electric potential is applied
• FE source works as cathode
• TEMs can use only one type of electron source
• FE sources are more monocromatic than thermionic sources
• Emission varies with crystal orientation of the source
• Best orientation for tip of LaB6 crystal is <110> and <310> for tungsten
crystalline tip
Thermionic emission
• All materials can emit electrons if given sufficient energy
• However, most materials either melt or vaporize when few eV of thermal
energy is introduced
• Viable source needs to have high melting point or low work function Φ
• Thermionic emission can be summarized in Richardson’s law
𝐽 = 𝐴𝑇2𝑒−
Φ
𝑘𝑇
• K is Boltzmann’s constant (8,6 * 10-5 eV/K) and A is Richardson’s constant
(A/m2K2)
Field emission
• Electric field E increases considerably at sharp points
• When voltage V is applied to sperical point with radius r, then
𝐸 =
𝑉
𝑟
.
• One of the easiest materials to produce with sharp needle point is tungsten
• Tungsten wire can be given with tip radius of < 0,1 µm
• Two different FE methods: cold field emission (CFE) and thermal field
emission (TFE)
• FE to occur, the surface of the tip must be free of contaminants and oxide.
• This can be achieved by operating on ultra high vacuum (UHV) (< 10-9 Pa)
Electron beam – brightness
• Electron beam is affected by source
• There is no best source for all applications
• Brigthtness is relevant to intensity viewed on screen affecting, how
easy it is to see images and operate the microscope
• Characteristics of source are diameter d0, cathode emission current ie
and divergence angle α0
• Brightness can be defined as
𝛽 =
𝑖𝑒
𝜋(
𝑑0
2
)2𝜋(𝛼0)2
=
4𝑖𝑒
(𝜋𝑑0𝛼0)2
Electron beam – brightness
• For thermionic sources Β increases linearly with accelerating voltage
• Higher value of β allows more electrons to be put into beam of given
size
• More information can be generated from specimen
• Sensetive spesimen can be damaged more easily
• Electron density can be increased by using brighter source
• This shortens exposure time minimizing image drift and instabilities
Electron beam – coherency
• In coherent beam of electrons, electrons have the same frequency
• This is called temporal coherency
• Definition of coherence length λc is
λ𝑐 =
𝑣ℎ
∆𝐸
• V is electron velocity, h is Planck’s constant and ΔE is energy spread of the
beam
• Stable power supply is needed to have small ΔE
• Temporal coherency is important for energy spread
• Because of good high-voltage supplies, energy spread will not often limit
aspects of TEM
Electron beam – coherency
• Coherency is related to the size of the source
• Smaller sources give better coherency
• Called spatial coherency
• The effective source size for coherent illumination can be calculated
𝑑𝑐 =
𝜆
2𝛼
• λ is wavelength of electron, α is angle subtended by the source at the specimen
• α can be controlled by using aperture
• Coherency can be maximized by
• Using smaller source
• Using smaller illumination aperture
• Decreasing accelerating voltage
Electron beam – stability
• Stable high-voltage supply to source is needed
• Also electron current from the source must be stable
• Intensity on screen varies if system is not stable
• Thermionic sources are very stable
• Variations < ± 1 %
• Better UHV conditions improve stability
• Summary about electron source and beam
• Important properties for sources: brightness, temporal coherency, energy
spread, spatial coherency and stability
Electron guns
• Electron guns are needed to be able to control the electron beam
• Source is incorporated into a gun assembly
• Assembly acts as focusing lens to electron beam
• Different designs for thermionic and FE sources
Electron guns – thermionic
• The LaB6 crystal source works as cathode
• Cathode is in grid called Wehnelt cylinder
• Anode is at earth potential
• Cable is used to attach cathode to high-voltage
supply
• Metal wire such as rhenium is bonded to LaB6
crystal
• Wire is used to resistively heat source causing thermionic emission
• To control electron beam, small negative bias is applied to Wehnelt cylinder
• This converges electrons to a point called crossover
Electron guns – thermionic
• The gun is designed to increase Wehnelt bias with increase of
emission current
• This is called self-biased gun
• When increasing the current to heat source does not increase
emission current, saturation condition is achieved
• Thermionic sources should be operated just below saturation as operating
above it, will reduce lifetime of source without any advantage
• Brightess is also optimized when operating at saturation
• Standard way of achieving saturation is to look at TEM screen for the
image of source crossover
Electron guns – thermionic
• LaB6 crystals should be operated just below saturation
• This will increase lifetime of source without compromising signal
• LaB6 crystals can break due to thermal shock if heated or cooled too
rapidly
• TEM computer often controls heating and cooling
• Aligning the source may need to be done but sources are usually
prealigned
• Most modern TEMs have electronic corrections to ensure alignment
• Only adjustments the user has to do to gun are alignment and
saturation
Field emission gun (FEG)
• FEGs are much simpler than thermionic guns
• When switched on, the extraction voltage
must be increased slowly
• Risk of fracturing tip by thermo-mechanical shock
• Rest of the steps are computer controlled
• FEG has two anodes
• First anode has extraction voltage to pull electrons out of the tip
• Second anode accelerates electrons to right potential
• Two anodes of FEG work as electrostatic lens
Field emission gun (FEG)
• CFE requires clean surface without contaminants or oxide
• Contaminants build on the tip, even in UHV conditions
• Contaminants are necessary to be removed bt flashing the tip
• Potential can be reversed to blow off the surface layers of atoms
• Tip can be quickly heated to ~5000 K to evaporate the contaminants
• Most CFE guns do flashing automatically
• Contaminants cause emission currents to decrease and extraction
currents to increase
Guns compared
• LaB6 crystals current densities are higher than that of tungsten, also
brightness is significantly grater and operating temperature is lower
• LaB6 sources are smaller resulting in better cohenrency and energy spread
• In FEGs, the current densities are even greater
• Brightness is correspondingly high
• FEGs are best when brightness and coherency is required
• Brightness of FEG at 100 kV is significanlty greater than that of LaB6 source at 400 kV
• CFE has best spatial coherency without monochromation
• TFE provides greater stability and less noise
• CFE requires UHV and is cleaner
Guns compared
• TFE tip is cleaned thermally, causing lower stress on tip compared to
flashing and resulting in longer lifetime of the source
• FEG source is too small for relatively low magnification (<50 – 100 000
X), LaB6 source is better in these circumstances
Usable potential
• The kV axiom:
• ”You should operate at the maximum available kV (unless you shouldn’t).”
• Usually highest possible potential should be used
• However, high potential beam could cause damage to some specimen
• Displacement damage threshold for most metals is less than 400 kV
• While studying crystalline specimen by diffraction contrast, lower is better
• Below 100 kV is not practical for most materials
• High potential should be uset to
• Get greatest brightness
• Get shortest wavelength to get better resolution
• Heating effects may be smaller due to less inelastic scatter
• Observing thicker specimens
• Peak to background ratio is improved
Summary
• Most TEMs use thermionic emission with LaB6 sources
• Operating just below saturation optimizes image quality and source
lifetime
• Operate at the highes possible potential
• Use FEG TEM for best resolution
• High coherency is important for high resolution imaging
• If source have to be changed, aligned or saturated, treat it carefully

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12113745.ppt

  • 1. Electron sources and guns for TEMs
  • 2. Different sources • Electron source affects image quality • Best available sources need to be used • Two types of sources • Thermionic • Modern sources are lantanum hexaboride LaB6 crystals, older are tungsten filaments • Field-emission (FE) sources • Fine tungsten needles • Carbon nanotubes are researched as alternative • Most advanced TEMs use FE sources, but most use still thermionic sources
  • 3. Principles of electron sources • Thermionic sources produces electrons when heated • FE sources produce electrons when large electric potential is applied • FE source works as cathode • TEMs can use only one type of electron source • FE sources are more monocromatic than thermionic sources • Emission varies with crystal orientation of the source • Best orientation for tip of LaB6 crystal is <110> and <310> for tungsten crystalline tip
  • 4. Thermionic emission • All materials can emit electrons if given sufficient energy • However, most materials either melt or vaporize when few eV of thermal energy is introduced • Viable source needs to have high melting point or low work function Φ • Thermionic emission can be summarized in Richardson’s law 𝐽 = 𝐴𝑇2𝑒− Φ 𝑘𝑇 • K is Boltzmann’s constant (8,6 * 10-5 eV/K) and A is Richardson’s constant (A/m2K2)
  • 5. Field emission • Electric field E increases considerably at sharp points • When voltage V is applied to sperical point with radius r, then 𝐸 = 𝑉 𝑟 . • One of the easiest materials to produce with sharp needle point is tungsten • Tungsten wire can be given with tip radius of < 0,1 µm • Two different FE methods: cold field emission (CFE) and thermal field emission (TFE) • FE to occur, the surface of the tip must be free of contaminants and oxide. • This can be achieved by operating on ultra high vacuum (UHV) (< 10-9 Pa)
  • 6. Electron beam – brightness • Electron beam is affected by source • There is no best source for all applications • Brigthtness is relevant to intensity viewed on screen affecting, how easy it is to see images and operate the microscope • Characteristics of source are diameter d0, cathode emission current ie and divergence angle α0 • Brightness can be defined as 𝛽 = 𝑖𝑒 𝜋( 𝑑0 2 )2𝜋(𝛼0)2 = 4𝑖𝑒 (𝜋𝑑0𝛼0)2
  • 7. Electron beam – brightness • For thermionic sources Β increases linearly with accelerating voltage • Higher value of β allows more electrons to be put into beam of given size • More information can be generated from specimen • Sensetive spesimen can be damaged more easily • Electron density can be increased by using brighter source • This shortens exposure time minimizing image drift and instabilities
  • 8. Electron beam – coherency • In coherent beam of electrons, electrons have the same frequency • This is called temporal coherency • Definition of coherence length λc is λ𝑐 = 𝑣ℎ ∆𝐸 • V is electron velocity, h is Planck’s constant and ΔE is energy spread of the beam • Stable power supply is needed to have small ΔE • Temporal coherency is important for energy spread • Because of good high-voltage supplies, energy spread will not often limit aspects of TEM
  • 9. Electron beam – coherency • Coherency is related to the size of the source • Smaller sources give better coherency • Called spatial coherency • The effective source size for coherent illumination can be calculated 𝑑𝑐 = 𝜆 2𝛼 • λ is wavelength of electron, α is angle subtended by the source at the specimen • α can be controlled by using aperture • Coherency can be maximized by • Using smaller source • Using smaller illumination aperture • Decreasing accelerating voltage
  • 10. Electron beam – stability • Stable high-voltage supply to source is needed • Also electron current from the source must be stable • Intensity on screen varies if system is not stable • Thermionic sources are very stable • Variations < ± 1 % • Better UHV conditions improve stability • Summary about electron source and beam • Important properties for sources: brightness, temporal coherency, energy spread, spatial coherency and stability
  • 11. Electron guns • Electron guns are needed to be able to control the electron beam • Source is incorporated into a gun assembly • Assembly acts as focusing lens to electron beam • Different designs for thermionic and FE sources
  • 12. Electron guns – thermionic • The LaB6 crystal source works as cathode • Cathode is in grid called Wehnelt cylinder • Anode is at earth potential • Cable is used to attach cathode to high-voltage supply • Metal wire such as rhenium is bonded to LaB6 crystal • Wire is used to resistively heat source causing thermionic emission • To control electron beam, small negative bias is applied to Wehnelt cylinder • This converges electrons to a point called crossover
  • 13. Electron guns – thermionic • The gun is designed to increase Wehnelt bias with increase of emission current • This is called self-biased gun • When increasing the current to heat source does not increase emission current, saturation condition is achieved • Thermionic sources should be operated just below saturation as operating above it, will reduce lifetime of source without any advantage • Brightess is also optimized when operating at saturation • Standard way of achieving saturation is to look at TEM screen for the image of source crossover
  • 14. Electron guns – thermionic • LaB6 crystals should be operated just below saturation • This will increase lifetime of source without compromising signal • LaB6 crystals can break due to thermal shock if heated or cooled too rapidly • TEM computer often controls heating and cooling • Aligning the source may need to be done but sources are usually prealigned • Most modern TEMs have electronic corrections to ensure alignment • Only adjustments the user has to do to gun are alignment and saturation
  • 15. Field emission gun (FEG) • FEGs are much simpler than thermionic guns • When switched on, the extraction voltage must be increased slowly • Risk of fracturing tip by thermo-mechanical shock • Rest of the steps are computer controlled • FEG has two anodes • First anode has extraction voltage to pull electrons out of the tip • Second anode accelerates electrons to right potential • Two anodes of FEG work as electrostatic lens
  • 16. Field emission gun (FEG) • CFE requires clean surface without contaminants or oxide • Contaminants build on the tip, even in UHV conditions • Contaminants are necessary to be removed bt flashing the tip • Potential can be reversed to blow off the surface layers of atoms • Tip can be quickly heated to ~5000 K to evaporate the contaminants • Most CFE guns do flashing automatically • Contaminants cause emission currents to decrease and extraction currents to increase
  • 17. Guns compared • LaB6 crystals current densities are higher than that of tungsten, also brightness is significantly grater and operating temperature is lower • LaB6 sources are smaller resulting in better cohenrency and energy spread • In FEGs, the current densities are even greater • Brightness is correspondingly high • FEGs are best when brightness and coherency is required • Brightness of FEG at 100 kV is significanlty greater than that of LaB6 source at 400 kV • CFE has best spatial coherency without monochromation • TFE provides greater stability and less noise • CFE requires UHV and is cleaner
  • 18. Guns compared • TFE tip is cleaned thermally, causing lower stress on tip compared to flashing and resulting in longer lifetime of the source • FEG source is too small for relatively low magnification (<50 – 100 000 X), LaB6 source is better in these circumstances
  • 19. Usable potential • The kV axiom: • ”You should operate at the maximum available kV (unless you shouldn’t).” • Usually highest possible potential should be used • However, high potential beam could cause damage to some specimen • Displacement damage threshold for most metals is less than 400 kV • While studying crystalline specimen by diffraction contrast, lower is better • Below 100 kV is not practical for most materials • High potential should be uset to • Get greatest brightness • Get shortest wavelength to get better resolution • Heating effects may be smaller due to less inelastic scatter • Observing thicker specimens • Peak to background ratio is improved
  • 20. Summary • Most TEMs use thermionic emission with LaB6 sources • Operating just below saturation optimizes image quality and source lifetime • Operate at the highes possible potential • Use FEG TEM for best resolution • High coherency is important for high resolution imaging • If source have to be changed, aligned or saturated, treat it carefully