Polysilicon, which is an extremely pure form of silicon used by the semiconductor industry, is primarily produced using the Siemens process developed in the 1950s. This batchwise process involves the thermal decomposition of trichlorosilane gas at high temperatures, resulting in the deposition of silicon onto a rod inside a chamber. The feedstock is metallurgical-grade silicon and hydrochloric acid that undergo several separation and reaction processes to produce trichlorosilane and deposit the high purity polysilicon.