PPT on Synthesis of Carbon Nano-Tubes

1. G H Patel College of Engineering & Technology
I.T. Department
Academic Year:2016-2017
2110011:Physics
Subject : Physics(2110011)
Topic : Synthesis of Carbon nanotubes:
Chemical vapour deposition method
Name Enrolment Number
Kelvin Parmar 160110116027
Vashi Bhavik 160110116061

2. Chemical vapour deposition method

3. • Principle :- Chemical vapour deposition is a
process , which involves flow of gas with
diffused reactants over a hot surface.

4. • A typical thermal CVD apparatus comprises of
gas supplying system , deposition chamber and
an exhaust system.
• The entire assembly is called a reactor.
• There are two types of thermal CVD reactor
which are used to perform CVD process.
1.Horizontal reactor
2.Vertical reactor

5. • In a reactor show ,the substrate surface is
raised to very high temperature with help of
resistance heaters.
• The resistor heaters either surrounded the
chamber or lie directly under the subsector
that holds the substrates.
• In thermal CVD process the chemical reaction
are initiated by a temperature at 1173K.
• The material to be deposited is heated to from
a gas phase and is subsequently deposited on
heated substrate.

6. • While the gas flows over the substrate the heat
energy actives chemical reaction at appropriate
site, nucleate and grow to from the thin film
whose thickness can be monitored and control
parallely during the growth process.
• The by-product are created on the substrate are
vented through the exhaust.
• The gas carries the reactants is called the
carrier gas.