2. Features
RECIPE 3D MultiEtch simulation
RIE, ICP and Bosch Etch simulator Simulate effect of multiple etches
Validated database Sidewall etch lag simulation
Experimental etch database Capability to predict important parameters
Rigorous validation experiments such as etch lag and sidewall angles
Real world usage Speed and accuracy
Predict and fine tune etch lag, Faster than performing a real etch. Tapeout
sidewall angle and footing with confidence
3. RSM derived etch database
Response surface matrix Etch rate as a function of APC and Coil Power