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Distribution of Silicon in the AluminumDistribution of Silicon in the Aluminum
Matrix for Rear Passivated Solar CellsMatrix for Rear Passivated Solar Cells
Elias URREJOLAElias URREJOLA11
, Kristian PETER, Kristian PETER11
,, HeikoHeiko PLAGWITZPLAGWITZ22
, Gunnar SCHUBERT, Gunnar SCHUBERT22
11
International Solar Energy Research CenterInternational Solar Energy Research Center -- ISCISC -- Konstanz, GermanyKonstanz, Germany
22
SUNWAYS AG Photovoltaic Technology, Konstanz, GermanySUNWAYS AG Photovoltaic Technology, Konstanz, Germany
SILICONSILICON PVPV
Tuesday, 19 April 2011Tuesday, 19 April 2011
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 2
IntroductionIntroduction
Standard p-Si solar cell
Al rear side
Rear passivated solar cell
Higher efficiency:
• Rear Passivation
• Local contact
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 3
Motivation: Local AlMotivation: Local Al--Si InteractionSi Interaction
rear passivated solar cell
is theis the SiSi diffusiondiffusion
limitedlimited
in the Al matrixin the Al matrix
??
Al
cross-section p-Si
Al
L-BSF
Al Si
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 5
Diffusion of Si in the Al matrixDiffusion of Si in the Al matrix
dd22
dd11
L-BSF
Total spread ofTotal spread of SiSi in the Al matrix din the Al matrix d22
depends linearly on firing temperaturedepends linearly on firing temperature
E. UrrejolaE. Urrejola et al.et al. ApplAppl. Phys.. Phys. LettLett. 98, 153508 (2011). 98, 153508 (2011)
d1: local contact opening
d2: spread of Si in Al
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 7
Influence of Contact SpacingInfluence of Contact Spacing
LLpp = 2 mm= 2 mm LLpp < 0.25 mm< 0.25 mm
Contact spacing limitsContact spacing limits SiSi diffusiondiffusion
influence on contact formation?influence on contact formation?
LLpp
dd22
dd11
Al
p-Si
Lp: contact spacing
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 8
Influence of Contact SpacingInfluence of Contact Spacing
Si diffusion inSi diffusion in AlAl
large contact spacing large spread of Si voids instead of eutectic
Si diffusion limited by contact spacing
Al
p-Si
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 9
35 m
KirkendallKirkendall voidvoid
Kirkendall effect: Difference in Interdiffusion rates
Si diffuses much faster in Al than Al in Si.
Large finger spacing high overlap of melted Al (unsaturated)
enhanced Si mass transfer Kirkendall void!
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 10
Influence of Contact SpacingInfluence of Contact Spacing
100100--2727 2211
87874.14.1 –– 4.54.52323 220.70.7
25254.54.5 –– 4.74.72323 220.250.25
885.75.7 –– 771414 220.10.1
VoidsVoids
[%][%]
BSFBSF
[[ m]m]
EutecticEutectic
depth [depth [ m]m]
LpLp
[mm][mm]
Small finger spacing Large finger spacing
35 m
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 11
Saturated Al
EDS/EDX AnalysisEDS/EDX Analysis
Kirkendall voids by high firing temperatureT = 950°C
E. UrrejolaE. Urrejola et al.et al. ApplAppl. Phys.. Phys. LettLett. 98, 153508 (2011). 98, 153508 (2011)
High T [°C] Kirkendall voids, BSF formed
eutectic
L-BSF
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 12
SummarySummary
Study on the diffusion of Si in screenStudy on the diffusion of Si in screen--printed Al:printed Al:
–– Rear side pattern influences contact formationRear side pattern influences contact formation
–– Spread of Si depends on firing temperature but notSpread of Si depends on firing temperature but not
on contact size (don contact size (d11))
–– Contact pitch (Contact pitch (LLpp) limits the contact formation and) limits the contact formation and
LL--BSFBSF
–– KirkendallKirkendall voids form at higher contact spacing,voids form at higher contact spacing,
wider local contact openings and too fast coolingwider local contact openings and too fast cooling
Acknowledgements:Acknowledgements:
German Federal Ministry of Education and ResearchGerman Federal Ministry of Education and Research
(contract no. 03SSF0335I).(contract no. 03SSF0335I).
Thank you!Thank you!
elias.urrejola@iscelias.urrejola@isc--konstanz.dekonstanz.de
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 14
npv workshop
www.npv-workshop.com
- 230 scientists
- industry and institutes
Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 15
Diffusion of Si in Al matrixDiffusion of Si in Al matrix
Broader openings distinct forms at the edges
E. Urrejola,E. Urrejola, et al.et al. J.J. ApplAppl. Phys.107, 124516 (2010).. Phys.107, 124516 (2010).

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Distribution of Silicon iin the Allumiinum Matriix for Rear Passiivated Sollar Celllls

  • 1. Distribution of Silicon in the AluminumDistribution of Silicon in the Aluminum Matrix for Rear Passivated Solar CellsMatrix for Rear Passivated Solar Cells Elias URREJOLAElias URREJOLA11 , Kristian PETER, Kristian PETER11 ,, HeikoHeiko PLAGWITZPLAGWITZ22 , Gunnar SCHUBERT, Gunnar SCHUBERT22 11 International Solar Energy Research CenterInternational Solar Energy Research Center -- ISCISC -- Konstanz, GermanyKonstanz, Germany 22 SUNWAYS AG Photovoltaic Technology, Konstanz, GermanySUNWAYS AG Photovoltaic Technology, Konstanz, Germany SILICONSILICON PVPV Tuesday, 19 April 2011Tuesday, 19 April 2011
  • 2. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 2 IntroductionIntroduction Standard p-Si solar cell Al rear side Rear passivated solar cell Higher efficiency: • Rear Passivation • Local contact
  • 3. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 3 Motivation: Local AlMotivation: Local Al--Si InteractionSi Interaction rear passivated solar cell is theis the SiSi diffusiondiffusion limitedlimited in the Al matrixin the Al matrix ?? Al cross-section p-Si Al L-BSF Al Si
  • 4.
  • 5.
  • 6.
  • 7.
  • 8.
  • 9. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 5 Diffusion of Si in the Al matrixDiffusion of Si in the Al matrix dd22 dd11 L-BSF Total spread ofTotal spread of SiSi in the Al matrix din the Al matrix d22 depends linearly on firing temperaturedepends linearly on firing temperature E. UrrejolaE. Urrejola et al.et al. ApplAppl. Phys.. Phys. LettLett. 98, 153508 (2011). 98, 153508 (2011) d1: local contact opening d2: spread of Si in Al
  • 10.
  • 11.
  • 12.
  • 13. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 7 Influence of Contact SpacingInfluence of Contact Spacing LLpp = 2 mm= 2 mm LLpp < 0.25 mm< 0.25 mm Contact spacing limitsContact spacing limits SiSi diffusiondiffusion influence on contact formation?influence on contact formation? LLpp dd22 dd11 Al p-Si Lp: contact spacing
  • 14. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 8 Influence of Contact SpacingInfluence of Contact Spacing Si diffusion inSi diffusion in AlAl large contact spacing large spread of Si voids instead of eutectic Si diffusion limited by contact spacing Al p-Si
  • 15. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 9 35 m KirkendallKirkendall voidvoid Kirkendall effect: Difference in Interdiffusion rates Si diffuses much faster in Al than Al in Si. Large finger spacing high overlap of melted Al (unsaturated) enhanced Si mass transfer Kirkendall void!
  • 16. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 10 Influence of Contact SpacingInfluence of Contact Spacing 100100--2727 2211 87874.14.1 –– 4.54.52323 220.70.7 25254.54.5 –– 4.74.72323 220.250.25 885.75.7 –– 771414 220.10.1 VoidsVoids [%][%] BSFBSF [[ m]m] EutecticEutectic depth [depth [ m]m] LpLp [mm][mm] Small finger spacing Large finger spacing 35 m
  • 17. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 11 Saturated Al EDS/EDX AnalysisEDS/EDX Analysis Kirkendall voids by high firing temperatureT = 950°C E. UrrejolaE. Urrejola et al.et al. ApplAppl. Phys.. Phys. LettLett. 98, 153508 (2011). 98, 153508 (2011) High T [°C] Kirkendall voids, BSF formed eutectic L-BSF
  • 18. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 12 SummarySummary Study on the diffusion of Si in screenStudy on the diffusion of Si in screen--printed Al:printed Al: –– Rear side pattern influences contact formationRear side pattern influences contact formation –– Spread of Si depends on firing temperature but notSpread of Si depends on firing temperature but not on contact size (don contact size (d11)) –– Contact pitch (Contact pitch (LLpp) limits the contact formation and) limits the contact formation and LL--BSFBSF –– KirkendallKirkendall voids form at higher contact spacing,voids form at higher contact spacing, wider local contact openings and too fast coolingwider local contact openings and too fast cooling
  • 19. Acknowledgements:Acknowledgements: German Federal Ministry of Education and ResearchGerman Federal Ministry of Education and Research (contract no. 03SSF0335I).(contract no. 03SSF0335I). Thank you!Thank you! elias.urrejola@iscelias.urrejola@isc--konstanz.dekonstanz.de
  • 20. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 14 npv workshop www.npv-workshop.com - 230 scientists - industry and institutes
  • 21. Distribution of Silicon in the Aluminum Matrix for Rear Passivated Solar Cells - Elias Urrejola 15 Diffusion of Si in Al matrixDiffusion of Si in Al matrix Broader openings distinct forms at the edges E. Urrejola,E. Urrejola, et al.et al. J.J. ApplAppl. Phys.107, 124516 (2010).. Phys.107, 124516 (2010).