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Craig J. Hawker




Commercial Application of Polymers as Nanomaterials
Research Philosophy
        Research Philosophy




To effectively use Polymers as Nanomaterials
To effectively use Polymers as Nanomaterials
       it is ESSENTIAL to accurately
        it is ESSENTIAL to accurately
manipulate chemical structure and architecture
manipulate chemical structure and architecture
Robust, Efficient, and Orthogonal Chemistry
  Robust, Efficient, and Orthogonal Chemistry




 Prof. K. Barry Sharpless
 Prof. K. Barry Sharpless        Prof. Sir John Cornforth
                                 Prof. Sir John Cornforth


   Need Robust, Efficient, and Orthogonal Chemistry to
    Need Robust, Efficient, and Orthogonal Chemistry to
prepare functionalized polymers for Nanoscale Applications
prepare functionalized polymers for Nanoscale Applications
Recent Examples of Efficient Chemistry
Recent Examples of Efficient Chemistry
 •• Click Chemistry
    Click Chemistry
    --nanoparticles for diagnosis and
       nanoparticles for diagnosis and
 treatment of cardiovascular disease
  treatment of cardiovascular disease


 •• LFRP Polymerization
    LFRP Polymerization
   --block copolymer lithography
      block copolymer lithography


 •• Isomerization
     Isomerization
   --films for holographic storage
      films for holographic storage
Challenges in NanoMedicine

CANCER
CANCER
•1.4 million cancer cases (2006)
 •1.4 million cancer cases (2006)
•560,000 deaths expected (2006)
 •560,000 deaths expected (2006)          Earlier detection strategies
•$210 billion (2005)
 •$210 billion (2005)                     and novel therapeutic
                                          approaches could help
HEART DISEASE
HEART DISEASE                             reduce surgical costs and
•71.3 million Americans (~1:3 adults)
 •71.3 million Americans (~1:3 adults)    increase the quality of life
•910,000 deaths (2003)
 •910,000 deaths (2003)
•$403 billion (2006)
 •$403 billion (2006)



Courtesy of American Cancer Society and American Heart Association
Targeted Nanoparticles for Vascular Injury
Targeted Nanoparticles for Vascular Injury




Injury causes rupture of endothelium
 Injury causes rupture of endothelium
and exposure of smooth muscle cells
 and exposure of smooth muscle cells
which over-express binding molecules
 which over-express binding molecules
at surface –αvβ3 αvβ5
 at surface –αvβ3 αvβ5

Target platlets --αIIvβ3
Target platlets αIIvβ3
Multi-functional Nanoparticles
            Multi-functional Nanoparticles
         Cell transduction component
             – permeation peptide      Targeting component for cell surface
                                           – antibody or small molecule




                                             Therapeutic payload
                                            – drug, protein or gene
    Detection Element
– radionuclide, MRI agent,
  or optical chromophore
                                                  Targeting component for
                                                 intracellular mRNA – PNA
Multi-functional Nanoparticles
          Multi-functional Nanoparticles


Design Criteria - Nanoparticles

1)   Must have long blood circulation lifetimes
2)   Attach diagnostic agents – surface or interior
3)   Functionalize with targeting ligands – surface
4)   Incorporate therapeutics – interior
5)   Design biodegradability
Synthesis of Nanoparticles
              Synthesis of Nanoparticles

                            +     +     Latent functionality



PEG: 1kDa – 10 kDa
PEG: 1kDa – 10 kDa


                          120oC




    For 5kDa PEG
     For 5kDa PEG
Mn = 17 kDa; PDI = 1.08
Mn = 17 kDa; PDI = 1.08


                                      Arm copolymer
Synthesis of Nanoparticles
                Synthesis of Nanoparticles

                                +             +

                                              Cross-linker

                                            -X- =       or
                                    NMP
                                    120oC
                Arm copolymer
Mn = 17 kDa; PDI = 1.08
Mn = 17 kDa; PDI = 1.08
                                                  Hydrophobic
                                                  Hydrophobic
        PEG shell for
        PEG shell for                                Core
                                                      Core
      biocompatibility
       biocompatibility
                                             Mn = 690 kDa; PDI = 1.18
                                             Mn = 690 kDa; PDI = 1.18
              Reactive
              Reactive
          Internal Groups
           Internal Groups                  Star copolymer
Molecular Weight Results
     GPC
    (DMF)                                                Mn
                                          5kDa - PEG            PDI
                                                        (kDa)

5kDa - PEG-Star/EGDA                      Star / EGDA   690     1.18

                                          Star / DVB    750     1.19
5kDa - PEG-Star/DVB
                                          Arm-17kDa     17.0    1.08
  5kDa - PEG-Arm
        10         20           30   40
                        [min]
                                                         Mn
                                          2kDa - PEG            PDI
                                                        (kDa)
 2kDa - PEG-Star/EGDA                     Star / EGDA   330     1.20

 2kDa - PEG-Star/DVB                      Star / DVB    390     1.19

   2kDa - PEG-Arm                         Arm-11kDa     113     1.07
        10         20           30   40
                        [min]
Size Distribution of Nanoparticles
  5kDa --PEG Arm (MW: 17kDa)
   5kDa PEG Arm (MW: 17kDa)             2kDa PEG Arm (MW: 11kDa)
                                         2kDa PEG Arm (MW: 11kDa)


DVB core
DVB core             EGDA core
                     EGDA core         DVB core
                                       DVB core           EGDA core
                                                          EGDA core




Dh = 60 nm            49 nm              35 nm             26 nm


Can control size, % of PEG, position and number of functional groups
Size Distribution of Nanoparticles
   5kDa --PEG Arm (MW: 17kDa)
    5kDa PEG Arm (MW: 17kDa)
                                       Darrin Pochan --Delaware
                                       Darrin Pochan Delaware
           EGDA core
           EGDA core




            49 nm


Cryo-TEM shows core shell structure and relative monodispersity
Multi-functional Nanoparticles
         Multi-functional Nanoparticles


Design Criteria - Nanoparticles

1)   Must have long blood circulation lifetimes
2)   Attach diagnostic agents – surface or interior
3)   Functionalize with targeting ligands – surface
4)   Incorporate therapeutics – interior
5)   Design biodegradability
Positron Emission Tomography (PET)
    Positron Emission Tomography (PET)
                  Annihilation
                  Annihilation

                                      511 keV
   64Cu                               Gamma Ray



              Positron β
                         +



                             e- Electron



          511 keV
          Gamma Ray


• The radionuclide decays and the resulting positrons
  subsequently annihilate on contact with electrons
  after traveling a short distance within the body

• Each annihilation produces two 511 keV photons
  traveling in opposite directions (~180°) which are
  detected by the detectors surrounding the subject
                                           Karen Wooley, Mike Welch, Carolyn Anderson
DOTA Conjugation and 64Cu Labeling
                      64Cu   properties
           COO-
                      •12.7 hr half-life

       N              •Decays by β+ (positron, PET imaging)
                      and β- (Beta particle, radiotherapy)
                  O
   N              O
  N        Cu
                  O
                      DOTA properties
                  O
                      •FDA approved chelator
       N
                      •Also used for Gd (MRI)
           COO-       •Readily chelates metal cations
Synthesis of DOTA-amine
       Synthesis of DOTA-amine


           HBTU, NHS
          TEA, DMF, R.T.
               91%


                           H2, Pd/C
                                      EtOH / THF
HBTU                                     90%




                                      Nature and length of linker
                                      Nature and length of linker
                                        affects 64Cu chelation
                                         affects 64Cu chelation
DOTA Conjugation into Star Copolymer


                               Optimize structure and
                                Optimize structure and
                              function of nanoparticles
                               function of nanoparticles
                                        --BioD
                                          BioD
             DOTA-amine
             DMF, R.T., 30h
Labeling with 64Cu
Labeling with 64Cu



            1. TFA
    DOTA-amine Cu2+
            2.
    DMF, R.T., 30h




                      64Cu
                       64Cu
Techniques for Biodistribution/microPET
Techniques for Biodistribution/microPET




      70



      60



      50



      40



      30



      20


      10



       0
                   lung



                          liver




                                           kidney
                                  spleen




                                                    muscle




                                                                   heart
           blood




                                                                           bone
                                                             fat
BioDistribution with diblock copolymer ‘arm’
BioDistribution with diblock copolymer ‘arm’

            100
                                    10m i
                                        n       1h    4h     24h     48h
            80
% I / gan




            60
  D or




                                Arm copolymer
            40
                         Mn = 17 kDa; PDI = 1.08
                         Mn = 17 kDa; PDI = 1.08
            20

             0
                  Bl




                                                                     Fe
                         Li


                                  Lu


                                          Sp


                                                     Ki


                                                             U
                                                              rn
                          ve
                   oo




                                                      dn


                                                               i


                                                                       ce
                                    ng


                                            lee
                            r




                                                                 e
                     d




                                                        ey




                                                                         s
                                               n
BioDistribution with star based on 2kDa PEG
BioDistribution with star based on 2kDa PEG

            100
                                 10m i
                                     n    1h     4h     24h     48h
            80
% I / gan




            60
  D or




                                                  Mn = 490 kDa; PDI = 1.19
                                                  Mn = 490 kDa; PDI = 1.19
            40

            20

             0
                  Bl




                                                                Fe
                         Li


                                Lu


                                       Sp


                                                Ki


                                                        U
                                                         rn
                          ve
                   oo




                                                 dn


                                                          i


                                                                  ce
                                  ng


                                         lee
                            r




                                                            e
                     d




                                                   ey




                                                                    s
                                            n
BioDistribution with star based on 5kDa PEG
BioDistribution with star based on 5kDa PEG
            100
                                     10m i
                                         n     1h     4h     24h     48h
            80
% I / gan




            60
  D or




                                                       Mn = 510 kDa; PDI = 1.18
                                                       Mn = 510 kDa; PDI = 1.18
            40

            20

             0
                  Bl




                                                                     Fe
                          Li


                                  Lu


                                           Sp


                                                     Ki


                                                             U
                                                               ri
                           ve
                   oo




                                                      dn




                                                                       ce
                                    ng


                                             l




                                                                ne
                                              ee
                              r
                     d




                                                        ey




                                                                         s
                                                 n


                         • Higher & longer blood circulation
                         • Much lower uptake in liver
Effects of PEG length on BioDistribution
                100
                                                           5kDa PEG stars
                                                            5kDa PEG stars
                     80
   % ID/organ



                     60                                    2kDa PEG stars
                                                            2kDa PEG stars
                     40                                    1kDa PEG stars
                                                            1kDa PEG stars
                     20
                      0
BLOOD                     0   10   20      30   40   50
                                    time (h)              * 5-10 kDa PEG
                                                          * 5-10 kDa PEG
                     40                                   * min. 20 arms
                                                          * min. 20 arms
                                                          * max. Mw of 1066
                                                          * max. Mw of 10
        % ID/organ




                     30

                     20

                     10

                      0
LIVER                     0   10   20      30   40   50
                                    time (h)
CT/PET Imaging of 5kDa PEG Stars
    CT/PET Imaging of 5kDa PEG Stars
5kDa Stars injected in aanormal Sprague-Dawley rat (top) and in aaBalb/C mouse (bottom)
 5kDa Stars injected in normal Sprague-Dawley rat (top) and in Balb/C mouse (bottom)




            1h post-injection                               4h post-injection
Targeted Nanoparticles
              Targeted Nanoparticles




Injury causes rupture of endothelium
 Injury causes rupture of endothelium
and exposure of smooth muscle cells
 and exposure of smooth muscle cells
which over-express binding molecules
 which over-express binding molecules
at surface – αvβ3
 at surface – αvβ3
Multi-functional Nanoparticles
         Multi-functional Nanoparticles

Design Criteria - Nanoparticles

1)   Must have long blood circulation lifetimes
2)   Attach diagnostic agents – surface or interior
3)   Functionalize with targeting ligands – surface
4)   Incorporate therapeutics – interior
5)   Design biodegradability
Synthesis of Nanoparticles
            Synthesis of Nanoparticles

  PEG: 5kDa
  PEG: 5kDa



                                       Orthogonal
                                       Orthogonal
                                         Latent
                                          Latent
                                     Functionalities
                                      Functionalities
                          120oC



Mn = 18 kDa; PDI = 1.10
Mn = 18 kDa; PDI = 1.10




                                    Arm copolymer
Synthesis of Nanoparticles
         Synthesis of Nanoparticles

                         +             +

                                       Cross-linker

                                     -X- =       or
                             NMP
                             120oC
         Arm copolymer


                                           Hydrophobic
                                           Hydrophobic
  PEG shell for
  PEG shell for                               Core
                                               Core
biocompatibility
 biocompatibility
                                      Orthogonal Reactive
                                      Orthogonal Reactive
        Reactive
        Reactive                       Terminal Groups
                                        Terminal Groups
    Internal Groups
     Internal Groups                 Mn = 550 kDa; PDI = 1.16
                                     Mn = 550 kDa; PDI = 1.16
DOTA Conjugation into Star Copolymer




             DOTA-amine
             DMF, R.T., 30h
Click Chemistry
              Click Chemistry
         R 1 R1       H
                      H      ++       N N N
                                   N N N R2 R 2
                                    - +

                                      CuSO 4
50 kcal driving force
50 kcal driving force             reducing agent
                                     rt - water
              1
              1              ::          1
                                         1
         R1       H     R1          HH       R1
** Compatibility with
** Compatibility with    +         ** Quantitative
                                    ** Quantitative
  functional groups
            N     N
   functional groups R N
                      2      N NR N Ryields
                                        yields
                                        2
               N                 N
                                 2
                           N
Peptide functionalization



Click reaction with acetylenes
Click reaction with acetylenes
    --modular chemistry
       modular chemistry




            Azide-Gly-Gly-Gly-Arg-Gly-Asp-Ser-Pro-Amide
            Azide-Gly-Gly-Gly-Arg-Gly-Asp-Ser-Pro-Amide

Azide-Gly-Gly-His-His-Ley-Gly-Gly-Ala-Lys-Gln-Ala-Gly-Asp-Val-Amide
Azide-Gly-Gly-His-His-Ley-Gly-Gly-Ala-Lys-Gln-Ala-Gly-Asp-Val-Amide
                                                  Jeff Smith - Burnham
Peptide functionalization
                              COO-

                          N
                                     O
                      N              O
                     N        Cu
                                     O
                                     O
                          N

                              COO-




          Peptides-N3
            Click



    * Quantitative Yields
     * Quantitative Yields
    * Mild reaction conditions
     * Mild reaction conditions
CT/PET Imaging of Targeted 5kDa PEG Stars
CT/PET Imaging of Targeted 5kDa PEG Stars
                                                                                  Injured Carotid
                                                                                   Injured Carotid
                                                                                  64Cu-5kDa PEG nanoparticle with c-RGD
                                                                                   64Cu-5kDa PEG nanoparticle with c-RGD
                                                                                  targeting 5h post-injury
                                                                                   targeting 5h post-injury

                                                                                  No statistical differences with post-injury
                                                                                   No statistical differences with post-injury
                                                                                  imaging times
                                                                                   imaging times

                                                15% of chain ends labeled – ca. 6 c-RGD units
                                                 15% of chain ends labeled – ca. 6 c-RGD units
                                      α vβ 3 Competitive Binding Assay       Binding affinity for αvvβ3(IC50): 6.4 nM
                                                                             Binding affinity for α β3 (IC50): 6.4 nM
                          100
 % Vitronectin Activity




                          75                                                   Affinity for αvvβ5(IC50) > 10,000 nM
                                                                               Affinity for α β5 (IC50) > 10,000 nM
                          50


                          25
                                                                                   No targeting groups --Affinity for
                                                                                   No targeting groups Affinity for
                                                                                   αvvβ3and αvvβ5(IC50) > 15,000 nM
                                                                                   α β3 and α β5 (IC50) > 15,000 nM
                           0
                                -3   -2    -1     0     1      2         3    4
                                          Log [Nanoparticle]
Imaging of Arterial Injury with 5kDa PEG Stars
Imaging of Arterial Injury with 5kDa PEG Stars

          Arterial Injury
          Arterial Injury
     R                              L



                                         ** 600% increase in
                                          ** 600% increase in
                                             detection level
                                              detection level




         RGD-star NP   Control star NP



              Sham Injury
              Sham Injury
Microelectronics
              Microelectronics
*** drive to 45 nm and smaller
*** drive to 45 nm and smaller




   Procedures are needed to allow sub 50 nm lithography
    Procedures are needed to allow sub 50 nm lithography
   -- Low Cost
      Low Cost
   -- Compatible with Current Manufacturing
      Compatible with Current Manufacturing
* NEED K < 2.0!!!!!
* NEED K < 2.0!!!!!
                       Dielectric
                       Dielectric
                       materials
                        materials


                        SiO22
                        SiO
                      K = 4.0!!!
                      K = 4.0!!!


                         AIR
                         AIR
           300 nm     K = 1.01??
                      K = 1.01??
Need Low K materials -- K < 2.0 -- porosity!!!!
Need Low K materials K < 2.0 porosity!!!!
Air Gap Manufacturing
          Air Gap Manufacturing
    Cu lines       Dielectric


                                 Deposit
                                Template


Size of holes is Critical < 20nm
Size of holes is Critical < 20nm                   Form Holes

                                 Remove
                                 Dielectric



     ‘Pinch off’ Holes

                                              --Low Cost
                                                Low Cost
                                  Build
                                              --Compatible with
                                                Compatible with
                                Multilayers
                                                Current Manufacturing
                                                Current Manufacturing
Block Copolymers
                  Block Copolymers
                           PMMA
Technologically
Technologically                                          Synthetic
                                                          Synthetic
  Important
   Important               PS                            Challenge
                                                         Challenge


 phase morphology depends on relative polymer-block chain lengths
  phase morphology depends on relative polymer-block chain lengths




 spheres                   lamellae
                            lamellae                   inverse-spheres
                                                        inverse-spheres
  spheres
              cylinders
               cylinders               inverse-cylinders
                                        inverse-cylinders
Comparison: Lithography vs. Self
        Comparison: Lithography vs. Self
         Assembling Block Copolymers
         Assembling Block Copolymers
                                   Critical steps
                                   Critical steps

                                1. Neutralization
                                 1. Neutralization
                                    of surface
                                     of surface
   Expensive
    Expensive
Photolithography
 Photolithography

                               2. Vertical alignment
                                2. Vertical alignment
                                 of PMMA cylinders
                                  of PMMA cylinders

                                 3. Photochemical
                                  3. Photochemical
                                     removal of
                                      removal of
                                 PMMA cylinders
                                  PMMA cylinders
Assembling a thin-film polymer template
Assembling a thin-film polymer template
                                 Tom Russell -- UMASS
                                 Tom Russell UMASS


 Block
 Block
 Copolymer
 Copolymer




 ** Critical to make cylinders
   ‘vertical’ not ‘horizontal’
       ** Use neutral layer
        ** Use neutral layer
Control of Surface Properties
       Control of Surface Properties

                      PMMA

                           PS

          NEUTRAL SURFACE
              NEUTRAL SURFACE
          NEUTRAL SURFACE
               NEUTRAL SURFACE

             42 58 50 50               100% PS
            MMA STY



          RANDOM COPOLYMER
          RANDOM COPOLYMER
100% PMMA
             STRUCTURES
             STRUCTURES
Random Copolymer
                           Random Copolymer
                                                                                     .
                                                                                     O
                                                   -
                                                  O                              N
                                 Zn/HOAc     +             PhMgBr
       NO2      +          CHO                N




                                                                    Jacobsen's
                                                                     Reagent
Routinely made on kg scale
Routinely made on kg scale
                                                                                              Cl




                           N
                      O                                N                                  N
                                              O                                      O

            O   OMe                58% Sty                   1. NaOAc
                                   42% MMA                   2. KOH

       58             42

OH                                            OH                                     Cl


      Surface attachment
Formation of Random Copolymer Brush
      Formation of Random Copolymer Brush
              OH OH OH OH OH OH OH OH
              Si   Si   Si     Si   Si   Si Si   Si




  Neutrality at
  Neutrality at                                             O
                                                                 N

  58% styrene       HEAT
                     HEAT
   58% styrene
and 42% MMA        12 hours
                    12 hours                      O   OMe
 and 42% MMA
                                                 58         42
                                           OH
Effect of Surface Preparation
           Effect of Surface Preparation
No surface preparation
 No surface preparation         NORMAL
                                NORMAL       PS-PMMA random
                                              PS-PMMA random
(native oxide //silicon)
 (native oxide silicon)    PS-PMMA copolymer copolymer --LFRP
                           PS-PMMA copolymer copolymer LFRP




   *
   *      random copolymer neutralizes surface for
           random copolymer neutralizes surface for
          proper diblock copolymer self-assembly
           proper diblock copolymer self-assembly
Comparison: Lithography vs. Self
        Comparison: Lithography vs. Self
         Assembling Block Copolymers
         Assembling Block Copolymers
                                   Critical steps
                                   Critical steps

                                1. Neutralization
                                 1. Neutralization
                                    of surface
                                     of surface
   Expensive
    Expensive
Photolithography
 Photolithography

                               2. Vertical alignment
                                2. Vertical alignment
                                 of PMMA cylinders
                                  of PMMA cylinders

                                 3. Photochemical
                                  3. Photochemical
                                     removal of
                                      removal of
                                 PMMA cylinders
                                  PMMA cylinders
Air Gap
Air Gap
Press Coverage
                          Press Coverage
IBM's chip breakthrough comes from
 IBM's chip breakthrough comes from
tiny holes. May 4, 2007
 tiny holes. May 4, 2007
Chips with minuscule holes in them can run faster
 Chips with minuscule holes in them can run faster
or use less energy, IBM said in announcing aanovel
 or use less energy, IBM said in announcing novel
way to create them — potentially one of the most
 way to create them — potentially one of the most
significant advances in chip manufacturing in
 significant advances in chip manufacturing in
years.
 years.
To create these tiny holes, the computer company
 To create these tiny holes, the computer company
has harnessed aaplastic-like material that
 has harnessed plastic-like material that
spontaneously forms into aasieve-like structure.
 spontaneously forms into sieve-like structure.
quot;To our knowledge, this is the first time anyone
 quot;To our knowledge, this is the first time anyone
has used nanoscale self-assembled materials to
 has used nanoscale self-assembled materials to
build things that machines aren't capable of doing,quot;
 build things that machines aren't capable of doing,quot;
said John Kelly, IBM's vice president of
 said John Kelly, IBM's vice president of
development.
 development.
Challenges to Manufacturing
       Challenges to Manufacturing


                           1. Neutral brush
                           1. Neutral brush
                              step is slow
                               step is slow
                            – 12 to 16 hours
                             – 12 to 16 hours
Critical step
Critical step
                             Critical steps
                             Critical steps


                            2. Regularity
                             2. Regularity
1. Replace Polymer Brush
               1. Replace Polymer Brush
          → Improved Manufacturability
          → Improved Manufacturability
      Polymer Brush
       Polymer Brush
  --very slow formation
     very slow formation




Crosslinked Thin Film
Crosslinked Thin Film
      -- very robust
         very robust
  -- quick formation
     quick formation
Chemistry
                   Chemistry
    * Based on Benzocyclobutene (BCB) chemistry
     * Based on Benzocyclobutene (BCB) chemistry


                                           o-quinoid structure is
                                            o-quinoid structure is
                                           extremely reactive
                                            extremely reactive
BCB ring is unreactive
BCB ring is unreactive



                               +   OTHER PRODUCTS




    Coupled product is
     Coupled product is
    extremely stable
     extremely stable
Improved Manufacturability
                  Improved Manufacturability

                                                                                                     N
                                                                                                 O
    N                                                                                                    H
O
        H                                             120 C
              +         +                 +                       O   OMe
                  O   OMe
                                                                            x        y       z
                                                                                                      3mol% BCB
                                                                                                       3mol% BCB
                                                                                                      55mol% Sty
                                                                                                       55mol% Sty
                                                                                                     42mol% MMA
                                                                                                      42mol% MMA
                                                                       Spin-coat 250 C

    O   OMe

              x             y                 z
                                                      Crosslink
                                                                  O   OMe
                                    OMe       O
                                                                            x            y   z




                  z             y                 x




    ** Simple spin-coat then bake procedure
    ** Simple spin-coat then bake procedure
Improved Manufacturability
              Improved Manufacturability
                          12

                          10
         Thickness (nm)

                          8                             12

                                                        10




                                       Thickness (nm)
                          6                              8

                                                         6                              o
                                                                                   200 C
                          4                              4                            o
                                                                                   250 C
                                                         2
                          2                              0
                                                             0   5   10       15   20   25      30
                                                                      Time (hr)
                          0
                               0   1                         2            3                 4
                                                 Time (hr)

** less than 10 minutes bake time at 250C gives robust films
** less than 10 minutes bake time at 250C gives robust films
Process Variability
          Process Variability
              Bare
               Bare           Coated with 66nm
                               Coated with nm
            Substrate
             Substrate   PSt-BCB-PMMA copolymer
                          PSt-BCB-PMMA copolymer

    Al
            36.1 o                      76.3 o

  SiN
           31.5 o                         76.2 o


Kapton
         53.6 o                             75.8 o


 PET
       65.3 o                                    75.9 o


   ** Examine water contact angles
   ** Examine water contact angles
Process Variability
                    Process Variability
           Thermal evaporation of Au


                                                              on Au

           19                          Au                      on Si
35 nm
                                       Si
                6


Block Copolymer                             Crosslinked P(S-r-BCB-r-MMA)
                                            Crosslinked P(S-r-BCB-r-MMA)
Block Copolymer
                                                   + Block Copolymer
                                                    + Block Copolymer
   on Au                    on Si                  on Au               on Si




    ** Process is substrate independent!!
    ** Process is substrate independent!!
Regularity
                Regularity
     300mm wafer edge




Current process -- PSt-PMMA
Current process PSt-PMMA
                -- Defects and Grain Boundaries
                   Defects and Grain Boundaries
                -- Limits applications
                   Limits applications
Regularity – CHANGE block polymer
      Regularity – CHANGE block polymer
PSt-PMMA
PSt-PMMA             PSt-PEO
                     PSt-PEO
Cannot degrade PEO!!!
Cannot degrade PEO!!!




                                                  High degree of order and
                                                   High degree of order and
                                                  possible REGISTRATION
                                                   possible REGISTRATION
                                                  opens up NEW possibilities
                                                   opens up NEW possibilities

 ** Absence of Grain Boundaries over Large Dimensions
    Absence of Grain Boundaries over Large Dimensions
 ** PEO-PSt block allows 7-8 nm features
     PEO-PSt block allows 7-8 nm features
Incorporate New Complexity into Blocks
Incorporate New Complexity into Blocks
                                                                                           O
     MeO       OH +                               MeO                 O                         OH
           O                                                 O
               n      O   O   O                                       n       O



                                                                                          O N
                                                                                                    H
                                                        DCC/DPTS

                Cleavable
                 Cleavable                                                                OH

               Ester Linkers
               Ester Linkers                                                                        H
                                                                                  O                      N
                                        MeO              O                            O                 O
                                                   O
                                                         n       O



                                                                          o
 Design Function into Block
  Design Function into Block                                         100 C

Copolymers through Chemistry
Copolymers through Chemistry                                                                            N3

                                                        O
                              MeO        O                   O                                                    O N
                                    O
                                         n    O                                                                         H



                                                                                                x             y
   Photochemical crosslinkable group
   Photochemical crosslinkable group                                                                         N3
2. Regularity
                     2. Regularity
                                     PEG                PS
* new block copolymer PEG-PSt

     substrate            Spin
                           Spin
                       copolymer            substrate
                        copolymer
                                                      hν
                                                       hν
       X-linked PS                               X-link azides
                                                 X-link azides

                          TBAH
                          TBAH
     substrate         Removes PEG
                       Removes PEG


                         -- NO RANDOM copolymer
                             NO RANDOM copolymer
                         -- Normal Photoresist developer
                            Normal Photoresist developer
2. Regularity
                      2. Regularity
                                         PEG                            PS
 * new block copolymer PEG-PSt                         OH-
                                                         OH-



        substrate            Spin
                              Spin
                          copolymer                substrate
                           copolymer
                                                                     Sharp
                                                                      Sharp
                                                                   Interfaces
                                                                    Interfaces
                                                               O
                                         MeO       O               O
                                               O



                                OH-
                                                   n O         O       PSt
                                         MeO       O               O
                                               O
                                                   n O         O       PSt
        NO degradation
        NO degradation                   MeO
                                               O
                                                   O
                                                   n O         O
                                                                   O
                                                                       PSt
                                         MeO       O               O
                                               O
                                                                       PSt
          NO Template
          NO Template                    MeO
                                               O
                                                   n O
                                                   O
                                                               O

                                                                   O
                                                   n O         O       PSt
                                         MeO       O               O
                                               O
                                                                       PSt
        Ester groups are not                       n O         O

        Ester groups are not             MeO
                                               O
                                                   O
                                                   n O         O
                                                                   O
                                                                       PSt
sufficiently available for hydrolysis
 sufficiently available for hydrolysis   MeO
                                               O
                                                   O
                                                   n O
                                                                   O
                                                                       PSt
Improving Long Range Order
      Improving Long Range Order
PS-b-PMMA: long-range order
                                       Make Triblock
                                       Make Triblock
                                        Copolymer
                                        Copolymer

                                       PS         PEO

                                             PMMA

PS-b-PEO: degradability
                                            UV irradiation
                                            UV irradiation


                              Nanoporous films with arrays
                              of well-ordered nanopores
ABC Triblock Copolymers
 ABC Triblock Copolymers




  Bring richer nanostructures and unique
  Bring richer nanostructures and unique
properties to Block Copolymer Lithography
properties to Block Copolymer Lithography
PEO-PMMA-PSt triblock copolymer
PEO-PMMA-PSt triblock copolymer



         PS        PEO

              PMMA




      Different Morphologies
Synthesis of Triblocks
    Synthesis of Triblocks
                     DCC, DPTS
                     DMAP                            O
O               OH
       O n                           O                       Br
                     Br    OH                  O n

                           O



                                         S
    MgBr   +   CS2
                                         S-




                                               O
  Synthesis of
   Synthesis of                  O                       S
                                         O n
PEG-macroinitiator
PEG-macroinitiator                                           S
Synthesis of Triblocks
                 Synthesis of Triblocks
                                                             O
            O                                  O                             S
                                O
O                 S                 OMe              O n                 m
      O n                                                                            S
                           AIBN, Benzene                                 O
                      S
                                   70 oC                             O




                                                     Benzene
                                                         70 oC


                                                         O
                                           O                                         S
                                                   O n               m           p
                                                                     O                   S
                PEG-triblocks
                PEG-triblocks                                    O




    Mn (PSt) = 40K; Mn (PMMA) = 12K; Mn (PEO) = 5K
               Mn (ABC) = 57K; PDI = 1.08
Characterization of Triblocks
       Characterization of Triblocks
                                                                          O                               b
NMR                                                                           c
                                                          O                       S
                                                                  O n
                                                                                              a                   PEG-macroinitiator
                                                                                          S




               b                   c
      a

                                                                          O
                                                              O                                   S
                                                                  O                   m       p
                                                                      n
                                                                                      O               S              PEG-triblock
                                                                                  O



  100 % functionality of the end
group



SEC                     PEO-PMMA-PS (5k-1.5k-13.5k)

                                                                                                      Narrow distribution
                                                                                                      (Mn/Mw < 1.1)
                                                     PEO-PMMA (5k-1.5k)
                                                       PEO (5k)
12        13       14         15                16       17       18
                           Elution time (min)
Low MW PMMA                       High MW PMMA
PEO Crystals                   Separate
                                Separate
PEO Crystals
                             PMMA/PEO
                              PMMA/PEO
                               domains
                                domains



Amorphous
 Amorphous                   PEO too short
                              PEO too short
PMMA/PEO
PMMA/PEO                     to crystallize
                              to crystallize
  blend
   blend




No PORES
No PORES                             PORES
                                     PORES

       ** Nature of nanostructure critical for function
Porous Block Copolymer Templates
         Porous Block Copolymer Templates
          AFM
           AFM                             TEM
                                           TEM
PEO(5K)-PMMA(6K)-PS(32K)




400 nm                         200 nm



             Pores traverse completely through film
Regularity
                    Regularity
  Current Photolithographic- ca. 50-100 nm




        Decrease Size/Maintain Regularity
        Decrease Size/Maintain Regularity
Storage Applications, Microelectronics, Photovolatics
Storage Applications, Microelectronics, Photovolatics
Market leader in Holographic Storage
        Market leader in Holographic Storage




              Holographic drive                     Holographic disc (tapestry™300r)

              20MB/s transfer rate                        1.5 mm recording material
            WORM recording format                           130 mm diameter disk
            405 nm laser wavelength                           50 year archive life
                 $18,000.00                                Capacity = 300GB native
                                                                   $180.00

•   Inphase Technologies, Longmont, Colorado 80501, USA
2-Stage Chemistry for InPhase System
          2-Stage Chemistry for InPhase System
                      SH
                                                                       OH
                                                                                                                                  OH
          O                   SH
                                                                   O
      O       O                                                                                                               O

HS        O               O   O                   HO
                                                                   O                                         HO
                      O                                O                                                                      O




                                                               n
                                                                                                                  O




                                                                                                                          n
                                                                       OH
                          O                                                                                                       OH
                                                                   S
          HS                                           O                                                                      S
                                                                                                                  O



                                                   n
 Matrix precursor I




                                                                                                              n
                                                  HO                   O
                                                                                                             HO                   O
                                   epoxy matrix                    O            O                Hologram                     O
                                                       S               O                                                                   O
                                    formation                                                    recording        S               O
                                                               O                        S
     O                O       O                            O       O                                                      O                        S
O                                                                                           OH                        O       O
                  n                                                                                                                                    OH
                                                                   O            S
                                                                                        O                                     O            S
                                                                       HO                                                                          O
 Matrix precursor II                                                                                                              HO



                                                                                    n
                                                                                O




                                                                                                                                               n
                                                                                    O                                                      O
                                                                                                                                               O
                                                                                            OH
                                                                                O                                                                      OH
                                                                                                                                           O
                                                                            n




                                                                                                                                       n
                                                                       HO
                                                       Monomer                                                                    HO

     Monomer

Initial Formulation                                    Holographic Disc                                               Data Storage
Merit and Drawbacks of InPhase Technology
     Merit and Drawbacks of InPhase Technology

Advantages          + High sensitivity

                    + High storage capacity

Disadvantages

       - Shrinkage of the material due to monomer diffusion                 image distortion

       - Polymerization inhibition due to oxygen and other inhibitors

       - Need of pre-exposure to remove inhibitors               dynamic range reduction

       - Phase separation if the resulting polymer is not compatible with the matrix
         material     low archival-life

       - low thermal stability of the material          low shelf-life


….holographic data storage is in aapeculiar situation: Research on recording devices and recording
 ….holographic data storage is in peculiar situation: Research on recording devices and recording
schemes has far progressed further than the development of the required materials; they constitute
 schemes has far progressed further than the development of the required materials; they constitute
aabottleneck for the development of the technology….
   bottleneck for the development of the technology….
                                             Stephan J. Zilker (CHEMPHYSCHEM, 2002, 3, 333)
                                               Stephan J. Zilker (CHEMPHYSCHEM, 2002, 3, 333)
Quantum Amplification Approach to Holography
                                                       hν




                     Hexamethyl Dewar benzene                      Hexamethyl benzene




        Photoinduced isomerization leads to change in the electronic structure
                         and the geometry of the molecule


  + No new bonds are forming      No shrinkage
  + One photon isomerizes more than one dewar benzene                                   high sensitivity
  + No developing step needed
Evans, T. R.; Wake, R. W.; Sifain, M. M.; Tetrahedron Lett. 1973, 9, 701.
Performance Comparison
                                            Performance Comparison
                             50
                                                                                                   60

                                                                                                   50




                                                                      diffraction efficiency (%)
                             40
diffraction efficiency (%)




                                                                                                   40
                             30
                                                                                                                   407 OFF
                                                                                                   30
                             20                                                                         407 ON
                                                                                                   20
                                               Inphase                                                                       UCSB
                             10                                                                    10
                                             120 sec , 42%                                                                40 sec , 55%
                                                                                                   0
                              0
                                  0    50    100          150   200                                 -10 0   10 20 30 40 50 60 70 80 90 100
                                             time (sec)                                                             time (sec)




                                  *** Holographic Speed and Efficiency is comparable
Angular Selectivity
                                                          Angular Selectivity
                                                                                      2.0
                             60
                                                                                      1.8
diffraction efficiency (%)




                             50                                                       1.6
                                                                                      1.4
                             40
                                                                                      1.2
                             30                                                       1.0
                                                                                      0.8
                             20
                                                                                      0.6
                             10                                                       0.4

                             0                                                        0.2
                                                                                      0.0
                                  20   22        24      26      28         30   32         20   22        24      26      28         30   32
                                            angular selectivity (degrees)                             angular selectivity (degrees)


                                        * High diffraction efficiency
                                        * Well-defined nulls
                                        * Can store large amounts of information
Angular Multiplicity
                                                        Angular Multiplicity
                                                                                                   3.0
                             8

                             7                                                                     2.5
diffraction efficiency (%)




                             6
                                                                                                   2.0




                                                                                  Cumulative M/#
                             5
                                                                                                   1.5
                             4

                             3                                                                     1.0

                             2
                                                                                                   0.5
                             1

                             0                                                                     0.0

                                 12     16       20     24     28      32    36                          0   50 100 150 200 250 300 350            400
                                                                                                                                              2
                                                                                                             Cumulative Exposure Energy (mJ/cm )
                                             angular selectivity (degrees)

                                      each hologram was recorded by 6 sec exposure to the writing beams
sharpness and symmetry of the curves indicate the high resolution
    that can be achieved by QAI Gen II (UCSB) imaging system

                             *** Comparable performance to InPhase – simplified processing
                              *** Comparable performance to InPhase – simplified processing
Shelf-life comparison
                    Shelf-life comparison
                                              3.0

                                              2.5

                                              2.0




                                        M/#
                           2 weeks            1.5
                            2 weeks
                                              1.0

                                              0.5

                                              0.0
                                                    0       2    4      6        8   10   12
                                                                  time (weeks)

         Photopolymer                                       QAI System (UCSB)

    80% decrease in storage                             No change in storage capacity
capacity after 2 weeks of formulation                   after 12+ weeks of formulation
    (Chem. Mater. 2000, 12, 1431)
Conclusions
                Conclusions


*
*   Efficient chemical transformations are
     Efficient chemical transformations are
    important in the design of new materials
     important in the design of new materials

*
*   For either microelectronic, data storage and
    For either microelectronic, data storage and
    energy applications – must control structure
    energy applications – must control structure
    – different structures give different performance
    – different structures give different performance
Thanks!!!
                     Thanks!!!

UCSB – Luis Campos, Jasmine Hunt, Nalini Gupta, Kenichi
UCSB – Luis Campos, Jasmine Hunt, Nalini Gupta, Kenichi
Fukukawa, Eric Pressly, Ashley Mynar, Ben Messmore, Eic
Fukukawa, Eric Pressly, Ashley Mynar, Ben Messmore, Eic
Drockenmuller, Chuanbing Tang, Joona Bang, Matt Kade, Katie
Drockenmuller, Chuanbing Tang, Joona Bang, Matt Kade, Katie
Schaefer, Ed Kramer.
Schaefer, Ed Kramer.

WUStL – Karen Wooley, Mike Welch, Dan Schuster, Dana
WUStL – Karen Wooley, Mike Welch, Dan Schuster, Dana
Abendschein, Carolyn Anderson, Raffa Rossin, Ashley Fiamengo,
Abendschein, Carolyn Anderson, Raffa Rossin, Ashley Fiamengo,
Amir Hagoolya.
Amir Hagoolya.

UMASS --Seung Hyun Kim, Joonwon Bae, Matthew J. Misner,
UMASS Seung Hyun Kim, Joonwon Bae, Matthew J. Misner,
Tom Russell
Tom Russell

Stanford --Marissa Caldwell, Li-Wen Chang, H.-S. Philip Wong
Stanford Marissa Caldwell, Li-Wen Chang, H.-S. Philip Wong

Eindhoven – Jos Paulusse, Bert Meijer
Eindhoven – Jos Paulusse, Bert Meijer
Financial Support
Financial Support

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Craig Hawker of UCSB: Commercial Applications of Polymer as Nanomaterials

  • 1. Craig J. Hawker Commercial Application of Polymers as Nanomaterials
  • 2. Research Philosophy Research Philosophy To effectively use Polymers as Nanomaterials To effectively use Polymers as Nanomaterials it is ESSENTIAL to accurately it is ESSENTIAL to accurately manipulate chemical structure and architecture manipulate chemical structure and architecture
  • 3. Robust, Efficient, and Orthogonal Chemistry Robust, Efficient, and Orthogonal Chemistry Prof. K. Barry Sharpless Prof. K. Barry Sharpless Prof. Sir John Cornforth Prof. Sir John Cornforth Need Robust, Efficient, and Orthogonal Chemistry to Need Robust, Efficient, and Orthogonal Chemistry to prepare functionalized polymers for Nanoscale Applications prepare functionalized polymers for Nanoscale Applications
  • 4. Recent Examples of Efficient Chemistry Recent Examples of Efficient Chemistry •• Click Chemistry Click Chemistry --nanoparticles for diagnosis and nanoparticles for diagnosis and treatment of cardiovascular disease treatment of cardiovascular disease •• LFRP Polymerization LFRP Polymerization --block copolymer lithography block copolymer lithography •• Isomerization Isomerization --films for holographic storage films for holographic storage
  • 5. Challenges in NanoMedicine CANCER CANCER •1.4 million cancer cases (2006) •1.4 million cancer cases (2006) •560,000 deaths expected (2006) •560,000 deaths expected (2006) Earlier detection strategies •$210 billion (2005) •$210 billion (2005) and novel therapeutic approaches could help HEART DISEASE HEART DISEASE reduce surgical costs and •71.3 million Americans (~1:3 adults) •71.3 million Americans (~1:3 adults) increase the quality of life •910,000 deaths (2003) •910,000 deaths (2003) •$403 billion (2006) •$403 billion (2006) Courtesy of American Cancer Society and American Heart Association
  • 6. Targeted Nanoparticles for Vascular Injury Targeted Nanoparticles for Vascular Injury Injury causes rupture of endothelium Injury causes rupture of endothelium and exposure of smooth muscle cells and exposure of smooth muscle cells which over-express binding molecules which over-express binding molecules at surface –αvβ3 αvβ5 at surface –αvβ3 αvβ5 Target platlets --αIIvβ3 Target platlets αIIvβ3
  • 7. Multi-functional Nanoparticles Multi-functional Nanoparticles Cell transduction component – permeation peptide Targeting component for cell surface – antibody or small molecule Therapeutic payload – drug, protein or gene Detection Element – radionuclide, MRI agent, or optical chromophore Targeting component for intracellular mRNA – PNA
  • 8. Multi-functional Nanoparticles Multi-functional Nanoparticles Design Criteria - Nanoparticles 1) Must have long blood circulation lifetimes 2) Attach diagnostic agents – surface or interior 3) Functionalize with targeting ligands – surface 4) Incorporate therapeutics – interior 5) Design biodegradability
  • 9. Synthesis of Nanoparticles Synthesis of Nanoparticles + + Latent functionality PEG: 1kDa – 10 kDa PEG: 1kDa – 10 kDa 120oC For 5kDa PEG For 5kDa PEG Mn = 17 kDa; PDI = 1.08 Mn = 17 kDa; PDI = 1.08 Arm copolymer
  • 10. Synthesis of Nanoparticles Synthesis of Nanoparticles + + Cross-linker -X- = or NMP 120oC Arm copolymer Mn = 17 kDa; PDI = 1.08 Mn = 17 kDa; PDI = 1.08 Hydrophobic Hydrophobic PEG shell for PEG shell for Core Core biocompatibility biocompatibility Mn = 690 kDa; PDI = 1.18 Mn = 690 kDa; PDI = 1.18 Reactive Reactive Internal Groups Internal Groups Star copolymer
  • 11. Molecular Weight Results GPC (DMF) Mn 5kDa - PEG PDI (kDa) 5kDa - PEG-Star/EGDA Star / EGDA 690 1.18 Star / DVB 750 1.19 5kDa - PEG-Star/DVB Arm-17kDa 17.0 1.08 5kDa - PEG-Arm 10 20 30 40 [min] Mn 2kDa - PEG PDI (kDa) 2kDa - PEG-Star/EGDA Star / EGDA 330 1.20 2kDa - PEG-Star/DVB Star / DVB 390 1.19 2kDa - PEG-Arm Arm-11kDa 113 1.07 10 20 30 40 [min]
  • 12. Size Distribution of Nanoparticles 5kDa --PEG Arm (MW: 17kDa) 5kDa PEG Arm (MW: 17kDa) 2kDa PEG Arm (MW: 11kDa) 2kDa PEG Arm (MW: 11kDa) DVB core DVB core EGDA core EGDA core DVB core DVB core EGDA core EGDA core Dh = 60 nm 49 nm 35 nm 26 nm Can control size, % of PEG, position and number of functional groups
  • 13. Size Distribution of Nanoparticles 5kDa --PEG Arm (MW: 17kDa) 5kDa PEG Arm (MW: 17kDa) Darrin Pochan --Delaware Darrin Pochan Delaware EGDA core EGDA core 49 nm Cryo-TEM shows core shell structure and relative monodispersity
  • 14. Multi-functional Nanoparticles Multi-functional Nanoparticles Design Criteria - Nanoparticles 1) Must have long blood circulation lifetimes 2) Attach diagnostic agents – surface or interior 3) Functionalize with targeting ligands – surface 4) Incorporate therapeutics – interior 5) Design biodegradability
  • 15. Positron Emission Tomography (PET) Positron Emission Tomography (PET) Annihilation Annihilation 511 keV 64Cu Gamma Ray Positron β + e- Electron 511 keV Gamma Ray • The radionuclide decays and the resulting positrons subsequently annihilate on contact with electrons after traveling a short distance within the body • Each annihilation produces two 511 keV photons traveling in opposite directions (~180°) which are detected by the detectors surrounding the subject Karen Wooley, Mike Welch, Carolyn Anderson
  • 16. DOTA Conjugation and 64Cu Labeling 64Cu properties COO- •12.7 hr half-life N •Decays by β+ (positron, PET imaging) and β- (Beta particle, radiotherapy) O N O N Cu O DOTA properties O •FDA approved chelator N •Also used for Gd (MRI) COO- •Readily chelates metal cations
  • 17. Synthesis of DOTA-amine Synthesis of DOTA-amine HBTU, NHS TEA, DMF, R.T. 91% H2, Pd/C EtOH / THF HBTU 90% Nature and length of linker Nature and length of linker affects 64Cu chelation affects 64Cu chelation
  • 18. DOTA Conjugation into Star Copolymer Optimize structure and Optimize structure and function of nanoparticles function of nanoparticles --BioD BioD DOTA-amine DMF, R.T., 30h
  • 19. Labeling with 64Cu Labeling with 64Cu 1. TFA DOTA-amine Cu2+ 2. DMF, R.T., 30h 64Cu 64Cu
  • 20. Techniques for Biodistribution/microPET Techniques for Biodistribution/microPET 70 60 50 40 30 20 10 0 lung liver kidney spleen muscle heart blood bone fat
  • 21. BioDistribution with diblock copolymer ‘arm’ BioDistribution with diblock copolymer ‘arm’ 100 10m i n 1h 4h 24h 48h 80 % I / gan 60 D or Arm copolymer 40 Mn = 17 kDa; PDI = 1.08 Mn = 17 kDa; PDI = 1.08 20 0 Bl Fe Li Lu Sp Ki U rn ve oo dn i ce ng lee r e d ey s n
  • 22. BioDistribution with star based on 2kDa PEG BioDistribution with star based on 2kDa PEG 100 10m i n 1h 4h 24h 48h 80 % I / gan 60 D or Mn = 490 kDa; PDI = 1.19 Mn = 490 kDa; PDI = 1.19 40 20 0 Bl Fe Li Lu Sp Ki U rn ve oo dn i ce ng lee r e d ey s n
  • 23. BioDistribution with star based on 5kDa PEG BioDistribution with star based on 5kDa PEG 100 10m i n 1h 4h 24h 48h 80 % I / gan 60 D or Mn = 510 kDa; PDI = 1.18 Mn = 510 kDa; PDI = 1.18 40 20 0 Bl Fe Li Lu Sp Ki U ri ve oo dn ce ng l ne ee r d ey s n • Higher & longer blood circulation • Much lower uptake in liver
  • 24. Effects of PEG length on BioDistribution 100 5kDa PEG stars 5kDa PEG stars 80 % ID/organ 60 2kDa PEG stars 2kDa PEG stars 40 1kDa PEG stars 1kDa PEG stars 20 0 BLOOD 0 10 20 30 40 50 time (h) * 5-10 kDa PEG * 5-10 kDa PEG 40 * min. 20 arms * min. 20 arms * max. Mw of 1066 * max. Mw of 10 % ID/organ 30 20 10 0 LIVER 0 10 20 30 40 50 time (h)
  • 25. CT/PET Imaging of 5kDa PEG Stars CT/PET Imaging of 5kDa PEG Stars 5kDa Stars injected in aanormal Sprague-Dawley rat (top) and in aaBalb/C mouse (bottom) 5kDa Stars injected in normal Sprague-Dawley rat (top) and in Balb/C mouse (bottom) 1h post-injection 4h post-injection
  • 26. Targeted Nanoparticles Targeted Nanoparticles Injury causes rupture of endothelium Injury causes rupture of endothelium and exposure of smooth muscle cells and exposure of smooth muscle cells which over-express binding molecules which over-express binding molecules at surface – αvβ3 at surface – αvβ3
  • 27. Multi-functional Nanoparticles Multi-functional Nanoparticles Design Criteria - Nanoparticles 1) Must have long blood circulation lifetimes 2) Attach diagnostic agents – surface or interior 3) Functionalize with targeting ligands – surface 4) Incorporate therapeutics – interior 5) Design biodegradability
  • 28. Synthesis of Nanoparticles Synthesis of Nanoparticles PEG: 5kDa PEG: 5kDa Orthogonal Orthogonal Latent Latent Functionalities Functionalities 120oC Mn = 18 kDa; PDI = 1.10 Mn = 18 kDa; PDI = 1.10 Arm copolymer
  • 29. Synthesis of Nanoparticles Synthesis of Nanoparticles + + Cross-linker -X- = or NMP 120oC Arm copolymer Hydrophobic Hydrophobic PEG shell for PEG shell for Core Core biocompatibility biocompatibility Orthogonal Reactive Orthogonal Reactive Reactive Reactive Terminal Groups Terminal Groups Internal Groups Internal Groups Mn = 550 kDa; PDI = 1.16 Mn = 550 kDa; PDI = 1.16
  • 30. DOTA Conjugation into Star Copolymer DOTA-amine DMF, R.T., 30h
  • 31. Click Chemistry Click Chemistry R 1 R1 H H ++ N N N N N N R2 R 2 - + CuSO 4 50 kcal driving force 50 kcal driving force reducing agent rt - water 1 1 :: 1 1 R1 H R1 HH R1 ** Compatibility with ** Compatibility with + ** Quantitative ** Quantitative functional groups N N functional groups R N 2 N NR N Ryields yields 2 N N 2 N
  • 32. Peptide functionalization Click reaction with acetylenes Click reaction with acetylenes --modular chemistry modular chemistry Azide-Gly-Gly-Gly-Arg-Gly-Asp-Ser-Pro-Amide Azide-Gly-Gly-Gly-Arg-Gly-Asp-Ser-Pro-Amide Azide-Gly-Gly-His-His-Ley-Gly-Gly-Ala-Lys-Gln-Ala-Gly-Asp-Val-Amide Azide-Gly-Gly-His-His-Ley-Gly-Gly-Ala-Lys-Gln-Ala-Gly-Asp-Val-Amide Jeff Smith - Burnham
  • 33. Peptide functionalization COO- N O N O N Cu O O N COO- Peptides-N3 Click * Quantitative Yields * Quantitative Yields * Mild reaction conditions * Mild reaction conditions
  • 34. CT/PET Imaging of Targeted 5kDa PEG Stars CT/PET Imaging of Targeted 5kDa PEG Stars Injured Carotid Injured Carotid 64Cu-5kDa PEG nanoparticle with c-RGD 64Cu-5kDa PEG nanoparticle with c-RGD targeting 5h post-injury targeting 5h post-injury No statistical differences with post-injury No statistical differences with post-injury imaging times imaging times 15% of chain ends labeled – ca. 6 c-RGD units 15% of chain ends labeled – ca. 6 c-RGD units α vβ 3 Competitive Binding Assay Binding affinity for αvvβ3(IC50): 6.4 nM Binding affinity for α β3 (IC50): 6.4 nM 100 % Vitronectin Activity 75 Affinity for αvvβ5(IC50) > 10,000 nM Affinity for α β5 (IC50) > 10,000 nM 50 25 No targeting groups --Affinity for No targeting groups Affinity for αvvβ3and αvvβ5(IC50) > 15,000 nM α β3 and α β5 (IC50) > 15,000 nM 0 -3 -2 -1 0 1 2 3 4 Log [Nanoparticle]
  • 35. Imaging of Arterial Injury with 5kDa PEG Stars Imaging of Arterial Injury with 5kDa PEG Stars Arterial Injury Arterial Injury R L ** 600% increase in ** 600% increase in detection level detection level RGD-star NP Control star NP Sham Injury Sham Injury
  • 36. Microelectronics Microelectronics *** drive to 45 nm and smaller *** drive to 45 nm and smaller Procedures are needed to allow sub 50 nm lithography Procedures are needed to allow sub 50 nm lithography -- Low Cost Low Cost -- Compatible with Current Manufacturing Compatible with Current Manufacturing
  • 37. * NEED K < 2.0!!!!! * NEED K < 2.0!!!!! Dielectric Dielectric materials materials SiO22 SiO K = 4.0!!! K = 4.0!!! AIR AIR 300 nm K = 1.01?? K = 1.01??
  • 38. Need Low K materials -- K < 2.0 -- porosity!!!! Need Low K materials K < 2.0 porosity!!!!
  • 39. Air Gap Manufacturing Air Gap Manufacturing Cu lines Dielectric Deposit Template Size of holes is Critical < 20nm Size of holes is Critical < 20nm Form Holes Remove Dielectric ‘Pinch off’ Holes --Low Cost Low Cost Build --Compatible with Compatible with Multilayers Current Manufacturing Current Manufacturing
  • 40. Block Copolymers Block Copolymers PMMA Technologically Technologically Synthetic Synthetic Important Important PS Challenge Challenge phase morphology depends on relative polymer-block chain lengths phase morphology depends on relative polymer-block chain lengths spheres lamellae lamellae inverse-spheres inverse-spheres spheres cylinders cylinders inverse-cylinders inverse-cylinders
  • 41. Comparison: Lithography vs. Self Comparison: Lithography vs. Self Assembling Block Copolymers Assembling Block Copolymers Critical steps Critical steps 1. Neutralization 1. Neutralization of surface of surface Expensive Expensive Photolithography Photolithography 2. Vertical alignment 2. Vertical alignment of PMMA cylinders of PMMA cylinders 3. Photochemical 3. Photochemical removal of removal of PMMA cylinders PMMA cylinders
  • 42. Assembling a thin-film polymer template Assembling a thin-film polymer template Tom Russell -- UMASS Tom Russell UMASS Block Block Copolymer Copolymer ** Critical to make cylinders ‘vertical’ not ‘horizontal’ ** Use neutral layer ** Use neutral layer
  • 43. Control of Surface Properties Control of Surface Properties PMMA PS NEUTRAL SURFACE NEUTRAL SURFACE NEUTRAL SURFACE NEUTRAL SURFACE 42 58 50 50 100% PS MMA STY RANDOM COPOLYMER RANDOM COPOLYMER 100% PMMA STRUCTURES STRUCTURES
  • 44. Random Copolymer Random Copolymer . O - O N Zn/HOAc + PhMgBr NO2 + CHO N Jacobsen's Reagent Routinely made on kg scale Routinely made on kg scale Cl N O N N O O O OMe 58% Sty 1. NaOAc 42% MMA 2. KOH 58 42 OH OH Cl Surface attachment
  • 45. Formation of Random Copolymer Brush Formation of Random Copolymer Brush OH OH OH OH OH OH OH OH Si Si Si Si Si Si Si Si Neutrality at Neutrality at O N 58% styrene HEAT HEAT 58% styrene and 42% MMA 12 hours 12 hours O OMe and 42% MMA 58 42 OH
  • 46. Effect of Surface Preparation Effect of Surface Preparation No surface preparation No surface preparation NORMAL NORMAL PS-PMMA random PS-PMMA random (native oxide //silicon) (native oxide silicon) PS-PMMA copolymer copolymer --LFRP PS-PMMA copolymer copolymer LFRP * * random copolymer neutralizes surface for random copolymer neutralizes surface for proper diblock copolymer self-assembly proper diblock copolymer self-assembly
  • 47. Comparison: Lithography vs. Self Comparison: Lithography vs. Self Assembling Block Copolymers Assembling Block Copolymers Critical steps Critical steps 1. Neutralization 1. Neutralization of surface of surface Expensive Expensive Photolithography Photolithography 2. Vertical alignment 2. Vertical alignment of PMMA cylinders of PMMA cylinders 3. Photochemical 3. Photochemical removal of removal of PMMA cylinders PMMA cylinders
  • 49. Press Coverage Press Coverage IBM's chip breakthrough comes from IBM's chip breakthrough comes from tiny holes. May 4, 2007 tiny holes. May 4, 2007 Chips with minuscule holes in them can run faster Chips with minuscule holes in them can run faster or use less energy, IBM said in announcing aanovel or use less energy, IBM said in announcing novel way to create them — potentially one of the most way to create them — potentially one of the most significant advances in chip manufacturing in significant advances in chip manufacturing in years. years. To create these tiny holes, the computer company To create these tiny holes, the computer company has harnessed aaplastic-like material that has harnessed plastic-like material that spontaneously forms into aasieve-like structure. spontaneously forms into sieve-like structure. quot;To our knowledge, this is the first time anyone quot;To our knowledge, this is the first time anyone has used nanoscale self-assembled materials to has used nanoscale self-assembled materials to build things that machines aren't capable of doing,quot; build things that machines aren't capable of doing,quot; said John Kelly, IBM's vice president of said John Kelly, IBM's vice president of development. development.
  • 50. Challenges to Manufacturing Challenges to Manufacturing 1. Neutral brush 1. Neutral brush step is slow step is slow – 12 to 16 hours – 12 to 16 hours Critical step Critical step Critical steps Critical steps 2. Regularity 2. Regularity
  • 51. 1. Replace Polymer Brush 1. Replace Polymer Brush → Improved Manufacturability → Improved Manufacturability Polymer Brush Polymer Brush --very slow formation very slow formation Crosslinked Thin Film Crosslinked Thin Film -- very robust very robust -- quick formation quick formation
  • 52. Chemistry Chemistry * Based on Benzocyclobutene (BCB) chemistry * Based on Benzocyclobutene (BCB) chemistry o-quinoid structure is o-quinoid structure is extremely reactive extremely reactive BCB ring is unreactive BCB ring is unreactive + OTHER PRODUCTS Coupled product is Coupled product is extremely stable extremely stable
  • 53. Improved Manufacturability Improved Manufacturability N O N H O H 120 C + + + O OMe O OMe x y z 3mol% BCB 3mol% BCB 55mol% Sty 55mol% Sty 42mol% MMA 42mol% MMA Spin-coat 250 C O OMe x y z Crosslink O OMe OMe O x y z z y x ** Simple spin-coat then bake procedure ** Simple spin-coat then bake procedure
  • 54. Improved Manufacturability Improved Manufacturability 12 10 Thickness (nm) 8 12 10 Thickness (nm) 6 8 6 o 200 C 4 4 o 250 C 2 2 0 0 5 10 15 20 25 30 Time (hr) 0 0 1 2 3 4 Time (hr) ** less than 10 minutes bake time at 250C gives robust films ** less than 10 minutes bake time at 250C gives robust films
  • 55. Process Variability Process Variability Bare Bare Coated with 66nm Coated with nm Substrate Substrate PSt-BCB-PMMA copolymer PSt-BCB-PMMA copolymer Al 36.1 o 76.3 o SiN 31.5 o 76.2 o Kapton 53.6 o 75.8 o PET 65.3 o 75.9 o ** Examine water contact angles ** Examine water contact angles
  • 56. Process Variability Process Variability Thermal evaporation of Au on Au 19 Au on Si 35 nm Si 6 Block Copolymer Crosslinked P(S-r-BCB-r-MMA) Crosslinked P(S-r-BCB-r-MMA) Block Copolymer + Block Copolymer + Block Copolymer on Au on Si on Au on Si ** Process is substrate independent!! ** Process is substrate independent!!
  • 57. Regularity Regularity 300mm wafer edge Current process -- PSt-PMMA Current process PSt-PMMA -- Defects and Grain Boundaries Defects and Grain Boundaries -- Limits applications Limits applications
  • 58. Regularity – CHANGE block polymer Regularity – CHANGE block polymer PSt-PMMA PSt-PMMA PSt-PEO PSt-PEO Cannot degrade PEO!!! Cannot degrade PEO!!! High degree of order and High degree of order and possible REGISTRATION possible REGISTRATION opens up NEW possibilities opens up NEW possibilities ** Absence of Grain Boundaries over Large Dimensions Absence of Grain Boundaries over Large Dimensions ** PEO-PSt block allows 7-8 nm features PEO-PSt block allows 7-8 nm features
  • 59. Incorporate New Complexity into Blocks Incorporate New Complexity into Blocks O MeO OH + MeO O OH O O n O O O n O O N H DCC/DPTS Cleavable Cleavable OH Ester Linkers Ester Linkers H O N MeO O O O O n O o Design Function into Block Design Function into Block 100 C Copolymers through Chemistry Copolymers through Chemistry N3 O MeO O O O N O n O H x y Photochemical crosslinkable group Photochemical crosslinkable group N3
  • 60. 2. Regularity 2. Regularity PEG PS * new block copolymer PEG-PSt substrate Spin Spin copolymer substrate copolymer hν hν X-linked PS X-link azides X-link azides TBAH TBAH substrate Removes PEG Removes PEG -- NO RANDOM copolymer NO RANDOM copolymer -- Normal Photoresist developer Normal Photoresist developer
  • 61. 2. Regularity 2. Regularity PEG PS * new block copolymer PEG-PSt OH- OH- substrate Spin Spin copolymer substrate copolymer Sharp Sharp Interfaces Interfaces O MeO O O O OH- n O O PSt MeO O O O n O O PSt NO degradation NO degradation MeO O O n O O O PSt MeO O O O PSt NO Template NO Template MeO O n O O O O n O O PSt MeO O O O PSt Ester groups are not n O O Ester groups are not MeO O O n O O O PSt sufficiently available for hydrolysis sufficiently available for hydrolysis MeO O O n O O PSt
  • 62. Improving Long Range Order Improving Long Range Order PS-b-PMMA: long-range order Make Triblock Make Triblock Copolymer Copolymer PS PEO PMMA PS-b-PEO: degradability UV irradiation UV irradiation Nanoporous films with arrays of well-ordered nanopores
  • 63. ABC Triblock Copolymers ABC Triblock Copolymers Bring richer nanostructures and unique Bring richer nanostructures and unique properties to Block Copolymer Lithography properties to Block Copolymer Lithography
  • 64. PEO-PMMA-PSt triblock copolymer PEO-PMMA-PSt triblock copolymer PS PEO PMMA Different Morphologies
  • 65. Synthesis of Triblocks Synthesis of Triblocks DCC, DPTS DMAP O O OH O n O Br Br OH O n O S MgBr + CS2 S- O Synthesis of Synthesis of O S O n PEG-macroinitiator PEG-macroinitiator S
  • 66. Synthesis of Triblocks Synthesis of Triblocks O O O S O O S OMe O n m O n S AIBN, Benzene O S 70 oC O Benzene 70 oC O O S O n m p O S PEG-triblocks PEG-triblocks O Mn (PSt) = 40K; Mn (PMMA) = 12K; Mn (PEO) = 5K Mn (ABC) = 57K; PDI = 1.08
  • 67. Characterization of Triblocks Characterization of Triblocks O b NMR c O S O n a PEG-macroinitiator S b c a O O S O m p n O S PEG-triblock O 100 % functionality of the end group SEC PEO-PMMA-PS (5k-1.5k-13.5k) Narrow distribution (Mn/Mw < 1.1) PEO-PMMA (5k-1.5k) PEO (5k) 12 13 14 15 16 17 18 Elution time (min)
  • 68. Low MW PMMA High MW PMMA PEO Crystals Separate Separate PEO Crystals PMMA/PEO PMMA/PEO domains domains Amorphous Amorphous PEO too short PEO too short PMMA/PEO PMMA/PEO to crystallize to crystallize blend blend No PORES No PORES PORES PORES ** Nature of nanostructure critical for function
  • 69. Porous Block Copolymer Templates Porous Block Copolymer Templates AFM AFM TEM TEM PEO(5K)-PMMA(6K)-PS(32K) 400 nm 200 nm Pores traverse completely through film
  • 70. Regularity Regularity Current Photolithographic- ca. 50-100 nm Decrease Size/Maintain Regularity Decrease Size/Maintain Regularity Storage Applications, Microelectronics, Photovolatics Storage Applications, Microelectronics, Photovolatics
  • 71. Market leader in Holographic Storage Market leader in Holographic Storage Holographic drive Holographic disc (tapestry™300r) 20MB/s transfer rate 1.5 mm recording material WORM recording format 130 mm diameter disk 405 nm laser wavelength 50 year archive life $18,000.00 Capacity = 300GB native $180.00 • Inphase Technologies, Longmont, Colorado 80501, USA
  • 72. 2-Stage Chemistry for InPhase System 2-Stage Chemistry for InPhase System SH OH OH O SH O O O O HS O O O HO O HO O O O n O n OH O OH S HS O S O n Matrix precursor I n HO O HO O epoxy matrix O O Hologram O S O O formation recording S O O S O O O O O O S O OH O O n OH O S O O S HO O Matrix precursor II HO n O n O O O OH O OH O n n HO Monomer HO Monomer Initial Formulation Holographic Disc Data Storage
  • 73. Merit and Drawbacks of InPhase Technology Merit and Drawbacks of InPhase Technology Advantages + High sensitivity + High storage capacity Disadvantages - Shrinkage of the material due to monomer diffusion image distortion - Polymerization inhibition due to oxygen and other inhibitors - Need of pre-exposure to remove inhibitors dynamic range reduction - Phase separation if the resulting polymer is not compatible with the matrix material low archival-life - low thermal stability of the material low shelf-life ….holographic data storage is in aapeculiar situation: Research on recording devices and recording ….holographic data storage is in peculiar situation: Research on recording devices and recording schemes has far progressed further than the development of the required materials; they constitute schemes has far progressed further than the development of the required materials; they constitute aabottleneck for the development of the technology…. bottleneck for the development of the technology…. Stephan J. Zilker (CHEMPHYSCHEM, 2002, 3, 333) Stephan J. Zilker (CHEMPHYSCHEM, 2002, 3, 333)
  • 74. Quantum Amplification Approach to Holography hν Hexamethyl Dewar benzene Hexamethyl benzene Photoinduced isomerization leads to change in the electronic structure and the geometry of the molecule + No new bonds are forming No shrinkage + One photon isomerizes more than one dewar benzene high sensitivity + No developing step needed Evans, T. R.; Wake, R. W.; Sifain, M. M.; Tetrahedron Lett. 1973, 9, 701.
  • 75. Performance Comparison Performance Comparison 50 60 50 diffraction efficiency (%) 40 diffraction efficiency (%) 40 30 407 OFF 30 20 407 ON 20 Inphase UCSB 10 10 120 sec , 42% 40 sec , 55% 0 0 0 50 100 150 200 -10 0 10 20 30 40 50 60 70 80 90 100 time (sec) time (sec) *** Holographic Speed and Efficiency is comparable
  • 76. Angular Selectivity Angular Selectivity 2.0 60 1.8 diffraction efficiency (%) 50 1.6 1.4 40 1.2 30 1.0 0.8 20 0.6 10 0.4 0 0.2 0.0 20 22 24 26 28 30 32 20 22 24 26 28 30 32 angular selectivity (degrees) angular selectivity (degrees) * High diffraction efficiency * Well-defined nulls * Can store large amounts of information
  • 77. Angular Multiplicity Angular Multiplicity 3.0 8 7 2.5 diffraction efficiency (%) 6 2.0 Cumulative M/# 5 1.5 4 3 1.0 2 0.5 1 0 0.0 12 16 20 24 28 32 36 0 50 100 150 200 250 300 350 400 2 Cumulative Exposure Energy (mJ/cm ) angular selectivity (degrees) each hologram was recorded by 6 sec exposure to the writing beams sharpness and symmetry of the curves indicate the high resolution that can be achieved by QAI Gen II (UCSB) imaging system *** Comparable performance to InPhase – simplified processing *** Comparable performance to InPhase – simplified processing
  • 78. Shelf-life comparison Shelf-life comparison 3.0 2.5 2.0 M/# 2 weeks 1.5 2 weeks 1.0 0.5 0.0 0 2 4 6 8 10 12 time (weeks) Photopolymer QAI System (UCSB) 80% decrease in storage No change in storage capacity capacity after 2 weeks of formulation after 12+ weeks of formulation (Chem. Mater. 2000, 12, 1431)
  • 79. Conclusions Conclusions * * Efficient chemical transformations are Efficient chemical transformations are important in the design of new materials important in the design of new materials * * For either microelectronic, data storage and For either microelectronic, data storage and energy applications – must control structure energy applications – must control structure – different structures give different performance – different structures give different performance
  • 80. Thanks!!! Thanks!!! UCSB – Luis Campos, Jasmine Hunt, Nalini Gupta, Kenichi UCSB – Luis Campos, Jasmine Hunt, Nalini Gupta, Kenichi Fukukawa, Eric Pressly, Ashley Mynar, Ben Messmore, Eic Fukukawa, Eric Pressly, Ashley Mynar, Ben Messmore, Eic Drockenmuller, Chuanbing Tang, Joona Bang, Matt Kade, Katie Drockenmuller, Chuanbing Tang, Joona Bang, Matt Kade, Katie Schaefer, Ed Kramer. Schaefer, Ed Kramer. WUStL – Karen Wooley, Mike Welch, Dan Schuster, Dana WUStL – Karen Wooley, Mike Welch, Dan Schuster, Dana Abendschein, Carolyn Anderson, Raffa Rossin, Ashley Fiamengo, Abendschein, Carolyn Anderson, Raffa Rossin, Ashley Fiamengo, Amir Hagoolya. Amir Hagoolya. UMASS --Seung Hyun Kim, Joonwon Bae, Matthew J. Misner, UMASS Seung Hyun Kim, Joonwon Bae, Matthew J. Misner, Tom Russell Tom Russell Stanford --Marissa Caldwell, Li-Wen Chang, H.-S. Philip Wong Stanford Marissa Caldwell, Li-Wen Chang, H.-S. Philip Wong Eindhoven – Jos Paulusse, Bert Meijer Eindhoven – Jos Paulusse, Bert Meijer