1. Facilitation Center for Industrial Plasma Technologies
Institute for Plasma Research (An Autonomous Institute of DAE, Govt. of India)
ISO 9000:2001 Center
A Brief Overview of FCIPT
Project Leader: Dr. S. Mukherjee (mukherji@ipr.res.in)
Established by Institute for Plasma Research in 1997
Dedicated to environment friendly industrial plasma applications
Concept to Commercialization Approach
Transfers IPR’s knowledgebase to benefit Indian industries: plasma processes, instrumentation
development & technology transfer
Transferred Plasma Pyrolysis (for Hospital Waste) to M/S Bhagwati Pyrocast (Ahmedabad) & Plasma
Nitriding to M/S Milman Thin Films (Pune)
2. FCIPT and It’s Competence
Surface Environment Modelling * Contract Technology
Service (Processes,
Engg. Remediation Research Development
Devices, &
Life time prediction
Dielectric
Plasma Plasma
PECVD Barrier
Nitriding Pyrolysis
Discharge
Instrumentation
Plasma Process
PSII & plasma
Etching Development
sources
Material
Analysis
Jobbing &
Demonstration
3. Low Pressure Industrial Application of Plasmas
(also known as Plasma Surface Eng.)
Modification Modification
on surface below surface
SURFACE
•PEPVD
•PECVD •Nitriding
•Etching •Implantation
4. Plasma Etching
Application in Angora fiber processing and water filter surface activation
Angora Rabbit At Kullu, world’s first Atm. Plasma Treated Plant
Untreated
Atm. Plasma Treated
Untreated Fiber After Air plasma treatment
5. Plasma Etching –Water Filter Surface Activation
Carbon water filters –
air plasma surface
activation for inducing
hydrophilicity on final
products
6. Plasma Enhanced Deposition
Formation of Thin Films in an Env. Friendly way
Development of SiOx coating for various applications
using HMDSO precursor in RF Capacititive plasma
7. Plasma nitriding, Plasma
Silicon oxy-nitride -
source ion implantation,
Antireflection coating
Plasma polymerization,
for solar cells,
thermal plasma for
decorative coatings
ceramic powder
treatments
Role in Materials,
processes &
technology
development
Welding (Cu-SS) and
Protective ‘Silicon
brazing joints (Cu-W,
oxynitride’ coating
Cu-Graphite etc.) for
using PECVD on large
Tokamak and other
size ((35 cm X 35 cm)
applications
silver mirrors
8. Plasma Surface Modification for making
Skin Mimics for testing P&G Products
A Confidential Project
Major Steps to make Skin Mimics
1. Polymer Casting to make base of skin mimic
2. Plasma Processing to create Wet / Dry skin mimic
3. QC Check for the produced skin mimic
4. Packing & Dispatch of Skin Mimics
QC Standards are followed very strictly from Raw Material to Final Product to
ensure High Quality Service to valuable customers
1. Raw Polymer Liquid – Viscosity Measurement
2. Plasma Process – Uniformity for thickness & surface chemistry: Surface Energy Measurement
3. Mimic Hardness – Durometer for Shore A hardness
4. Mimic Transparency – L a b Values
5. Wet / Dry Property – Surface Energy Measurement
6. Surface Chemistry – XPS Analysis
9. Plasma Nitriding
Increasing Life of Industrial Components
Sectors Benefiting:
- Plastic molds
- Auto-components
- Aerospace
- Space research
- Defence
- Textile component
- Brass dies
- Hydropower
Hot wall Plasma Nitriding reactors Technology Transferred to
∅
(∅ 1500 mm x 1000 mm); reactors M/s Milman Thinfilm Systems
Pvt. Ltd., Pune, India for
can be stacked on top of each other commercialization
10. Plasma Nitriding – Various Applications
Crankshafts Guide Vanes Automatic gear box parts
Plasma Nitriding Reactors built by our Tech. Transfer Partner
M/s Milman Thin Films (PUNE)
NBC, BIT, FCIPT @
Jaipur
IGTR, GUJCOST,
FCIPT @ Ahmedabad
11. Plasma Immersion Ion Implantation
Non-thermodynamic incorporation of elements
Bias = upto -20 kV
Fluence = upto 1018/cm2 Cross-sectional SEM: -20 kV nitrogen PIII of
AISI316. The expanded austenite thickness ~ 8
Gas = N2, Ar, O2, CH4, H2 microns has higher hardness without loosing
corrosion resistance.
Temperature = upto 550 C
Processing time = upto 24 hrs
Pulse = IGBT / Tetrode
12. Plasma Source Ion Implantation in India
At FCIPT; gaseous ion implantation (-20 kV)
At IIT- Kgp ionImplantation (-
20 kV)
At FCIPT; multi metal deposition &
implantation (-5 kV)
13. Plasma Deposition - Cu coating on Polycarbonate
B Magnetron
E
EXB
Poly
mer
surf
ace
Cu Sample Holder
Magnetic Field Coils
Physical Vapour Dep.
Sputter = Copper
P = 10 microbar
Gas = Argon
Sputter bias = -800 V
Substrate bias = pulsed
30 cm – 1 kV
14. Plasma Deposition - Teflon coating on steel
Untreated SS surface Teflon coated SS surface
Chemical Vapour Deposition
Gas: CF2 containing precursors
Pressure: 10 microbar
Substrate bias: RF (13.56 MHz), develops negative self bias which enhances
ion bombardment
15. Coatings for fusion Applications
• Indian TBM – LLCB involves liquid + solid breeder design
• T permeation, liquid metal corrosion & MHD drag are core issues
• Alumindes with a top alulmina coating are considered candidate coatings for TBM
• Process optimization under progress for hot dip aluminized coatings
3000
100 ● αFe
90 2500
BSE Image Al
80 Fe2Al5
Al ●
70 2000
Wt% Concentration
Intensity (cps)
Fe
60
1500
50 ●
40
1000
30
SE Image
20
Al 500
10 ●
0
Steel
0
20 40 60 80 100
0 50 100 150 200 250
Case Depth (m icrons) 2 Theta (degree)
17. Plasma Pyrolysis
Eco-Friendly Waste Remediation Technology
• Thermal decomposition of
carbonaceous material (using
atmospheric pressure Plasma) in
the absence of oxygen.
• Heat causes the molecules to
disintegrate during pyrolysis
and leads to fragmentation of
compounds.
Useful to destroy:
• Medical waste & Plastic waste
• Municipal Solid waste
• Toxic Chemical waste
• Contaminated PVC waste
• Hazardous waste
18. Plasma Pyrolysis
Eco-Friendly Waste Remediation Technology
Features:
• Complete destruction of waste
• Free from NOx and dioxin
emissions
• Negligible bottom ash
• Destroys pathogens by UV
radiation.
• Low manpower requirement
• ENVIRONMENT FRIENDLY
SYSTEM
• Provisions for generation of
ELECTRICITY from waste
Fig: Plasma Pyrolysis system installed at Goa
Medical College, Goa, India.
Plasma Pyrolysis Technology for We are installing this system at 10 different
Medical waste disposal transferred to locations across India
M/s Bhagwati Pyrotech Pvt. Ltd.,
A’bad, for commercialization. Volume minimization of low level nuclear waste
is being developed alongwith BARC
19. Features
Graphite Arc based Plasma Pyrolysis System
Developed at FCIPT
• Graphite plasma torch
• Continuous operation
• No heat losses due to cooling
of torch electrodes
• Proper refractory lining to
minimize heat losses
• Secondary chamber with
special design to reduce soot
particles
20. Future Activities of FCIPT
1. WASTE MANAGEMENT
- Energy recovery from waste
- Safe disposal of variety of waste streams ( E-Waste)
2. SURFACE ENGINEERING and Modifications
- Development of large coatings facilities
- Plasma Nitrocarburizing & Carburizing
- Plasma Etching & Textile Applications
- Industrial Scale Systems Development
3. PLASMA DEVICES
- Pulsed plasma thruster
- Plasma diagnostic tools (probes, RPA)
4. POPULARIZING EXPERIMENTAL PLASMA SCIENCE RESEARCH IN INDIA
21. FCIPT (IPR) & PLASMA PROCESSING
In INDIA
IPR, GANDHINAGAR
Plasma Nitriding
Plasma Implantation
PYROLYSIS
Thin Films
Plasma
Instrumentation