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Facilitation Center for Industrial Plasma Technologies
Institute for Plasma Research (An Autonomous Institute of DAE, Govt. of India)
                                 ISO 9000:2001 Center
                                              A Brief Overview of FCIPT




           Project Leader: Dr. S. Mukherjee (mukherji@ipr.res.in)
Established by Institute for Plasma Research in 1997
Dedicated to environment friendly industrial plasma applications
Concept to Commercialization Approach
Transfers IPR’s knowledgebase to benefit Indian industries: plasma processes, instrumentation
development & technology transfer
Transferred Plasma Pyrolysis (for Hospital Waste) to M/S Bhagwati Pyrocast (Ahmedabad) & Plasma
Nitriding to M/S Milman Thin Films (Pune)
FCIPT and It’s Competence

                Surface       Environment         Modelling *            Contract    Technology
Service                                            (Processes,
                 Engg.        Remediation                                Research   Development
                                                   Devices, &
                                               Life time prediction
                                      Dielectric
    Plasma                 Plasma
                PECVD                  Barrier
    Nitriding             Pyrolysis
                                      Discharge
                                                                Instrumentation
                Plasma                                                                Process
      PSII                                                          & plasma
                Etching                                                             Development
                                                                     sources




          Material
          Analysis

       Jobbing &
     Demonstration
Low Pressure Industrial Application of Plasmas
          (also known as Plasma Surface Eng.)


                        Modification     Modification
                        on surface       below surface


SURFACE

                        •PEPVD
                        •PECVD           •Nitriding
                        •Etching         •Implantation
Plasma Etching
 Application in Angora fiber processing and water filter surface activation
Angora Rabbit              At Kullu, world’s first Atm. Plasma Treated Plant




 Untreated




Atm. Plasma Treated




                              Untreated Fiber      After Air plasma treatment
Plasma Etching –Water Filter Surface Activation



                              Carbon water filters –
                              air     plasma   surface
                              activation for inducing
                              hydrophilicity on final
                              products
Plasma Enhanced Deposition
Formation of Thin Films in an Env. Friendly way




Development of SiOx coating for various applications
 using HMDSO precursor in RF Capacititive plasma
Plasma nitriding, Plasma
                                                Silicon oxy-nitride -
source ion implantation,
                                                Antireflection coating
Plasma polymerization,
                                                for solar cells,
thermal plasma for
                                                decorative coatings
ceramic powder
treatments


                           Role in Materials,
                              processes &
                              technology
                             development




                                                Welding (Cu-SS) and
Protective ‘Silicon
                                                brazing joints (Cu-W,
oxynitride’ coating
                                                Cu-Graphite etc.) for
using PECVD on large
                                                Tokamak and other
size ((35 cm X 35 cm)
                                                applications
silver mirrors
Plasma Surface Modification for making
           Skin Mimics for testing P&G Products
                                 A Confidential Project

                           Major Steps to make Skin Mimics
 1.     Polymer Casting to make base of skin mimic
 2.     Plasma Processing to create Wet / Dry skin mimic
 3.     QC Check for the produced skin mimic
 4.     Packing & Dispatch of Skin Mimics

      QC Standards are followed very strictly from Raw Material to Final Product to
                   ensure High Quality Service to valuable customers
1.     Raw Polymer Liquid – Viscosity Measurement
2.     Plasma Process – Uniformity for thickness & surface chemistry: Surface Energy Measurement
3.     Mimic Hardness – Durometer for Shore A hardness
4.     Mimic Transparency – L a b Values
5.     Wet / Dry Property – Surface Energy Measurement
6.     Surface Chemistry – XPS Analysis
Plasma Nitriding
    Increasing Life of Industrial Components

                                         Sectors Benefiting:

                                         - Plastic molds
                                         - Auto-components
                                         - Aerospace
                                         - Space research
                                         - Defence
                                         - Textile component
                                         - Brass dies
                                         - Hydropower
Hot wall Plasma Nitriding reactors    Technology Transferred to
 ∅
(∅ 1500 mm x 1000 mm); reactors       M/s Milman Thinfilm Systems
                                      Pvt. Ltd., Pune, India for
can be stacked on top of each other   commercialization
Plasma Nitriding – Various Applications




      Crankshafts               Guide Vanes        Automatic gear box parts
Plasma Nitriding Reactors built by our Tech. Transfer Partner
M/s Milman Thin Films (PUNE)
                    NBC, BIT, FCIPT @
                    Jaipur




                    IGTR, GUJCOST,
                    FCIPT @ Ahmedabad
Plasma Immersion Ion Implantation
                     Non-thermodynamic incorporation of elements




Bias = upto -20 kV
Fluence = upto 1018/cm2                   Cross-sectional SEM: -20 kV nitrogen PIII of
                                          AISI316. The expanded austenite thickness ~ 8
Gas = N2, Ar, O2, CH4, H2                 microns has higher hardness without loosing
                                          corrosion resistance.
Temperature = upto 550 C
Processing time = upto 24 hrs
Pulse = IGBT / Tetrode
Plasma Source Ion Implantation in India
At FCIPT; gaseous ion implantation (-20 kV)
                                              At IIT- Kgp ionImplantation (-
                                              20 kV)




At FCIPT; multi metal deposition &
implantation (-5 kV)
Plasma Deposition - Cu coating on Polycarbonate

       B                              Magnetron
           E
    EXB

                           Poly
                           mer
                           surf
                           ace




Cu Sample Holder
                   Magnetic Field Coils


                                                  Physical Vapour Dep.
                                                  Sputter = Copper
                                                  P = 10 microbar
                                                  Gas = Argon
                                                  Sputter bias = -800 V
                                                  Substrate bias = pulsed
    30 cm                                                              – 1 kV
Plasma Deposition - Teflon coating on steel




        Untreated SS surface             Teflon coated SS surface

Chemical Vapour Deposition
Gas: CF2 containing precursors
Pressure: 10 microbar
Substrate bias: RF (13.56 MHz), develops negative self bias which enhances
ion bombardment
Coatings for fusion Applications


                          •       Indian TBM – LLCB involves liquid + solid breeder design
                          •       T permeation, liquid metal corrosion & MHD drag are core issues
                          •       Alumindes with a top alulmina coating are considered candidate coatings for TBM
                          •       Process optimization under progress for hot dip aluminized coatings




                                                                                                                             3000

                    100                                                                                                                                                   ● αFe
                     90                                                                                                      2500
                                                                                               BSE Image                                                                      Al
                     80                                                                                                                                                       Fe2Al5
                                                                             Al                                                                               ●
                     70                                                                                                      2000
Wt% Concentration




                                                                                                           Intensity (cps)
                                                                             Fe
                     60
                                                                                                                             1500
                     50                                                                                                                       ●
                     40
                                                                                                                             1000
                     30
                                                                                               SE Image
                     20
                                                                                  Al                                         500
                     10                                                                                                                                                   ●

                      0
                                                                                       Steel
                                                                                                                               0
                                                                                                                                    20   40              60          80                100
                              0     50       100      150        200   250
                                         Case Depth (m icrons)                                                                                    2 Theta (degree)
Surface Science
Advanced Material Characterization Laboratory
Plasma Pyrolysis
                    Eco-Friendly Waste Remediation Technology

•  Thermal     decomposition    of
   carbonaceous material (using
   atmospheric pressure Plasma) in
   the absence of oxygen.
• Heat causes the molecules to
   disintegrate during pyrolysis
   and leads to fragmentation of
   compounds.
  Useful to destroy:
  • Medical waste & Plastic waste
  • Municipal Solid waste
  • Toxic Chemical waste
  • Contaminated PVC waste
  • Hazardous waste
Plasma Pyrolysis
                      Eco-Friendly Waste Remediation Technology

  Features:
  • Complete destruction of waste
  • Free from NOx and dioxin
      emissions
  • Negligible bottom ash
  • Destroys pathogens by UV
      radiation.
  • Low manpower requirement
  • ENVIRONMENT FRIENDLY
      SYSTEM
  • Provisions for generation of
      ELECTRICITY from waste
                                        Fig: Plasma Pyrolysis system installed at Goa
                                                 Medical College, Goa, India.

Plasma Pyrolysis Technology for       We are installing this system at 10 different
Medical waste disposal transferred to locations across India
M/s Bhagwati Pyrotech Pvt. Ltd.,
A’bad, for commercialization.         Volume minimization of low level nuclear waste
                                      is being developed alongwith BARC
Features
Graphite Arc based Plasma Pyrolysis System
Developed at FCIPT
                                             • Graphite plasma torch



                                             • Continuous operation


                                             • No heat losses due to cooling
                                             of torch electrodes


                                             • Proper refractory lining to
                                             minimize heat losses


                                             • Secondary chamber with
                                             special design to reduce soot
                                             particles
Future Activities of FCIPT
1.   WASTE MANAGEMENT
        -  Energy recovery from waste
        -  Safe disposal of variety of waste streams ( E-Waste)

2.   SURFACE ENGINEERING and Modifications
        -  Development of large coatings facilities
        -  Plasma Nitrocarburizing & Carburizing
        -  Plasma Etching & Textile Applications
        -  Industrial Scale Systems Development

3.   PLASMA DEVICES
        -  Pulsed plasma thruster
        -  Plasma diagnostic tools (probes, RPA)

4.   POPULARIZING EXPERIMENTAL PLASMA SCIENCE RESEARCH IN INDIA
FCIPT (IPR) & PLASMA PROCESSING
                      In   INDIA




IPR, GANDHINAGAR

                                         Plasma Nitriding

                                         Plasma Implantation

                                         PYROLYSIS
                                         Thin Films

                                         Plasma
                                         Instrumentation

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Fcipt Overview

  • 1. Facilitation Center for Industrial Plasma Technologies Institute for Plasma Research (An Autonomous Institute of DAE, Govt. of India) ISO 9000:2001 Center A Brief Overview of FCIPT Project Leader: Dr. S. Mukherjee (mukherji@ipr.res.in) Established by Institute for Plasma Research in 1997 Dedicated to environment friendly industrial plasma applications Concept to Commercialization Approach Transfers IPR’s knowledgebase to benefit Indian industries: plasma processes, instrumentation development & technology transfer Transferred Plasma Pyrolysis (for Hospital Waste) to M/S Bhagwati Pyrocast (Ahmedabad) & Plasma Nitriding to M/S Milman Thin Films (Pune)
  • 2. FCIPT and It’s Competence Surface Environment Modelling * Contract Technology Service (Processes, Engg. Remediation Research Development Devices, & Life time prediction Dielectric Plasma Plasma PECVD Barrier Nitriding Pyrolysis Discharge Instrumentation Plasma Process PSII & plasma Etching Development sources Material Analysis Jobbing & Demonstration
  • 3. Low Pressure Industrial Application of Plasmas (also known as Plasma Surface Eng.) Modification Modification on surface below surface SURFACE •PEPVD •PECVD •Nitriding •Etching •Implantation
  • 4. Plasma Etching Application in Angora fiber processing and water filter surface activation Angora Rabbit At Kullu, world’s first Atm. Plasma Treated Plant Untreated Atm. Plasma Treated Untreated Fiber After Air plasma treatment
  • 5. Plasma Etching –Water Filter Surface Activation Carbon water filters – air plasma surface activation for inducing hydrophilicity on final products
  • 6. Plasma Enhanced Deposition Formation of Thin Films in an Env. Friendly way Development of SiOx coating for various applications using HMDSO precursor in RF Capacititive plasma
  • 7. Plasma nitriding, Plasma Silicon oxy-nitride - source ion implantation, Antireflection coating Plasma polymerization, for solar cells, thermal plasma for decorative coatings ceramic powder treatments Role in Materials, processes & technology development Welding (Cu-SS) and Protective ‘Silicon brazing joints (Cu-W, oxynitride’ coating Cu-Graphite etc.) for using PECVD on large Tokamak and other size ((35 cm X 35 cm) applications silver mirrors
  • 8. Plasma Surface Modification for making Skin Mimics for testing P&G Products A Confidential Project Major Steps to make Skin Mimics 1. Polymer Casting to make base of skin mimic 2. Plasma Processing to create Wet / Dry skin mimic 3. QC Check for the produced skin mimic 4. Packing & Dispatch of Skin Mimics QC Standards are followed very strictly from Raw Material to Final Product to ensure High Quality Service to valuable customers 1. Raw Polymer Liquid – Viscosity Measurement 2. Plasma Process – Uniformity for thickness & surface chemistry: Surface Energy Measurement 3. Mimic Hardness – Durometer for Shore A hardness 4. Mimic Transparency – L a b Values 5. Wet / Dry Property – Surface Energy Measurement 6. Surface Chemistry – XPS Analysis
  • 9. Plasma Nitriding Increasing Life of Industrial Components Sectors Benefiting: - Plastic molds - Auto-components - Aerospace - Space research - Defence - Textile component - Brass dies - Hydropower Hot wall Plasma Nitriding reactors Technology Transferred to ∅ (∅ 1500 mm x 1000 mm); reactors M/s Milman Thinfilm Systems Pvt. Ltd., Pune, India for can be stacked on top of each other commercialization
  • 10. Plasma Nitriding – Various Applications Crankshafts Guide Vanes Automatic gear box parts Plasma Nitriding Reactors built by our Tech. Transfer Partner M/s Milman Thin Films (PUNE) NBC, BIT, FCIPT @ Jaipur IGTR, GUJCOST, FCIPT @ Ahmedabad
  • 11. Plasma Immersion Ion Implantation Non-thermodynamic incorporation of elements Bias = upto -20 kV Fluence = upto 1018/cm2 Cross-sectional SEM: -20 kV nitrogen PIII of AISI316. The expanded austenite thickness ~ 8 Gas = N2, Ar, O2, CH4, H2 microns has higher hardness without loosing corrosion resistance. Temperature = upto 550 C Processing time = upto 24 hrs Pulse = IGBT / Tetrode
  • 12. Plasma Source Ion Implantation in India At FCIPT; gaseous ion implantation (-20 kV) At IIT- Kgp ionImplantation (- 20 kV) At FCIPT; multi metal deposition & implantation (-5 kV)
  • 13. Plasma Deposition - Cu coating on Polycarbonate B Magnetron E EXB Poly mer surf ace Cu Sample Holder Magnetic Field Coils Physical Vapour Dep. Sputter = Copper P = 10 microbar Gas = Argon Sputter bias = -800 V Substrate bias = pulsed 30 cm – 1 kV
  • 14. Plasma Deposition - Teflon coating on steel Untreated SS surface Teflon coated SS surface Chemical Vapour Deposition Gas: CF2 containing precursors Pressure: 10 microbar Substrate bias: RF (13.56 MHz), develops negative self bias which enhances ion bombardment
  • 15. Coatings for fusion Applications • Indian TBM – LLCB involves liquid + solid breeder design • T permeation, liquid metal corrosion & MHD drag are core issues • Alumindes with a top alulmina coating are considered candidate coatings for TBM • Process optimization under progress for hot dip aluminized coatings 3000 100 ● αFe 90 2500 BSE Image Al 80 Fe2Al5 Al ● 70 2000 Wt% Concentration Intensity (cps) Fe 60 1500 50 ● 40 1000 30 SE Image 20 Al 500 10 ● 0 Steel 0 20 40 60 80 100 0 50 100 150 200 250 Case Depth (m icrons) 2 Theta (degree)
  • 16. Surface Science Advanced Material Characterization Laboratory
  • 17. Plasma Pyrolysis Eco-Friendly Waste Remediation Technology • Thermal decomposition of carbonaceous material (using atmospheric pressure Plasma) in the absence of oxygen. • Heat causes the molecules to disintegrate during pyrolysis and leads to fragmentation of compounds. Useful to destroy: • Medical waste & Plastic waste • Municipal Solid waste • Toxic Chemical waste • Contaminated PVC waste • Hazardous waste
  • 18. Plasma Pyrolysis Eco-Friendly Waste Remediation Technology Features: • Complete destruction of waste • Free from NOx and dioxin emissions • Negligible bottom ash • Destroys pathogens by UV radiation. • Low manpower requirement • ENVIRONMENT FRIENDLY SYSTEM • Provisions for generation of ELECTRICITY from waste Fig: Plasma Pyrolysis system installed at Goa Medical College, Goa, India. Plasma Pyrolysis Technology for We are installing this system at 10 different Medical waste disposal transferred to locations across India M/s Bhagwati Pyrotech Pvt. Ltd., A’bad, for commercialization. Volume minimization of low level nuclear waste is being developed alongwith BARC
  • 19. Features Graphite Arc based Plasma Pyrolysis System Developed at FCIPT • Graphite plasma torch • Continuous operation • No heat losses due to cooling of torch electrodes • Proper refractory lining to minimize heat losses • Secondary chamber with special design to reduce soot particles
  • 20. Future Activities of FCIPT 1. WASTE MANAGEMENT - Energy recovery from waste - Safe disposal of variety of waste streams ( E-Waste) 2. SURFACE ENGINEERING and Modifications - Development of large coatings facilities - Plasma Nitrocarburizing & Carburizing - Plasma Etching & Textile Applications - Industrial Scale Systems Development 3. PLASMA DEVICES - Pulsed plasma thruster - Plasma diagnostic tools (probes, RPA) 4. POPULARIZING EXPERIMENTAL PLASMA SCIENCE RESEARCH IN INDIA
  • 21. FCIPT (IPR) & PLASMA PROCESSING In INDIA IPR, GANDHINAGAR Plasma Nitriding Plasma Implantation PYROLYSIS Thin Films Plasma Instrumentation