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NANO STRUCTURE
COATING
PRESENTED BY
KARTIKEY TRIVEDI
ROLL NO-1402940078
INTRODUCTION
• The Nano Structure films are the thin films which
are grown by deposition of pre formed cluster on a
substrate
• Grain size is of nanometre range, so material exhibit
interesting mechanical and physical property.
• Nano Structure Coating Composed of Phase mixture
which is used to improve physical and chemical
properties
• Coating are needed to prevent corrosion ,erosion
and also provide thermal insulation.
OBJECTIVE
PROCESS
• MAGNETRON SPUTTERING
• SOL-GEL METHOD
• ELECTRON BEAM VAPOUR DEPOSITION
• ELECTROPLATING
• PLASMA SPRAY
• LASER DEPOSITION
MAGNETRON SPUTTERING
• It is most commonly used method for sputter
deposition
• It uses powerful magnets to confine the glow
discharge
• The electron follow the helical path
around the magnetic field lines
• The sputtered atoms are neutrally
charged and so are unaffected
by magnetic trap
SOL-GEL METHOD
• It is a wet chemical technique
• Metal alkoxides and metal chlorides are typical
precursors
• Formation of metal oxide involves connecting the
metal centres with Oxo or Hydroxo bridge
• Drying and calcination
ELECTRON BEAM VAPOUR DEPOSITION
• Electron beam is generated by
tungsten filament
• Material is placed in the
graphite crucible
• Target anode is bombarded with
an electron beam
• These atoms precipitate into
solid form of anode material
ELECTROPLATING
• The anode should be
made from the same
material as the
electroplating metal
• The substrate is to be
made cathode
• Electrolyte must contain
ions of electroplating
metal
PLASMA SPRAY
• plasma spray gun comprises a copper anode and
tungsten cathode
• Coating material is fed in the form of powder
• Molten metal is transfer with a high velocity and
provide a coating
LASER DEPOSITION
• A high-power pulsed laser is focused on the target
• It has high deposition rate
• The challenge in this method to minimize the
particulate formation
PROCESS BARRIERS
• Material Availability
• Process Productivity
• Material and Manufacturing cost
• Thermal stability
• Multi lot properties data
APPROACH TO OVERCOME
BARRIER
• Application driven research
• Choice of processing parameter
• Selection of material and deposition
parameter
• Establishment of scientific drivers
ADVANTAGE
• Wear Resistance
• Thermal barrier
• Erosion resistance
• Crack resistance
APPLICATION
• AUTOMOTIVE INDUSTRIES
• AVIATION INDUSTRIES
• TURBINE BLADES
• SOLER CELL
REFERENCES
• http://www.wtec.org/loyola/nano/us_r_n_d
• Wadley research group. University of Virginia
Thank You

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SEMINAR NANO_STRUCTURE_COATING[1].pptx

  • 1. NANO STRUCTURE COATING PRESENTED BY KARTIKEY TRIVEDI ROLL NO-1402940078
  • 2. INTRODUCTION • The Nano Structure films are the thin films which are grown by deposition of pre formed cluster on a substrate • Grain size is of nanometre range, so material exhibit interesting mechanical and physical property.
  • 3. • Nano Structure Coating Composed of Phase mixture which is used to improve physical and chemical properties • Coating are needed to prevent corrosion ,erosion and also provide thermal insulation. OBJECTIVE
  • 4. PROCESS • MAGNETRON SPUTTERING • SOL-GEL METHOD • ELECTRON BEAM VAPOUR DEPOSITION • ELECTROPLATING • PLASMA SPRAY • LASER DEPOSITION
  • 5. MAGNETRON SPUTTERING • It is most commonly used method for sputter deposition • It uses powerful magnets to confine the glow discharge • The electron follow the helical path around the magnetic field lines • The sputtered atoms are neutrally charged and so are unaffected by magnetic trap
  • 6. SOL-GEL METHOD • It is a wet chemical technique • Metal alkoxides and metal chlorides are typical precursors • Formation of metal oxide involves connecting the metal centres with Oxo or Hydroxo bridge • Drying and calcination
  • 7. ELECTRON BEAM VAPOUR DEPOSITION • Electron beam is generated by tungsten filament • Material is placed in the graphite crucible • Target anode is bombarded with an electron beam • These atoms precipitate into solid form of anode material
  • 8. ELECTROPLATING • The anode should be made from the same material as the electroplating metal • The substrate is to be made cathode • Electrolyte must contain ions of electroplating metal
  • 9. PLASMA SPRAY • plasma spray gun comprises a copper anode and tungsten cathode • Coating material is fed in the form of powder • Molten metal is transfer with a high velocity and provide a coating
  • 10. LASER DEPOSITION • A high-power pulsed laser is focused on the target • It has high deposition rate • The challenge in this method to minimize the particulate formation
  • 11. PROCESS BARRIERS • Material Availability • Process Productivity • Material and Manufacturing cost • Thermal stability • Multi lot properties data
  • 12. APPROACH TO OVERCOME BARRIER • Application driven research • Choice of processing parameter • Selection of material and deposition parameter • Establishment of scientific drivers
  • 13. ADVANTAGE • Wear Resistance • Thermal barrier • Erosion resistance • Crack resistance
  • 14. APPLICATION • AUTOMOTIVE INDUSTRIES • AVIATION INDUSTRIES • TURBINE BLADES • SOLER CELL

Editor's Notes

  1. Light amplification stimulated emission of radiation
  2. Hydrolysis and polycondensate reaction calcination –thermal treatment
  3. Atoms are transfer in gaseous phase
  4. To make plume of the atoms