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Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
     International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
               www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
Electrochemical Behaviour of AA6063 Alloy in Hydrochloric Acid
      using Schiff Base Compounds as Corrosion Inhibitors.

    Sanaulla Pathapalya Fakrudeen*, Lokesh H. B**, Ananda Murthy H. C***,
                            Bheema Raju V. B****.
*
 Department of Engineering Chemistry, HKBK College of Engineering, Nagawara, Bangalore Karnataka, India
  **
     Department of Engineering Chemistry, Vivekananad Institute of Technology, , Bangalore-Karnataka, India.
                  ***
                     Department of Engineering Chemistry, R N Shetty Institute of Technology,
                                         Bangalore, Karnataka, India.
****
     Department of Engineering Chemistry, Dr. Ambedkar Institute of Technology,, Bangalore , Karnataka, India.



ABSTRACT
         The electrochemical behavior of                   however, are reactive materials and are prone to
aluminium alloy AA6063 were investigated                   corrosion. A strong adherent and continuous
using Schiff base compounds namely N, N’-bis               passive oxide film is developed on Al upon
(Salicylidene)-1, 4-Diaminobutane (SDB) and                exposure to aqueous solutions. This surface film is
N, N’-bis (3-Methoxy Salicylidene)-1, 4                    amphoteric and dissolves when the metal is
Diaminobutane (MSDB) as corrosion inhibitors               exposed to high concentrations of acids or bases
in presence of 1M Hydrochloric Acid by weight              [1]. Hydrochloric acid solutions are used for acid
loss,    Potentiodynamic        polarization(PDP),         cleaning,    acid     de-scaling,   chemical     and
electrochemical impedance spectroscopy(EIS)                electrochemical etching in many chemical process
and scanning electron microcopy (SEM).                     industries where in aluminium alloys are used. It is
Potentiodynamic polarization study revealed                very important to add corrosion inhibitors to
that the two Schiff bases acted as mixed type              prevent metal dissolution and minimize acid
inhibitors. The change in EIS parameters is                consumption [2]. Most of the efficient acid
indicative of adsorption of Schiff bases on                inhibitors are organic compounds that contain
aluminum alloys surface leading to formation of            mainly nitrogen, sulfur or oxygen atoms in their
protective layer. The weight loss study showed             structure. The choice of inhibitor is based on two
that the inhibition efficiency of these compounds          considerations: first it could be synthesized
increases with increase in concentration and               conveniently from relatively cheap raw materials;
vary with solution temperature and immersion               second, it contains the electron cloud on the
time. The various thermodynamic parameters                 aromatic ring or electronegative atoms such as
were also calculated to investigate the                    nitrogen, oxygen in relatively long-chain
mechanism of corrosion inhibition. The effect of           compounds. Numerous            organic substances
methoxy group on corrosion efficiency was                  containing polar functions with nitrogen, oxygen,
observed from the results obtained between                 and sulphur atoms and aromatic rings in a
SDB and MSDB. The effectiveness of these                   conjugated system have been reported as effective
inhibitors were in the order of MSDB>SDB. The              corrosion inhibitors for aluminium alloys [3-5].
adsorption of Schiff bases on AA6063 alloy                 Some Schiff bases have been reported earlier as
surface in acid obeyed Langmuir adsorption                 corrosion inhibitors for aluminum alloys [6-8], iron
isotherm. The surface characteristics of                   [9-10] and copper [11-12]. Compounds with π-
inhibited and uninhibited alloy samples were               bonds also generally exhibit good inhibitive
investigated by scanning electron microscopy               properties due to interaction of π orbital with metal
(SEM).                                                     surface. Schiff bases with RC = NR′ as general
                                                           formula have both the features combined with their
Keywords:     Electrochemical       techniques,            structure which may then give rise to particularly
Corrosion, Schiff base, Adsorption, Aluminum               potential inhibitors.
alloy.
                                                                    The present work is aimed at investigating
1. Introduction:                                           the inhibitive ability of two Schiff base molecules
         Corrosion of aluminum and its alloys has          on corrosion of AA6063 in 1M Hydrochloric acid
been a subject of numerous studies due to their            medium. The weight loss, potentiodynamic
high technological value and wide range of                 polarization and electrochemical impedance
industrial applications especially in aerospace and        techniques were employed to study inhibitive effect
house-hold industries. Aluminum and its alloys,            of two Schiff base molecules at different
                                                           concentrations. The effect of temperature,

                                                                                               2049 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
immersion time on corrosion behaviour of                   samples were cut into cylindrical test specimens
aluminium alloy was also studied in absence and            and moulded in cold setting Acrylic resin exposing
presence of inhibitor at various concentrations. For       a surface area of 1.0 cm2 for electrochemical
further confirmation aluminum alloy samples were           measurements. For weight loss experiments the
analyzed by scanning electron microscopic (SEM)            cylindrical alloy rods were cut into 24 mm dia x
technique.                                                 2mm length -circular cylindrical disc specimens
The inhibition effect of Schiff base compounds are         using an abrasive cutting wheel and a 2mm
reported on steel [13-14], Copper [15], and pure           mounting hole at the centre of the specimen was
aluminium and its alloys [16-19], in acidic                drilled. Before each experiment, the electrodes
medium. However, no substantial work has been              were abraded with a sequence of emery papers of
carried out on corrosion inhibition of aluminium           different grades (600, 800, and 1200), washed with
alloys in acidic medium by Schiff bases. Thus, it          double distilled water, degreased with acetone and
was thought worthwhile to study the corrosion              dried at 353 K for 30 min in a thermostated electric
inhibition effect of       Schiff base compounds           oven and stored in a moisture-free desiccator prior
namely      N,    Nʹ-bis      (Salicylidene)-1,   4-       to use. The corrosive medium selected for this
Diaminobutane (SDB) and N, Nʹ-bis (3-Methoxy               study was 1M hydrochloric acid, which was
Salicylidene)-1, 4 Diaminobutane (MSDB) on                 prepared from analytical grade 37 percent acid
AA6063 Alloy in 1M Hydrochloric acid medium.               concentrated (Merck ) in double distilled water.

2. Experimental
  2.1 Materials
         The alloy samples were procured from
M/S. Fenfe Metallurgical, Bangalore, India. The
typical chemical composition of AA6063 alloy in
weight percentage is shown in Table 1. The alloy

                               Table-1. Typical Chemical Composition of AA 6063

  Element      Cu       Mg        Si      Fe       Mn     Ti         Cr       Zn      Others     Al
  Wt.%         0.10     0.45 -    0.2 -   0.35     0.10   0.10       0.10     0.10    0.15       Reminder
                        0.90      0.6     Max      Max    Max        Max      Max     Max



2.2 Inhibitor.                                             melting points, Fourier transform infrared
         The Schiff Bases were prepared by the             spectroscopy (FT-IR) and Proton Nuclear Magnetic
condensation of respective aromatic aldehydes with         Resonance (1H NMR). The structure, molecular
each of diamines as per the reported procedure             formula, molecular mass, melting points are shown
[20]. All reagents used were of analytical grade           in Table-2.
procured       from     Sigma     Aldrich.    N,N'-
bis(Salicylidene)-1,4-Diaminobutane (SDB) was              N,N'-bis(Salicylidene)-1,4-Diaminobutane
prepared by slow addition of Salicylaldehyde (2            IR (KBr cm-1): 3400(OH), 3054(=C-H), 2903(-
mmol) in 30 mL methanol over a solution of 1,4-            CH), 1628(C=N).
                                                           1
diaminobutane (1mmol) in 30 mL methanol and                  HNMR (CDCl3): δ 1.79-1.82(t, 4H, -CH2CH2-), δ
N,N'-bis(3-MethoxySalicylidene)-1,4-
                                                           3.62-3.65(t, 4H, -CH2-N) 6.84–7.31 (m, 8H, ArH).
Diaminophenelyne (MSDB) by slow addition of
Methoxysalicylaldehyde (2 mmol) in 30 mL                   8.34(s, 2H, N=CH), 13.49 (s, 1H, OH),
methanol over a solution of 1,4-diaminobutane (1
                                                           N,N'-bis(3-Methoxy Salicylidene)-1,4-
mmol) in 30 mL methanol taken in a 250 mL
condensation flask. In each case, 2-3drops of acetic       Diaminobutane
acid was added to the mixture of aldehyde and
                                                           IR (KBr cm-1): 3429(OH), 2996(=C-H), 2932(-
diamine with stirring at constant temperature 25ºC
for 1 hour. Further the mixture was refluxed for 4-5       CH), 1628(C=N). 1253(-OCH3).
hours on a water bath, heating occasionally to             1
                                                            HNMR (CDCl3): δ 1.80-1.83(t, 4H, -CH2CH2-), δ
improve the yield of the product. The reaction
mixture was cooled to room temperature overnight               3.63-3.66(t, 4H, -CH2-N) δ 3.90(s, 6H, -OCH3),
and the colored compound was filtered off and
                                                           6.77–7.2 (m, 6H, ArH). 8.32(s, 2H, N=CH), 14.00
dried. The compounds were recrystallised with
ethanol. The product identity was confirmed via                                 (s, 1H, OH),


                                                                                               2050 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
                       Table-2. The structure, molecular formula, molecular mass, melting points

                        Structure and Name                               Molecular Formula             Molecular         Melting
                                                                                                        Mass              Point

              CH N          (CH2)4     N     CH
                                                                            C18H20N2O2                    296.36          89°C
           OH                                     HO
    N,N'-bis(Salicylidene)-1,4-Diaminobutane               (SDB)

                 CH N       (CH2)4    N    CH

       O     OH                                 HO           O
 H3C                                                             CH3
                                                                            C20H24N2O4                    356.42         152°C
   N,N'-bis(3-Methoxy Salicylidene)-1,4-Diaminobutane
                              (MSDB)

 2.3 Weight loss measurements                                          experiments were measured after immersion of alloy
          Weight      loss    measurements      were                   specimens for 30 minutes to establish a steady state
 performed on aluminium alloys as per ASTM                             open circuit potential in absence and presence of
 Method [21]. The test specimens were immersed                         inhibitors at 303 K.
 in 100mL 1M hydrochloric acid solution in absence
 and presence of different concentrations (25,50,75                               Tafel plots were obtained using
 and 100 ppm ) of SDB         and MSDB at different                    conventional three electrode Pyrex glass cell with
 temperature ranges (303, 313, 323 and 333 K) in                       alloy specimen (1cm2) as working electrode (WE),
 thermostated water bath. The difference in weight                     platinum electrode (Pt) as an auxiliary electrode and
 for exposed period of 2, 4, 6 and 8 hours was taken                   standard calomel electrode (SCE) as reference
 as the total weight loss. The weight loss                             electrode. All the values of potential were referred to
 experiments were carried out in triplicate and                        SCE..Tafel plots were obtained by polarizing the
 average values were recorded. The corrosion rate                      electrode potential automatically from – 250 to +
 was evaluated as per ASTM Method [21]. The                            250 mV with respect to open circuit potential (OCP)
 percentage of inhibition efficiency (µWL%) and                        at a scan rate 1mV s –1. The linear Tafel segments of
 the degree of surface coverage (θ) were calculated                    anodic and cathodic curves were extrapolated to
 using equations (1) and (2):                                          corrosion potential (Ecorr) to obtain corrosion current
                                                                       densities (Icorr). The inhibition efficiency was
                                                                       evaluated from the Icorr values using the following
                 Wo – Wi                             (1)               relationship (3):
  µWL% =                       x     100
                  Wo
                                                                                         i0corr – icorr                    (3)
                                                                                µp% =                      x 100
                                                                                              i0corr
                        Wo – Wi                      (2)
           θ =
                                                                                                                 1
                                                                        Where, i0corr and icorr are values of corrosion current
                         Wo                                             densities in absence and presence of inhibitor
                                                                        respectively.
          Where Wi and Wo are the weight loss
 values of aluminium alloy sample in the presence                                EIS measurements were carried out in a
 and absence of the inhibitor and θ is the degree of                    frequency range from 100 kHz to 0.01 Hz with
 surface coverage of the inhibitor.                                     small amplitude of 10mV peak -to-peak, using AC
                                                                        signal at OCP. The impedance data was analyzed
2.4 Electrochemical measurements.                                       using Nyquist plot and Echem software ZSimpWin
          Potentiodynamic polarization (PDP) and                        version 3.21 was used for data fitting. The
electrochemical impedance spectroscopy (EIS)                            inhibition efficiency (Rct %) was calculated from
measurements were performed using CH660c                                the charge transfer resistance (Rct) values using
electrochemical work station. All electrochemical                       following equation (4):

                                                                                                                   2051 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
                         Rict – R0ct
       µ Rct %       =                 x 100   (4)                          -0.5
                           Rict
                                                                            -1.0
                 0
     Where, R ct and        Rict
                          are the charge transfer                           -1.5
resistance in
 absence and presence of inhibitor, respectively.                           -2.0




                                                          -2
                                                          log i / mA / cm
                                                                            -2.5
 2.5 Scanning electron microscopy (SEM).
The surface morphology of the corroded surface in                           -3.0
the presence and absence of inhibitors were studied
                                                                            -3.5                                                  Balnk63
using scanning electron microscope (SEM) [Model
No JSM-840A-JEOL]. To understand the                                                                                              SDB25ppm
                                                                            -4.0                                                  SDB50ppm
morphology of the aluminium alloy surface in the
                                                                                                                                  SDB75ppm
absence and presence of inhibitors, the following                           -4.5
                                                                                                                                  SDB100ppm
cases were examined.
                                                                            -5.0
 (i) Polished aluminium alloy specimen.                                            -0.5    -0.6    -0.7       -0.8      -0.9       -1.0          -1.1
 (ii) Aluminium alloy specimen dipped in 1M HCl.
                                                                                                         E / mV vs. SCE
 (iii) Aluminium alloy specimen dipped in 1M HCl                                                                                       1(a)
       containing 100 ppm of Schiff base.                                                                                              )

3. Results and Discussion
3.1 Potentiodynamic polarisation (PDP)                                      -0.5
           The polarization measurements of                                 -1.0
AA6063 alloy specimens were carried out in 1M
                                                                            -1.5
Hydrochloric acid, in the absence and in the
presence of different concentrations (25 -100 ppm)                          -2.0
of SDB and MSDB at 303K in order to study the
                                                          -2
                                                           log i / mA cm




                                                                            -2.5
anodic and cathodic reactions. The Fig.1(a) and (b).
represents potentiodynamic polarisation curves                              -3.0
(Tafel plots) of AA6063 alloy in 1M Hydrochloric                            -3.5
acid in absence and presence of various                                                                                        Balnk63
                                                                            -4.0
concentrations of SDB and MSDB at 303K                                                                                         MSDB25ppm
respectively. The electrochemical parameters i.e.                           -4.5                                               MSDB50ppm
corrosion potential (Ecorr), corrosion current density                                                                         MSDB75ppm
                                                                            -5.0                                               MSDB100ppm
(icorr), cathodic and anodic Tafel slopes (ba and bc)
associated with the polarization measurements of                            -5.5
                                                                                   -0.5   -0.6    -0.7      -0.8     -0.9       -1.0      -1.1
SDB and MSDB are listed in Table.3. The
inhibition efficiency (µp %) of inhibitors at                                                       E / mV vs. SCE
different concentrations was calculated from the                                                                                  1(b)
equation (4). It is observed from the PDP results
                                                                            Figure. 1. potentiodynamic polarisation curves
that, in presence of inhibitors, the curves are shifted
                                                                            (Tafel plots) of AA6063 alloy in 1M
to lower current density (icorr) regions and Tafel
                                                                            Hydrochloric acid in absence and presence of
slopes ba and bc values increased with increase in
                                                                            various concentrations of (a) SDB and (b)
concentration of inhibitors showing the inhibition
                                                                            MSDB at 303K
tendency of SDB and MSDB. The corrosion
potential (Ecorr) values do not show any appreciable
shift, which suggest that both inhibitors acted as
mixed type but predominantly cathodic inhibitors
[22-23]. This can probably be due to the adsorption
of protonated Schiff base molecules on the cathodic
and anodic sites




                                                                                                              2052 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061

  Table.3. Potentiodynamic polarisation parameters of AA6063 alloy in 1M Hydrochloric acid in absence and
                       presence of various concentrations of SDB and MSDB at 303K




3.2 Electrochemical impedance spectroscopy.
The effect of the inhibitor concentration on the
impedance behavior of AA6063 alloy in 1M                            60                                                            Blank63
                                                                                                                                  SDB25ppm
Hydrochloric acid was studied and Nyquist plots of                  50                                                            SDB50ppm
AA6063 in absence and presence of various                                                                                         SDB75ppm
                                                                    40                                                            SDB100ppm
concentrations of Schiff bases are given in Fig 2 (a)
and (b).                                                            30
                                                            2
                                                            -Z i /  cm




         It is clear from the figure that the                       20
impedance diagrams obtained yield a semicircle
                                                                    10
shape. This indicates that the corrosion process is
mainly controlled by charge transfer. The general                         0

shape of the Nyquist plots is similar for all samples             -10
of AA 6063 alloy, with a large capacitive loop at
                                                                  -20
higher frequencies and inductive loop at lower
frequencies. The similar impedance plots have been                             0   10   20   30   40   50   602   70    80   90    100   110
                                                                                                                                               2(a)
                                                                                                   Zr /  cm
reported for the corrosion aluminum and its alloys
in hydrochloric acid [24-30].
                                                                                                                                  Blank63
The Nyquist plot with a depressed semicircle with                     80
                                                                                                                                  MSDB25ppm
the center under the real axis is characteristic                      70                                                          MSDB50ppm
                                                                                                                                  MSDB75ppm
property of solid electrode and this kind of                          60
                                                                                                                                  MSDB100ppm
phenomenon is known as the dispersing effect [31-                     50

32]                                            An                     40
                                                             2




equivalent circuit fitting of five elements was used
                                                             -Z i /  cm




                                                                      30

to simulate the measured impedance data of                            20

AA6063 alloy is depicted in Fig.3.                                    10

                                                                           0

                                                                    -10

                                                                    -20

                                                                    -30
                                                                                                                                                 2(b)
                                                                               0   10   20   30   40   50   60     70
                                                                                                                   2
                                                                                                                        80   90    100 110 120
                                                                                                       Zr /  cm




                                                                                                                        2053 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
Figure. 2. Nyquist plot for AA6063 alloy in 1M           [35]. The double layer capacitance (Cdl) can be
Hydrochloric acid in absence and presence of             calculated from the equation.(6) [36].
various concentrations of (a) SDB and (b) MSDB                                                         (6)
at 303K                                                           Cdl = Y0 (ωmax) n – 1
                                                         Where Cdl is the double layer capacitance and ωmax
                                                         is the angular frequency at which – Z″ reaches
                                                         maximum and n is the CPE exponent.

                                                         The electrochemical impedance parameters Rs, Rct,
                                                         ω, CPE, n and Cdl are listed in Table-4.

                                                                   The inhibition efficiency was evaluated by
                                                         Rct and Cdl values of the impedance data, it is
                                                         shown from Table.(4)           that charge transfer
                                                         resistance ( Rct ) of inhibited system increased and
                                                         double layer capacitance (Cdl) decreased with
                                                         increase in inhibitor concentration. This was due to
                                                         adsorption of Schiff base molecule on the metal
                                                         surface, the adsorbed inhibitor blocks either
                                                         cathodic or anodic reaction or both formation of
                                                         physical barrier, which reduces metal reactivity.
                                                         The effect of inhibitor may be due to changes in
                                                         electric double layer at the interface of solution and
                                                         metal electrode. The decrease in double layer
Figure..3. The equivalent circuit model used to fit      capacitance (Cdl) can be caused by decrease in local
the experimental impedance data.                         dielectric constant and /or increase in the thickness
                                                         of electric double layer, this suggest that the Schiff
          The equivalent circuit includes solution       base molecules inhibit the aluminium alloy by
resistance Rs, charge transfer resistance Rct,           adsorption at the metal – acid interface. It is
inductive elements RL and L. The circuit also            evident that the inhibition efficiency increases with
consists of constant phase element, CPE (Q) in           increase in inhibitor concentration which is in good
parallel to the parallel resistors Rct and RL, and RL    agreement with the Potentiodynamic polarization
is in series with the inductor L. The impedance          results.
spectra for the aluminium alloy in absence and
presence of the inhibitors are depressed. The            Table-4. Electrochemical impedance parameters of
deviation of this kind is referred as frequency          AA6063 alloy in 1M Hydrochloric acid in absence
dispersion, and has been attributed to                   and presence of various concentrations of (a) SDB
inhomogeneous of solid surface of aluminum alloy.        and (b) MSDB at 303K
Assumption of a simple Rct –Cdl is usually a poor
approximation especially for systems showing
depressed semicircle behavior due to non – ideal
capacitive behaviour of solid electrodes [33]. The
capacitor in the equivalent circuit can be replaced
by a constant phase element (CPE), which is a
frequency dependent element and related to surface
roughness. CPE is substituted for the respective
capacitor of Cdl in order to give a more accurate fit.
The impedance function of a CPE is defined in
impedance [34] representation as (5).

                   1
  ZCPE =
                ( Y0jω)n        (5)

         Where, Y0 magnitude of CPE, n is
exponent of CPE, and are frequency independent,
and ω is the angular frequency for which – Z″
reaches its maximum value, n is dependent on the
surface morphology : – 1 ≤ n ≤ 1. Y0 and n can be
calculated by the equation proved by Mansfeld et al

                                                                                              2054 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
       International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
                 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
3.3 Weight loss measurements                                     90
The experimental data of weight loss (∆w),
                                                                                                                  SDB
percentage of inhibition efficiency (µWL%),                                                                       MSDB
Corrosion Rate (C.R.) in mmpy and degree of                      80
Surface Coverage (θ) for AA6063 in 1M
Hydrochloric acid in absence and presence of
various concentration of SDB and MSDB Schiff                     70




                                                          % IE
bases at 2 hours of exposure time and different
temperature are shown in Table. 5.
                                                                 60
3.3.1 Effect of inhibitor concentration
The variation of inhibition efficiency (µWL%) with
inhibitor concentration is shown in Fig..4(a).                   50
Increase in inhibition efficiency at higher                           0         2       4               6           8      10

concentration of inhibitor may be attributed to                                              Time / h

larger coverage of metal surface with inhibitor                                                             4(b)
molecules. The maximum inhibition efficiency was
achieved at 100 ppm and a further increase in                    90

inhibitor concentration caused no appreciable                                                                      SDB
                                                                                                                   MSDB
change in performance
3.3.2 Effect of immersion time                                   80

The effect of immersion time on inhibition
efficiency is shown in Fig..4(b). All the tested
Schiff bases show a decrease in inhibition                       70
                                                          % IE



efficiency with increase in immersion time from 2
to 8 hours. This indicates desorption of the Schiff
Base over a longer test period and may be                        60

attributed to various other factors such as formation
of less persistent film layer on the metal surface,
and increase in cathodic reaction or increase in                 50
                                                                          303          313                  323           333
ferrous ion concentration [37].                                                 4(c)         Temp / K
3.3.3 Effect of temperature
The influence of temperature on inhibition
efficiency of two Schiff bases compounds is shown       Figure. 4. Variation of inhibition efficiency with (a)
in Fig.4(c). The inhibition efficiency for the two      Inhibitor concentration (b) Exposure time          (c)
Schiff base compounds decreases with increase in        Temperature in 1M Hydrochloric acid for SDB and
temperature from 303 to 333K. The decrease in           MSDB.
inhibition efficiency with rise in temperature may
be attributed to desorption of the inhibitor
molecules from metal surface at higher
temperatures and higher dissolution rates of
aluminium at elevated temperatures.

       90

                                        SDB
       85
                                        MSDB


       80
% IE




       75



       70



       65



       60
            0     25   50         75   100     125

                            C / ppm
                4(a)


                                                                                                        2055 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
 Table- 5. Weight loss parameters for AA6063 in 1M hydrochloric acid in the absence and presence of various
           concentrations of SDB and MSDB at 2 hours of exposure time and different temperature.




3.3.4 Thermodynamic activation parameters                                       3.0
 Thermodynamic activation parameters are                                                                                     Blank-63
important to study the inhibition mechanism. The                                                                             SDB25ppm
                                                                                2.5                                          SDB50ppm
activation energy (Ea) is calculated from the                                                                                SDB75ppm
logarithm of the corrosion rate in acidic solution is                           2.0
                                                                                                                             SDB100ppm
                                                              -1




a linear function of (1/T) -Arrhenius equation (7):
                                                               Log (CR) / mmy




   log (CR) = – Ea / 2.303RT + A                                                1.5
                                                 (7)
                                                                                1.0
Where, Ea is the apparent effective activation
energy, R is the universal gas constant and A is the                            0.5
Arrhenius pre exponential factor. Plots of logarithm
of corrosion rate obtained by weight loss                                       0.0
measurement versus 1/T gave straight lines and                                        2.9   3.0     3.1                3.2            3.3
                                                                                                          3       -1
slope equal to (– Ea/2.303R) as shown in Figs. 5(a)                                               (1 / T)10 / K                5(a)
and 5(b) for SDB and MSDB respectively. The Ea
values calculated are listed in Table.6.




                                                                                                           2056 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
                            International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
                                      www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
                                                                                                                       0.5
                          3.0
                                                                                                                                                             Blank-63
                                                                               Blank-63                                                                      MSDB25ppm
                                                                               MSDB25ppm                               0.0                                   MSDB50ppm
                          2.5                                                  MSDB50ppm                                                                     MSDB75ppm
                                                                               MSDB75ppm                                                                     MSDB100ppm




                                                                                                 -1
                                                                                                  Log CR / T / mmy K
                                                                               MSDB100ppm                              -0.5




                                                                                                 -1
                          2.0
-1
Log (CR) / mmy




                                                                                                                       -1.0
                          1.5



                          1.0                                                                                          -1.5



                          0.5                                                                                          -2.0


                                                                                                                              2.9   3.0     3.1            3.2      3.3
                          0.0                                                                                                                     3   -1
                                                                                                                                          (1 / T)10 / K
                                2.9    3.0      3.1                      3.2            3.3                                                                        6(b)
                                             (1 / T)10 / K
                                                          3        -1
                                                                                 5(b)
                                                                                                Figure..6. Arrhenius plot of log (CR/T) versus 1/T
             Figure.5. Arrhenius plot of log CR versus 1/T in                                   in absence and presence of (a) SDB and (b) MSDB
             absence and presence of (a) SDB and (b)MSDB
                                                                                                Table-6. Thermodynamic parameters of activation
                       A plot of log (CR/T) versus 1/T gave a                                   of AA6063 in 1M HCl in presence and absence of
             straight line, Figs. 6(a) and (b) with a slope of (–                               different concentrations of SDB and MSDB
             ΔH/2.303 R) and an intercept of [(log (R/Nh) +
             (ΔS/2.303 R)], from which the values of ΔS* and                                    Table-6. Thermodynamic parameters of activation
             ΔH* were calculated. The straight lines were                                       of AA6063 in 1M HCl in presence and absence of
             obtained according to transition state equation (8):                               different concentrations of SDB and MSDB

          C R= RT/ N h exp(–ΔH*/ RT) exp (ΔS*/ R)
                                                                                          (8)


             Where, h is the Plank constant, N is the Avogadro
             number, ΔS* is entropy of activation and ΔH* is the
             enthalpy of activation. The ΔS* and ΔH* values
             calculated are listed in Table. 6


                           0.5
                                                                              Blank-63
                                                                              SDB25ppm
                           0.0                                                SDB50ppm
                                                                              SDB75ppm
                                                                              SDB100ppm
 -1
     Log CR / T / mmy K




                          -0.5
 -1




                          -1.0



                          -1.5



                          -2.0


                                 2.9   3.0     3.1                      3.2         3.3
                                                      3       -1
                                             (1 / T)10 / K

                                                                                        6(a)




                                                                                                                                                          2057 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
   International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
             www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061

The Ea values of aluminium alloy in 1M                    Where C(inh) is inhibitor concentration and K(ads) is
Hydrochloric acid in the presence of Schiff base          an equilibrium constant for adsorption and
compounds are higher than those in the absence of         desorption.
Schiff bases. The increase in the Ea values, with         The K(ads) was calculated from the intercepts of the
increasing inhibitor concentration is attributed to       straight lines on the C(inh) / θ axis Fig.7(a) and
physical adsorption of inhibitor molecules on the         standard free energy of adsorption of inhibitor
metal surface [38]. In other words, the adsorption        ΔG0ads was calculated using the relation (10);.
of inhibitor on the electrode surface leads to
formation of a physical barrier that reduces the                                                    (10)
                                                              ΔG0ads = – RT ln (55.5 Kads)
metal dissolution in electrochemical reactions [39].
The inhibition efficiency decreases with increase in
temperature which indicates desorption of inhibitor       To calculate heat of adsorption (ΔH0ads) and
molecules as the temperature increases [40].              entropy of adsorption (ΔS0ads) ln K(ads) vs. 1/T was
The values of enthalpy of activation (ΔH*) are            plotted as shown in Fig.7(b). The straight lines
positive; this indicates that the corrosion process is    were obtained with a sloe equal to (– ΔH0ads / R)
endothermic. The values of entropy of activation          and intercept equal to (ΔS0ads / R + ln 1/55.5). The
(ΔS*) are higher in the presence of inhibitor than        values of equilibrium constant (K(ads)), Standard
those in the absence of inhibitor, The increase in        free energy of adsorption(ΔG0ads ), enthalpy of
values of       ΔS* reveals that an increase in           adsorption (ΔH0ads) and entropy of adsorption
randomness occurred on going from reactants to            (ΔS0ads) are listed in Table.7.
the activated complex [41-43].
                                                                    The negative values of standard free of
3.3.5 Adsorption isotherms                                adsorption indicated spontaneous adsorption of
It is generally assumed that the adsorption of the        Schiff bases on aluminium alloy surface. The
inhibitor at the interface of metal and solution is the   calculated standard free energy of adsorption
first step in the mechanism of inhibition aggressive      values for the Schiff bases are closer to – 40 kJ
media. It is also widely                                  mole–1 and it can be concluded that the adsorption
                                                          of Schiff bases on the aluminium surface is more
acknowledged that adsorption isotherms provide            chemical than physical one [45]. The sign of
useful insights into the mechanism of corrosion           enthalpy and entropy of adsorption are positive and
inhibition. The investigated compounds inhibit the        is related to substitutional adsorption can be
corrosion by adsorption at the metal surface.             attributed to the increase in the solvent entropy and
Theoretically, the adsorption process has been            to a more positive water desorption enthalpy. The
regarded as a simple substitution adsorption              increase in entropy is the driving force for the
process, in which an organic molecule in the              adsorption of the Schiff bases on the aluminium
aqueous phase substitutes the water molecules             alloy surface.
adsorbed on the metal surface [44]. The surface           The adsorption of Schiff base on the aluminium
coverage (θ) value calculated from weight loss data       alloy surface can be attributed to adsorption of the
for different concentrations of Schiff bases was          organic compounds via phenolic and iminic groups
used to explain the best adsorption isotherm. The         in both cases. Among these two Schiff bases, the
value of surface coverage (θ) was tested                  chelate effect of MSDB is greater than that of SDB.
graphically for fitting a suitable adsorption             This is due to the presence of two electron donating
isotherm. Attempts were made to fit surface               groups of –OCH3 in MSDB structure than SDB.
coverage (θ) values of various isotherms including        The more efficient adsorption of MSDB is the
Langmuir, Freundlich and Temkin isotherms.                result of electronegative oxygen atoms present in
Among three adsorption isotherms obtained, the            the MSDB compared to SDB Structure.
best fitted isotherm was the Langmuir adsorption
isotherm (C(inh) / θ vs. C(inh) ) Fig.7(a) with the
linear regression coefficient values (R2) in the
range of 0.9994 - 0.9996. The Langmuir adsorption
isotherm can be expressed by following equation
(9):


    C(inh)        1
             =            + C(inh)              (9)
     θ           K(ads)



                                                                                              2058 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
                          International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
                                    www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061

                   140

                                           2
                                 SDB-R =0.9996
                   120                  2
                                 MSDB-R =0.9994


                   100
        C//ppm




                    80



                    60



                    40

7(a)
                    20
                          0     25             50         75          100         125

                                                C / ppm

                   10.0

                                                                    SDB
                                                                    MSDB

                    9.5
       -1
       ln Kads/M




                    9.0




                    8.5



7(b)
                    8.0
                          2.9        3.0            3.1         3.2         3.3           Table-7. Thermodynamic parameters for the adsorption of
                                                          3
                                               (1 / T)10 / K
                                                               -1                       inhibitor in 1M HCl on AA6063 alloy at different temperatures

                   Figure.7. (a) Langmuir adsorption isotherm plot
                   and (b) Heat of adsorption isotherm plot for SDB
                   and MSDB

                   3.4 Scanning electron microscope (SEM)
                           Scanning electron microscopy of the
                   AA6063 sample of inhibited and uninhibited metal
                   samples is presented in Fig. 8. The SEM study
                   shows that the inhibited alloy surface is found
                   smoother than the uninhibited surface.




                                                                                                                          2059 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
  International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
            www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061




              a                                                b




             c                                                 d
 Figure. 8. Scanning electron micrographs of (a) Polished AA6063 alloy, (b) After immersion in 1M HCl for
2h, (c) After immersion in 1M HCl for 2h in presence of 100 ppm SDB and (d) After immersion in 1M HCl for
                                     2h in presence of 100 ppm MSDB.


4. Conclusions
 1.   The investigated Schiff bases are good              7.   Scanning Electron Microscopy (SEM)
      inhibitors for aluminium alloy 6063 in 1M                shows a smoother surface for inhibited alloy
      Hydrochloric acid solution.                              samples than uninhibited samples due to
 2.   In weight loss studies, the inhibition                   formation of protective barrier film.
      efficiency (µWL%) of the Schiff bases
      increase with increase in inhibitor              References:
      concentration, whereas decreases with               1.       U.Ergun, D.Yuzer and K.C.Emregul,
      increase in immersion time and temperature.                  Mater. Chem.Phys., 109(2008)492-499.
 3.   Potentiodynamic       polarisation     studies      2.       T.Hurlen, H.H.Lian, O.S.Odegard and
      demonstrate the Schiff bases under                           T.V.Valand
      investigation act as mixed type but                          Mater.Chem.Phys.,29(1984)579-585.
      predominantly cathodic inhibitors.                  3.        A.K.Maayta,        N.A.F.Al-Rawashdeh,
 4.    EIS measurements show that as the                           Corros.Sci. 46 (2004) 1129.
      inhibitor concentration is increased, the           4.       E.E.Oguzie, Mater.Lett. 59 (2005) 1076.
      charge transfer      resistance increases and       5.       A. Popova, M. Chouristov, S. Raicheva,
      double layer capacitance decreases.                          E. Sokolova, Corros. Sci. 46 (2004) 1333.
 5.   The inhibition efficiency obtained using            6.       R.G. Nuzzo, E.M. Korenic, L.H. Dubois,
      weight loss, potentiodynamic polarisation,                   J. Chem. Phys. 93, 767 (1980).
      and EIS studies are in good agreement and           7.       A.Aytac,           U.Ozmen            and
      in accordance to the order: MSDB > SDB                       M.Kabbasakaloglu,      Mater.Chem.Phys.,
      for AA6063.                                                  89(2005)176.
 6.    The adsorptions of Schiff bases on alloy           8.       Hahner, G., Woll, Ch., Buck, M., Grunze,
      surface in 1M HCl solution are governed by                   M., 1993. Langmuir 9 (1), 955.
      Langmuir adsorption isotherm.



                                                                                            2060 | P a g e
Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B /
International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622
          www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061
9.    H. Shorky, M. Yuasa, I. Sekine, R.M. Issa,       32.   W.R. Fawcett, Z. Kovacova, A. Mtheo, C.
      H.Y. El-Baradie, G.K. Gomma, Corros.                   Foss, J. Electronal. Chem. 326, 91,
      Sci. 40, 2173 (1998).                                  (1992).
10.   C.D. Bain, E.B. Thouroughton, Y.T. Tao,          33.   R. deLevi, Electrochem. Acta 8 (1963)
      J. Evall, G.M. Whiteside, J.G. Nuzzo, J.               751.
      Am. Soc. 111, 321.                               34.   H.J.W. Lenderink, M.V.D. Linden, J.H.W.
11.   Z. Quan, S.H. Chen, Y. Li, X. Cui,                     De Wit, Electrochim. Acta 38 (1989)
      Corros. Sci. 44, 703 (2002).                           1993.)
12.   S.L. Li, Y.G. Wang, S.H. Chen, R. Yu,            35.   F. Mansfeld, C.H. Tsai, H. Shih, in: R.S.
      S.B. Lei, H.Y. Ma, D.X. Liu, Corros. Sci.              Munn (Ed.), Computer Modeling in
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13.   Ashish Kumar Singh, M . A. Quraishi, Int.              p. 86.
      J. Electrochem. Sci., 7 (20120 3222-3241.        36.   C.H. Hsu, F. Mansfeld, corrosion 57
14.   Fatemeh baghaei          Ravari,    Athareh            (2001) 747.
      Dadagarinezhad, Iran Shekhshoaei, J.Chi.         37.   M.A Quraishi. Rawat J (2001) Corrosion
      Chem. Soc. 55, N° 3 (2010) 328-331.                    19: 273.
15.   Fatemeh baghaei          Ravari,    Athareh      38.   H. Ashassi-Sorkhabi, B. Shaabani, D.
      Dadagarinezhad,       Iran     Shekhshoaei,            Seifzadeh, Appl. Surf. Sci. 239 (2005) 154.
      G.U.Journal of Science. 22(3);175-182            39.   F. Mansfeld, Corrosion Mechanism,
      (2009).                                                Marcel Dekkar, New York, 1987, p. 119.
16.   A.S. Patel, V. A. Panchal, G. V. Mudaliar,       40.    Ashish Kumar Singh, M.A. Quraishi,
      N. K. Singh, Journal of Saudi Chemical                 Corros. Sci. 52 (2010) 156.
      society (2011)xxx, xxx, xxx.                     41.   E.A. Noor, A.H. Al-Moubaraki, Mater.
17.   A. S. Patel, V. A. Panchal and N. K. Shah,             Chem. Phys. 110 (2008) 145.
      PRAJÑĀ - Journal of Pure and Applied             42.   A. Yurt, A. Balaban, S.U. Kandemir, G.
      Sciences, Vol. 18: 73 - 75 (2010).                     Bereket, B. Erk, Mater. Chem. Phys.
18.   T. Sethi, A. Chaturvedi, R. K. Upadhyaya,              85(2004) 420.
      and S. P. Mathur, Protection of Metals           43.   G.E. Badr, Corros. Sci. (2009),
      and Physical Chemistry of Surfaces, 2009,              doi:10.1016/j.corsci.2009.06.017.
      Vol. 45, No. 4, pp. 466–471.                     44.   T. Paskossy, J. Electroanal. Chem. 364
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      ASKALANY, K. SHALABI, ZAŠTITA                    45.   A.Yurt, A. Balaban. S. Ustin Kandemir,
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                                                                                       2061 | P a g e

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AA6063 Corrosion

  • 1. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Electrochemical Behaviour of AA6063 Alloy in Hydrochloric Acid using Schiff Base Compounds as Corrosion Inhibitors. Sanaulla Pathapalya Fakrudeen*, Lokesh H. B**, Ananda Murthy H. C***, Bheema Raju V. B****. * Department of Engineering Chemistry, HKBK College of Engineering, Nagawara, Bangalore Karnataka, India ** Department of Engineering Chemistry, Vivekananad Institute of Technology, , Bangalore-Karnataka, India. *** Department of Engineering Chemistry, R N Shetty Institute of Technology, Bangalore, Karnataka, India. **** Department of Engineering Chemistry, Dr. Ambedkar Institute of Technology,, Bangalore , Karnataka, India. ABSTRACT The electrochemical behavior of however, are reactive materials and are prone to aluminium alloy AA6063 were investigated corrosion. A strong adherent and continuous using Schiff base compounds namely N, N’-bis passive oxide film is developed on Al upon (Salicylidene)-1, 4-Diaminobutane (SDB) and exposure to aqueous solutions. This surface film is N, N’-bis (3-Methoxy Salicylidene)-1, 4 amphoteric and dissolves when the metal is Diaminobutane (MSDB) as corrosion inhibitors exposed to high concentrations of acids or bases in presence of 1M Hydrochloric Acid by weight [1]. Hydrochloric acid solutions are used for acid loss, Potentiodynamic polarization(PDP), cleaning, acid de-scaling, chemical and electrochemical impedance spectroscopy(EIS) electrochemical etching in many chemical process and scanning electron microcopy (SEM). industries where in aluminium alloys are used. It is Potentiodynamic polarization study revealed very important to add corrosion inhibitors to that the two Schiff bases acted as mixed type prevent metal dissolution and minimize acid inhibitors. The change in EIS parameters is consumption [2]. Most of the efficient acid indicative of adsorption of Schiff bases on inhibitors are organic compounds that contain aluminum alloys surface leading to formation of mainly nitrogen, sulfur or oxygen atoms in their protective layer. The weight loss study showed structure. The choice of inhibitor is based on two that the inhibition efficiency of these compounds considerations: first it could be synthesized increases with increase in concentration and conveniently from relatively cheap raw materials; vary with solution temperature and immersion second, it contains the electron cloud on the time. The various thermodynamic parameters aromatic ring or electronegative atoms such as were also calculated to investigate the nitrogen, oxygen in relatively long-chain mechanism of corrosion inhibition. The effect of compounds. Numerous organic substances methoxy group on corrosion efficiency was containing polar functions with nitrogen, oxygen, observed from the results obtained between and sulphur atoms and aromatic rings in a SDB and MSDB. The effectiveness of these conjugated system have been reported as effective inhibitors were in the order of MSDB>SDB. The corrosion inhibitors for aluminium alloys [3-5]. adsorption of Schiff bases on AA6063 alloy Some Schiff bases have been reported earlier as surface in acid obeyed Langmuir adsorption corrosion inhibitors for aluminum alloys [6-8], iron isotherm. The surface characteristics of [9-10] and copper [11-12]. Compounds with π- inhibited and uninhibited alloy samples were bonds also generally exhibit good inhibitive investigated by scanning electron microscopy properties due to interaction of π orbital with metal (SEM). surface. Schiff bases with RC = NR′ as general formula have both the features combined with their Keywords: Electrochemical techniques, structure which may then give rise to particularly Corrosion, Schiff base, Adsorption, Aluminum potential inhibitors. alloy. The present work is aimed at investigating 1. Introduction: the inhibitive ability of two Schiff base molecules Corrosion of aluminum and its alloys has on corrosion of AA6063 in 1M Hydrochloric acid been a subject of numerous studies due to their medium. The weight loss, potentiodynamic high technological value and wide range of polarization and electrochemical impedance industrial applications especially in aerospace and techniques were employed to study inhibitive effect house-hold industries. Aluminum and its alloys, of two Schiff base molecules at different concentrations. The effect of temperature, 2049 | P a g e
  • 2. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 immersion time on corrosion behaviour of samples were cut into cylindrical test specimens aluminium alloy was also studied in absence and and moulded in cold setting Acrylic resin exposing presence of inhibitor at various concentrations. For a surface area of 1.0 cm2 for electrochemical further confirmation aluminum alloy samples were measurements. For weight loss experiments the analyzed by scanning electron microscopic (SEM) cylindrical alloy rods were cut into 24 mm dia x technique. 2mm length -circular cylindrical disc specimens The inhibition effect of Schiff base compounds are using an abrasive cutting wheel and a 2mm reported on steel [13-14], Copper [15], and pure mounting hole at the centre of the specimen was aluminium and its alloys [16-19], in acidic drilled. Before each experiment, the electrodes medium. However, no substantial work has been were abraded with a sequence of emery papers of carried out on corrosion inhibition of aluminium different grades (600, 800, and 1200), washed with alloys in acidic medium by Schiff bases. Thus, it double distilled water, degreased with acetone and was thought worthwhile to study the corrosion dried at 353 K for 30 min in a thermostated electric inhibition effect of Schiff base compounds oven and stored in a moisture-free desiccator prior namely N, Nʹ-bis (Salicylidene)-1, 4- to use. The corrosive medium selected for this Diaminobutane (SDB) and N, Nʹ-bis (3-Methoxy study was 1M hydrochloric acid, which was Salicylidene)-1, 4 Diaminobutane (MSDB) on prepared from analytical grade 37 percent acid AA6063 Alloy in 1M Hydrochloric acid medium. concentrated (Merck ) in double distilled water. 2. Experimental 2.1 Materials The alloy samples were procured from M/S. Fenfe Metallurgical, Bangalore, India. The typical chemical composition of AA6063 alloy in weight percentage is shown in Table 1. The alloy Table-1. Typical Chemical Composition of AA 6063 Element Cu Mg Si Fe Mn Ti Cr Zn Others Al Wt.% 0.10 0.45 - 0.2 - 0.35 0.10 0.10 0.10 0.10 0.15 Reminder 0.90 0.6 Max Max Max Max Max Max 2.2 Inhibitor. melting points, Fourier transform infrared The Schiff Bases were prepared by the spectroscopy (FT-IR) and Proton Nuclear Magnetic condensation of respective aromatic aldehydes with Resonance (1H NMR). The structure, molecular each of diamines as per the reported procedure formula, molecular mass, melting points are shown [20]. All reagents used were of analytical grade in Table-2. procured from Sigma Aldrich. N,N'- bis(Salicylidene)-1,4-Diaminobutane (SDB) was N,N'-bis(Salicylidene)-1,4-Diaminobutane prepared by slow addition of Salicylaldehyde (2 IR (KBr cm-1): 3400(OH), 3054(=C-H), 2903(- mmol) in 30 mL methanol over a solution of 1,4- CH), 1628(C=N). 1 diaminobutane (1mmol) in 30 mL methanol and HNMR (CDCl3): δ 1.79-1.82(t, 4H, -CH2CH2-), δ N,N'-bis(3-MethoxySalicylidene)-1,4- 3.62-3.65(t, 4H, -CH2-N) 6.84–7.31 (m, 8H, ArH). Diaminophenelyne (MSDB) by slow addition of Methoxysalicylaldehyde (2 mmol) in 30 mL 8.34(s, 2H, N=CH), 13.49 (s, 1H, OH), methanol over a solution of 1,4-diaminobutane (1 N,N'-bis(3-Methoxy Salicylidene)-1,4- mmol) in 30 mL methanol taken in a 250 mL condensation flask. In each case, 2-3drops of acetic Diaminobutane acid was added to the mixture of aldehyde and IR (KBr cm-1): 3429(OH), 2996(=C-H), 2932(- diamine with stirring at constant temperature 25ºC for 1 hour. Further the mixture was refluxed for 4-5 CH), 1628(C=N). 1253(-OCH3). hours on a water bath, heating occasionally to 1 HNMR (CDCl3): δ 1.80-1.83(t, 4H, -CH2CH2-), δ improve the yield of the product. The reaction mixture was cooled to room temperature overnight 3.63-3.66(t, 4H, -CH2-N) δ 3.90(s, 6H, -OCH3), and the colored compound was filtered off and 6.77–7.2 (m, 6H, ArH). 8.32(s, 2H, N=CH), 14.00 dried. The compounds were recrystallised with ethanol. The product identity was confirmed via (s, 1H, OH), 2050 | P a g e
  • 3. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Table-2. The structure, molecular formula, molecular mass, melting points Structure and Name Molecular Formula Molecular Melting Mass Point CH N (CH2)4 N CH C18H20N2O2 296.36 89°C OH HO N,N'-bis(Salicylidene)-1,4-Diaminobutane (SDB) CH N (CH2)4 N CH O OH HO O H3C CH3 C20H24N2O4 356.42 152°C N,N'-bis(3-Methoxy Salicylidene)-1,4-Diaminobutane (MSDB) 2.3 Weight loss measurements experiments were measured after immersion of alloy Weight loss measurements were specimens for 30 minutes to establish a steady state performed on aluminium alloys as per ASTM open circuit potential in absence and presence of Method [21]. The test specimens were immersed inhibitors at 303 K. in 100mL 1M hydrochloric acid solution in absence and presence of different concentrations (25,50,75 Tafel plots were obtained using and 100 ppm ) of SDB and MSDB at different conventional three electrode Pyrex glass cell with temperature ranges (303, 313, 323 and 333 K) in alloy specimen (1cm2) as working electrode (WE), thermostated water bath. The difference in weight platinum electrode (Pt) as an auxiliary electrode and for exposed period of 2, 4, 6 and 8 hours was taken standard calomel electrode (SCE) as reference as the total weight loss. The weight loss electrode. All the values of potential were referred to experiments were carried out in triplicate and SCE..Tafel plots were obtained by polarizing the average values were recorded. The corrosion rate electrode potential automatically from – 250 to + was evaluated as per ASTM Method [21]. The 250 mV with respect to open circuit potential (OCP) percentage of inhibition efficiency (µWL%) and at a scan rate 1mV s –1. The linear Tafel segments of the degree of surface coverage (θ) were calculated anodic and cathodic curves were extrapolated to using equations (1) and (2): corrosion potential (Ecorr) to obtain corrosion current densities (Icorr). The inhibition efficiency was evaluated from the Icorr values using the following Wo – Wi (1) relationship (3): µWL% = x 100 Wo i0corr – icorr (3) µp% = x 100 i0corr Wo – Wi (2) θ = 1 Where, i0corr and icorr are values of corrosion current Wo densities in absence and presence of inhibitor respectively. Where Wi and Wo are the weight loss values of aluminium alloy sample in the presence EIS measurements were carried out in a and absence of the inhibitor and θ is the degree of frequency range from 100 kHz to 0.01 Hz with surface coverage of the inhibitor. small amplitude of 10mV peak -to-peak, using AC signal at OCP. The impedance data was analyzed 2.4 Electrochemical measurements. using Nyquist plot and Echem software ZSimpWin Potentiodynamic polarization (PDP) and version 3.21 was used for data fitting. The electrochemical impedance spectroscopy (EIS) inhibition efficiency (Rct %) was calculated from measurements were performed using CH660c the charge transfer resistance (Rct) values using electrochemical work station. All electrochemical following equation (4): 2051 | P a g e
  • 4. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Rict – R0ct µ Rct % = x 100 (4) -0.5 Rict -1.0 0 Where, R ct and Rict are the charge transfer -1.5 resistance in absence and presence of inhibitor, respectively. -2.0 -2 log i / mA / cm -2.5 2.5 Scanning electron microscopy (SEM). The surface morphology of the corroded surface in -3.0 the presence and absence of inhibitors were studied -3.5 Balnk63 using scanning electron microscope (SEM) [Model No JSM-840A-JEOL]. To understand the SDB25ppm -4.0 SDB50ppm morphology of the aluminium alloy surface in the SDB75ppm absence and presence of inhibitors, the following -4.5 SDB100ppm cases were examined. -5.0 (i) Polished aluminium alloy specimen. -0.5 -0.6 -0.7 -0.8 -0.9 -1.0 -1.1 (ii) Aluminium alloy specimen dipped in 1M HCl. E / mV vs. SCE (iii) Aluminium alloy specimen dipped in 1M HCl 1(a) containing 100 ppm of Schiff base. ) 3. Results and Discussion 3.1 Potentiodynamic polarisation (PDP) -0.5 The polarization measurements of -1.0 AA6063 alloy specimens were carried out in 1M -1.5 Hydrochloric acid, in the absence and in the presence of different concentrations (25 -100 ppm) -2.0 of SDB and MSDB at 303K in order to study the -2 log i / mA cm -2.5 anodic and cathodic reactions. The Fig.1(a) and (b). represents potentiodynamic polarisation curves -3.0 (Tafel plots) of AA6063 alloy in 1M Hydrochloric -3.5 acid in absence and presence of various Balnk63 -4.0 concentrations of SDB and MSDB at 303K MSDB25ppm respectively. The electrochemical parameters i.e. -4.5 MSDB50ppm corrosion potential (Ecorr), corrosion current density MSDB75ppm -5.0 MSDB100ppm (icorr), cathodic and anodic Tafel slopes (ba and bc) associated with the polarization measurements of -5.5 -0.5 -0.6 -0.7 -0.8 -0.9 -1.0 -1.1 SDB and MSDB are listed in Table.3. The inhibition efficiency (µp %) of inhibitors at E / mV vs. SCE different concentrations was calculated from the 1(b) equation (4). It is observed from the PDP results Figure. 1. potentiodynamic polarisation curves that, in presence of inhibitors, the curves are shifted (Tafel plots) of AA6063 alloy in 1M to lower current density (icorr) regions and Tafel Hydrochloric acid in absence and presence of slopes ba and bc values increased with increase in various concentrations of (a) SDB and (b) concentration of inhibitors showing the inhibition MSDB at 303K tendency of SDB and MSDB. The corrosion potential (Ecorr) values do not show any appreciable shift, which suggest that both inhibitors acted as mixed type but predominantly cathodic inhibitors [22-23]. This can probably be due to the adsorption of protonated Schiff base molecules on the cathodic and anodic sites 2052 | P a g e
  • 5. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Table.3. Potentiodynamic polarisation parameters of AA6063 alloy in 1M Hydrochloric acid in absence and presence of various concentrations of SDB and MSDB at 303K 3.2 Electrochemical impedance spectroscopy. The effect of the inhibitor concentration on the impedance behavior of AA6063 alloy in 1M 60 Blank63 SDB25ppm Hydrochloric acid was studied and Nyquist plots of 50 SDB50ppm AA6063 in absence and presence of various SDB75ppm 40 SDB100ppm concentrations of Schiff bases are given in Fig 2 (a) and (b). 30 2 -Z i /  cm It is clear from the figure that the 20 impedance diagrams obtained yield a semicircle 10 shape. This indicates that the corrosion process is mainly controlled by charge transfer. The general 0 shape of the Nyquist plots is similar for all samples -10 of AA 6063 alloy, with a large capacitive loop at -20 higher frequencies and inductive loop at lower frequencies. The similar impedance plots have been 0 10 20 30 40 50 602 70 80 90 100 110 2(a) Zr /  cm reported for the corrosion aluminum and its alloys in hydrochloric acid [24-30]. Blank63 The Nyquist plot with a depressed semicircle with 80 MSDB25ppm the center under the real axis is characteristic 70 MSDB50ppm MSDB75ppm property of solid electrode and this kind of 60 MSDB100ppm phenomenon is known as the dispersing effect [31- 50 32] An 40 2 equivalent circuit fitting of five elements was used -Z i /  cm 30 to simulate the measured impedance data of 20 AA6063 alloy is depicted in Fig.3. 10 0 -10 -20 -30 2(b) 0 10 20 30 40 50 60 70 2 80 90 100 110 120 Zr /  cm 2053 | P a g e
  • 6. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Figure. 2. Nyquist plot for AA6063 alloy in 1M [35]. The double layer capacitance (Cdl) can be Hydrochloric acid in absence and presence of calculated from the equation.(6) [36]. various concentrations of (a) SDB and (b) MSDB (6) at 303K Cdl = Y0 (ωmax) n – 1 Where Cdl is the double layer capacitance and ωmax is the angular frequency at which – Z″ reaches maximum and n is the CPE exponent. The electrochemical impedance parameters Rs, Rct, ω, CPE, n and Cdl are listed in Table-4. The inhibition efficiency was evaluated by Rct and Cdl values of the impedance data, it is shown from Table.(4) that charge transfer resistance ( Rct ) of inhibited system increased and double layer capacitance (Cdl) decreased with increase in inhibitor concentration. This was due to adsorption of Schiff base molecule on the metal surface, the adsorbed inhibitor blocks either cathodic or anodic reaction or both formation of physical barrier, which reduces metal reactivity. The effect of inhibitor may be due to changes in electric double layer at the interface of solution and metal electrode. The decrease in double layer Figure..3. The equivalent circuit model used to fit capacitance (Cdl) can be caused by decrease in local the experimental impedance data. dielectric constant and /or increase in the thickness of electric double layer, this suggest that the Schiff The equivalent circuit includes solution base molecules inhibit the aluminium alloy by resistance Rs, charge transfer resistance Rct, adsorption at the metal – acid interface. It is inductive elements RL and L. The circuit also evident that the inhibition efficiency increases with consists of constant phase element, CPE (Q) in increase in inhibitor concentration which is in good parallel to the parallel resistors Rct and RL, and RL agreement with the Potentiodynamic polarization is in series with the inductor L. The impedance results. spectra for the aluminium alloy in absence and presence of the inhibitors are depressed. The Table-4. Electrochemical impedance parameters of deviation of this kind is referred as frequency AA6063 alloy in 1M Hydrochloric acid in absence dispersion, and has been attributed to and presence of various concentrations of (a) SDB inhomogeneous of solid surface of aluminum alloy. and (b) MSDB at 303K Assumption of a simple Rct –Cdl is usually a poor approximation especially for systems showing depressed semicircle behavior due to non – ideal capacitive behaviour of solid electrodes [33]. The capacitor in the equivalent circuit can be replaced by a constant phase element (CPE), which is a frequency dependent element and related to surface roughness. CPE is substituted for the respective capacitor of Cdl in order to give a more accurate fit. The impedance function of a CPE is defined in impedance [34] representation as (5). 1 ZCPE = ( Y0jω)n (5) Where, Y0 magnitude of CPE, n is exponent of CPE, and are frequency independent, and ω is the angular frequency for which – Z″ reaches its maximum value, n is dependent on the surface morphology : – 1 ≤ n ≤ 1. Y0 and n can be calculated by the equation proved by Mansfeld et al 2054 | P a g e
  • 7. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 3.3 Weight loss measurements 90 The experimental data of weight loss (∆w), SDB percentage of inhibition efficiency (µWL%), MSDB Corrosion Rate (C.R.) in mmpy and degree of 80 Surface Coverage (θ) for AA6063 in 1M Hydrochloric acid in absence and presence of various concentration of SDB and MSDB Schiff 70 % IE bases at 2 hours of exposure time and different temperature are shown in Table. 5. 60 3.3.1 Effect of inhibitor concentration The variation of inhibition efficiency (µWL%) with inhibitor concentration is shown in Fig..4(a). 50 Increase in inhibition efficiency at higher 0 2 4 6 8 10 concentration of inhibitor may be attributed to Time / h larger coverage of metal surface with inhibitor 4(b) molecules. The maximum inhibition efficiency was achieved at 100 ppm and a further increase in 90 inhibitor concentration caused no appreciable SDB MSDB change in performance 3.3.2 Effect of immersion time 80 The effect of immersion time on inhibition efficiency is shown in Fig..4(b). All the tested Schiff bases show a decrease in inhibition 70 % IE efficiency with increase in immersion time from 2 to 8 hours. This indicates desorption of the Schiff Base over a longer test period and may be 60 attributed to various other factors such as formation of less persistent film layer on the metal surface, and increase in cathodic reaction or increase in 50 303 313 323 333 ferrous ion concentration [37]. 4(c) Temp / K 3.3.3 Effect of temperature The influence of temperature on inhibition efficiency of two Schiff bases compounds is shown Figure. 4. Variation of inhibition efficiency with (a) in Fig.4(c). The inhibition efficiency for the two Inhibitor concentration (b) Exposure time (c) Schiff base compounds decreases with increase in Temperature in 1M Hydrochloric acid for SDB and temperature from 303 to 333K. The decrease in MSDB. inhibition efficiency with rise in temperature may be attributed to desorption of the inhibitor molecules from metal surface at higher temperatures and higher dissolution rates of aluminium at elevated temperatures. 90 SDB 85 MSDB 80 % IE 75 70 65 60 0 25 50 75 100 125 C / ppm 4(a) 2055 | P a g e
  • 8. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 Table- 5. Weight loss parameters for AA6063 in 1M hydrochloric acid in the absence and presence of various concentrations of SDB and MSDB at 2 hours of exposure time and different temperature. 3.3.4 Thermodynamic activation parameters 3.0 Thermodynamic activation parameters are Blank-63 important to study the inhibition mechanism. The SDB25ppm 2.5 SDB50ppm activation energy (Ea) is calculated from the SDB75ppm logarithm of the corrosion rate in acidic solution is 2.0 SDB100ppm -1 a linear function of (1/T) -Arrhenius equation (7): Log (CR) / mmy log (CR) = – Ea / 2.303RT + A 1.5 (7) 1.0 Where, Ea is the apparent effective activation energy, R is the universal gas constant and A is the 0.5 Arrhenius pre exponential factor. Plots of logarithm of corrosion rate obtained by weight loss 0.0 measurement versus 1/T gave straight lines and 2.9 3.0 3.1 3.2 3.3 3 -1 slope equal to (– Ea/2.303R) as shown in Figs. 5(a) (1 / T)10 / K 5(a) and 5(b) for SDB and MSDB respectively. The Ea values calculated are listed in Table.6. 2056 | P a g e
  • 9. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 0.5 3.0 Blank-63 Blank-63 MSDB25ppm MSDB25ppm 0.0 MSDB50ppm 2.5 MSDB50ppm MSDB75ppm MSDB75ppm MSDB100ppm -1 Log CR / T / mmy K MSDB100ppm -0.5 -1 2.0 -1 Log (CR) / mmy -1.0 1.5 1.0 -1.5 0.5 -2.0 2.9 3.0 3.1 3.2 3.3 0.0 3 -1 (1 / T)10 / K 2.9 3.0 3.1 3.2 3.3 6(b) (1 / T)10 / K 3 -1 5(b) Figure..6. Arrhenius plot of log (CR/T) versus 1/T Figure.5. Arrhenius plot of log CR versus 1/T in in absence and presence of (a) SDB and (b) MSDB absence and presence of (a) SDB and (b)MSDB Table-6. Thermodynamic parameters of activation A plot of log (CR/T) versus 1/T gave a of AA6063 in 1M HCl in presence and absence of straight line, Figs. 6(a) and (b) with a slope of (– different concentrations of SDB and MSDB ΔH/2.303 R) and an intercept of [(log (R/Nh) + (ΔS/2.303 R)], from which the values of ΔS* and Table-6. Thermodynamic parameters of activation ΔH* were calculated. The straight lines were of AA6063 in 1M HCl in presence and absence of obtained according to transition state equation (8): different concentrations of SDB and MSDB C R= RT/ N h exp(–ΔH*/ RT) exp (ΔS*/ R) (8) Where, h is the Plank constant, N is the Avogadro number, ΔS* is entropy of activation and ΔH* is the enthalpy of activation. The ΔS* and ΔH* values calculated are listed in Table. 6 0.5 Blank-63 SDB25ppm 0.0 SDB50ppm SDB75ppm SDB100ppm -1 Log CR / T / mmy K -0.5 -1 -1.0 -1.5 -2.0 2.9 3.0 3.1 3.2 3.3 3 -1 (1 / T)10 / K 6(a) 2057 | P a g e
  • 10. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 The Ea values of aluminium alloy in 1M Where C(inh) is inhibitor concentration and K(ads) is Hydrochloric acid in the presence of Schiff base an equilibrium constant for adsorption and compounds are higher than those in the absence of desorption. Schiff bases. The increase in the Ea values, with The K(ads) was calculated from the intercepts of the increasing inhibitor concentration is attributed to straight lines on the C(inh) / θ axis Fig.7(a) and physical adsorption of inhibitor molecules on the standard free energy of adsorption of inhibitor metal surface [38]. In other words, the adsorption ΔG0ads was calculated using the relation (10);. of inhibitor on the electrode surface leads to formation of a physical barrier that reduces the (10) ΔG0ads = – RT ln (55.5 Kads) metal dissolution in electrochemical reactions [39]. The inhibition efficiency decreases with increase in temperature which indicates desorption of inhibitor To calculate heat of adsorption (ΔH0ads) and molecules as the temperature increases [40]. entropy of adsorption (ΔS0ads) ln K(ads) vs. 1/T was The values of enthalpy of activation (ΔH*) are plotted as shown in Fig.7(b). The straight lines positive; this indicates that the corrosion process is were obtained with a sloe equal to (– ΔH0ads / R) endothermic. The values of entropy of activation and intercept equal to (ΔS0ads / R + ln 1/55.5). The (ΔS*) are higher in the presence of inhibitor than values of equilibrium constant (K(ads)), Standard those in the absence of inhibitor, The increase in free energy of adsorption(ΔG0ads ), enthalpy of values of ΔS* reveals that an increase in adsorption (ΔH0ads) and entropy of adsorption randomness occurred on going from reactants to (ΔS0ads) are listed in Table.7. the activated complex [41-43]. The negative values of standard free of 3.3.5 Adsorption isotherms adsorption indicated spontaneous adsorption of It is generally assumed that the adsorption of the Schiff bases on aluminium alloy surface. The inhibitor at the interface of metal and solution is the calculated standard free energy of adsorption first step in the mechanism of inhibition aggressive values for the Schiff bases are closer to – 40 kJ media. It is also widely mole–1 and it can be concluded that the adsorption of Schiff bases on the aluminium surface is more acknowledged that adsorption isotherms provide chemical than physical one [45]. The sign of useful insights into the mechanism of corrosion enthalpy and entropy of adsorption are positive and inhibition. The investigated compounds inhibit the is related to substitutional adsorption can be corrosion by adsorption at the metal surface. attributed to the increase in the solvent entropy and Theoretically, the adsorption process has been to a more positive water desorption enthalpy. The regarded as a simple substitution adsorption increase in entropy is the driving force for the process, in which an organic molecule in the adsorption of the Schiff bases on the aluminium aqueous phase substitutes the water molecules alloy surface. adsorbed on the metal surface [44]. The surface The adsorption of Schiff base on the aluminium coverage (θ) value calculated from weight loss data alloy surface can be attributed to adsorption of the for different concentrations of Schiff bases was organic compounds via phenolic and iminic groups used to explain the best adsorption isotherm. The in both cases. Among these two Schiff bases, the value of surface coverage (θ) was tested chelate effect of MSDB is greater than that of SDB. graphically for fitting a suitable adsorption This is due to the presence of two electron donating isotherm. Attempts were made to fit surface groups of –OCH3 in MSDB structure than SDB. coverage (θ) values of various isotherms including The more efficient adsorption of MSDB is the Langmuir, Freundlich and Temkin isotherms. result of electronegative oxygen atoms present in Among three adsorption isotherms obtained, the the MSDB compared to SDB Structure. best fitted isotherm was the Langmuir adsorption isotherm (C(inh) / θ vs. C(inh) ) Fig.7(a) with the linear regression coefficient values (R2) in the range of 0.9994 - 0.9996. The Langmuir adsorption isotherm can be expressed by following equation (9): C(inh) 1 = + C(inh) (9) θ K(ads) 2058 | P a g e
  • 11. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 140 2 SDB-R =0.9996 120 2 MSDB-R =0.9994 100 C//ppm 80 60 40 7(a) 20 0 25 50 75 100 125 C / ppm 10.0 SDB MSDB 9.5 -1 ln Kads/M 9.0 8.5 7(b) 8.0 2.9 3.0 3.1 3.2 3.3 Table-7. Thermodynamic parameters for the adsorption of 3 (1 / T)10 / K -1 inhibitor in 1M HCl on AA6063 alloy at different temperatures Figure.7. (a) Langmuir adsorption isotherm plot and (b) Heat of adsorption isotherm plot for SDB and MSDB 3.4 Scanning electron microscope (SEM) Scanning electron microscopy of the AA6063 sample of inhibited and uninhibited metal samples is presented in Fig. 8. The SEM study shows that the inhibited alloy surface is found smoother than the uninhibited surface. 2059 | P a g e
  • 12. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 a b c d Figure. 8. Scanning electron micrographs of (a) Polished AA6063 alloy, (b) After immersion in 1M HCl for 2h, (c) After immersion in 1M HCl for 2h in presence of 100 ppm SDB and (d) After immersion in 1M HCl for 2h in presence of 100 ppm MSDB. 4. Conclusions 1. The investigated Schiff bases are good 7. Scanning Electron Microscopy (SEM) inhibitors for aluminium alloy 6063 in 1M shows a smoother surface for inhibited alloy Hydrochloric acid solution. samples than uninhibited samples due to 2. In weight loss studies, the inhibition formation of protective barrier film. efficiency (µWL%) of the Schiff bases increase with increase in inhibitor References: concentration, whereas decreases with 1. U.Ergun, D.Yuzer and K.C.Emregul, increase in immersion time and temperature. Mater. Chem.Phys., 109(2008)492-499. 3. Potentiodynamic polarisation studies 2. T.Hurlen, H.H.Lian, O.S.Odegard and demonstrate the Schiff bases under T.V.Valand investigation act as mixed type but Mater.Chem.Phys.,29(1984)579-585. predominantly cathodic inhibitors. 3. A.K.Maayta, N.A.F.Al-Rawashdeh, 4. EIS measurements show that as the Corros.Sci. 46 (2004) 1129. inhibitor concentration is increased, the 4. E.E.Oguzie, Mater.Lett. 59 (2005) 1076. charge transfer resistance increases and 5. A. Popova, M. Chouristov, S. Raicheva, double layer capacitance decreases. E. Sokolova, Corros. Sci. 46 (2004) 1333. 5. The inhibition efficiency obtained using 6. R.G. Nuzzo, E.M. Korenic, L.H. Dubois, weight loss, potentiodynamic polarisation, J. Chem. Phys. 93, 767 (1980). and EIS studies are in good agreement and 7. A.Aytac, U.Ozmen and in accordance to the order: MSDB > SDB M.Kabbasakaloglu, Mater.Chem.Phys., for AA6063. 89(2005)176. 6. The adsorptions of Schiff bases on alloy 8. Hahner, G., Woll, Ch., Buck, M., Grunze, surface in 1M HCl solution are governed by M., 1993. Langmuir 9 (1), 955. Langmuir adsorption isotherm. 2060 | P a g e
  • 13. Sanaulla Pathapalya Fakrudeen, Lokesh H. B, Ananda Murthy H. C, Bheema Raju V. B / International Journal of Engineering Research and Applications (IJERA) ISSN: 2248-9622 www.ijera.com Vol. 2, Issue 5, September- October 2012, pp.2049-2061 9. H. Shorky, M. Yuasa, I. Sekine, R.M. Issa, 32. W.R. Fawcett, Z. Kovacova, A. Mtheo, C. H.Y. El-Baradie, G.K. Gomma, Corros. Foss, J. Electronal. Chem. 326, 91, Sci. 40, 2173 (1998). (1992). 10. C.D. Bain, E.B. Thouroughton, Y.T. Tao, 33. R. deLevi, Electrochem. Acta 8 (1963) J. Evall, G.M. Whiteside, J.G. Nuzzo, J. 751. Am. Soc. 111, 321. 34. H.J.W. Lenderink, M.V.D. Linden, J.H.W. 11. Z. Quan, S.H. Chen, Y. Li, X. Cui, De Wit, Electrochim. Acta 38 (1989) Corros. Sci. 44, 703 (2002). 1993.) 12. S.L. Li, Y.G. Wang, S.H. Chen, R. Yu, 35. F. Mansfeld, C.H. Tsai, H. Shih, in: R.S. S.B. Lei, H.Y. Ma, D.X. Liu, Corros. Sci. Munn (Ed.), Computer Modeling in 41, 1769 (1999). Corrosion,ASTM, Philadelphia, PA, 1992, 13. Ashish Kumar Singh, M . A. Quraishi, Int. p. 86. J. Electrochem. Sci., 7 (20120 3222-3241. 36. C.H. Hsu, F. Mansfeld, corrosion 57 14. Fatemeh baghaei Ravari, Athareh (2001) 747. Dadagarinezhad, Iran Shekhshoaei, J.Chi. 37. M.A Quraishi. Rawat J (2001) Corrosion Chem. Soc. 55, N° 3 (2010) 328-331. 19: 273. 15. Fatemeh baghaei Ravari, Athareh 38. H. Ashassi-Sorkhabi, B. Shaabani, D. Dadagarinezhad, Iran Shekhshoaei, Seifzadeh, Appl. Surf. Sci. 239 (2005) 154. G.U.Journal of Science. 22(3);175-182 39. F. Mansfeld, Corrosion Mechanism, (2009). Marcel Dekkar, New York, 1987, p. 119. 16. A.S. Patel, V. A. Panchal, G. V. Mudaliar, 40. Ashish Kumar Singh, M.A. Quraishi, N. K. Singh, Journal of Saudi Chemical Corros. Sci. 52 (2010) 156. society (2011)xxx, xxx, xxx. 41. E.A. Noor, A.H. Al-Moubaraki, Mater. 17. A. S. Patel, V. A. Panchal and N. K. Shah, Chem. Phys. 110 (2008) 145. PRAJÑĀ - Journal of Pure and Applied 42. A. Yurt, A. Balaban, S.U. Kandemir, G. Sciences, Vol. 18: 73 - 75 (2010). Bereket, B. Erk, Mater. Chem. Phys. 18. T. Sethi, A. Chaturvedi, R. K. Upadhyaya, 85(2004) 420. and S. P. Mathur, Protection of Metals 43. G.E. Badr, Corros. Sci. (2009), and Physical Chemistry of Surfaces, 2009, doi:10.1016/j.corsci.2009.06.017. Vol. 45, No. 4, pp. 466–471. 44. T. Paskossy, J. Electroanal. Chem. 364 19. A. S. FOUDA, G. Y. ELEWADY, A. EL- (1994) 111. ASKALANY, K. SHALABI, ZAŠTITA 45. A.Yurt, A. Balaban. S. Ustin Kandemir, MATERIJALA 51 (2010) broj 4, Scientific G. Bereket. B. Erk, Mateerials Chemistry paper UDC:620.197.3:669.717 and physics. 85 (2004) 420-426. 20. John Reglinski , Samantha Morris, Davina E. Stevenson Polyhedron 21 (2002) 2175- 2182 . Acknowledgement 21. ASTM (2004) Standard practice for Authors would like to thank for their Laboratory Immersion Corrsion Testing of encouragement to Dr. M.A. Quraishi, Professor of Metals G31-72. Chemistry, Banaras Hindu University (BHU), 22. A. Yurt, S. Ulutas, H. Dal, Appl. Surf. Sci. Varanasi, India, Dr. D.B. Fakruddin, Professor 253 (2006) 919. Emeritus, Siddaganga Institute of Technology, 23. A. El-Sayed, Corros. Prev. Control 43 Tumkur, India, Thanks are due to Dr. Syed Abu (1996) 23.). Sayeed Mohammed, Prof. MN Zulfiqar Ahmed and 24. M. Metikos-Hukovic, R. Babic, Z. Mr. Syed Nayazulla of department of Engineering Grubac, J. Appl. Electrochem. 28 (1998) Chemistry, Ms. Soni. M. EEE department, HKBK 433. College of Engineering, for their contribut 25. C.M.A. Brett, J. Appl. Electrochem. 20 (1990) 1000. 26. E.J. Lee, S.I. Pyun, Corros. Sci. 37 (1995) 157. 27. C.M.A. Brett, Corros. Sci. 33 (1992) 203. 28. K.F. Khaled, M.M. Al-Qahtani, Mater. Chem. Phys. 113 (2009) 150. 29. A. Ehteram Noor, Mater. Chem. Phys. 114 (2009) 533. 30. A. Aytac, U. Ozmen, M. Kabasakaloglu, Mater. Chem. Phys. 89 (2005) 176. 31. T. Pajkossy, J. Electronal. Chem. 364, 111, (1994). 2061 | P a g e