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• Name: Hasnain Sarwar
• Roll No.: 4128
• UOG Roll No.: 18571507-034
• Department: Chemistry
• Semester: 6th
• Teacher: Dr. Rashid
• Govt. Post Graduate Gordon College, Rawalpindi.
• Two of the most important materials silicon can be
doped with, are boron (3 valence electrons = 3-valent)
and phosphorus (5 valence electrons = 5-valent). Other
materials are aluminum, indium.valent) and arsenic,
antimony (5-valent)
• Doping is the intentional introduction of
impurities into an intrinsic semiconductor for
the purpose of
• 1-modulating
• 2-electrical
• 3-optical
• 4-structural properties.
• A Dopant, also called a doping agent, is a trace of
impurity element that is introduced into a chemical
material to alter its original electrical or optical
properties. The amount of dopant necessary to cause
changes is typically very low. When doped into
crystalline substances, the dopant's atoms get
incorporated into its crystal lattice.
• Because the band gap is so small
for semiconductors, doping with small
amounts of impurities can
dramatically increase the conductivity
of the material. Doping, therefore,
allows scientists to exploit the
properties of sets of elements referred
to as “dopants” in order to modulate
the conductivity of a semiconductor.
Types of doping
• There are Two types of doping:
1- N-Type:The dopant, which emits an electron, is known as
an electron donor.
• The 5-valent dopant has an outer electron more than the
silicon atoms. Four outer electrons combine with ever one
silicon atom, while the fifth electron is free to move and
serves as charge carrier.
• This free electron requires much less energy to be lifted from
the valence band into the conduction band, than the electrons
which cause the intrinsic conductivity of silicon
• The dopants are positively charged by the loss of negative
charge carriers and are built into the lattice, only the
negative electrons can move.
• Doped semimetals whose conductivity is based on free
(negative) electrons are n-type or n-doped.
2-P-TYPE DOPING
• In contrast to the free electron due to doping with
phosphorus, the 3-valent dopant effect is exactly the opposite.
• The 3-valent dopants can catch an additional outerelectron,
thus leaving a hole in the valence band of silicon atoms.
• Therefore the electrons in the valence band become
mobile.
• The holes move in the opposite direction to the movement of
the electrons.
• The necessary energy to lift an electron into the energy
level of indium as a dopant, is only 1 % of the energy
which is needed to raise a valence electron of silicon into
the conduction band.
• With the inclusion of an electron, the dopant is negatively
charged, such dopants are called acceptors.
• Again, the dopant is fixed in the crystal lattice, only the
positive charges can move. Due to positive holes these
semiconductors are called p-conductive or p-doped.
• Analog to n-doped semiconductors, the holes are the
majority charge carriers, free electrons are the minority
charge carriers.
Doping and its Types.

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Doping and its Types.

  • 1. • Name: Hasnain Sarwar • Roll No.: 4128 • UOG Roll No.: 18571507-034 • Department: Chemistry • Semester: 6th • Teacher: Dr. Rashid • Govt. Post Graduate Gordon College, Rawalpindi.
  • 2. • Two of the most important materials silicon can be doped with, are boron (3 valence electrons = 3-valent) and phosphorus (5 valence electrons = 5-valent). Other materials are aluminum, indium.valent) and arsenic, antimony (5-valent)
  • 3. • Doping is the intentional introduction of impurities into an intrinsic semiconductor for the purpose of • 1-modulating • 2-electrical • 3-optical • 4-structural properties.
  • 4. • A Dopant, also called a doping agent, is a trace of impurity element that is introduced into a chemical material to alter its original electrical or optical properties. The amount of dopant necessary to cause changes is typically very low. When doped into crystalline substances, the dopant's atoms get incorporated into its crystal lattice.
  • 5. • Because the band gap is so small for semiconductors, doping with small amounts of impurities can dramatically increase the conductivity of the material. Doping, therefore, allows scientists to exploit the properties of sets of elements referred to as “dopants” in order to modulate the conductivity of a semiconductor.
  • 6. Types of doping • There are Two types of doping: 1- N-Type:The dopant, which emits an electron, is known as an electron donor. • The 5-valent dopant has an outer electron more than the silicon atoms. Four outer electrons combine with ever one silicon atom, while the fifth electron is free to move and serves as charge carrier. • This free electron requires much less energy to be lifted from the valence band into the conduction band, than the electrons which cause the intrinsic conductivity of silicon
  • 7. • The dopants are positively charged by the loss of negative charge carriers and are built into the lattice, only the negative electrons can move. • Doped semimetals whose conductivity is based on free (negative) electrons are n-type or n-doped.
  • 8. 2-P-TYPE DOPING • In contrast to the free electron due to doping with phosphorus, the 3-valent dopant effect is exactly the opposite. • The 3-valent dopants can catch an additional outerelectron, thus leaving a hole in the valence band of silicon atoms. • Therefore the electrons in the valence band become mobile. • The holes move in the opposite direction to the movement of the electrons.
  • 9. • The necessary energy to lift an electron into the energy level of indium as a dopant, is only 1 % of the energy which is needed to raise a valence electron of silicon into the conduction band. • With the inclusion of an electron, the dopant is negatively charged, such dopants are called acceptors. • Again, the dopant is fixed in the crystal lattice, only the positive charges can move. Due to positive holes these semiconductors are called p-conductive or p-doped. • Analog to n-doped semiconductors, the holes are the majority charge carriers, free electrons are the minority charge carriers.