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CHARACTERIZATION
  OF MATERIALS
EDITORIAL BOARD
Elton N. Kaufmann, (Editor-in-Chief)   Ronald Gronsky
Argonne National Laboratory            University of California at Berkeley
Argonne, IL                            Berkeley, CA

Reza Abbaschian                        Leonard Leibowitz
University of Florida at Gainesville   Argonne National Laboratory
Gainesville, FL                        Argonne, IL

Peter A. Barnes                        Thomas Mason
Clemson University                     Spallation Neutron Source Project
Clemson, SC                            Oak Ridge, TN

Andrew B. Bocarsly                     Juan M. Sanchez
Princeton University                   University of Texas at Austin
Princeton, NJ                          Austin, TX

Chia-Ling Chien                        Alan C. Samuels, Developmental Editor
Johns Hopkins University               Edgewood Chemical Biological Center
Baltimore, MD                          Aberdeen Proving Ground, MD

David Dollimore
University of Toledo                   EDITORIAL STAFF
Toledo, OH
                                       VP, STM Books: Janet Bailey
Barney L. Doyle                        Executive Editor: Jacqueline I. Kroschwitz
Sandia National Laboratories           Editor: Arza Seidel
Albuquerque, NM                        Director, Book Production
                                       and Manufacturing:
Brent Fultz                            Camille P. Carter
                                       Managing Editor: Shirley Thomas
California Institute of Technology
                                       Assistant Managing Editor: Kristen Parrish
Pasadena, CA

Alan I. Goldman
Iowa State University
Ames, IA
CHARACTERIZATION
  OF MATERIALS
        VOLUMES 1 AND 2




  Characterization of Materials is available Online in full color
          at www.mrw.interscience.wiley.com/com.




        A John Wiley and Sons Publication
Copyright # 2003 by John Wiley & Sons, Inc. All rights reserved.

Published by John Wiley & Sons, Inc., Hoboken, New Jersey.
Published simultaneously in Canada.

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Library of Congress Cataloging in Publication Data is available.

Characterization of Materials, 2 volume set
Elton N. Kaufmann, editor-in-chief

ISBN: 0-471-26882-8 (acid-free paper)

Printed in the United States of America

10 9 8 7 6 5 4 3 2 1
CONTENTS, VOLUMES 1 AND 2

FOREWORD                                          vii       THERMAL ANALYSIS                                   337

PREFACE                                           ix        Thermal Analysis, Introduction                     337
                                                            Thermal Analysis—Definitions, Codes of Practice,
CONTRIBUTORS                                     xiii         and Nomenclature                                 337
                                                            Thermogravimetric Analysis                         344
COMMON CONCEPTS                                    1        Differential Thermal Analysis and Differential
                                                              Scanning Calorimetry                             362
Common Concepts in Materials Characterization,
                                                            Combustion Calorimetry                             373
  Introduction                                    1
                                                            Thermal Diffusivity by the Laser Flash Technique   383
General Vacuum Techniques                         1
                                                            Simultaneous Techniques Including Analysis
Mass and Density Measurements                    24
                                                              of Gaseous Products                              392
Thermometry                                      30
Symmetry in Crystallography                      39
Particle Scattering                              51         ELECTRICAL AND ELECTRONIC MEASUREMENTS             401
Sample Preparation for Metallography             63         Electrical and Electronic Measurement,
                                                              Introduction                                     401
                                                            Conductivity Measurement                           401
COMPUTATION AND THEORETICAL METHODS              71
                                                            Hall Effect in Semiconductors                      411
Computation and Theoretical Methods,                        Deep-Level Transient Spectroscopy                  418
  Introduction                                   71         Carrier Lifetime: Free Carrier Absorption,
Introduction to Computation                      71           Photoconductivity, and Photoluminescence         427
Summary of Electronic Structure Methods          74         Capacitance-Voltage (C-V) Characterization
Prediction of Phase Diagrams                     90           of Semiconductors                                456
Simulation of Microstructural Evolution                     Characterization of pn Junctions                   466
  Using the Field Method                         112        Electrical Measurements on Superconductors
Bonding in Metals                                134          by Transport                                     472
Binary and Multicomponent Diffusion              145
Molecular-Dynamics Simulation of Surface                    MAGNETISM AND MAGNETIC MEASUREMENTS                491
  Phenomena                                      156
Simulation of Chemical Vapor                                Magnetism and Magnetic Measurement,
  Deposition Processes                           166          Introduction                                     491
Magnetism in Alloys                              180        Generation and Measurement of Magnetic Fields      495
Kinematic Diffraction of X Rays                  206        Magnetic Moment and Magnetization                  511
Dynamical Diffraction                            224        Theory of Magnetic Phase Transitions               528
Computation of Diffuse Intensities in Alloys     252        Magnetometry                                       531
                                                            Thermomagnetic Analysis                            540
                                                            Techniques to Measure Magnetic Domain
MECHANICAL TESTING                               279          Structures                                       545
                                                            Magnetotransport in Metals and Alloys              559
Mechanical Testing, Introduction                 279        Surface Magneto-Optic Kerr Effect                  569
Tension Testing                                  279
High-Strain-Rate Testing of Materials            288
Fracture Toughness Testing Methods               302        ELECTROCHEMICAL TECHNIQUES                         579
Hardness Testing                                 316        Electrochemical Techniques, Introduction           579
Tribological and Wear Testing                    324        Cyclic Voltammetry                                 580

                                                        v
vi    CONTENTS, VOLUMES 1 AND 2

Electrochemical Techniques for Corrosion                 X-Ray Diffraction Techniques for Liquid
  Quantification                                   592      Surfaces and Monomolecular Layers            1027
Semiconductor Photoelectrochemistry               605
Scanning Electrochemical Microscopy               636    ELECTRON TECHNIQUES                            1049
The Quartz Crystal Microbalance
  in Electrochemistry                             653    Electron Techniques, Introduction              1049
                                                         Scanning Electron Microscopy                   1050
OPTICAL IMAGING AND SPECTROSCOPY                  665    Transmission Electron Microscopy               1063
                                                         Scanning Transmission Electron Microscopy:
Optical Imaging and Spectroscopy, Introduction    665      Z-Contrast Imaging                           1090
Optical Microscopy                                667    Scanning Tunneling Microscopy                  1111
Reflected-Light Optical Microscopy                 674    Low-Energy Electron Diffraction                1120
Photoluminescence Spectroscopy                    681    Energy-Dispersive Spectrometry                 1135
Ultraviolet and Visible Absorption Spectroscopy   688    Auger Electron Spectroscopy                    1157
Raman Spectroscopy of Solids                      698
Ultraviolet Photoelectron Spectroscopy            722
                                                         ION-BEAM TECHNIQUES                            1175
Ellipsometry                                      735
Impulsive Stimulated Thermal Scattering           744    Ion-Beam Techniques, Introduction              1175
                                                         High-Energy Ion-Beam Analysis                  1176
RESONANCE METHODS                                 761    Elastic Ion Scattering for Composition
                                                           Analysis                                     1179
Resonance Methods, Introduction                   761    Nuclear Reaction Analysis and Proton-Induced
Nuclear Magnetic Resonance Imaging                762      Gamma Ray Emission                           1200
Nuclear Quadrupole Resonance                      775    Particle-Induced X-Ray Emission                1210
Electron Paramagnetic Resonance Spectroscopy      792    Radiation Effects Microscopy                   1223
Cyclotron Resonance                               805    Trace Element Accelerator Mass
  ¨
Mossbauer Spectrometry                            816      Spectrometry                                 1235
                                                         Introduction to Medium-Energy Ion Beam
X-RAY TECHNIQUES                                  835      Analysis                                     1258
X-Ray Techniques, Introduction                    835    Medium-Energy Backscattering and
X-Ray Powder Diffraction                          835      Forward-Recoil Spectrometry                  1259
Single-Crystal X-Ray Structure Determination      850    Heavy-Ion Backscattering Spectrometry          1273
XAFS Spectroscopy                                 869
X-Ray and Neutron Diffuse Scattering                     NEUTRON TECHNIQUES                             1285
  Measurements                                    882
Resonant Scattering Techniques                    905    Neutron Techniques, Introduction               1285
Magnetic X-Ray Scattering                         917    Neutron Powder Diffraction                     1285
X-Ray Microprobe for Fluorescence                        Single-Crystal Neutron Diffraction             1307
  and Diffraction Analysis                         939   Phonon Studies                                 1316
X-Ray Magnetic Circular Dichroism                  953   Magnetic Neutron Scattering                    1328
X-Ray Photoelectron Spectroscopy                   970
Surface X-Ray Diffraction                         1007   INDEX                                          1341
FOREWORD

Whatever standards may have been used for materials                     The successes that accompanied the new approach to
research in antiquity, when fabrication was regarded                 materials research and development stimulated an
more as an art than a science and tended to be shrouded              entirely new spirit of invention. What had once been
in secrecy, an abrupt change occurred with the systematic            dreams, such as the invention of the automobile and the
discovery of the chemical elements two centuries ago by              airplane, were transformed into reality, in part through
Cavendish, Priestly, Lavoisier, and their numerous suc-              the modification of old materials and in part by creation
cessors. This revolution was enhanced by the parallel                of new ones. The growth in basic understanding of electro-
development of electrochemistry and eventually capped                magnetic phenomena, coupled with the discovery that
by the consolidating work of Mendeleyev which led to the             some materials possessed special electrical properties,
periodic chart of the elements.                                      encouraged the development of new equipment for power
   The age of materials science and technology had finally            conversion and new methods of long-distance communica-
begun. This does not mean that empirical or trial and error          tion with the use of wired or wireless systems. In brief, the
work was abandoned as unnecessary. But rather that a                 successes derived from the new approach to the develop-
new attitude had entered the field. The diligent fabricator           ment of materials had the effect of stimulating attempts
of materials would welcome the development of new tools              to achieve practical goals which had previously seemed
that could advance his or her work whether exploratory               beyond reach. The technical base of society was being
or applied. For example, electrochemistry became an                  shaken to its foundations. And the end is not yet in sight.
intimate part of the armature of materials technology.                  The process of fabricating special materials for well
   Fortunately, the physicist as well as the chemist were            defined practical missions, such as the development of
able to offer new tools. Initially these included such mat-          new inventions or improving old ones, has, and continues
ters as a vast improvement of the optical microscope, the            to have, its counterpart in exploratory research that is
development of the analytic spectroscope, the discovery              carried out primarily to expand the range of knowledge
of x-ray diffraction and the invention of the electron               and properties of materials of various types. Such investi-
microscope. Moreover, many other items such as isotopic              gations began in the field of mineralogy somewhat before
tracers, laser spectroscopes and magnetic resonance                  the age of modern chemistry and were stimulated by the
equipment eventually emerged and were found useful in                fact that many common minerals display regular cleavage
their turn as the science of physics and the demands for             planes and may exhibit unusual optical properties, such
better materials evolved.                                            as different indices of refraction in different directions.
   Quite apart from being used to re-evaluate the basis for          Studies of this type became much broader and more sys-
the properties of materials that had long been useful, the           tematic, however, once the variety of sophisticated
new approaches provided much more important dividends.               exploratory tools provided by chemistry and physics
The ever-expanding knowledge of chemistry made it possi-             became available. Although the groups of individuals
ble not only to improve upon those properties by varying             involved in this work tended to live somewhat apart from
composition, structure and other factors in controlled               the technologists, it was inevitable that some of their dis-
amounts, but revealed the existence of completely new                coveries would eventually prove to be very useful. Many
materials that frequently turned out to be exceedingly use-          examples can be given. In the 1870s a young investigator
ful. The mechanical properties of relatively inexpensive             who was studying the electrical properties of a group of
steels were improved by the additions of silicon, an element         poorly conducting metal sulfides, today classed among
which had been produced first as a chemist’s oddity. More             the family of semiconductors, noted that his specimens
complex ferrosilicon alloys revolutionized the performance           seemed to exhibit a different electrical conductivity when
of electric transformers. A hitherto all but unknown ele-            the voltage was applied in opposite directions. Careful
ment, tungsten, provided a long-term solution in the search          measurements at a later date demonstrated that specially
for a durable filament for the incandescent lamp. Even-               prepared specimens of silicon displayed this rectifying
tually the chemists were to emerge with valuable families            effect to an even more marked degree. Another investiga-
of organic polymers that replaced many natural materials.            tor discovered a family of crystals that displayed surface
                                                               vii
viii    FOREWORD

charges of opposite polarity when placed under unidirec-        bearing on the properties of materials being explored for
tional pressure, so called piezoelectricity. Natural radioac-   novel purposes. The semiconductor industry has been an
tivity was discovered in a specimen of a uranium mineral        important beneficiary of this form of exploratory research
whose physical properties were under study. Supercon-           since the operation of integrated circuits can be highly sen-
ductivity was discovered incidentally in a systematic study     sitive to imperfections.
of the electrical conductivity of simple metals close to the        In this connection, it should be added that the ever-
absolute zero of temperature. The possibility of creating a     increasing search for special materials that possess new
light-emitting crystal diode was suggested once wave            or superior properties under conditions in which the spon-
mechanics was developed and began to be applied to              sors of exploratory research and development and the pro-
advance our understanding of the properties of materials        spective beneficiaries of the technological advance have
further. Actually, achievement of the device proved to be       parallel interests has made it possible for those engaged
more difficult than its conception. The materials involved       in the exploratory research to share in the funds directed
had to be prepared with great care.                             toward applications. This has done much to enhance the
   Among the many avenues explored for the sake of              degree of partnership between the scientist and engineer
obtaining new basic knowledge is that related to the            in advancing the field of materials research.
influence of imperfections on the properties of materials.           Finally, it should be emphasized again that whenever
Some imperfections, such as those which give rise to            materials research has played a decisive role in advancing
temperature-dependent electrical conductivity in semicon-       some aspect of technology, the advance has frequently
ductors, salts and metals could be ascribed to thermal          been aided by the introduction of an increasingly sophisti-
fluctuations. Others were linked to foreign atoms which          cated set of characterization tools that are drawn from a
were added intentionally or occurred by accident. Still         wide range of scientific disciplines. These tools usually
others were the result of deviations in the arrangement         remain a part of the array of test equipment.
of atoms from that expected in ideal lattice structures.
As might be expected, discoveries in this area not only                                                 FREDERICK SEITZ
clarified mysteries associated with ancient aspects of                         President Emeritus, Rockefeller University
materials research, but provided tests that could have a              Past President, National Academy of Sciences, USA
PREFACE

Materials research is an extraordinarily broad and diverse           that is observed. When both tool and sample each contri-
field. It draws on the science, the technology, and the tools         bute their own materials properties—e.g., electrolyte and
of a variety of scientific and engineering disciplines as it          electrode, pin and disc, source and absorber, etc.—distinc-
pursues research objectives spanning the very fundamen-              tions are blurred. Although these distinctions in principle
tal to the highly applied. Beyond the generic idea of a              ought not to be taken too seriously, keeping them in mind
‘‘material’’ per se, perhaps the single unifying element             will aid in efficiently accessing content of interest in these
that qualifies this collection of pursuits as a field of               volumes.
research and study is the existence of a portfolio of charac-           Frequently, the materials property sought is not what
terization methods that is widely applicable irrespective of         is directly measured. Rather it is deduced from direct
discipline or ultimate materials application. Characteriza-          observation of some other property or phenomenon that
tion of Materials specifically addresses that portfolio with          acts as a signature of what is of interest. These relation-
which researchers and educators must have working                    ships take many forms. Thermal arrest, magnetic anomaly,
familiarity.                                                         diffraction spot intensity, relaxation rate and resistivity,
   The immediate challenge to organizing the content for a           to name only a few, might all serve as signatures of a phase
methodological reference work is determining how best to             transition and be used as ‘‘spectator’’ properties to deter-
parse the field. By far the largest number of materials               mine a critical temperature. Similarly, inferred properties
researchers are focused on particular classes of materials           such as charge carrier mobility are deduced from basic
and also perhaps on their uses. Thus a comfortable choice            electrical quantities and temperature-composition phase
would have been to commission chapters accordingly.                  diagrams are deduced from observed microstructures.
Alternatively, the objective and product of any measure-             Characterization of Materials, being organized by techni-
ment,—i.e., a materials property—could easily form a logi-           que, naturally places initial emphasis on the most directly
cal basis. Unfortunately, each of these approaches would             measured properties, but authors have provided many
have required mention of several of the measurement                  application examples that illustrate the derivative proper-
methods in just about every chapter. Therefore, if only to           ties a techniques may address.
reduce redundancy, we have chosen a less intuitive taxon-               First among our objectives is to help the researcher dis-
omy by arranging the content according to the type of mea-           criminate among alternative measurement modalities
surement ‘‘probe’’ upon which a method relies. Thus you              that may apply to the property under study. The field of
will find chapters focused on application of electrons,               possibilities is often very wide, and although excellent
ions, x rays, heat, light, etc., to a sample as the generic          texts treating each possible method in great detail exist,
thread tying several methods together. Our field is too               identifying the most appropriate method before delving
complex for this not to be an oversimplification, and indeed          deeply into any one seems the most efficient approach.
some logical inconsistencies are inevitable.                         Characterization of Materials serves to sort the options at
   We have tried to maintain the distinction between a               the outset, with individual articles affording the research-
property and a method. This is easy and clear for methods            er a description of the method sufficient to understand its
based on external independent probes such as electron                applicability, limitations, and relationship to competing
beams, ion beams, neutrons, or x-rays. However many                  techniques, while directing the reader to more extensive
techniques rely on one and the same phenomenon for                   resources that fit specific measurement needs.
probe and property, as is the case for mechanical, electro-             Whether one plans to perform such measurements one-
nic, and thermal methods. Many methods fall into both                self or whether one simply needs to gain sufficient famil-
regimes. For example, light may be used to observe a                 iarity to effectively collaborate with experts in the
microstructure, but may also be used to measure an optical           method, Characterization of Materials will be a useful
property. From the most general viewpoint, we recognize              reference. Although our expert authors were given great
that the properties of the measuring device and those of             latitude to adjust their presentations to the ‘‘personalities’’
the specimen under study are inextricably linked. It is              of their specific methods, some uniformity and circum-
actually a joint property of the tool-plus-sample system             scription of content was sought. Thus, you will find most
                                                                ix
x     PREFACE

units organized in a similar fashion. First, an introduction     be a necessary corollary to an experiment to understand
serves to succinctly describe for what properties the            the result after the fact or to predict the result and thus
method is useful and what alternatives may exist. Under-         help direct an experimental search in advance. More
lying physical principles of the method and practical            than this, as equipment needs of many experimental stu-
aspects of its implementation follow. Most units will offer      dies increase in complexity and cost, as the materials
examples of data and their analyses as well as warnings          themselves become more complex and multicomponent in
about common problems of which one should be aware.              nature, and as computational power continues to expand,
Preparation of samples and automation of the methods             simulation of properties will in fact become the measure-
are also treated as appropriate.                                 ment method of choice in many cases.
   As implied above, the level of presentation of these             Another unique chapter is the first, covering ‘‘common
volumes is intended to be intermediate between cursory           concepts.’’ It collects some of the ubiquitous aspects of mea-
overview and detailed instruction. Readers will find that,        surement methods that would have had to be described
in practice, the level of coverage is also very much dictated    repeatedly and in more detail in later units. Readers
by the character of the technique described. Many are            may refer back to this chapter as related topics arise
based on quite complex concepts and devices. Others are          around specific methods, or they may use this chapter as
less so, but still, of course, demand a precision of under-      a general tutorial. The Common Concepts chapter, how-
standing and execution. What is or is not included in a pre-     ever, does not and should not eliminate all redundancies
sentation also depends on the technical background               in the remaining chapters. Expositions within individual
assumed of the reader. This obviates the need to delve           articles attempt to be somewhat self-contained and the
into concepts that are part of rather standard technical         details as to how a common concept actually relates to a
curricula, while requiring inclusion of less common, more        given method are bound to differ from one to the next.
specialized topics.                                              Although Characterization of Materials is directed more
   As much as possible, we have avoided extended discus-         toward the research lab than the classroom, the focused
sion of the science and application of the materials proper-     units in conjunction with chapters one and two can serve
ties themselves, which, although very interesting and            as a useful educational tool.
clearly the motivation for research in first place, do not           The content of Characterization of Materials had pre-
generally speak to efficacy of a method or its accomplish-        viously appeared as Methods in Materials Research, a
ment.                                                            loose-leaf compilation amenable to updating. To retain
   This is a materials-oriented volume, and as such, must        the ability to keep content as up to date as possible, Char-
overlap fields such as physics, chemistry, and engineering.       acterization of Materials is also being published on-line
There is no sharp delineation possible between a ‘‘physics’’     where several new and expanded topics will be added
property (e.g., the band structure of a solid) and the mate-     over time.
rials consequences (e.g., conductivity, mobility, etc.) At the
other extreme, it is not at all clear where a materials prop-
erty such as toughness ends and an engineering property          ACKNOWLEDGMENTS
associated with performance and life-cycle begins. The
very attempt to assign such concepts to only one disciplin-      First we express our appreciation to the many expert
ary category serves no useful purpose. Suffice it to say,         authors who have contributed to Characterization of
therefore, that Characterization of Materials has focused        Materials. On the production side of the predecessor
its coverage on a core of materials topics while trying to       publication, Methods in Materials Research, we are
remain inclusive at the boundaries of the field.                  pleased to acknowledge the work of a great many staff of
   Processing and fabrication are also important aspect of       the Current Protocols division of John Wiley & Sons, Inc.
materials research. Characterization of Materials does not       We also thank the previous series editors, Dr. Virginia
deal with these methods per se because they are not              Chanda and Dr. Alan Samuels. Republication in the
strictly measurement methods. However, here again no             present on-line and hard-bound forms owes its continu-
clear line is found and in such methods as electrochemis-        ing quality to staff of the Major Reference Works group of
try, tribology, mechanical testing, and even ion-beam irra-      John Wiley & Sons, Inc., most notably Dr. Jacqueline
diation, where the processing can be the measurement,            Kroschwitz and Dr. Arza Seidel.
these aspects are perforce included.
   The second chapter is unique in that it collects methods
that are not, literally speaking, measurement methods;                                                    For the editors,
these articles do not follow the format found in subsequent
chapters. As theory or simulation or modeling methods,                                                    ELTON N. KAUFMANN
they certainly serve to augment experiment. They may                                                      Editor-in-Chief
CONTRIBUTORS

Reza Abbaschian                                            Peter A. Barnes
University of Florida at Gainesville                       Clemson University
Gainesville, FL                                            Clemson, SC
Mechanical Testing, Introduction                           Electrical and Electronic Measurements, Introduction
     ˚                                                     Capacitance-Voltage (C-V) Characterization of
John Agren
                                                           Semiconductors
Royal Institute of Technology, KTH
Stockholm, SWEDEN                                          Jack Bass
Binary and Multicomponent Diffusion                        Michigan State University
Stephen D. Antolovich                                      East Lansing, MI
Washington State University                                Magnetotransport in Metals and Alloys
Pullman, WA                                                Bob Bastasz
Tension Testing                                            Sandia National Laboratories
Samir J. Anz                                               Livermore, CA
California Institute of Technology                         Particle Scattering
Pasadena, CA
                                                           Raymond G. Bayer
Semiconductor Photoelectrochemistry
                                                           Consultant
Georgia A. Arbuckle-Keil                                   Vespal, NY
Rutgers University                                         Tribological and Wear Testing
Camden, NJ
The Quartz Crystal Microbalance In Electrochemistry        Goetz M. Bendele
                                                           SUNY Stony Brook
Ljubomir Arsov                                             Stony Brook, NY
University of Kiril and Metodij                            X-Ray Powder Diffraction
Skopje, MACEDONIA
Ellipsometry                                               Andrew B. Bocarsly
                                                           Princeton University
Albert G. Baca                                             Princeton, NJ
Sandia National Laboratories                               Cyclic Voltammetry
Albuquerque, NM                                            Electrochemical Techniques, Introduction
Characterization of pn Junctions
                                                           Mark B.H. Breese
Sam Bader
                                                           University of Surrey, Guildford
Argonne National Laboratory
                                                           Surrey, UNITED KINGDOM
Argonne, IL
                                                           Radiation Effects Microscopy
Surface Magneto-Optic Kerr Effect
James C. Banks                                             Iain L. Campbell
Sandia National Laboratories                               University of Guelph
Albuquerque, NM                                            Guelph, Ontario CANADA
Heavy-Ion Backscattering Spectrometry                      Particle-Induced X-Ray Emission

Charles J. Barbour                                         Gerbrand Ceder
Sandia National Laboratory                                 Massachusetts Institute of Technology
Albuquerque, NM                                            Cambridge, MA
Elastic Ion Scattering for Composition Analysis            Introduction to Computation
                                                      xi
xii    CONTRIBUTORS

Robert Celotta                                      Gareth R. Eaton
National Institute of Standards and                 University of Denver
Technology Gaithersburg, MD                         Denver, CO
Techniques to Measure Magnetic Domain Structures    Electron Paramagnetic Resonance
                                                    Spectroscopy
Gary W. Chandler
University of Arizona                               Sandra S. Eaton
Tucson, AZ                                          University of Denver
Scanning Electron Microscopy                        Denver, CO
                                                    Electron Paramagnetic Resonance
Haydn H. Chen                                       Spectroscopy
University of Illinois
Urbana, IL                                          Fereshteh Ebrahimi
Kinematic Diffraction of X Rays                     University of Florida
                                                    Gainesville, FL
Long-Qing Chen                                      Fracture Toughness Testing Methods
Pennsylvania State University
University Park, PA                                 Wolfgang Eckstein
Simulation of Microstructural Evolution Using the   Max-Planck-Institut fur Plasmaphysik
Field Method                                        Garching, GERMANY
                                                    Particle Scattering
Chia-Ling Chien
Johns Hopkins University                            Arnel M. Fajardo
Baltimore, MD                                       California Institute of Technology
Magnetism and Magnetic Measurements, Introduction   Pasadena, CA
                                                    Semiconductor Photoelectrochemistry
J.M.D. Coey
University of Dublin, Trinity College               Kenneth D. Finkelstein
Dublin, IRELAND                                     Cornell University
Generation and Measurement of Magnetic Fields       Ithaca, NY
                                                    Resonant Scattering Technique
Richard G. Connell
University of Florida                               Simon Foner
Gainesville, FL                                     Massachusetts Institute of Technology
Optical Microscopy Reflected-Light                   Cambridge, MA
Optical Microscopy                                  Magnetometry
                                                    Brent Fultz
Didier de Fontaine
                                                    California Institute of Technology
University of California
                                                    Pasadena, CA
Berkeley, CA
                                                    Electron Techniques, Introduction
Prediction of Phase Diagrams
                                                      ¨
                                                    Mossbauer Spectrometry
T.M. Devine                                         Resonance Methods, Introduction
University of California                            Transmission Electron Microscopy
Berkeley, CA
                                                    Jozef Gembarovic
Raman Spectroscopy of Solids
                                                    Thermophysical Properties Research Laboratory
David Dollimore                                     West Lafayette, IN
University of Toledo                                Thermal Diffusivity by the Laser
Toledo, OH                                          Flash Technique
Mass and Density Measurements Thermal Analysis-     Craig A. Gerken
Definitions, Codes of Practice, and Nomenclature     University of Illinois
Thermometry                                         Urbana, IL
Thermal Analysis, Introduction                      Low-Energy, Electron Diffraction
Barney L. Doyle                                     Atul B. Gokhale
Sandia National Laboratory                          MetConsult, Inc.
Albuquerque, NM                                     Roosevelt Island, NY
High-Energy Ion Beam Analysis                       Sample Preparation for Metallography
Ion-Beam Techniques, Introduction
                                                    Alan I. Goldman
Jeff G. Dunn                                        Iowa State University
University of Toledo                                Ames, IA
Toledo, OH                                          X-Ray Techniques, Introduction
Thermogravimetric Analysis                          Neutron Techniques, Introduction
CONTRIBUTORS       xiii

John T. Grant                                   Robert A. Jacobson
University of Dayton                            Iowa State University
Dayton, OH                                      Ames, IA
Auger Electron Spectroscopy                     Single-Crystal X-Ray Structure Determination

George T. Gray                                  Duane D. Johnson
Los Alamos National Laboratory                  University of Illinois
Los Alamos, NM                                  Urbana, IL
High-Strain-Rate Testing of Materials           Computation of Diffuse Intensities in Alloys
                                                Magnetism in Alloys
Vytautas Grivickas
                                                Michael H. Kelly
Vilnius University
                                                National Institute of Standards and Technology
Vilnius, LITHUANIA
                                                Gaithersburg, MD
Carrier Lifetime: Free Carrier Absorption,
                                                Techniques to Measure Magnetic Domain Structures
Photoconductivity, and Photoluminescence
                                                Elton N. Kaufmann
Robert P. Guertin
                                                Argonne National Laboratory
Tufts University
                                                Argonne, IL
Medford, MA
                                                Common Concepts in Materials Characterization,
Magnetometry
                                                Introduction
Gerard S. Harbison                              Janice Klansky
University of Nebraska                          Beuhler Ltd.
Lincoln, NE                                     Lake Bluff, IL
Nuclear Quadrupole Resonance                    Hardness Testing
Steve Heald                                     Chris R. Kleijn
Argonne National Laboratory                     Delft University of Technology
Argonne, IL                                     Delft, THE NETHERLANDS
XAFS Spectroscopy                               Simulation of Chemical Vapor Deposition Processes

Bruno Herreros                                  James A. Knapp
University of Southern California               Sandia National Laboratories
Los Angeles, CA                                 Albuquerque, NM
Nuclear Quadrupole Resonance                    Heavy-Ion Backscattering Spectrometry
                                                Thomas Koetzle
John P. Hill
                                                Brookhaven National Laboratory
Brookhaven National Laboratory
                                                Upton, NY
Upton, NY
                                                Single-Crystal Neutron Diffraction
Magnetic X-Ray Scattering
Ultraviolet Photoelectron Spectroscopy          Junichiro Kono
                                                Rice University
Kevin M. Horn                                   Houston, TX
Sandia National Laboratories                    Cyclotron Resonance
Albuquerque, NM
Ion Beam Techniques, Introduction               Phil Kuhns
                                                Florida State University
Joseph P. Hornak                                Tallahassee, FL
Rochester Institute of Technology               Generation and Measurement of Magnetic Fields
Rochester, NY                                   Jonathan C. Lang
Nuclear Magnetic Resonance Imaging              Argonne National Laboratory
James M. Howe                                   Argonne, IL
University of Virginia                          X-Ray Magnetic Circular Dichroism
Charlottesville, VA                             David E. Laughlin
Transmission Electron Microscopy                Carnegie Mellon University
                                                Pittsburgh, PA
Gene E. Ice
                                                Theory of Magnetic Phase Transitions
Oak Ridge National Laboratory
Oak Ridge, TN                                   Leonard Leibowitz
X-Ray Microprobe for Fluorescence               Argonne National Laboratory
and Diffraction                                 Argonne, IL
Analysis X-Ray and Neutron Diffuse Scattering   Differential Thermal Analysis and Differential Scanning
Measurements                                    Calorimetry
xiv    CONTRIBUTORS

Supaporn Lerdkanchanaporn                                 Daniel T. Pierce
University of Toledo                                      National Institute of Standards and Technology
Toledo, OH                                                Gaithersburg, MD
Simultaneouse Techniques Including Analysis of Gaseous    Techniques to Measure Magnetic
Products                                                  Domain Structures
Nathan S. Lewis                                           Frank J. Pinski
California Institute of Technology                        University of Cincinnati
Pasadena, CA                                              Cincinnati, OH
Semiconductor Photoelectrochemistry                       Magnetism in Alloys
Dusan Lexa                                                Computation of Diffuse Intensities in Alloys
Argonne National Laboratory                               Branko N. Popov
Argonne, IL                                               University of South Carolina
Differential Thermal Analysis and Differential Scanning   Columbia, SC
Calorimetry                                               Ellipsometry
Jan Linnros
                                                          Ziqiang Qiu
Royal Institute of Technology
                                                          University of California at Berkeley
Kista-Stockholm, SWEDEN
                                                          Berkeley, CA
Carrier Liftime: Free Carrier Absorption,
                                                          Surface Magneto-Optic Kerr Effect
Photoconductivity, and Photoluminescene
David C. Look                                             Talat S. Rahman
Wright State University                                   Kansas State University
Dayton, OH                                                Manhattan, Kansas
Hall Effect in Semiconductors                             Molecular-Dynamics Simulation of Surface Phenomena
Jeffery W. Lynn                                           T.A. Ramanarayanan
University of Maryland                                    Exxon Research and Engineering Corp.
College Park, MD                                          Annandale, NJ
Magentic Neutron Scattering                               Electrochemical Techniques for Corrosion Quantification
Kosta Maglic                                              M. Ramasubramanian
Institute of Nuclear Sciences ‘‘Vinca’’                   University of South Carolina
Belgrade, YUGOSLAVIA                                      Columbia, SC
Thermal Diffusivity by the Laser Flash Technique          Ellipsometry
Floyd McDaniel                                            S.S.A. Razee
University of North Texas                                 University of Warwick
Denton, TX                                                Coventry, UNITED KINGDOM
Trace Element Accelerator Mass Spectrometry               Magnetism in Alloys
Michael E. McHenry
Carnegie Mellon University                                James L. Robertson
Pittsburgh, PA                                            Oak Ridge National Laboratory
Magnetic Moment and Magnetization                         Oak Ridge, TN
Thermomagnetic Analysis                                   X-Ray and Neutron Diffuse Scattering Measurements
Theory of Magnetic Phase Transitions                      Ian K. Robinson
Keith A. Nelson                                           University of Illinois
Massachusetts Institute of Technology                     Urbana, IL
Cambridge, MA                                             Surface X-Ray Diffraction
Impulsive Stimulated Thermal Scattering
                                                          John A. Rogers
Dale E. Newbury                                           Bell Laboratories, Lucent Technologies
National Institute of Standards and Technology            Murray Hill, NJ
Gaithersburg, MD                                          Impulsive Stimulated Thermal Scattering
Energy-Dispersive Spectrometry
P.A.G. O’Hare                                             William J. Royea
Darien, IL                                                California Institute of Technology
Combustion Calorimetry                                    Pasadena, CA
                                                          Semiconductor Photoelectrochemistry
Stephen J. Pennycook
Oak Ridge National Laboratory                             Larry Rubin
Oak Ridge, TN                                             Massachusetts Institute of Technology
Scanning Transmission Electron                            Cambridge, MA
Microscopy: Z-Contrast Imaging                            Generation and Measurement of Magnetic Fields
CONTRIBUTORS      xv

Miquel Salmeron                                       Hugo Steinfink
Lawrence Berkeley National Laboratory                 University of Texas
Berkeley, CA                                          Austin, TX
Scanning Tunneling Microscopy                         Symmetry in Crystallography
Alan C. Samuels                                       Peter W. Stephens
Edgewood Chemical Biological Center                   SUNY Stony Brook
Aberdeen Proving Ground, MD                           Stony Brook, NY
Mass and Density Measurements                         X-Ray Powder Diffraction
Optical Imaging and Spectroscopy, Introduction
Thermometry                                           Ray E. Taylor
                                                      Thermophysical Properties Research Laboratory
Juan M. Sanchez                                       West Lafayette, IN 47906
University of Texas at Austin                         Thermal Diffusivity by the Laser Flash Technique
Austin, TX
Computational and Theoretical Methods, Introduction   Chin-Che Tin
                                                      Auburn University
Hans J. Schneider-Muntau
                                                      Auburn, AL
Florida State University
                                                      Deep-Level Transient Spectroscopy
Tallahassee, FL
Generation and Measurement of Magnetic Fields         Brian M. Tissue
                                                      Virginia Polytechnic Institute & State University
Christian Schott
                                                      Blacksburg, VA
Swiss Federal Institute of Technology
                                                      Ultraviolet and Visible Absorption Spectroscopy
Lausanne, SWITZERLAND
Generation and Measurement of Magnetic Fields         James E. Toney
Justin Schwartz                                       Applied Electro-Optics Corporation
Florida State University                              Bridgeville, PA
Tallahassee, FL                                       Photoluminescene Spectroscopy
Electrical Measurements on Superconductors by         John Unguris
Transport                                             National Institute of Standards and Technology
Supapan Seraphin                                      Gaithersburg, MD
University of Arizona                                 Techniques to Measure Magnetic Domain Structures
Tucson, AZ                                            David Vaknin
Scanning Electron Microscopy                          Iowa State University
Qun Shen                                              Ames, IA
Cornell University                                    X-Ray Diffraction Techniques for Liquid Surfaces and
Ithaca, NY                                            Monomolecular Layers
Dynamical Diffraction Y
                                                      Mark van Schilfgaarde
Jack Singleton                                        SRI International
Consultant                                            Menlo Park, California
Monroeville, PA                                       Summary of Electronic Structure Methods
General Vacuum Techniques
                                                         ¨
                                                      Gyorgy Vizkelethy
Gabor A. Somorjai
                                                      Sandia National Laboratories
University of California & Lawrence Berkeley
                                                      Albuquerque, NM
National Laboratory
                                                      Nuclear Reaction Analysis and Proton-Induced Gamma
Berkeley, CA
                                                      Ray Emission
Low-Energy Electron Diffraction
                                                      Thomas Vogt
Cullie J. Sparks
                                                      Brookhaven National Laboratory
Oak Ridge National Laboratory
                                                      Upton, NY
Oak Ridge, TN
                                                      Neutron Powder Diffraction
X-Ray and Neutron Diffuse Scattering Measurements
Costas Stassis                                        Yunzhi Wang
Iowa State University                                 Ohio State University
Ames, IA                                              Columbus, OH
Phonon Studies                                        Simulation of Microstructural Evolution Using the Field
                                                      Method
Julie B. Staunton
University of Warwick                                 Richard E. Watson
Coventry, UNITED KINGDOM                              Brookhaven National Laboratory
Computation of Diffuse Intensities in Alloys          Upton, NY
Magnetism in Alloys                                   Bonding in Metals
xvi    CONTRIBUTORS

Huub Weijers                                 Introduction To Medium-Energy Ion Beam Analysis
Florida State University                     Medium-Energy Backscattering and Forward-Recoil
Tallahassee, FL                              Spectrometry
Electrical Measurements on Superconductors
by Transport                                 Stuart Wentworth
                                             Auburn University
Jefferey Weimer                              Auburn University, AL
University of Alabama                        Conductivity Measurement
Huntsville, AL
X-Ray Photoelectron Spectroscopy             David Wipf
Michael Weinert                              Mississippi State University
Brookhaven National Laboratory               Mississippi State, MS
Upton, NY                                    Scanning Electrochemical Microscopy
Bonding in Metals                            Gang Xiao
Robert A. Weller                             Brown University
Vanderbilt University                        Providence, RI
Nashville, TN                                Magnetism and Magnetic Measurements, Introduction
CHARACTERIZATION
  OF MATERIALS
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COMMON CONCEPTS
COMMON CONCEPTS IN MATERIALS                                           As Characterization of Materials evolves, additional
CHARACTERIZATION, INTRODUCTION                                      common concepts will be added. However, when it seems
                                                                    more appropriate, such content will appear more closely
From a tutorial standpoint, one may view this chapter as            tied to its primary topical chapter.
a good preparatory entrance to subsequent chapters of
Characterization of Materials. In an educational setting,                                         ELTON N. KAUFMANN
the generally applicable topics of the units in this chapter
can play such a role, notwithstanding that they are each
quite independent without having been sequenced with
                                                                    GENERAL VACUUM TECHNIQUES
any pedagogical thread in mind.
   In practice, we expect that each unit of this chapter will
                                                                    INTRODUCTION
be separately valuable to users of Characterization of
Materials as they choose to refer to it for concepts under-
                                                                    In this unit we discuss the procedures and equipment used
lying many of those exposed in units covering specific mea-
                                                                    to maintain a vacuum system at pressures in the range
surement methods.
                                                                    from 10À3 to 10À11 torr. Total and partial pressure gauges
   Of course, not every topic covered by a unit in this chap-
                                                                    used in this range are also described.
ter will be relevant to every measurement method covered
                                                                        Because there is a wide variety of equipment, we
in subsequent chapters. However, the concepts in this
                                                                    describe each of the various components, including details
chapter are sufficiently common to appear repeatedly in
                                                                    of their principles and technique of operation, as well as
the pursuit of materials research. It can be argued that
                                                                    their recommended uses.
the units treating vacuum techniques, thermometry, and
                                                                        SI units are not used in this unit. The American
sample preparation do not deal directly with the materials
                                                                    Vacuum Society attempted their introduction many years
properties to be measured at all. Rather, they are crucial to
                                                                    ago, but the more traditional units continue to dominate in
preparation and implementation of such a measurement.
                                                                    this field in North America. Our usage will be consistent
It is interesting to note that the properties of materials
                                                                    with that generally found in the current literature. The
nevertheless play absolutely crucial roles for each of these
                                                                    following units will be used.
topics as they rely on materials performance to accomplish
                                                                        Pressure is given in torr. 1 torr is equivalent to 133.32
their ends.
                                                                    pascal (Pa).
   Mass/density measurement does of course relate to a
                                                                        Volume is given in liters (L), and time in seconds (s).
most basic materials property, but is itself more likely to
                                                                        The flow of gas through a system, i.e., the ‘‘throughput’’
be an ancillary necessity of a measurement protocol than
                                                                    (Q), is given in torr-L/s.
to be the end goal of a measurement (with the important
                                                                        Pumping speed (S) and conductance (C) are given in
exceptions of properties related to porosity, defect density,
                                                                    L/s.
etc.). In temperature and mass measurement, apprecia-
ting the role of standards and definitions is central to pro-
per use of these parameters.
                                                                    PRINCIPLES OF VACUUM TECHNOLOGY
   It is hard to think of a materials property that does not
depend on the crystal structure of the materials in ques-
                                                                    The most difficult step in designing and building a vacuum
tion. Whether the structure is a known part of the explana-
                                                                    system is defining precisely the conditions required to ful-
tion of the value of another property or its determination is
                                                                    fill the purpose at hand. Important factors to consider
itself the object of the measurement, a good grounding
                                                                    include:
in essentials of crystallographic groups and syntax is a
common need in most measurement circumstances. A
                                                                       1. The required system operating pressure and the
unit provided in this chapter serves that purpose well.
                                                                          gaseous impurities that must be avoided;
   Several chapters in Characterization of Materials deal
with impingement of projectiles of one kind or another                 2. The frequency with which the system must be vented
on a sample, the reaction to which reflects properties of                  to the atmosphere, and the required recycling time;
interest in the target. Describing the scattering of the pro-          3. The kind of access to the vacuum system needed for
jectiles is necessary in all these cases. Many concepts in                the insertion or removal of samples.
such a description are similar regardless of projectile
type, while the details differ greatly among ions, electrons,          For systems operating at pressures of 10À6 to 10À7 torr,
neutrons, and photons. Although the particle scattering             venting the system is the simplest way to gain access, but
unit in this chapter emphasizes the charged particle and            for ultrahigh vacuum (UHV), e.g., below 10À8 torr, the
ions in particular, the concepts are somewhat portable. A           pumpdown time can be very long, and system bakeout
good deal of generic scattering background is provided in           would usually be required. A vacuum load-lock antecham-
the chapters covering neutrons, x rays, and electrons as            ber for the introduction and removal of samples may be
projectiles as well.                                                essential in such applications.
                                                                1
2      COMMON CONCEPTS

   Because it is difficult to address all of the above ques-      rapidly. However, water will persist as the major outgas-
tions, a viable specification of system performance is often      sing load. Every time a system is vented to air, the walls
neglected, and it is all too easy to assemble a more sophis-     are exposed to moisture and one or more layers of water
ticated and expensive system than necessary, or, if bud-         will adsorb virtually instantaneously. The amount
gets are low, to compromise on an inadequate system              adsorbed will be greatest when the relative humidity is
that cannot easily be upgraded.                                  high, increasing the time needed to reach base pressure.
   Before any discussion of the specific components of a          Water is bound by physical adsorption, a reversible pro-
vacuum system, it is instructive to consider the factors         cess, but the binding energy of adsorption is so great
that govern the ultimate, or base, pressure. The pressure        that the rate of desorption is slow at ambient temperature.
can be calculated from                                           Physical adsorption involves van der Waal’s forces, which
                                                                 are relatively weak. Physical adsorption should be distin-
                                 Q                               guished from chemisorption, which typically involves the
                            P¼                            ð1Þ
                                 S                               formation of chemical-type bonding of a gas to an atomi-
                                                                 cally clean surface—for example, oxygen on a stainless
where P is the pressure in torr, Q is the total flow, or
                                                                 steel surface. Chemisorption of gas is irreversible under
throughput of gas, in torr-L/s, and S is the pumping speed
                                                                 all conditions normally encountered in a vacuum system.
in L/s.
                                                                 After the first few minutes of pumping, pressures are
   The influx of gas, Q, can be a combination of a deliberate
                                                                 almost always in the free molecular flow regime, and
influx of process gas from an exterior source and gas origi-
                                                                 when a water molecule is desorbed, it experiences only col-
nating in the system itself. With no external source, the
                                                                 lisions with the walls, rather than with other molecules.
base pressure achieved is frequently used as the principle
                                                                 Consequently, as it leaves the system, it is readsorbed
indicator of system performance. The most important
                                                                 many times, and on each occasion desorption is a slow pro-
internal sources of gas are outgassing from the walls and
                                                                 cess.
permeation from the atmosphere, most frequently through
                                                                      One way of accelerating the removal of adsorbed water
elastomer O-rings. There may also be leaks, but these can
                                                                 is by purging at a pressure in the viscous flow region, using
readily be reduced to negligible levels by proper system
                                                                 a dry gas such as nitrogen or argon. Under viscous flow
design and construction. Vacuum pumps also contribute
                                                                 conditions, the desorbed water molecules rarely reach
to background pressure, and here again careful selection
                                                                 the system walls, and readsorption is greatly reduced. A
and operation will minimize such problems.
                                                                 second method is to heat the system above its normal
                                                                 operating temperature.
The Problem of Outgassing
                                                                      Any process that reduces the adsorption of water in a
Of the sources of gas described above, outgassing is often       vacuum system will improve the rate of pumpdown. The
the most important. With a new system, the origin of out-        simplest procedure is to vent a vacuum system with a
gassing may be in the manufacture of the materials used          dry gas rather than with atmospheric air, and to minimize
in construction, in handling during construction, and in         the time the system remains open following such a proce-
exposure of the system to the atmosphere. In general these       dure. Dry air will work well, but it is usually more conve-
sources scale with the area of the system walls, so that it is   nient to substitute nitrogen or argon.
wise to minimize the surface area and to avoid porous                 From Equation 1, it is evident that there are two
materials in construction. For example, aluminum is an           approaches to achieving a lower ultimate pressure, and
excellent choice for use in vacuum systems, but anodized         hence a low impurity level, in a system. The first is to
aluminum has a porous oxide layer that provides an inter-        increase the effective pumping speed, and the second is
nal surface for gas adsorption many times greater than the       to reduce the outgassing rate. There are severe limitations
apparent surface, making it much less suitable for use in        to the first approach. In a typical system, most of one wall
vacuum.                                                          of the chamber will be occupied by the connection to the
   The rate of outgassing in a new, unbaked system, fabri-       high-vacuum pump; this limits the size of pump that can
cated from materials such as aluminum and stainless              be used, imposing an upper limit on the achievable pum-
steel, is initially very high, on the order of 10À6 to           ping speed. As already noted, the ultimate pressure
10À7 torr-L/s Á cm2 of surface area after one hour of expo-      achieved in an unbaked system having this configuration
sure to vacuum (O’Hanlon, 1989). With continued pump-            will rarely reach the mid-10À8 torr range. Even if one could
ing, the rate falls by one or two orders of magnitude            mount a similar-sized pump on every side, the best to be
during the first 24 hr, but thereafter drops very slowly          expected would be a 6-fold improvement, achieving a
over many months. Typically the main residual gas is             base pressure barely into the 10À9 torr range, even after
water vapor. In a clean vacuum system, operating at ambi-        very long exhaust times.
ent temperature and containing only a moderate number                 It is evident that, to routinely reach pressures in the
of O-rings, the lowest achievable pressure is usually 10À7       10À10 torr range in a realistic period of time, a reduction
to mid-10À8 torr. The limiting factor is generally residual      in the rate of outgassing is necessary—e.g., by heating
outgassing, not the capability of the high-vacuum pump.          the vacuum system. Baking an entire system to 4008C
   The outgassing load is highest when a new system is           for 16 hr can produce outgassing rates of 10À15 torr-L/
put into service, but with steady use the sins of construc-      s Á cm2 (Alpert, 1959), a reduction of 108 from those found
tion are slowly erased, and on each subsequent evacuation,       after 1 hr of pumping at ambient temperature. The mag-
the system will reach its typical base pressure more             nitude of this reduction shows that as large a portion as
GENERAL VACUUM TECHNIQUES            3

possible of a system should be heated to obtain maximum          Oil-Sealed Pumps
advantage.
                                                                 The earliest roughing pumps used either a piston or liquid
                                                                 to displace the gas. The first production methods for incan-
PRACTICAL ASPECTS OF VACUUM TECHNOLOGY                           descent lamps used such pumps, and the development of
                                                                 the oil-sealed mechanical pump by Gaede, around 1907,
Vacuum Pumps                                                     was driven by the need to accelerate the pumping process.

The operation of most vacuum systems can be divided into
two regimes. The first involves pumping the system from              Applications. The modern versions of this pump are the
atmosphere to a pressure at which a high-vacuum pump             most economic and convenient for achieving pressures as
can be brought into operation. This is traditionally known       low as the 10À4 torr range. The pumps are widely used
as the rough vacuum regime and the pumps used are com-           as a backing pump for both diffusion and turbomolecular
monly referred to as roughing pumps. Clearly, a system           pumps; in this application the backstreaming of mechani-
that operates at an ultimate pressure within the capability      cal pump oil is intercepted by the high vacuum pump, and
of the roughing pump will require no additional pumps.           a foreline trap is not required.
    Once the system has been roughed down, a high-
vacuum pump must be used to achieve lower pressures.                 Operating Principles. The oil-sealed pump is a positive-
If the high-vacuum pump is the type known as a transfer          displacement pump, of either the vane or piston type, with
pump, such as a diffusion or turbomolecular pump, it will        a compression ratio of the order of 105:1 (Dobrowolski,
require the continuous support of the roughing pump in           1979). It is available as a single or two-stage pump, capable
order to maintain the pressure at the exit of the high-          of reaching base pressures in the 10À2 and 10À4 torr range,
vacuum pump at a tolerable level (in this phase of the           respectively. The pump uses oil to maintain sealing, and to
pumping operation the function of the roughing pump              provide lubrication and heat transfer, particularly at the
has changed, and it is frequently referred to as a backing       contact between the sliding vanes and the pump wall.
or forepump). Transfer pumps have the advantage that             Oil also serves to fill the significant dead space leading to
their capacity for continuous pumping of gas, within their       the exhaust valve, essentially functioning as a hydraulic
operating pressure range, is limited only by their reliabi-      valve lifter and permitting the very high compression
lity. They do not accumulate gas, an important considera-        ratio.
tion where hazardous gases are involved. Note that the               The speed of such pumps is often quoted as the ‘‘free-air
reliability of transfer pumping systems depends upon the         displacement,’’ which is simply the volume swept by the
satisfactory performance of two separate pumps. A second         pump rotor. In a typical two-stage pump this speed is sus-
class of pumps, known collectively as capture pumps,             tained down to $1 Â 10À1 torr; below this pressure the
require no further support from a roughing pump once             speed decreases, reaching zero in the 10À5 torr range. If
they have started to pump. Examples of this class are cryo-      a pump is to sustain pressures near the bottom of its range,
genic pumps and sputter-ion pumps. These types of pump           the required pump size must be determined from pub-
have the advantage that the vacuum system is isolated            lished pumping-speed performance data. It should be
from the atmosphere, so that system operation depends            noted that mechanical pumps have relatively small pump-
upon the reliability of only one pump. Their disadvantage        ing speed, at least when compared with typical high-
is that they can provide only limited storage of pumped          vacuum pumps. A typical laboratory-sized pump, powered
gas, and as that limit is reached, pumping will deteriorate.     by a 1/3 hp motor, may have a speed of $3.5 cubic feet per
The effect of such a limitation is quite different for the two   minute (cfm), or rather less than 2 L/s, as compared to the
examples cited. A cryogenic pump can be totally regene-          smallest turbomolecular pump, which has a rated speed of
rated by a brief purging at ambient temperature, but a           50 L/s.
sputter-ion pump requires replacement of its internal com-
ponents. One aspect of the cryopump that should not be
overlooked is that hazardous gases are stored, unchanged,           Avoiding Oil Contamination from an Oil-Sealed Mechani-
within the pump, so that an unexpected failure of the            cal Pump. The versatility and reliability of the oil-sealed
pump can release these accumulated gases, requiring pro-         mechanical pump carries with it a serious penalty. When
vision for their automatic safe dispersal in such an emer-       used improperly, contamination of the vacuum system is
gency.                                                           inevitable. These pumps are probably the most prevalent
                                                                 source of oil contamination in vacuum systems. The pro-
                                                                 blem arises when thay are untrapped and pump a system
Roughing Pumps
                                                                 down to its ultimate pressure, often in the free molecular
Two classes of roughing pumps are in use. The first type,         flow regime. In this regime, oil molecules flow freely into
the oil-sealed mechanical pump, is by far the most com-          the vacuum chamber. The problem can readily be avoided
mon, but because of the enormous concern in the semi-            by careful control of the pumping procedures, but possible
conductor industry about oil contamination, a second             system or operator malfunction, leading to contamination,
type, the so-called ‘‘dry’’ pump, is now frequently used.        must be considered. For many years, it was common prac-
In this context, ‘‘dry’’ implies the absence of volatile orga-   tice to leave a system in the standby condition evacuated
nics in the part of the pump that communicates with the          only by an untrapped mechanical pump, making contami-
vacuum system.                                                   nation inevitable.
4     COMMON CONCEPTS

   Mechanical pump oil has a vapor pressure, at room tem-      flowing from the system side of the trap to the pump
perature, in the low 10À5 torr range when first installed,      (D.J. Santeler, pers. comm.). The foreline is isolated from
but this rapidly deteriorates up to two orders of magnitude    the rest of the system and the gas flow is continued
as the pump is operated (Holland, 1971). A pump operates       throughout the heating cycle, until the trap has cooled
at temperatures of 608C, or higher, so the oil vapor pres-     back to ambient temperature. An adsorbent foreline trap
sure far exceeds 10À3 torr, and evaporation results in a       must be optically dense, so the oil molecules have no
substantial flux of oil into the roughing line. When a sys-     path past the adsorbent; commercial traps do not always
tem at atmospheric pressure is connected to the mechani-       fulfill this basic requirement. Where regeneration of the
cal pump, the initial gas flow from the vacuum chamber is       foreline trap has been totally neglected, acceptable perfor-
in the viscous flow regime, and oil molecules are driven        mance may still be achieved simply because a diffusion
back to the pump by collisions with the gas being ex-          pump or turbomolecular pump serves as the true ‘‘trap,’’
hausted (Holland, 1971; Lewin, 1985). Provided the rough-      intercepting the oil from the forepump.
ing process is terminated while the gas flow is still in the       Oil contamination can also result from improperly tur-
viscous flow regime, no significant contamination of the         ning a pump off. If it is stopped and left under vacuum, oil
vacuum chamber will occur. The condition for viscous           frequently leaks slowly across the exhaust valve into the
flow is given by the equation                                   pump. When it is partially filled with oil, a hydraulic
                                                               lock may prevent the pump from starting. Continued leak-
                         PD ! 0:5                        ð2Þ   age will drive oil into the vacuum system itself; an inter-
                                                               esting procedure for recovery from such a catastrophe
where P is the pressure in torr and D is the internal dia-     has been described (Hoffman, 1979).
meter of the roughing line in centimeters.                        Whenever the pump is stopped, either deliberately or by
   Termination of the roughing process in the viscous flow      power failure or other failure, automatic controls that first
region is entirely practical when the high-vacuum pump is      isolate it from the vacuum system, and then vent it to
either a turbomolecular or modern diffusion pump (see          atmospheric pressure, should be used.
precautions discussed under Diffusion Pumps and Turbo-            Most gases exhausted from a system, including oxygen
molecular Pumps, below). Once these pumps are in opera-        and nitrogen, are readily removed from the pump oil, but
tion, they function as an effective barrier against oil        some can liquify under maximum compression just before
migration into the system from the forepump. Hoffman           the exhaust valve opens. Such liquids mix with the oil and
(1979) has described the use of a continuous gas purge         are more difficult to remove. They include water and sol-
on the foreline of a diffusion-pumped system as a means        vents frequently used to clean system components. When
of avoiding backstreaming from the forepump.                   pumping large volumes of air from a vacuum chamber,
                                                               particularly during periods of high humidity (or whenever
   Foreline Traps. A foreline trap is a second approach to     solvent residues are present), it is advantageous to use a
preventing oil backstreaming. If a liquid nitrogenÀcooled      gas-ballast feature commonly fitted to two-stage and also
trap is always in place between a forepump and the             to some single-stage pumps. This feature admits air du-
vacuum chamber, cleanliness is assured. But the operative      ring the final stage of compression, raising the pressure
word is ‘‘always.’’ If the trap warms to ambient tempera-      and forcing the exhaust valve to open before the partial
ture, oil from the trap will migrate upstream, and this is     pressure of water has reached saturation. The ballast fea-
much more serious if it occurs while the line is evacuated.    ture minimizes pump contamination and reduces pump-
A different class of trap uses an adsorbent for oil. Typical   down time for a chamber exposed to humid air, although
adsorbents are activated alumina, molecular sieve (a syn-      at the cost of about ten-times-poorer base pressure.
thetic zeolite), a proprietary ceramic (Micromaze foreline
traps; Kurt J. Lesker Co.), and metal wool. The metal          Oil-Free (‘‘Dry’’) Pumps
wool traps have much less capacity than the other types,       Many different types of oil-free pumps are available. We
and unless there is evidence of their efficacy, they are        will emphasize those that are most useful in analytical
best avoided. Published data show that activated alumina       and diagnostic applications.
can trap 99% of the backstreaming oil molecules (Fulker,
1968). However, one must know when such traps should               Diaphragm Pumps
be reactivated. Unequivocal determination requires inser-          Applications: Diaphragm pumps are increasingly used
tion of an oil-detection device, such as a mass spectro-       where the absence of oil is an imperative, for example, as
meter, on the foreline. The saturation time of a trap          the forepump for compound turbomolecular pumps that
depends upon the rate of oil influx, which in turn depends      incorporate a molecular drag stage. The combination ren-
upon the vapor pressure of oil in the pump and the conduc-     ders oil contamination very unlikely. Most diaphragm
tance of the line between pump and trap. The only safe pro-    pumps have relatively small pumping speeds. They are
cedure is frequent reactivation of traps on a conservative     adequate once the system pressure reaches the operating
schedule. Reactivation may be done by venting the system,      range of a turbomolecular pump, usually well below
replacing the adsorbent with a new charge, or by baking        10À2 torr, but not for rapidly roughing down a large
the adsorbent in a stream of dry air or inert gas to a tem-    volume. Pumps are available with speeds up to several
perature of $3008C for several hours. Some traps can be        liters per second, and base pressures from a few torr to
regenerated by heating in situ, but only using a stream        as low as 10À3 torr, lower ultimate pressures being asso-
of inert gas, at a pressure in the viscous flow region,         ciated with the lower-speed pumps.
GENERAL VACUUM TECHNIQUES            5

    Operating Principles: Four diaphragm modules are             been used in the compound turbomolecular pump as an
often arranged in three separate pumping stages, with            integral backing stage. This will be discussed in detail
the lowest-pressure stage served by two modules in tan-          under Turbomolecular Pumps.
dem to boost the capacity. Single modules are adequate
                                                                     Operating Principles: The pump uses one or more
for subsequent stages, since the gas has already been com-
                                                                 drums rotating at speeds as high as 90,000 rpm inside sta-
pressed to a smaller volume. Each module uses a flexible
                                                                 tionary, coaxial housings. The clearance between drum
diaphragm of Viton or other elastomer, as well as inlet
                                                                 and housing is $0.3 mm. Gas is dragged in the direction
and outlet valves. In some pumps the modules can be
                                                                 of rotation by momentum transfer to the pump exit along
arranged to provide four stages of pumping, providing a
                                                                 helical grooves machined in the housing. The bearings of
lower base pressure, but at lower pumping speed because
                                                                 these devices are similar to those in turbomolecular pumps
only a single module is employed for the first stage. The
                                                                 (see discussion of Turbomolecular Pumps, below). An
major required maintenance in such pumps is replacement
                                                                 internal motor avoids difficulties inherent in a high-speed
of the diaphragm after 10,000 to 15,000 hr of operation.
                                                                 vacuum seal. A typical pump uses two or more separate
                                                                 stages, arranged in series, providing a compression ratio
   Scroll Pumps
                                                                 as high as 1:107 for air, but typically less than 1:103 for
   Applications: Scroll pumps (Coffin, 1982; Hablanian,
                                                                 hydrogen. It must be supported by a backing pump, often
1997) are used in some refrigeration systems, where the
                                                                 of the diaphragm type, that can maintain the forepressure
limited number of moving parts is reputed to provide
                                                                 below a critical value, typically 10 to 30 torr, depending
high reliability. The most recent versions introduced for
                                                                 upon the particular design. The much lower compression
general vacuum applications have the advantages of dia-
                                                                 ratio for hydrogen, a characteristic shared by all turbo-
phragm pumps, but with higher pumping speed. Published
                                                                 molecular pumps, will increase its percentage in a vacuum
speeds on the order of 10 L/s and base pressures below
                                                                 chamber, a factor to consider in rare cases where the pre-
10À2 torr make this an appealing combination. Speeds
                                                                 sence of hydrogen affects the application.
decline rapidly at pressures below $2 Â 10À2 torr.
                                                                    Sorption Pumps
   Operating Principles: Scroll pumps use two enmeshed
                                                                    Applications: Sorption pumps were introduced for
spiral components, one fixed and the other orbiting. Suc-
                                                                 roughing down ultrahigh vacuum systems prior to turning
cessive crescent-shaped segments of gas are trapped
                                                                 on a sputter-ion pump (Welch, 1991). The pumping speed
between the two scrolls and compressed from the inlet
                                                                 of a typical sorption pump is similar to that of a small oil-
(vacuum side) toward the exit, where they are vented to
                                                                 sealed mechanical pump, but they are rather awkward in
the atmosphere. A sophisticated and expensive version of
                                                                 application. This is of little concern in a vacuum system
this pump has long been used for processes where leak-
                                                                 likely to run many months before venting to the atmo-
tight operation and noncontamination are essential, for
                                                                 sphere. Occasional inconvenience is a small price for the
example, in the nuclear industry for pumping radioactive
                                                                 ultimate in contamination-free operation.
gases. An excellent description of the characteristics of this
design has been given by Coffin (1982). In this version,              Operating Principles: A typical sorption pump is a
extremely close tolerances (10 mm) between the two scrolls       cannister containing $3 lb of a molecular sieve material
minimize leakage between the high- and low-pressure              that is cooled to liquid nitrogen temperature. Under these
ends of the scrolls. The more recent pump designs, which         conditions the molecular sieve can adsorb $7.6 Â 104 torr-
substitute Teflon-like seals for the close tolerances, have       liter of most atmospheric gases; exceptions are helium and
made the pump an affordable option for general oil-free          hydrogen, which are not significantly adsorbed, and neon,
applications. The life of the seals is reported to be in the     which is adsorbed to a limited extent. Together, these
same range as that of the diaphragm in a diaphragm               gases, if not pumped, would leave a residual pressure in
pump.                                                            the 10À2 torr range. This is too high to guarantee the trou-
                                                                 ble-free start of a sputter-ion pump, but the problem is
   Screw Compressor. Although not yet widely used,               readily avoided. For example, a sorption pump connected
pumps based on the principle of the screw compressor, such       to a vacuum chamber of $100 L volume exhausts air to a
as that used in supercharging some high-performance cars,        pressure in the viscous flow region, say 5 torr, and then is
appear to offer some interesting advantages: i.e., pumping       valved off. The nonadsorbing gases are swept into the
speeds in excess of 10 L/s, direct discharge to the atmo-        pump along with the adsorbed gases; the pump now con-
sphere, and ultimate pressures in the 10À3 torr range. If        tains a fraction (760–5)/760 or 99.3% of the nonadsorbable
such pumps demonstrate high reliability in diverse appli-        gases originally present, leaving hydrogen, helium, and
cations, they constitute the closest alternative, in a single-   neon in the low 10À4 torr range in the vacuum chamber.
unit ‘‘dry’’ pump, to the oil-sealed mechanical pump.            A second sorption pump on the vacuum chamber will
                                                                 then readily achieve a base pressure below 5 Â 10À4 torr,
   Molecular Drag Pump                                           quite adequate to start even a recalcitrant ion pump.
   Applications: The molecular drag pump is useful for
applications requiring pressures in the 1 to 10À7 torr range
                                                                 High-Vacuum Pumps
and freedom from organic contamination. Over this range
the pump permits a far higher throughput of gas, com-            Four types of high-vacuum pumps are in general use:
pared to a standard turbomolecular pump. It has also             diffusion, turbomolecular, cryosorption, and sputter-ion.
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Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
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Characterization of materials  elton n. kaufmann
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Characterization of materials  elton n. kaufmann
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Characterization of materials  elton n. kaufmann
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Characterization of materials  elton n. kaufmann
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Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann
Characterization of materials  elton n. kaufmann

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Characterization of materials elton n. kaufmann

  • 1.
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  • 4. EDITORIAL BOARD Elton N. Kaufmann, (Editor-in-Chief) Ronald Gronsky Argonne National Laboratory University of California at Berkeley Argonne, IL Berkeley, CA Reza Abbaschian Leonard Leibowitz University of Florida at Gainesville Argonne National Laboratory Gainesville, FL Argonne, IL Peter A. Barnes Thomas Mason Clemson University Spallation Neutron Source Project Clemson, SC Oak Ridge, TN Andrew B. Bocarsly Juan M. Sanchez Princeton University University of Texas at Austin Princeton, NJ Austin, TX Chia-Ling Chien Alan C. Samuels, Developmental Editor Johns Hopkins University Edgewood Chemical Biological Center Baltimore, MD Aberdeen Proving Ground, MD David Dollimore University of Toledo EDITORIAL STAFF Toledo, OH VP, STM Books: Janet Bailey Barney L. Doyle Executive Editor: Jacqueline I. Kroschwitz Sandia National Laboratories Editor: Arza Seidel Albuquerque, NM Director, Book Production and Manufacturing: Brent Fultz Camille P. Carter Managing Editor: Shirley Thomas California Institute of Technology Assistant Managing Editor: Kristen Parrish Pasadena, CA Alan I. Goldman Iowa State University Ames, IA
  • 5. CHARACTERIZATION OF MATERIALS VOLUMES 1 AND 2 Characterization of Materials is available Online in full color at www.mrw.interscience.wiley.com/com. A John Wiley and Sons Publication
  • 6. Copyright # 2003 by John Wiley & Sons, Inc. All rights reserved. Published by John Wiley & Sons, Inc., Hoboken, New Jersey. Published simultaneously in Canada. No part of this publication may be reproduced, stored in a retrieval system, or transmitted in any form or by any means, electronic, mechanical, photocopying, recording, scanning, or otherwise, except as permitted under Section 107 or 108 of the 1976 United States Copyright Act, without either the prior written permission of the Publisher, or authorization through payment of the appropriate per-copy fee to the Copyright Clearance Center, Inc., 222 Rosewood Drive, Danvers, MA 01923, 978-750-8400, fax 978-750-4470, or on the web at www.copyright.com. Requests to the Publisher for permission should be addressed to the Permissions Department, John Wiley & Sons, Inc., 111 River Street, Hoboken, NJ 07030, (201) 748-6011, fax (201) 748-6008, e-mail: permreq@wiley.com. Limit of Liability/Disclaimer of Warranty: While the publisher and author have used their best efforts in preparing this book, they make no representations or warranties with respect to the accuracy or completeness of the contents of this book and specifically disclaim any implied warranties of merchantability or fitness for a particular purpose. No warranty may be created or extended by sales representatives or written sales materials. The advice and strategies contained herein may not be suitable for your situation. You should consult with a professional where appropriate. Neither the publisher nor author shall be liable for any loss of profit or any other commercial damages, including but not limited to special, incidental, consequential, or other damages. For general information on our other products and services please contact our Customer Care Department within the U.S. at 877-762-2974, outside the U.S. at 317-572-3993 or fax 317-572-4002. Wiley also publishes its books in a variety of electronic formats. Some content that appears in print, however, may not be available in electronic format. Library of Congress Cataloging in Publication Data is available. Characterization of Materials, 2 volume set Elton N. Kaufmann, editor-in-chief ISBN: 0-471-26882-8 (acid-free paper) Printed in the United States of America 10 9 8 7 6 5 4 3 2 1
  • 7. CONTENTS, VOLUMES 1 AND 2 FOREWORD vii THERMAL ANALYSIS 337 PREFACE ix Thermal Analysis, Introduction 337 Thermal Analysis—Definitions, Codes of Practice, CONTRIBUTORS xiii and Nomenclature 337 Thermogravimetric Analysis 344 COMMON CONCEPTS 1 Differential Thermal Analysis and Differential Scanning Calorimetry 362 Common Concepts in Materials Characterization, Combustion Calorimetry 373 Introduction 1 Thermal Diffusivity by the Laser Flash Technique 383 General Vacuum Techniques 1 Simultaneous Techniques Including Analysis Mass and Density Measurements 24 of Gaseous Products 392 Thermometry 30 Symmetry in Crystallography 39 Particle Scattering 51 ELECTRICAL AND ELECTRONIC MEASUREMENTS 401 Sample Preparation for Metallography 63 Electrical and Electronic Measurement, Introduction 401 Conductivity Measurement 401 COMPUTATION AND THEORETICAL METHODS 71 Hall Effect in Semiconductors 411 Computation and Theoretical Methods, Deep-Level Transient Spectroscopy 418 Introduction 71 Carrier Lifetime: Free Carrier Absorption, Introduction to Computation 71 Photoconductivity, and Photoluminescence 427 Summary of Electronic Structure Methods 74 Capacitance-Voltage (C-V) Characterization Prediction of Phase Diagrams 90 of Semiconductors 456 Simulation of Microstructural Evolution Characterization of pn Junctions 466 Using the Field Method 112 Electrical Measurements on Superconductors Bonding in Metals 134 by Transport 472 Binary and Multicomponent Diffusion 145 Molecular-Dynamics Simulation of Surface MAGNETISM AND MAGNETIC MEASUREMENTS 491 Phenomena 156 Simulation of Chemical Vapor Magnetism and Magnetic Measurement, Deposition Processes 166 Introduction 491 Magnetism in Alloys 180 Generation and Measurement of Magnetic Fields 495 Kinematic Diffraction of X Rays 206 Magnetic Moment and Magnetization 511 Dynamical Diffraction 224 Theory of Magnetic Phase Transitions 528 Computation of Diffuse Intensities in Alloys 252 Magnetometry 531 Thermomagnetic Analysis 540 Techniques to Measure Magnetic Domain MECHANICAL TESTING 279 Structures 545 Magnetotransport in Metals and Alloys 559 Mechanical Testing, Introduction 279 Surface Magneto-Optic Kerr Effect 569 Tension Testing 279 High-Strain-Rate Testing of Materials 288 Fracture Toughness Testing Methods 302 ELECTROCHEMICAL TECHNIQUES 579 Hardness Testing 316 Electrochemical Techniques, Introduction 579 Tribological and Wear Testing 324 Cyclic Voltammetry 580 v
  • 8. vi CONTENTS, VOLUMES 1 AND 2 Electrochemical Techniques for Corrosion X-Ray Diffraction Techniques for Liquid Quantification 592 Surfaces and Monomolecular Layers 1027 Semiconductor Photoelectrochemistry 605 Scanning Electrochemical Microscopy 636 ELECTRON TECHNIQUES 1049 The Quartz Crystal Microbalance in Electrochemistry 653 Electron Techniques, Introduction 1049 Scanning Electron Microscopy 1050 OPTICAL IMAGING AND SPECTROSCOPY 665 Transmission Electron Microscopy 1063 Scanning Transmission Electron Microscopy: Optical Imaging and Spectroscopy, Introduction 665 Z-Contrast Imaging 1090 Optical Microscopy 667 Scanning Tunneling Microscopy 1111 Reflected-Light Optical Microscopy 674 Low-Energy Electron Diffraction 1120 Photoluminescence Spectroscopy 681 Energy-Dispersive Spectrometry 1135 Ultraviolet and Visible Absorption Spectroscopy 688 Auger Electron Spectroscopy 1157 Raman Spectroscopy of Solids 698 Ultraviolet Photoelectron Spectroscopy 722 ION-BEAM TECHNIQUES 1175 Ellipsometry 735 Impulsive Stimulated Thermal Scattering 744 Ion-Beam Techniques, Introduction 1175 High-Energy Ion-Beam Analysis 1176 RESONANCE METHODS 761 Elastic Ion Scattering for Composition Analysis 1179 Resonance Methods, Introduction 761 Nuclear Reaction Analysis and Proton-Induced Nuclear Magnetic Resonance Imaging 762 Gamma Ray Emission 1200 Nuclear Quadrupole Resonance 775 Particle-Induced X-Ray Emission 1210 Electron Paramagnetic Resonance Spectroscopy 792 Radiation Effects Microscopy 1223 Cyclotron Resonance 805 Trace Element Accelerator Mass ¨ Mossbauer Spectrometry 816 Spectrometry 1235 Introduction to Medium-Energy Ion Beam X-RAY TECHNIQUES 835 Analysis 1258 X-Ray Techniques, Introduction 835 Medium-Energy Backscattering and X-Ray Powder Diffraction 835 Forward-Recoil Spectrometry 1259 Single-Crystal X-Ray Structure Determination 850 Heavy-Ion Backscattering Spectrometry 1273 XAFS Spectroscopy 869 X-Ray and Neutron Diffuse Scattering NEUTRON TECHNIQUES 1285 Measurements 882 Resonant Scattering Techniques 905 Neutron Techniques, Introduction 1285 Magnetic X-Ray Scattering 917 Neutron Powder Diffraction 1285 X-Ray Microprobe for Fluorescence Single-Crystal Neutron Diffraction 1307 and Diffraction Analysis 939 Phonon Studies 1316 X-Ray Magnetic Circular Dichroism 953 Magnetic Neutron Scattering 1328 X-Ray Photoelectron Spectroscopy 970 Surface X-Ray Diffraction 1007 INDEX 1341
  • 9. FOREWORD Whatever standards may have been used for materials The successes that accompanied the new approach to research in antiquity, when fabrication was regarded materials research and development stimulated an more as an art than a science and tended to be shrouded entirely new spirit of invention. What had once been in secrecy, an abrupt change occurred with the systematic dreams, such as the invention of the automobile and the discovery of the chemical elements two centuries ago by airplane, were transformed into reality, in part through Cavendish, Priestly, Lavoisier, and their numerous suc- the modification of old materials and in part by creation cessors. This revolution was enhanced by the parallel of new ones. The growth in basic understanding of electro- development of electrochemistry and eventually capped magnetic phenomena, coupled with the discovery that by the consolidating work of Mendeleyev which led to the some materials possessed special electrical properties, periodic chart of the elements. encouraged the development of new equipment for power The age of materials science and technology had finally conversion and new methods of long-distance communica- begun. This does not mean that empirical or trial and error tion with the use of wired or wireless systems. In brief, the work was abandoned as unnecessary. But rather that a successes derived from the new approach to the develop- new attitude had entered the field. The diligent fabricator ment of materials had the effect of stimulating attempts of materials would welcome the development of new tools to achieve practical goals which had previously seemed that could advance his or her work whether exploratory beyond reach. The technical base of society was being or applied. For example, electrochemistry became an shaken to its foundations. And the end is not yet in sight. intimate part of the armature of materials technology. The process of fabricating special materials for well Fortunately, the physicist as well as the chemist were defined practical missions, such as the development of able to offer new tools. Initially these included such mat- new inventions or improving old ones, has, and continues ters as a vast improvement of the optical microscope, the to have, its counterpart in exploratory research that is development of the analytic spectroscope, the discovery carried out primarily to expand the range of knowledge of x-ray diffraction and the invention of the electron and properties of materials of various types. Such investi- microscope. Moreover, many other items such as isotopic gations began in the field of mineralogy somewhat before tracers, laser spectroscopes and magnetic resonance the age of modern chemistry and were stimulated by the equipment eventually emerged and were found useful in fact that many common minerals display regular cleavage their turn as the science of physics and the demands for planes and may exhibit unusual optical properties, such better materials evolved. as different indices of refraction in different directions. Quite apart from being used to re-evaluate the basis for Studies of this type became much broader and more sys- the properties of materials that had long been useful, the tematic, however, once the variety of sophisticated new approaches provided much more important dividends. exploratory tools provided by chemistry and physics The ever-expanding knowledge of chemistry made it possi- became available. Although the groups of individuals ble not only to improve upon those properties by varying involved in this work tended to live somewhat apart from composition, structure and other factors in controlled the technologists, it was inevitable that some of their dis- amounts, but revealed the existence of completely new coveries would eventually prove to be very useful. Many materials that frequently turned out to be exceedingly use- examples can be given. In the 1870s a young investigator ful. The mechanical properties of relatively inexpensive who was studying the electrical properties of a group of steels were improved by the additions of silicon, an element poorly conducting metal sulfides, today classed among which had been produced first as a chemist’s oddity. More the family of semiconductors, noted that his specimens complex ferrosilicon alloys revolutionized the performance seemed to exhibit a different electrical conductivity when of electric transformers. A hitherto all but unknown ele- the voltage was applied in opposite directions. Careful ment, tungsten, provided a long-term solution in the search measurements at a later date demonstrated that specially for a durable filament for the incandescent lamp. Even- prepared specimens of silicon displayed this rectifying tually the chemists were to emerge with valuable families effect to an even more marked degree. Another investiga- of organic polymers that replaced many natural materials. tor discovered a family of crystals that displayed surface vii
  • 10. viii FOREWORD charges of opposite polarity when placed under unidirec- bearing on the properties of materials being explored for tional pressure, so called piezoelectricity. Natural radioac- novel purposes. The semiconductor industry has been an tivity was discovered in a specimen of a uranium mineral important beneficiary of this form of exploratory research whose physical properties were under study. Supercon- since the operation of integrated circuits can be highly sen- ductivity was discovered incidentally in a systematic study sitive to imperfections. of the electrical conductivity of simple metals close to the In this connection, it should be added that the ever- absolute zero of temperature. The possibility of creating a increasing search for special materials that possess new light-emitting crystal diode was suggested once wave or superior properties under conditions in which the spon- mechanics was developed and began to be applied to sors of exploratory research and development and the pro- advance our understanding of the properties of materials spective beneficiaries of the technological advance have further. Actually, achievement of the device proved to be parallel interests has made it possible for those engaged more difficult than its conception. The materials involved in the exploratory research to share in the funds directed had to be prepared with great care. toward applications. This has done much to enhance the Among the many avenues explored for the sake of degree of partnership between the scientist and engineer obtaining new basic knowledge is that related to the in advancing the field of materials research. influence of imperfections on the properties of materials. Finally, it should be emphasized again that whenever Some imperfections, such as those which give rise to materials research has played a decisive role in advancing temperature-dependent electrical conductivity in semicon- some aspect of technology, the advance has frequently ductors, salts and metals could be ascribed to thermal been aided by the introduction of an increasingly sophisti- fluctuations. Others were linked to foreign atoms which cated set of characterization tools that are drawn from a were added intentionally or occurred by accident. Still wide range of scientific disciplines. These tools usually others were the result of deviations in the arrangement remain a part of the array of test equipment. of atoms from that expected in ideal lattice structures. As might be expected, discoveries in this area not only FREDERICK SEITZ clarified mysteries associated with ancient aspects of President Emeritus, Rockefeller University materials research, but provided tests that could have a Past President, National Academy of Sciences, USA
  • 11. PREFACE Materials research is an extraordinarily broad and diverse that is observed. When both tool and sample each contri- field. It draws on the science, the technology, and the tools bute their own materials properties—e.g., electrolyte and of a variety of scientific and engineering disciplines as it electrode, pin and disc, source and absorber, etc.—distinc- pursues research objectives spanning the very fundamen- tions are blurred. Although these distinctions in principle tal to the highly applied. Beyond the generic idea of a ought not to be taken too seriously, keeping them in mind ‘‘material’’ per se, perhaps the single unifying element will aid in efficiently accessing content of interest in these that qualifies this collection of pursuits as a field of volumes. research and study is the existence of a portfolio of charac- Frequently, the materials property sought is not what terization methods that is widely applicable irrespective of is directly measured. Rather it is deduced from direct discipline or ultimate materials application. Characteriza- observation of some other property or phenomenon that tion of Materials specifically addresses that portfolio with acts as a signature of what is of interest. These relation- which researchers and educators must have working ships take many forms. Thermal arrest, magnetic anomaly, familiarity. diffraction spot intensity, relaxation rate and resistivity, The immediate challenge to organizing the content for a to name only a few, might all serve as signatures of a phase methodological reference work is determining how best to transition and be used as ‘‘spectator’’ properties to deter- parse the field. By far the largest number of materials mine a critical temperature. Similarly, inferred properties researchers are focused on particular classes of materials such as charge carrier mobility are deduced from basic and also perhaps on their uses. Thus a comfortable choice electrical quantities and temperature-composition phase would have been to commission chapters accordingly. diagrams are deduced from observed microstructures. Alternatively, the objective and product of any measure- Characterization of Materials, being organized by techni- ment,—i.e., a materials property—could easily form a logi- que, naturally places initial emphasis on the most directly cal basis. Unfortunately, each of these approaches would measured properties, but authors have provided many have required mention of several of the measurement application examples that illustrate the derivative proper- methods in just about every chapter. Therefore, if only to ties a techniques may address. reduce redundancy, we have chosen a less intuitive taxon- First among our objectives is to help the researcher dis- omy by arranging the content according to the type of mea- criminate among alternative measurement modalities surement ‘‘probe’’ upon which a method relies. Thus you that may apply to the property under study. The field of will find chapters focused on application of electrons, possibilities is often very wide, and although excellent ions, x rays, heat, light, etc., to a sample as the generic texts treating each possible method in great detail exist, thread tying several methods together. Our field is too identifying the most appropriate method before delving complex for this not to be an oversimplification, and indeed deeply into any one seems the most efficient approach. some logical inconsistencies are inevitable. Characterization of Materials serves to sort the options at We have tried to maintain the distinction between a the outset, with individual articles affording the research- property and a method. This is easy and clear for methods er a description of the method sufficient to understand its based on external independent probes such as electron applicability, limitations, and relationship to competing beams, ion beams, neutrons, or x-rays. However many techniques, while directing the reader to more extensive techniques rely on one and the same phenomenon for resources that fit specific measurement needs. probe and property, as is the case for mechanical, electro- Whether one plans to perform such measurements one- nic, and thermal methods. Many methods fall into both self or whether one simply needs to gain sufficient famil- regimes. For example, light may be used to observe a iarity to effectively collaborate with experts in the microstructure, but may also be used to measure an optical method, Characterization of Materials will be a useful property. From the most general viewpoint, we recognize reference. Although our expert authors were given great that the properties of the measuring device and those of latitude to adjust their presentations to the ‘‘personalities’’ the specimen under study are inextricably linked. It is of their specific methods, some uniformity and circum- actually a joint property of the tool-plus-sample system scription of content was sought. Thus, you will find most ix
  • 12. x PREFACE units organized in a similar fashion. First, an introduction be a necessary corollary to an experiment to understand serves to succinctly describe for what properties the the result after the fact or to predict the result and thus method is useful and what alternatives may exist. Under- help direct an experimental search in advance. More lying physical principles of the method and practical than this, as equipment needs of many experimental stu- aspects of its implementation follow. Most units will offer dies increase in complexity and cost, as the materials examples of data and their analyses as well as warnings themselves become more complex and multicomponent in about common problems of which one should be aware. nature, and as computational power continues to expand, Preparation of samples and automation of the methods simulation of properties will in fact become the measure- are also treated as appropriate. ment method of choice in many cases. As implied above, the level of presentation of these Another unique chapter is the first, covering ‘‘common volumes is intended to be intermediate between cursory concepts.’’ It collects some of the ubiquitous aspects of mea- overview and detailed instruction. Readers will find that, surement methods that would have had to be described in practice, the level of coverage is also very much dictated repeatedly and in more detail in later units. Readers by the character of the technique described. Many are may refer back to this chapter as related topics arise based on quite complex concepts and devices. Others are around specific methods, or they may use this chapter as less so, but still, of course, demand a precision of under- a general tutorial. The Common Concepts chapter, how- standing and execution. What is or is not included in a pre- ever, does not and should not eliminate all redundancies sentation also depends on the technical background in the remaining chapters. Expositions within individual assumed of the reader. This obviates the need to delve articles attempt to be somewhat self-contained and the into concepts that are part of rather standard technical details as to how a common concept actually relates to a curricula, while requiring inclusion of less common, more given method are bound to differ from one to the next. specialized topics. Although Characterization of Materials is directed more As much as possible, we have avoided extended discus- toward the research lab than the classroom, the focused sion of the science and application of the materials proper- units in conjunction with chapters one and two can serve ties themselves, which, although very interesting and as a useful educational tool. clearly the motivation for research in first place, do not The content of Characterization of Materials had pre- generally speak to efficacy of a method or its accomplish- viously appeared as Methods in Materials Research, a ment. loose-leaf compilation amenable to updating. To retain This is a materials-oriented volume, and as such, must the ability to keep content as up to date as possible, Char- overlap fields such as physics, chemistry, and engineering. acterization of Materials is also being published on-line There is no sharp delineation possible between a ‘‘physics’’ where several new and expanded topics will be added property (e.g., the band structure of a solid) and the mate- over time. rials consequences (e.g., conductivity, mobility, etc.) At the other extreme, it is not at all clear where a materials prop- erty such as toughness ends and an engineering property ACKNOWLEDGMENTS associated with performance and life-cycle begins. The very attempt to assign such concepts to only one disciplin- First we express our appreciation to the many expert ary category serves no useful purpose. Suffice it to say, authors who have contributed to Characterization of therefore, that Characterization of Materials has focused Materials. On the production side of the predecessor its coverage on a core of materials topics while trying to publication, Methods in Materials Research, we are remain inclusive at the boundaries of the field. pleased to acknowledge the work of a great many staff of Processing and fabrication are also important aspect of the Current Protocols division of John Wiley & Sons, Inc. materials research. Characterization of Materials does not We also thank the previous series editors, Dr. Virginia deal with these methods per se because they are not Chanda and Dr. Alan Samuels. Republication in the strictly measurement methods. However, here again no present on-line and hard-bound forms owes its continu- clear line is found and in such methods as electrochemis- ing quality to staff of the Major Reference Works group of try, tribology, mechanical testing, and even ion-beam irra- John Wiley & Sons, Inc., most notably Dr. Jacqueline diation, where the processing can be the measurement, Kroschwitz and Dr. Arza Seidel. these aspects are perforce included. The second chapter is unique in that it collects methods that are not, literally speaking, measurement methods; For the editors, these articles do not follow the format found in subsequent chapters. As theory or simulation or modeling methods, ELTON N. KAUFMANN they certainly serve to augment experiment. They may Editor-in-Chief
  • 13. CONTRIBUTORS Reza Abbaschian Peter A. Barnes University of Florida at Gainesville Clemson University Gainesville, FL Clemson, SC Mechanical Testing, Introduction Electrical and Electronic Measurements, Introduction ˚ Capacitance-Voltage (C-V) Characterization of John Agren Semiconductors Royal Institute of Technology, KTH Stockholm, SWEDEN Jack Bass Binary and Multicomponent Diffusion Michigan State University Stephen D. Antolovich East Lansing, MI Washington State University Magnetotransport in Metals and Alloys Pullman, WA Bob Bastasz Tension Testing Sandia National Laboratories Samir J. Anz Livermore, CA California Institute of Technology Particle Scattering Pasadena, CA Raymond G. Bayer Semiconductor Photoelectrochemistry Consultant Georgia A. Arbuckle-Keil Vespal, NY Rutgers University Tribological and Wear Testing Camden, NJ The Quartz Crystal Microbalance In Electrochemistry Goetz M. Bendele SUNY Stony Brook Ljubomir Arsov Stony Brook, NY University of Kiril and Metodij X-Ray Powder Diffraction Skopje, MACEDONIA Ellipsometry Andrew B. Bocarsly Princeton University Albert G. Baca Princeton, NJ Sandia National Laboratories Cyclic Voltammetry Albuquerque, NM Electrochemical Techniques, Introduction Characterization of pn Junctions Mark B.H. Breese Sam Bader University of Surrey, Guildford Argonne National Laboratory Surrey, UNITED KINGDOM Argonne, IL Radiation Effects Microscopy Surface Magneto-Optic Kerr Effect James C. Banks Iain L. Campbell Sandia National Laboratories University of Guelph Albuquerque, NM Guelph, Ontario CANADA Heavy-Ion Backscattering Spectrometry Particle-Induced X-Ray Emission Charles J. Barbour Gerbrand Ceder Sandia National Laboratory Massachusetts Institute of Technology Albuquerque, NM Cambridge, MA Elastic Ion Scattering for Composition Analysis Introduction to Computation xi
  • 14. xii CONTRIBUTORS Robert Celotta Gareth R. Eaton National Institute of Standards and University of Denver Technology Gaithersburg, MD Denver, CO Techniques to Measure Magnetic Domain Structures Electron Paramagnetic Resonance Spectroscopy Gary W. Chandler University of Arizona Sandra S. Eaton Tucson, AZ University of Denver Scanning Electron Microscopy Denver, CO Electron Paramagnetic Resonance Haydn H. Chen Spectroscopy University of Illinois Urbana, IL Fereshteh Ebrahimi Kinematic Diffraction of X Rays University of Florida Gainesville, FL Long-Qing Chen Fracture Toughness Testing Methods Pennsylvania State University University Park, PA Wolfgang Eckstein Simulation of Microstructural Evolution Using the Max-Planck-Institut fur Plasmaphysik Field Method Garching, GERMANY Particle Scattering Chia-Ling Chien Johns Hopkins University Arnel M. Fajardo Baltimore, MD California Institute of Technology Magnetism and Magnetic Measurements, Introduction Pasadena, CA Semiconductor Photoelectrochemistry J.M.D. Coey University of Dublin, Trinity College Kenneth D. Finkelstein Dublin, IRELAND Cornell University Generation and Measurement of Magnetic Fields Ithaca, NY Resonant Scattering Technique Richard G. Connell University of Florida Simon Foner Gainesville, FL Massachusetts Institute of Technology Optical Microscopy Reflected-Light Cambridge, MA Optical Microscopy Magnetometry Brent Fultz Didier de Fontaine California Institute of Technology University of California Pasadena, CA Berkeley, CA Electron Techniques, Introduction Prediction of Phase Diagrams ¨ Mossbauer Spectrometry T.M. Devine Resonance Methods, Introduction University of California Transmission Electron Microscopy Berkeley, CA Jozef Gembarovic Raman Spectroscopy of Solids Thermophysical Properties Research Laboratory David Dollimore West Lafayette, IN University of Toledo Thermal Diffusivity by the Laser Toledo, OH Flash Technique Mass and Density Measurements Thermal Analysis- Craig A. Gerken Definitions, Codes of Practice, and Nomenclature University of Illinois Thermometry Urbana, IL Thermal Analysis, Introduction Low-Energy, Electron Diffraction Barney L. Doyle Atul B. Gokhale Sandia National Laboratory MetConsult, Inc. Albuquerque, NM Roosevelt Island, NY High-Energy Ion Beam Analysis Sample Preparation for Metallography Ion-Beam Techniques, Introduction Alan I. Goldman Jeff G. Dunn Iowa State University University of Toledo Ames, IA Toledo, OH X-Ray Techniques, Introduction Thermogravimetric Analysis Neutron Techniques, Introduction
  • 15. CONTRIBUTORS xiii John T. Grant Robert A. Jacobson University of Dayton Iowa State University Dayton, OH Ames, IA Auger Electron Spectroscopy Single-Crystal X-Ray Structure Determination George T. Gray Duane D. Johnson Los Alamos National Laboratory University of Illinois Los Alamos, NM Urbana, IL High-Strain-Rate Testing of Materials Computation of Diffuse Intensities in Alloys Magnetism in Alloys Vytautas Grivickas Michael H. Kelly Vilnius University National Institute of Standards and Technology Vilnius, LITHUANIA Gaithersburg, MD Carrier Lifetime: Free Carrier Absorption, Techniques to Measure Magnetic Domain Structures Photoconductivity, and Photoluminescence Elton N. Kaufmann Robert P. Guertin Argonne National Laboratory Tufts University Argonne, IL Medford, MA Common Concepts in Materials Characterization, Magnetometry Introduction Gerard S. Harbison Janice Klansky University of Nebraska Beuhler Ltd. Lincoln, NE Lake Bluff, IL Nuclear Quadrupole Resonance Hardness Testing Steve Heald Chris R. Kleijn Argonne National Laboratory Delft University of Technology Argonne, IL Delft, THE NETHERLANDS XAFS Spectroscopy Simulation of Chemical Vapor Deposition Processes Bruno Herreros James A. Knapp University of Southern California Sandia National Laboratories Los Angeles, CA Albuquerque, NM Nuclear Quadrupole Resonance Heavy-Ion Backscattering Spectrometry Thomas Koetzle John P. Hill Brookhaven National Laboratory Brookhaven National Laboratory Upton, NY Upton, NY Single-Crystal Neutron Diffraction Magnetic X-Ray Scattering Ultraviolet Photoelectron Spectroscopy Junichiro Kono Rice University Kevin M. Horn Houston, TX Sandia National Laboratories Cyclotron Resonance Albuquerque, NM Ion Beam Techniques, Introduction Phil Kuhns Florida State University Joseph P. Hornak Tallahassee, FL Rochester Institute of Technology Generation and Measurement of Magnetic Fields Rochester, NY Jonathan C. Lang Nuclear Magnetic Resonance Imaging Argonne National Laboratory James M. Howe Argonne, IL University of Virginia X-Ray Magnetic Circular Dichroism Charlottesville, VA David E. Laughlin Transmission Electron Microscopy Carnegie Mellon University Pittsburgh, PA Gene E. Ice Theory of Magnetic Phase Transitions Oak Ridge National Laboratory Oak Ridge, TN Leonard Leibowitz X-Ray Microprobe for Fluorescence Argonne National Laboratory and Diffraction Argonne, IL Analysis X-Ray and Neutron Diffuse Scattering Differential Thermal Analysis and Differential Scanning Measurements Calorimetry
  • 16. xiv CONTRIBUTORS Supaporn Lerdkanchanaporn Daniel T. Pierce University of Toledo National Institute of Standards and Technology Toledo, OH Gaithersburg, MD Simultaneouse Techniques Including Analysis of Gaseous Techniques to Measure Magnetic Products Domain Structures Nathan S. Lewis Frank J. Pinski California Institute of Technology University of Cincinnati Pasadena, CA Cincinnati, OH Semiconductor Photoelectrochemistry Magnetism in Alloys Dusan Lexa Computation of Diffuse Intensities in Alloys Argonne National Laboratory Branko N. Popov Argonne, IL University of South Carolina Differential Thermal Analysis and Differential Scanning Columbia, SC Calorimetry Ellipsometry Jan Linnros Ziqiang Qiu Royal Institute of Technology University of California at Berkeley Kista-Stockholm, SWEDEN Berkeley, CA Carrier Liftime: Free Carrier Absorption, Surface Magneto-Optic Kerr Effect Photoconductivity, and Photoluminescene David C. Look Talat S. Rahman Wright State University Kansas State University Dayton, OH Manhattan, Kansas Hall Effect in Semiconductors Molecular-Dynamics Simulation of Surface Phenomena Jeffery W. Lynn T.A. Ramanarayanan University of Maryland Exxon Research and Engineering Corp. College Park, MD Annandale, NJ Magentic Neutron Scattering Electrochemical Techniques for Corrosion Quantification Kosta Maglic M. Ramasubramanian Institute of Nuclear Sciences ‘‘Vinca’’ University of South Carolina Belgrade, YUGOSLAVIA Columbia, SC Thermal Diffusivity by the Laser Flash Technique Ellipsometry Floyd McDaniel S.S.A. Razee University of North Texas University of Warwick Denton, TX Coventry, UNITED KINGDOM Trace Element Accelerator Mass Spectrometry Magnetism in Alloys Michael E. McHenry Carnegie Mellon University James L. Robertson Pittsburgh, PA Oak Ridge National Laboratory Magnetic Moment and Magnetization Oak Ridge, TN Thermomagnetic Analysis X-Ray and Neutron Diffuse Scattering Measurements Theory of Magnetic Phase Transitions Ian K. Robinson Keith A. Nelson University of Illinois Massachusetts Institute of Technology Urbana, IL Cambridge, MA Surface X-Ray Diffraction Impulsive Stimulated Thermal Scattering John A. Rogers Dale E. Newbury Bell Laboratories, Lucent Technologies National Institute of Standards and Technology Murray Hill, NJ Gaithersburg, MD Impulsive Stimulated Thermal Scattering Energy-Dispersive Spectrometry P.A.G. O’Hare William J. Royea Darien, IL California Institute of Technology Combustion Calorimetry Pasadena, CA Semiconductor Photoelectrochemistry Stephen J. Pennycook Oak Ridge National Laboratory Larry Rubin Oak Ridge, TN Massachusetts Institute of Technology Scanning Transmission Electron Cambridge, MA Microscopy: Z-Contrast Imaging Generation and Measurement of Magnetic Fields
  • 17. CONTRIBUTORS xv Miquel Salmeron Hugo Steinfink Lawrence Berkeley National Laboratory University of Texas Berkeley, CA Austin, TX Scanning Tunneling Microscopy Symmetry in Crystallography Alan C. Samuels Peter W. Stephens Edgewood Chemical Biological Center SUNY Stony Brook Aberdeen Proving Ground, MD Stony Brook, NY Mass and Density Measurements X-Ray Powder Diffraction Optical Imaging and Spectroscopy, Introduction Thermometry Ray E. Taylor Thermophysical Properties Research Laboratory Juan M. Sanchez West Lafayette, IN 47906 University of Texas at Austin Thermal Diffusivity by the Laser Flash Technique Austin, TX Computational and Theoretical Methods, Introduction Chin-Che Tin Auburn University Hans J. Schneider-Muntau Auburn, AL Florida State University Deep-Level Transient Spectroscopy Tallahassee, FL Generation and Measurement of Magnetic Fields Brian M. Tissue Virginia Polytechnic Institute & State University Christian Schott Blacksburg, VA Swiss Federal Institute of Technology Ultraviolet and Visible Absorption Spectroscopy Lausanne, SWITZERLAND Generation and Measurement of Magnetic Fields James E. Toney Justin Schwartz Applied Electro-Optics Corporation Florida State University Bridgeville, PA Tallahassee, FL Photoluminescene Spectroscopy Electrical Measurements on Superconductors by John Unguris Transport National Institute of Standards and Technology Supapan Seraphin Gaithersburg, MD University of Arizona Techniques to Measure Magnetic Domain Structures Tucson, AZ David Vaknin Scanning Electron Microscopy Iowa State University Qun Shen Ames, IA Cornell University X-Ray Diffraction Techniques for Liquid Surfaces and Ithaca, NY Monomolecular Layers Dynamical Diffraction Y Mark van Schilfgaarde Jack Singleton SRI International Consultant Menlo Park, California Monroeville, PA Summary of Electronic Structure Methods General Vacuum Techniques ¨ Gyorgy Vizkelethy Gabor A. Somorjai Sandia National Laboratories University of California & Lawrence Berkeley Albuquerque, NM National Laboratory Nuclear Reaction Analysis and Proton-Induced Gamma Berkeley, CA Ray Emission Low-Energy Electron Diffraction Thomas Vogt Cullie J. Sparks Brookhaven National Laboratory Oak Ridge National Laboratory Upton, NY Oak Ridge, TN Neutron Powder Diffraction X-Ray and Neutron Diffuse Scattering Measurements Costas Stassis Yunzhi Wang Iowa State University Ohio State University Ames, IA Columbus, OH Phonon Studies Simulation of Microstructural Evolution Using the Field Method Julie B. Staunton University of Warwick Richard E. Watson Coventry, UNITED KINGDOM Brookhaven National Laboratory Computation of Diffuse Intensities in Alloys Upton, NY Magnetism in Alloys Bonding in Metals
  • 18. xvi CONTRIBUTORS Huub Weijers Introduction To Medium-Energy Ion Beam Analysis Florida State University Medium-Energy Backscattering and Forward-Recoil Tallahassee, FL Spectrometry Electrical Measurements on Superconductors by Transport Stuart Wentworth Auburn University Jefferey Weimer Auburn University, AL University of Alabama Conductivity Measurement Huntsville, AL X-Ray Photoelectron Spectroscopy David Wipf Michael Weinert Mississippi State University Brookhaven National Laboratory Mississippi State, MS Upton, NY Scanning Electrochemical Microscopy Bonding in Metals Gang Xiao Robert A. Weller Brown University Vanderbilt University Providence, RI Nashville, TN Magnetism and Magnetic Measurements, Introduction
  • 19. CHARACTERIZATION OF MATERIALS
  • 21. COMMON CONCEPTS COMMON CONCEPTS IN MATERIALS As Characterization of Materials evolves, additional CHARACTERIZATION, INTRODUCTION common concepts will be added. However, when it seems more appropriate, such content will appear more closely From a tutorial standpoint, one may view this chapter as tied to its primary topical chapter. a good preparatory entrance to subsequent chapters of Characterization of Materials. In an educational setting, ELTON N. KAUFMANN the generally applicable topics of the units in this chapter can play such a role, notwithstanding that they are each quite independent without having been sequenced with GENERAL VACUUM TECHNIQUES any pedagogical thread in mind. In practice, we expect that each unit of this chapter will INTRODUCTION be separately valuable to users of Characterization of Materials as they choose to refer to it for concepts under- In this unit we discuss the procedures and equipment used lying many of those exposed in units covering specific mea- to maintain a vacuum system at pressures in the range surement methods. from 10À3 to 10À11 torr. Total and partial pressure gauges Of course, not every topic covered by a unit in this chap- used in this range are also described. ter will be relevant to every measurement method covered Because there is a wide variety of equipment, we in subsequent chapters. However, the concepts in this describe each of the various components, including details chapter are sufficiently common to appear repeatedly in of their principles and technique of operation, as well as the pursuit of materials research. It can be argued that their recommended uses. the units treating vacuum techniques, thermometry, and SI units are not used in this unit. The American sample preparation do not deal directly with the materials Vacuum Society attempted their introduction many years properties to be measured at all. Rather, they are crucial to ago, but the more traditional units continue to dominate in preparation and implementation of such a measurement. this field in North America. Our usage will be consistent It is interesting to note that the properties of materials with that generally found in the current literature. The nevertheless play absolutely crucial roles for each of these following units will be used. topics as they rely on materials performance to accomplish Pressure is given in torr. 1 torr is equivalent to 133.32 their ends. pascal (Pa). Mass/density measurement does of course relate to a Volume is given in liters (L), and time in seconds (s). most basic materials property, but is itself more likely to The flow of gas through a system, i.e., the ‘‘throughput’’ be an ancillary necessity of a measurement protocol than (Q), is given in torr-L/s. to be the end goal of a measurement (with the important Pumping speed (S) and conductance (C) are given in exceptions of properties related to porosity, defect density, L/s. etc.). In temperature and mass measurement, apprecia- ting the role of standards and definitions is central to pro- per use of these parameters. PRINCIPLES OF VACUUM TECHNOLOGY It is hard to think of a materials property that does not depend on the crystal structure of the materials in ques- The most difficult step in designing and building a vacuum tion. Whether the structure is a known part of the explana- system is defining precisely the conditions required to ful- tion of the value of another property or its determination is fill the purpose at hand. Important factors to consider itself the object of the measurement, a good grounding include: in essentials of crystallographic groups and syntax is a common need in most measurement circumstances. A 1. The required system operating pressure and the unit provided in this chapter serves that purpose well. gaseous impurities that must be avoided; Several chapters in Characterization of Materials deal with impingement of projectiles of one kind or another 2. The frequency with which the system must be vented on a sample, the reaction to which reflects properties of to the atmosphere, and the required recycling time; interest in the target. Describing the scattering of the pro- 3. The kind of access to the vacuum system needed for jectiles is necessary in all these cases. Many concepts in the insertion or removal of samples. such a description are similar regardless of projectile type, while the details differ greatly among ions, electrons, For systems operating at pressures of 10À6 to 10À7 torr, neutrons, and photons. Although the particle scattering venting the system is the simplest way to gain access, but unit in this chapter emphasizes the charged particle and for ultrahigh vacuum (UHV), e.g., below 10À8 torr, the ions in particular, the concepts are somewhat portable. A pumpdown time can be very long, and system bakeout good deal of generic scattering background is provided in would usually be required. A vacuum load-lock antecham- the chapters covering neutrons, x rays, and electrons as ber for the introduction and removal of samples may be projectiles as well. essential in such applications. 1
  • 22. 2 COMMON CONCEPTS Because it is difficult to address all of the above ques- rapidly. However, water will persist as the major outgas- tions, a viable specification of system performance is often sing load. Every time a system is vented to air, the walls neglected, and it is all too easy to assemble a more sophis- are exposed to moisture and one or more layers of water ticated and expensive system than necessary, or, if bud- will adsorb virtually instantaneously. The amount gets are low, to compromise on an inadequate system adsorbed will be greatest when the relative humidity is that cannot easily be upgraded. high, increasing the time needed to reach base pressure. Before any discussion of the specific components of a Water is bound by physical adsorption, a reversible pro- vacuum system, it is instructive to consider the factors cess, but the binding energy of adsorption is so great that govern the ultimate, or base, pressure. The pressure that the rate of desorption is slow at ambient temperature. can be calculated from Physical adsorption involves van der Waal’s forces, which are relatively weak. Physical adsorption should be distin- Q guished from chemisorption, which typically involves the P¼ ð1Þ S formation of chemical-type bonding of a gas to an atomi- cally clean surface—for example, oxygen on a stainless where P is the pressure in torr, Q is the total flow, or steel surface. Chemisorption of gas is irreversible under throughput of gas, in torr-L/s, and S is the pumping speed all conditions normally encountered in a vacuum system. in L/s. After the first few minutes of pumping, pressures are The influx of gas, Q, can be a combination of a deliberate almost always in the free molecular flow regime, and influx of process gas from an exterior source and gas origi- when a water molecule is desorbed, it experiences only col- nating in the system itself. With no external source, the lisions with the walls, rather than with other molecules. base pressure achieved is frequently used as the principle Consequently, as it leaves the system, it is readsorbed indicator of system performance. The most important many times, and on each occasion desorption is a slow pro- internal sources of gas are outgassing from the walls and cess. permeation from the atmosphere, most frequently through One way of accelerating the removal of adsorbed water elastomer O-rings. There may also be leaks, but these can is by purging at a pressure in the viscous flow region, using readily be reduced to negligible levels by proper system a dry gas such as nitrogen or argon. Under viscous flow design and construction. Vacuum pumps also contribute conditions, the desorbed water molecules rarely reach to background pressure, and here again careful selection the system walls, and readsorption is greatly reduced. A and operation will minimize such problems. second method is to heat the system above its normal operating temperature. The Problem of Outgassing Any process that reduces the adsorption of water in a Of the sources of gas described above, outgassing is often vacuum system will improve the rate of pumpdown. The the most important. With a new system, the origin of out- simplest procedure is to vent a vacuum system with a gassing may be in the manufacture of the materials used dry gas rather than with atmospheric air, and to minimize in construction, in handling during construction, and in the time the system remains open following such a proce- exposure of the system to the atmosphere. In general these dure. Dry air will work well, but it is usually more conve- sources scale with the area of the system walls, so that it is nient to substitute nitrogen or argon. wise to minimize the surface area and to avoid porous From Equation 1, it is evident that there are two materials in construction. For example, aluminum is an approaches to achieving a lower ultimate pressure, and excellent choice for use in vacuum systems, but anodized hence a low impurity level, in a system. The first is to aluminum has a porous oxide layer that provides an inter- increase the effective pumping speed, and the second is nal surface for gas adsorption many times greater than the to reduce the outgassing rate. There are severe limitations apparent surface, making it much less suitable for use in to the first approach. In a typical system, most of one wall vacuum. of the chamber will be occupied by the connection to the The rate of outgassing in a new, unbaked system, fabri- high-vacuum pump; this limits the size of pump that can cated from materials such as aluminum and stainless be used, imposing an upper limit on the achievable pum- steel, is initially very high, on the order of 10À6 to ping speed. As already noted, the ultimate pressure 10À7 torr-L/s Á cm2 of surface area after one hour of expo- achieved in an unbaked system having this configuration sure to vacuum (O’Hanlon, 1989). With continued pump- will rarely reach the mid-10À8 torr range. Even if one could ing, the rate falls by one or two orders of magnitude mount a similar-sized pump on every side, the best to be during the first 24 hr, but thereafter drops very slowly expected would be a 6-fold improvement, achieving a over many months. Typically the main residual gas is base pressure barely into the 10À9 torr range, even after water vapor. In a clean vacuum system, operating at ambi- very long exhaust times. ent temperature and containing only a moderate number It is evident that, to routinely reach pressures in the of O-rings, the lowest achievable pressure is usually 10À7 10À10 torr range in a realistic period of time, a reduction to mid-10À8 torr. The limiting factor is generally residual in the rate of outgassing is necessary—e.g., by heating outgassing, not the capability of the high-vacuum pump. the vacuum system. Baking an entire system to 4008C The outgassing load is highest when a new system is for 16 hr can produce outgassing rates of 10À15 torr-L/ put into service, but with steady use the sins of construc- s Á cm2 (Alpert, 1959), a reduction of 108 from those found tion are slowly erased, and on each subsequent evacuation, after 1 hr of pumping at ambient temperature. The mag- the system will reach its typical base pressure more nitude of this reduction shows that as large a portion as
  • 23. GENERAL VACUUM TECHNIQUES 3 possible of a system should be heated to obtain maximum Oil-Sealed Pumps advantage. The earliest roughing pumps used either a piston or liquid to displace the gas. The first production methods for incan- PRACTICAL ASPECTS OF VACUUM TECHNOLOGY descent lamps used such pumps, and the development of the oil-sealed mechanical pump by Gaede, around 1907, Vacuum Pumps was driven by the need to accelerate the pumping process. The operation of most vacuum systems can be divided into two regimes. The first involves pumping the system from Applications. The modern versions of this pump are the atmosphere to a pressure at which a high-vacuum pump most economic and convenient for achieving pressures as can be brought into operation. This is traditionally known low as the 10À4 torr range. The pumps are widely used as the rough vacuum regime and the pumps used are com- as a backing pump for both diffusion and turbomolecular monly referred to as roughing pumps. Clearly, a system pumps; in this application the backstreaming of mechani- that operates at an ultimate pressure within the capability cal pump oil is intercepted by the high vacuum pump, and of the roughing pump will require no additional pumps. a foreline trap is not required. Once the system has been roughed down, a high- vacuum pump must be used to achieve lower pressures. Operating Principles. The oil-sealed pump is a positive- If the high-vacuum pump is the type known as a transfer displacement pump, of either the vane or piston type, with pump, such as a diffusion or turbomolecular pump, it will a compression ratio of the order of 105:1 (Dobrowolski, require the continuous support of the roughing pump in 1979). It is available as a single or two-stage pump, capable order to maintain the pressure at the exit of the high- of reaching base pressures in the 10À2 and 10À4 torr range, vacuum pump at a tolerable level (in this phase of the respectively. The pump uses oil to maintain sealing, and to pumping operation the function of the roughing pump provide lubrication and heat transfer, particularly at the has changed, and it is frequently referred to as a backing contact between the sliding vanes and the pump wall. or forepump). Transfer pumps have the advantage that Oil also serves to fill the significant dead space leading to their capacity for continuous pumping of gas, within their the exhaust valve, essentially functioning as a hydraulic operating pressure range, is limited only by their reliabi- valve lifter and permitting the very high compression lity. They do not accumulate gas, an important considera- ratio. tion where hazardous gases are involved. Note that the The speed of such pumps is often quoted as the ‘‘free-air reliability of transfer pumping systems depends upon the displacement,’’ which is simply the volume swept by the satisfactory performance of two separate pumps. A second pump rotor. In a typical two-stage pump this speed is sus- class of pumps, known collectively as capture pumps, tained down to $1 Â 10À1 torr; below this pressure the require no further support from a roughing pump once speed decreases, reaching zero in the 10À5 torr range. If they have started to pump. Examples of this class are cryo- a pump is to sustain pressures near the bottom of its range, genic pumps and sputter-ion pumps. These types of pump the required pump size must be determined from pub- have the advantage that the vacuum system is isolated lished pumping-speed performance data. It should be from the atmosphere, so that system operation depends noted that mechanical pumps have relatively small pump- upon the reliability of only one pump. Their disadvantage ing speed, at least when compared with typical high- is that they can provide only limited storage of pumped vacuum pumps. A typical laboratory-sized pump, powered gas, and as that limit is reached, pumping will deteriorate. by a 1/3 hp motor, may have a speed of $3.5 cubic feet per The effect of such a limitation is quite different for the two minute (cfm), or rather less than 2 L/s, as compared to the examples cited. A cryogenic pump can be totally regene- smallest turbomolecular pump, which has a rated speed of rated by a brief purging at ambient temperature, but a 50 L/s. sputter-ion pump requires replacement of its internal com- ponents. One aspect of the cryopump that should not be overlooked is that hazardous gases are stored, unchanged, Avoiding Oil Contamination from an Oil-Sealed Mechani- within the pump, so that an unexpected failure of the cal Pump. The versatility and reliability of the oil-sealed pump can release these accumulated gases, requiring pro- mechanical pump carries with it a serious penalty. When vision for their automatic safe dispersal in such an emer- used improperly, contamination of the vacuum system is gency. inevitable. These pumps are probably the most prevalent source of oil contamination in vacuum systems. The pro- blem arises when thay are untrapped and pump a system Roughing Pumps down to its ultimate pressure, often in the free molecular Two classes of roughing pumps are in use. The first type, flow regime. In this regime, oil molecules flow freely into the oil-sealed mechanical pump, is by far the most com- the vacuum chamber. The problem can readily be avoided mon, but because of the enormous concern in the semi- by careful control of the pumping procedures, but possible conductor industry about oil contamination, a second system or operator malfunction, leading to contamination, type, the so-called ‘‘dry’’ pump, is now frequently used. must be considered. For many years, it was common prac- In this context, ‘‘dry’’ implies the absence of volatile orga- tice to leave a system in the standby condition evacuated nics in the part of the pump that communicates with the only by an untrapped mechanical pump, making contami- vacuum system. nation inevitable.
  • 24. 4 COMMON CONCEPTS Mechanical pump oil has a vapor pressure, at room tem- flowing from the system side of the trap to the pump perature, in the low 10À5 torr range when first installed, (D.J. Santeler, pers. comm.). The foreline is isolated from but this rapidly deteriorates up to two orders of magnitude the rest of the system and the gas flow is continued as the pump is operated (Holland, 1971). A pump operates throughout the heating cycle, until the trap has cooled at temperatures of 608C, or higher, so the oil vapor pres- back to ambient temperature. An adsorbent foreline trap sure far exceeds 10À3 torr, and evaporation results in a must be optically dense, so the oil molecules have no substantial flux of oil into the roughing line. When a sys- path past the adsorbent; commercial traps do not always tem at atmospheric pressure is connected to the mechani- fulfill this basic requirement. Where regeneration of the cal pump, the initial gas flow from the vacuum chamber is foreline trap has been totally neglected, acceptable perfor- in the viscous flow regime, and oil molecules are driven mance may still be achieved simply because a diffusion back to the pump by collisions with the gas being ex- pump or turbomolecular pump serves as the true ‘‘trap,’’ hausted (Holland, 1971; Lewin, 1985). Provided the rough- intercepting the oil from the forepump. ing process is terminated while the gas flow is still in the Oil contamination can also result from improperly tur- viscous flow regime, no significant contamination of the ning a pump off. If it is stopped and left under vacuum, oil vacuum chamber will occur. The condition for viscous frequently leaks slowly across the exhaust valve into the flow is given by the equation pump. When it is partially filled with oil, a hydraulic lock may prevent the pump from starting. Continued leak- PD ! 0:5 ð2Þ age will drive oil into the vacuum system itself; an inter- esting procedure for recovery from such a catastrophe where P is the pressure in torr and D is the internal dia- has been described (Hoffman, 1979). meter of the roughing line in centimeters. Whenever the pump is stopped, either deliberately or by Termination of the roughing process in the viscous flow power failure or other failure, automatic controls that first region is entirely practical when the high-vacuum pump is isolate it from the vacuum system, and then vent it to either a turbomolecular or modern diffusion pump (see atmospheric pressure, should be used. precautions discussed under Diffusion Pumps and Turbo- Most gases exhausted from a system, including oxygen molecular Pumps, below). Once these pumps are in opera- and nitrogen, are readily removed from the pump oil, but tion, they function as an effective barrier against oil some can liquify under maximum compression just before migration into the system from the forepump. Hoffman the exhaust valve opens. Such liquids mix with the oil and (1979) has described the use of a continuous gas purge are more difficult to remove. They include water and sol- on the foreline of a diffusion-pumped system as a means vents frequently used to clean system components. When of avoiding backstreaming from the forepump. pumping large volumes of air from a vacuum chamber, particularly during periods of high humidity (or whenever Foreline Traps. A foreline trap is a second approach to solvent residues are present), it is advantageous to use a preventing oil backstreaming. If a liquid nitrogenÀcooled gas-ballast feature commonly fitted to two-stage and also trap is always in place between a forepump and the to some single-stage pumps. This feature admits air du- vacuum chamber, cleanliness is assured. But the operative ring the final stage of compression, raising the pressure word is ‘‘always.’’ If the trap warms to ambient tempera- and forcing the exhaust valve to open before the partial ture, oil from the trap will migrate upstream, and this is pressure of water has reached saturation. The ballast fea- much more serious if it occurs while the line is evacuated. ture minimizes pump contamination and reduces pump- A different class of trap uses an adsorbent for oil. Typical down time for a chamber exposed to humid air, although adsorbents are activated alumina, molecular sieve (a syn- at the cost of about ten-times-poorer base pressure. thetic zeolite), a proprietary ceramic (Micromaze foreline traps; Kurt J. Lesker Co.), and metal wool. The metal Oil-Free (‘‘Dry’’) Pumps wool traps have much less capacity than the other types, Many different types of oil-free pumps are available. We and unless there is evidence of their efficacy, they are will emphasize those that are most useful in analytical best avoided. Published data show that activated alumina and diagnostic applications. can trap 99% of the backstreaming oil molecules (Fulker, 1968). However, one must know when such traps should Diaphragm Pumps be reactivated. Unequivocal determination requires inser- Applications: Diaphragm pumps are increasingly used tion of an oil-detection device, such as a mass spectro- where the absence of oil is an imperative, for example, as meter, on the foreline. The saturation time of a trap the forepump for compound turbomolecular pumps that depends upon the rate of oil influx, which in turn depends incorporate a molecular drag stage. The combination ren- upon the vapor pressure of oil in the pump and the conduc- ders oil contamination very unlikely. Most diaphragm tance of the line between pump and trap. The only safe pro- pumps have relatively small pumping speeds. They are cedure is frequent reactivation of traps on a conservative adequate once the system pressure reaches the operating schedule. Reactivation may be done by venting the system, range of a turbomolecular pump, usually well below replacing the adsorbent with a new charge, or by baking 10À2 torr, but not for rapidly roughing down a large the adsorbent in a stream of dry air or inert gas to a tem- volume. Pumps are available with speeds up to several perature of $3008C for several hours. Some traps can be liters per second, and base pressures from a few torr to regenerated by heating in situ, but only using a stream as low as 10À3 torr, lower ultimate pressures being asso- of inert gas, at a pressure in the viscous flow region, ciated with the lower-speed pumps.
  • 25. GENERAL VACUUM TECHNIQUES 5 Operating Principles: Four diaphragm modules are been used in the compound turbomolecular pump as an often arranged in three separate pumping stages, with integral backing stage. This will be discussed in detail the lowest-pressure stage served by two modules in tan- under Turbomolecular Pumps. dem to boost the capacity. Single modules are adequate Operating Principles: The pump uses one or more for subsequent stages, since the gas has already been com- drums rotating at speeds as high as 90,000 rpm inside sta- pressed to a smaller volume. Each module uses a flexible tionary, coaxial housings. The clearance between drum diaphragm of Viton or other elastomer, as well as inlet and housing is $0.3 mm. Gas is dragged in the direction and outlet valves. In some pumps the modules can be of rotation by momentum transfer to the pump exit along arranged to provide four stages of pumping, providing a helical grooves machined in the housing. The bearings of lower base pressure, but at lower pumping speed because these devices are similar to those in turbomolecular pumps only a single module is employed for the first stage. The (see discussion of Turbomolecular Pumps, below). An major required maintenance in such pumps is replacement internal motor avoids difficulties inherent in a high-speed of the diaphragm after 10,000 to 15,000 hr of operation. vacuum seal. A typical pump uses two or more separate stages, arranged in series, providing a compression ratio Scroll Pumps as high as 1:107 for air, but typically less than 1:103 for Applications: Scroll pumps (Coffin, 1982; Hablanian, hydrogen. It must be supported by a backing pump, often 1997) are used in some refrigeration systems, where the of the diaphragm type, that can maintain the forepressure limited number of moving parts is reputed to provide below a critical value, typically 10 to 30 torr, depending high reliability. The most recent versions introduced for upon the particular design. The much lower compression general vacuum applications have the advantages of dia- ratio for hydrogen, a characteristic shared by all turbo- phragm pumps, but with higher pumping speed. Published molecular pumps, will increase its percentage in a vacuum speeds on the order of 10 L/s and base pressures below chamber, a factor to consider in rare cases where the pre- 10À2 torr make this an appealing combination. Speeds sence of hydrogen affects the application. decline rapidly at pressures below $2 Â 10À2 torr. Sorption Pumps Operating Principles: Scroll pumps use two enmeshed Applications: Sorption pumps were introduced for spiral components, one fixed and the other orbiting. Suc- roughing down ultrahigh vacuum systems prior to turning cessive crescent-shaped segments of gas are trapped on a sputter-ion pump (Welch, 1991). The pumping speed between the two scrolls and compressed from the inlet of a typical sorption pump is similar to that of a small oil- (vacuum side) toward the exit, where they are vented to sealed mechanical pump, but they are rather awkward in the atmosphere. A sophisticated and expensive version of application. This is of little concern in a vacuum system this pump has long been used for processes where leak- likely to run many months before venting to the atmo- tight operation and noncontamination are essential, for sphere. Occasional inconvenience is a small price for the example, in the nuclear industry for pumping radioactive ultimate in contamination-free operation. gases. An excellent description of the characteristics of this design has been given by Coffin (1982). In this version, Operating Principles: A typical sorption pump is a extremely close tolerances (10 mm) between the two scrolls cannister containing $3 lb of a molecular sieve material minimize leakage between the high- and low-pressure that is cooled to liquid nitrogen temperature. Under these ends of the scrolls. The more recent pump designs, which conditions the molecular sieve can adsorb $7.6 Â 104 torr- substitute Teflon-like seals for the close tolerances, have liter of most atmospheric gases; exceptions are helium and made the pump an affordable option for general oil-free hydrogen, which are not significantly adsorbed, and neon, applications. The life of the seals is reported to be in the which is adsorbed to a limited extent. Together, these same range as that of the diaphragm in a diaphragm gases, if not pumped, would leave a residual pressure in pump. the 10À2 torr range. This is too high to guarantee the trou- ble-free start of a sputter-ion pump, but the problem is Screw Compressor. Although not yet widely used, readily avoided. For example, a sorption pump connected pumps based on the principle of the screw compressor, such to a vacuum chamber of $100 L volume exhausts air to a as that used in supercharging some high-performance cars, pressure in the viscous flow region, say 5 torr, and then is appear to offer some interesting advantages: i.e., pumping valved off. The nonadsorbing gases are swept into the speeds in excess of 10 L/s, direct discharge to the atmo- pump along with the adsorbed gases; the pump now con- sphere, and ultimate pressures in the 10À3 torr range. If tains a fraction (760–5)/760 or 99.3% of the nonadsorbable such pumps demonstrate high reliability in diverse appli- gases originally present, leaving hydrogen, helium, and cations, they constitute the closest alternative, in a single- neon in the low 10À4 torr range in the vacuum chamber. unit ‘‘dry’’ pump, to the oil-sealed mechanical pump. A second sorption pump on the vacuum chamber will then readily achieve a base pressure below 5 Â 10À4 torr, Molecular Drag Pump quite adequate to start even a recalcitrant ion pump. Applications: The molecular drag pump is useful for applications requiring pressures in the 1 to 10À7 torr range High-Vacuum Pumps and freedom from organic contamination. Over this range the pump permits a far higher throughput of gas, com- Four types of high-vacuum pumps are in general use: pared to a standard turbomolecular pump. It has also diffusion, turbomolecular, cryosorption, and sputter-ion.