1. 1
Pratik Motwani
PhD candidate & Six Sigma Green belt trainee
OBJECTIVE
To secure a challenging position in fields related to semiconductor device processing and material science where I can effectively
contribute my skills to sustain, develop and transfer processes for production.
EDUCATION
Ph.D. in Electrical engineering, University of Houston, Major CGPA: 3.78/4 Graduation: Dec 2014
B.E. Electronics and Communication Engineering, S.P.University, India, CGPA : 3.8/4 Graduation: Jun 2009
RESEARCH & PROFESSIONAL EXPERIENCE
Research Engineer, Nanosystem Manufacturing Center Aug 2010 - present
Dissertation: Development of novel metallic nano-sensors for bio-molecular sensing, chemical analysis & MEMS applications
 Plasmonic nano-sensors for improving the sensitivity of surface enhanced Raman spectroscopy
o Development of a new generation of 3D mesoporous particles thatcan be integrated in bio-sensing chips, capable
of multiplex detection with very high sensitivity.
o Structural evolution of gold and gold alloy nano dots, and their impact on Surface enhanced Raman scattering.
o Integrating nano-sensors around tapered cylindrical optical fibers for practical applications.
 Discovery and development of a novel sensor technology for early detection of subsea oil spills.
o Development of wire sensors that can detect extremely trace amounts of hydrocarbon.
Other Projects
 Silicon and deep Si etching for silicon stencil mask fabrication
o Stencil masks with 75nm hole-arrays using thin film deposition, e-beam lithography and plasma etching.
 A reliable and a high throughput approach for 3D MEMS Devices fabricated on aggressive topographies
o Development of a high throughput plasma enhanced chemical vapor deposition of a negative tone resist material.
o Reliable mask to substrate alignment for 3D lithography.
Internship, Entroplus solutions Sept 2010 – Jan 2011
 Development of fuel cell cathodes for enhanced power density
Equipment Ownership: DC Magnetron Sputter deposition (PVD), Plasma enhanced chemical vapor deposition (PECVD),
Ion beam processing, Magnetically enhanced reactive ion etching system (RIE), Deep-UV Photolithography.
Operations Manager: Nanosystem Manufacturing Center (a 4000 sq.ft lab), Scanning electron microscope (LEO 1525).
Teaching Assistant – Cullen college of Engineering.
SUMMARY OF SKILLS
 Hands on clean room (Class 100) experience –
Fabrication process development: Thin filmprocessing, Plasma etching,Lithography, Silicon surfacepreparation and wet etching
Metrology: High resolution Scanning electron microscopy, Atomic force microscopy, Ellipsometry, Surface Profilometry,
Energy dispersive spectrometry, Raman microscopy, 4-point probe, SIMS, XPS, XRD.
 Advanced knowledge of MEMS Processing, Device Physics, Process Integration, Statistical process control and Lean
manufacturing.
 Software expertise: Programming - C, C++, VHDL, Verilog, MATLAB, Mathematica
Process analysis - TSUPREM4, LABVIEW, PROLITH, TRIM, SRIM, PYTHON, LATEX
Analysis and simulation - TCAD, SPICE, CADENCE, SOLIDWORKS, SILVACO.
Statistics and operating systems - JMP, SAS, UNIX, UBUNTU
Phone: 713-540-8878 e-mail: pratikmotwani@gmail.com

2. 2
Pratik Motwani
PhD candidate & Six Sigma Green belt trainee
PATENTS AND PUBLICATIONS (5)
 Nanoporous gold nanoparticles as high-payload molecular cargos, photothermal/photodynamic therapeutic agents, and
ultrahigh surface-to-volume plasmonic sensors, Application Number: PCT/US2013/030462.
 Pratik Motwani et.al., “Surface enhanced Raman spectroscopy with monolithic nanoporous gold disk substrates,” Nanoscale,
Advance Article (Journal cover), Dec. 2012.
 Pratik Motwani et.al., “Structural evolution of nanoporous gold thin films on gold-coated substrates and its impact on surface
enhanced Raman scattering ,” Applied Physics Letters, (in Press).
 Pratik Motwani et.al., “Morphological, plasmonic, and SERS characterization of DC-sputtered gold nanoislands,” Biomedical
Spectroscopy and Imaging 4(1): 95-103, 2015.
 Fusheng Zhao, Pratik Motwani et.al., “Monolithic nanoporous gold disks with large specific surface area, tunable plasmon
resonance, and high-density, internal plasmonic hot-spots,” Nanoscale, (Published – May 2014).
CONFERENCE PROCEEDINGS (Multiple)
 Ji Qi, Pratik Motwani et.al., Proc.SPIE.8597, Plasmonics in Biology and Medicine X, Feb. 2012,
 Pratik Motwani et.al., Advances in Optics for Biotechnology, Medicine and Surgery, Engineering Conference International,
Naples FL, Jun 2011. (Best poster Award),
 Pratik Motwani et.al., Proc. SPIE 8597,Plasmonicsin Biology and MedicineX,85970I (February 21, 2013),
 Pratik Motwani et.al., 57th international Electron Ion and Photon Beam technology and Nanofabrication, Nashville,TN,May 2013
HONORS/AWARDS AND MEMBERSHIPS
 Responsible for more than $3 million in research funding for Advisor(NSF,NIH,NASA,GOMRI,DOI)
 Best poster award, (1) ECI: Advances in Optics for Biotechnology, Medicine and Surgery, Naples, FL 2011, (2) Graduate
Research Conference, University of Houston.
 Nanoscale article featured on Journal cover.
 Member: American Vacuum Society (AVS), Nature Nanoporous Gold, ACS, ASIE, IEEE, SPIE.
 Featured in the inaugural Electrical and Computer Engineering Magazine.
Assisted students to fabricate small satellite antennas for CubeSat applications, a project funded by NASA.
http://www.egr.uh.edu/news/201305/nasa-sponsored-student-team-develops-innovative-small-satellite-antenna-designs
 Doctoral Student tuition fellowship recipient since August 2011.
ACADEMIC COURSEWORK AND PROJECTS
 Relevant coursework: Principles of Plasma processing,VLSI Design, Thin filmtechnology, Advanced topics in microelectronics,
Nanoscale Design and fabrication, Introduction to Stochastic processes, Principles of Lithography, Topics in Optic Imaging,
Integrated Circuit Engineering, Advanced Digital Design, Advanced Process Integration, MEMS Devices and processing.
 Designing and Modelling Computational Lithography like Optical Proximity Correction, Off-axis, Phase-shifting etc., in
immersion photolithography using PYTHON and MATLAB.
 Monte carlo simulation to study the kinetics of early thin filmgrowth in a vapor phase deposition process using MATLAB and C.
 Demonstrated the operation of a BCD to seven segment decoder IC using Computer aided design with CADENCE/VIRTUOSO.
 High-k dielectric/metal gate stack technology development for current and future trends in CMOS scaling.
Phone: 713-540-8878 e-mail: pratikmotwani@gmail.com