Self assembled hybrid films of phosphotungstic acid and aminoalkoxysilane sur...
Defense
1. 08-18-08
Kothanda Rama Pichaandi
Chemistry Department, Tulane University, New Orleans
Defense Seminar
Synthesis of Strained Ring Compounds: Precursors to Disilyne
via Molecular Beam Method
2. Introduction
Multiple bonded
(Me)2Si O
Si Si
Me
Me
Me
Me
Si C
Me
Me
Me
Me
CH3Si+
CH3Si
-
CH3Si (C2H5)3Si
Low valent
Organosilicon reactive intermediates involves one or
more silicon atoms that are either multiply bonded or low
valent in nature.
Many of them are transient in nature and can be
observable only at very low temperature under
condensed matrix conditions.
Si Si MeMe
Si
Ph
Ph
Si
Bu
Bu
t
t
3. Microlitho
graphy
Applications of Organosilicon Reactive Intermediates
Semiconductors
Aerospace Industries
Stereo selective synthesis
Me
O Ph
O
O
Si
Bu
Bu
AgOTs
O
O
O Ph
Me
Si
Bu Bu
6 electro
cyclization
Ph
COOHHO
MeIreland-Claison
rearrangement
Hydrolysis
(1)
(2)
(3)
t tt
t
4. Synthesis of a series of Bis(siliranes): Precursors to Disilyne
via Molecular Beam Method
------------------------------------------------------------------------------
-----------------------------------------------------------------------------
The Thermal and Photochemical Decomposition of
2,2,3,3-Tetramethyl-1,1-bis(dimethylphenylsilyl) Silirane
Manuscript under preparation for Organometallics
Project I
Project II
Project III
Content of the Talk
Manuscript under preparation for Organometallics
Synthesis, Electrochemistry and Spectroelectrochemistry
of a Silicon (IV) Phthalocyanine Chloride
Submitted to Inorganica Chemica Acta
5. Synthesis of a Series of Bis(siliranes): Precursors to Disilyne
via Molecular Beam Method
6. HC CH
C
E = Si, Ge, Sn, PbE E RR
H2C CH2
E E
R
R
R
R
Why Multiple Bonded Compounds of Heavier
Elements are Reactive
Si
Ge
Sn
Pb
C
7. HC CH
E = Si, Ge, Sn, PbE E RR
H2C CH2
E E
R
R
R
R
Pauli repulsion from the
inner shell electrons.
Mismatch in Orbital size
and s electrons become
increasingly lone pair in
character.
Why Multiple Bonded Compounds of Heavier
Elements are Reactive
8. hυ
Stable disilene
Stable Multiple Bonded Silicon Compounds
KC8 / THF
Stable disilyne
Mes = Me
Me
Me
Si
SiMe3
Mes SiMe3
Mes
Si Si
Mes
Mes
Mes
Mes
Si
Si Si
Si
(Me3Si)2HC
(Me3Si)2HC
CH(SiMe3)2
CH(SiMe3)2
i
Pr
i
PrSiSi
(Me3Si)2HC
(Me3Si)2HC
i
Pr
Br
Br
Br
Sekiguchi, A.; Kinjo, R.; Ichinohe, M. Science 2004, 305, 1755.
West, R.; Fink, M. J.; Michl, J. Science 1981, 214,
1343
9. Si
Si
HH
10
20
30
40
0
kcalmol-1
Si SiH H
42.3
20.4
Si Si
H
H
11.8
Si Si
H
H
H
SiSi
H
10.8
Obstacles in the Synthesis of Simple Disilynes
Existence of more stable isomers and small energy
barriers for conversions
H
SiSi
H
*
14.9
12.7
H
SiSi
H *
High reactivity
3.1
1.9
Colegrovet, B. T.; SchaeferIII, H. F. J. Am. Chem. Soc 1991, 113, 1557.
10. ablation laser pulse
rotating rod
inert gas
reactive intermediate
118 nm laser pulse
TOF Mass
Spectrometer
reflectron
microchannel
plate
Can We Generate and Observe the Simple Disilynes
MOLECULAR BEAM METHOD
Animation with permission from Dunkan’ group, University of Georgia, Athens
11. Ando et al., J. Am. Chem. Soc., 1997, 119, 3629
Why We Have Chosen Bis(silirane)
Evidence for disilyne from bis(silirane)
Si
Si
Me
Me
Me
Me
Me
Me
Me
Me
R
R
Si Si
R
R
Si
SiR
R
SiMe3
Me3Si
Me3Si SiMe3
SiMe3Me3Si
ΔΔ
12. Ge
Ge
Ge Mes
Mes
Mes
Mes
Mes
Mes
Ge Ge
Mes
Mes
Mes
Mes
+ Ge
Mes
Mes
Ge
Si
Ge Mes
Mes
Mes
Mes
Mes
Mes
Ge Ge
Mes
Mes
Mes
Mes
Si
Mes
Mes
+
Ge Si
Mes
Mes
Mes
Mes
Ge
Mes
Mes
+
2+1 type fragmentation by laser ablation method
Fink et al. Organometallics 2002, 21, 2438. Mes = Me
Me
Me
Why We Have Chosen Bis(silirane)
13. Stable Bis(silirane): The Target
Ando et al., J. Am. Chem. Soc., 1997, 119, 3629.
2000, 122, 3775.
SiSi
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
SiSi
Me
Me
Me
Me
Me
Ph
Ph
Me
Me
Me
SiSi
Me
Me
Me
Me
Me
Me
Me
Me
Me
MeMe
Me
Me
Me
14. Synthetic Approach to the tert-Butyl Substituted Bis(silirane)
Si
CH
H
CH
Me Me
Me Me
Cl
Si Si
Me
Me
Me
Me
Me
Me
tert-butylLi
Si
CH
CH
Me
Me
H
Me
Me
Me
Me Me
Br2
Si
CH
CH
Me
Me
Br
Me
Me
Me
Me Me
CH
Me
Me
CH
Me
Me
CH
Me
Me
CH
Me Me
ether CH2Cl2
KC8 /THF
80%
90%
83%
Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
NBS / CCl4
AIBN
Mg*
/ THF
37%
23%
2.47 Å
1.94 Å
Orthorhombic
C2221
15. Bromination of Disilane – a Synthetic Challenge
Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me
Me
Me
Me
Me
Me
CH
Me
Me
CH
Me
Me
CH
Me
Me
CH
Me Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
NBS / CCl4
AIBNhv /
1
H NMR(d8THF)
1H NMR(d8THF)
HPLC separation gave near pure compound
Thermally
unstable at
room temp.
13
C NMR (THF-d8)Si Si
Me
Me
Me
Me
Me
Me
Me
Me
Br
CH
Me
MeMe
MeBr
BrHC
CH2Br
Side Products Separated in HPLC
Si Si
Me
Me
Me
Me
Me
Me
Me
Me
Br
CH
Me
MeMe
MeBr
Me
CH2
16. Proposed Route to the Impurities
Si Si
Me
Me
Me
Me
Me
Me
Me
Me
Br
CH
Me
MeMe
MeBr
Me
CH2
Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me
Me
Me
Me
Me
Me
CH
Me
Me
CH
Me
Me
CH
Me
Me
CH
Me Me
CH
Me Br
Me
Me
Me
Me
MeBr
Me
Br Me
NBS / CCl4
AIBNhv /
Si Si
Me
Me
Me
Me
Me
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
Si Si
Me
Me
Me
Me
Me
Me
Me
Me
Br
CH
Me
MeMe
MeBr
BrHC
CH2Br
-HBr
Br
17. Disordered Crystal Structure
Si-Si = 2.658 Å
Rhombohedral
Space group R C3
3 Superimposed along
the Si-Si axis
DFT Optimized Structure
Si-Si = 2.801 Å
Si Si
Me
Me
Me
Me
Me
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
Si Si
Me
Me
Me
Me
Me
Me
C
Me
Me
C
Me
Me
C
Me
Me
C
Me
Me
Me
Me
Me
Me
Si-Si = 2.69 Å
Wiberg et al Angew.Chem.Int.Ed.Engl. 1986, 25, 79.
18. Distinct NMR Behavior of tert-Butyl Substituted Bis(silirane)
Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
Mg*
/ THF
(B)
(B)
(A)
(B)
(B)
1
H NMR (C6D6)
(A)
(B)
19. Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br Me
Mg*
/ THF
(B)
(B)
(A)
(B)
(B)
(C)
(C)
(B)
(B)
(B)
(B)
(C)
(C)
(C)
(A)
13
C{1
H} NMR (C6D6)
Distinct NMR Behavior of tert-Butyl Substituted Bis(silirane)
20. 1
H NMR (C6D6)
(B)
1
H NMR (C6D6)
(D)
(F)
(F)
SiSi
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
(D)
(F)
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me (B)
(B)
(A)
(B)
(B)
(A)
Comparison of NMR Behavior
21. 13
C{1
H) NMR (C6D6)
C
B
B
C B
B
C
A
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
(B)
(B)
(A)
(B)
(B)
(C)
(C)
SiSi
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
(D)
(E)
(F)
(F)
(D)
(E)
(F)(F) Comparison of NMR Behavior
22. Question About the Structure of the Molecule
Bis(silirane)
Disilacyclohexane
Si Si
Me
Me
Me
Me
Me
Me
Me Br
Me
Me
Me
BrMe
MeBr
Me
Br MeSi Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Si
Si
Me
Me
Me
Me
Me
Me
Me Me
Me
Me
Me
Me
Me
Me
23. DFT Calculation Supports Experimental 29
Si NMR Value
- 62.86 +36.21
Spectroscopic Evidence for the Bis(silirane) Structure
-60.7Experimental
25. Si
Si
SiMe3
SiMe3
Me
Me
Me
Me
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Me3Si SiMe3
Me Me
Me
Me
Me
Me
140 0
C
Si
Si
SiMe3
SiMe3
Me
Me
Me
Me
Me Me
Me
Me
Me
Me
OO2
Chemical Evidence for the Bis(silirane) Structure
Si Si
Me
Me Me
Me
Me
Me
Me
MeMe
Me
Si Si
Me
Me Me
Me
Me
Me
Me Me
Me
Me
27. Evidence from Sekiguchi’s Report
Sekiguchi etal. J.Am.Chem.Soc. 2007, 129, (25), 7766.
Si Si
R
R
2-butene
Si Si
R
RC
C
H Me
Me H
Si Si
R
RH
Me
Me H
Si Si
R
H
Me
Me H
R
Si Si
R
H
Me
Me H
R
Si
C
R
H
Si
C
HMe
Me
R
Si Si
H H
MeMe
RR
0 (kcal/mol)
23.2
10.7
13.4
13.0
21.6
- 14.8
+
12.5
2.7
8.6
R = Sii
Pr[CH(SiMe3)2]2
28. Si
Si
SiMe3
SiMe3
Me
Me
Me
Me
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Me3Si SiMe3
Me Me
Me
Me
Me
Me
140 0
C
Si
Si
SiMe3
SiMe3
Me
Me
Me
Me
Me Me
Me
Me
Me
Me
OO2
Si Si
Me
Me Me
Me
Me
Me
Me
MeMe
Me
Si Si
Me
Me Me
Me
Me
Me
Me Me
Me
Me
Si
Si
Me
Me
Me
Me
Me
Me
Me Me
Me
Me
Me
Me
Me
Me
X
Chemical Evidence for the Bis(silirane) Structure
29. 1
H NMR (C6D6)
(B)
1
H NMR (C6D6)
(D)
(F)
(F)
SiSi
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
(D)
(F)
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me (B)
(B)
(A)
(B)
(B)
(A)
Can We Justify the NMR Behavior ?
31. Laser Ablation of Bis(silirane)
Animation with permission from Dunkan’ group, University of Georgia, Athens
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Si Si
Me
Me
Me
Me
Me
Me
32. Preliminary Laser Ablation Results
Si Si
Me Me
Me
Me
Me Me
Me
Me
Me
Me
Me
MeMe
Me
Si Si
Me
Me
Me
Me
Me
Me
Si Si
Me
Me Me
Me
Me
Me
Me Me
Me
Me
+
150 200 250 300
0.066
0.064
0.062
0.060
0.058
intensity
mass
254
170
Reasoning
Dissolved oxygen
34. Conclusion
Synthesized the air, moisture, thermally stable tert-butyl
substituted bis(silirane)
Confirmed the bis(silirane) structure by NMR spectroscopy
and thermolysis reaction with bis(trimethylsilylacetylene)
Rotational barrier of 30 kcal/mol justified the
conformational rigidity in solution
Preliminary Laser ablation experiments suggested the
formation of the disilyne and the cyclic disilene.
Established crystal structures for various intermediates.
35. The Thermal and Photochemical Decomposition of
2,2,3,3-Tetramethyl-1,1-bis(dimethylphenylsilyl) Silirane
Kothanda Rama Pichaandi, Joel T Mague, Mark J Fink.
Chemistry Department, Tulane University, New Orleans, LA 70118, USA.
Manuscript Under Preparation for Organometallics
36. Classification of Silylenes
Transient silylenes
Stable silylenes
Have very short life time
at room temperature
Can be observable only
at very low temperature
Si
Ph
Ph
Si
Me
Me
Si
Bu
Bu
t
t
N
Si
N
Bu
Bu
N
Si
N
Bu
Bu
N
Si
N
Np
Np
Si
Me3Si SiMe3
Me3Si SiMe3
N-Heterocyclic silylenes
2,2,5,5-tetrakis(trimethylsilyl)
silacyclopentane-1,1-diyl
t
t t
t
West. et.al., Acc. Chem. Res.
2000, 33, (10), 704.
Kira et.al. J. Am. Chem. Soc.
1999, 121, (41), 9722.
37. Seiferth et.al., J.Am.Chem.Soc 1975, 97, 7162.
Kira et.al., J. Chem. Soc., Dalton Trans., 2002, 1539.
Precursors for Transient Silylenes
Strained ring molecules
Si
Me
Me
Me
Me
Me
Me
MeMe
Me Me
+ Si
Me
Me
ΔΔ
hυ
Si
Me
Me
Me
Me
Me
Me
Si
SiMe3
SiMe3
Me
Me
Si
Si
Si
BuMe2Si SiMe2
t
Bu
SiMe2
t
BuBuMe2Si
SiMe2
t
Bu
SiMe2
t
Bu
t
t
2+1 Type Fragmentation
38. Si
Ph
Ph SiMe3
SiMe3
hv
Si2Me6 + SiPh2
Precursors for Transient Silylenes
Ando et.al. J. Am. Chem. Soc. 1978, 100, 3613.
Fragmentation due to the aromatic chromophore
Polysilanes
Si
Si
Si
Si
Si
Si
MeMe
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
Si
Ph
Ph SiMe3
SiMe3
Si
H
Sii
Pr3Pr3Si
Pr3Si
i
i
Branched Cyclic
39. Ando et.al. J. Am. Chem. Soc. 1999, 121, 3651
Si
Si
Si
Si
Si
Si
MeMe
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
Si
Si
SiSi
Si
Me
Me
Me
Me
Me Me
Me
Me
Me
MeMe2Si +
hv
Fragmentation due to the σ - σ* transitions
Polysilanes
Si
Si
Si
Si
Si
Si
MeMe
Me
Me
Me
Me
Me
Me
Me
Me
Me
Me
Si
Ph
Ph SiMe3
SiMe3
Si
H
Sii
Pr3Pr3Si
Pr3Si
i
i
Branched Cyclic
Precursors for Transient Silylenes
40. Molecule with Two Independent Substructures for Silylene
Generation
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
Me
Me
Me Me
Si
Me
Me
Me Me
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
+
Si Si
Me
Ph
Me
Me
Ph
Me
+
Me
Me
Me
Me
hυ
hυ
41. Synthetic Strategy for the Silirane
Si
CH
Me Me
CH
Me Me
ClCl
Me
Si
Me
Ph
Cl
Me
Si
Me
Ph
Li
Me
Si
Me
Ph
Si
CH
CH
Me Me
Me Me
Si
Ph
Me
Me
Me
Si
Me
Ph
Si
Me Me
Me Me
Si
Ph
Me
Me
Br
Br
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
Me
Me
Me Me
Li / THF
THF
NBS/CCl4
Mg* / THF
AIBN
62%
42%80%
Air, moisture
sensitive.
Unstable at
room temperature.
45. 29
Si{1
H} NMR (C6D6)
Theo: -110.4, -22.1
-123.9
-13.9
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
Me
Me
Me Me
Si
Sii
Pr3Pr3Sii
MeMe
-149.6
Gaspar et.al.; Organometallics, 1999, 18, 3921
Confirmation of Silirane Structure
46. Decomposition Pathway of Silirane
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
Me
Me
Me Me
Si
Me
Me
Me Me
Si
Si
Si
Me
Me
Ph
Me
Me
Ph
+
Si Si
Me
Ph
Me
Me
Ph
Me
+
Me
Me
Me
Me
Xhυ or ∆
hυ or ∆
48. T
T
b
a
a
b
P
P
P
P
P
P
After 5.5 h photolysis
Pure
Before photolysis
Confirmation of Formation of the
Trimethylmethoxysilane Adduct by 29
Si{1
H} NMR
Si
SiMe2Ph
SiMe2Ph
Me3Si
MeO
P
P
P
Si
SiMe2Ph
SiMe2Ph
Me
Me
Me Me
b
a
T – MeOSiMe3
49. After 5.5 h photolysis
Pure
Before photolysis
T
T
c
a or b
c
e
e
a or b
d
d
Confirmation of Formation of the
Bis(trimethylsilylacetylene) Adduct by 29
Si{1
H} NMR
Si
SiMe2Ph
SiMe2Ph
Me3Si
Me3Si
a or b
c
a or b
Si
SiMe2Ph
SiMe2Ph
Me
Me
Me Me
d
e
T = SiMe3Me3Si
50. c
1.10 – 0.4 = 0.70 ∼ 0.71
TME
After 5.5 h photolysis
MeOSiMe3
Si
SiMe2Ph
SiMe2PhMe
Me
Me
Me
Me
Me
Me
Me
MeOSiMe3
Si
SiMe2Ph
SiMe2PhMe
Me
Me
Me
Calculation of Quantitative Formation of
Silylene by 1
H NMR
Before photolysis
Si
SiMe2Ph
SiMe2Ph
Me3Si
MeO
+
Si
SiMe2Ph
SiMe2PhMe
Me
Si
SiMe2Ph
SiMe2Ph
hv orMe
Me
Me
Me
Me
Me
+
51. Conclusion
Synthesized a Silirane with two independent
substructures for silylene generation.
Photolysis as well as thermolysis of silirane generated
a bissilyl substituted silylene and not the cyclic one.
Silylene was intercepted with trapping
agents such as triethylsilane, trimethylmethoxysilane
and bis(trimethylsilylacetylene).
Quantitative formation of silylene was confirmed
by NMR experiments.
52. Synthesis, Electrochemistry and Spectroelectrochemistry of a
Silicon (IV) Phthalocyanine Chloride
Kothanda Rama Pichaandi, Heiko Jacobsen, and Mark J. Fink
Department of Chemistry, Tulane University, New Orleans, LA 70118
Manuscript submitted to Inorganic Chemica Acta
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bun
Bu
n
Bu
CH3Cl
54. Polymers with direct Si-Si bond
expected to possess better
electronic properties due to σ
delocalization in the polysilane
backbone
Phthalocyanine Polymers with Direct Si-Si Bond:
a Novel Idea
55. Earlier Reports of Cofacial Dimers
Kobayashi et.al. Chem. Eur. J 2002, 8, 1474
Hanack et.al. Angew. Chem. Int. Ed. 2002, 41, 3239
N
N
N
N
N
N
N
NIn
t
Bu
t
Bu
t
Bu
t
Bu
N
N
N
N
N
N
N
NIn
t
Bu
t
Bu
t
Bu
t
Bu
N
N
Me
Me
Me
Me
N
N
Me
Me
Me
Me
N
N
N
N
N
N
N
NIn
t
Bu
t
Bu
t
Bu
t
Bu
Cl
Mg, TMEDA, THF
n
BuO
NH
NH
NH
n
BuO
N
N
N
N
N
N
N
NSi
n
BuO
n
BuO
On
Bu
On
Bu
On
Bu
On
Bun
BuO
n
BuO
Si2Cl6, quinoline
N
N
N
N
N
N
N
NSi
n
BuO
n
BuO
On
Bu
On
Bu
On
Bu
On
Bun
BuO
n
BuO
ClCl
Accompanied with Impurities
Polymers from this is difficult
58. Attempts towards the Dimeric Phthalocyanine
Uncharacterizable
products
Green color solution dark reddish violet color then back to
green color
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
CH3Cl
KC8, THF
Trials :Molar ratio of 1:1, 1:2, 1:3 (SiPc: KC8)
Dimethoxyethane as solvent
Other reducing agents like Na and tert-butyl Li gave the
same results
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
CH3HO
+
59. Si
Cl
CH3
Si
Cl
CH3
Si
CH3
KC 8
- Cl
Si
CH3
Si
CH3
THF
Can We Explain the Failure of Wurtz Coupling
Reaction which can Lead to an Alternative Route.
Stability of the anion radical and
ability of cleavage of Cl-
ion ?
Redox process at the central metal
atom or on the phthalocyanine ring ?
Cyclic voltametry
Spectroelectrochemistry
DFT Calculations
Experiments to address these questions
+ Impurities
Si
Cl
CH3
Si
Cl
CH3
Si
CH3
Si
OH
CH3
KC 8
- Cl
O2
Si
CH3
Si
CH3
X
X
THF
60. Cyclic Voltametry
Two one-electron reductions and two one electron oxidations
within the limit of solvent.
I, II reductions and I oxidations are reversible
2 1 0 -1 -2
-1.2x10
-5
-8.0x10
-6
-4.0x10
-6
0.0
4.0x10
-6
8.0x10
-6
CURRENT(A)
VOLTAGE(V)
-1.62
-1.44
-1.08
0.55
0.67
1.32
1.41
-0.99
72. Alternative Approach to the Dimer
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bun
Bu
n
Bu
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bun
Bu
n
Bu
CH3CH3
n
Bun
Bu
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bun
Bu
n
Bu
CH3Br
N
N
N
N
N
N
N
NSi
n
Bu
n
Bu
n
Bu
n
Bu
n
Bu
n
Bun
Bu
n
Bu
CH3HSiBr Si Si
KC8
THF
KC8 / THF
73. Conclusion
Attempt made to synthesize the dimer with Si-Si bond through
Wurtz coupling reaction.
CV, Spectroelectrochemistry answered the two questions.
i) Stability of anion
ii) Redox process takes place in the phthalocyanine ring
Alternative approach to the dimer can be using bromomethyl
siliconphthalocyanine instead of its chloro analog.
74. Acknowledgement
Dr. Mark J. Fink
(Advisor)
Collaborators
Dr. Joel T. Mague
Crystallography
Dr. Mark Sulkes
Laser experiments
Dr. Heiko Jacobsen
DFT calculation
Dr. Russell H. Schmehl
Spectroelectrochemistry
expts
Dr. James Bollinger
Cyclic Voltametry
Committee
members
Dr. Alexander L Burin
Dr. Russell H. Schmehl
Dr. Mark Sulkes
My group members
Faculty Members
Staffs of Chemistry Dept
My Tulane Friends
My Family Members
NSF
Dr. Peter Gaspar