Semiconductors require ever increasing purity in fluids that come in contact with the devices to reduce the defectivity during the manufacturing process. Defect control is extremely critical and continues to be one of biggest challenges in lithography processes for integrated device manufacturers (IDMs) as the critical dimension (CD) size shrinks [1]. Any defect could result in an unusable device, resulting in a financial loss for the IDMs. Particularly in 193nm lithography processes, there have been widespread occurrences of various defects in the coated films, and many factors could play a role in defect formation. For example, photoresist and BARC coating defects could be affected by the dispense process, cleanliness of the materials, and filtration process.
Particle removal filters are used in almost every process step where a liquid comes in contact with a wafer. Implementation of polymer membrane-based microfiltration in the photochemical manufacturing process effectively improves the cleanliness of the materials. Furthermore, in today’s state-of-the art semiconductor fabs, an extra filtration step at the point of dispense on the coater module is adopted to further minimize coating defects by providing particle/bubble-free photochemical dispense on the wafer.
With the continuous demands for defect reduction and high productivity, Entegris has developed a new, highly retentive 5nm rated asymmetric ultrahigh molecular weight polyethylene (UPE) filter to address these demands particularly in advanced lithography processes. The purpose of this application note is to provide data to show the performance of 5nm asymmetric UPE filters and its effectiveness of reducing the wafer defects for various lithographic processes.
Effective use of crystalline waterproofing technology will reduce the
porosity and permeability of conventional concrete, and provide the high performance
advantages and benefits that building owners and design professionals have come to rely
upon in design and construction projects.
PAINTINGS OF EXTERIOR AND INTERIOR SURFACESjagrutib22
PAINTINGS OF EXTERIOR AND INTERIOR SURFACES - principal types of coating, Paints - function, purpose, properties, classification, components of paints, different types of paints, why do we need different types of paints, manufacturing procedure, surface preparation for exterior and interior surfaces, defects in paints, cost and everything about paints.
Acrylic Emulsion Paints Manufacturing Industry. Setting up a Paint Factory
Emulsion Paint typically consists of pigment, resin, solvent and additives. Emulsion is water based paint. As compared to oil based paint, working with emulsion paint is far better.
Acrylic paint is a fast-drying paint made of pigment suspended in acrylic polymer emulsion. Acrylic paints are water-soluble, but become water-resistant when dry. Acrylic emulsion paints have now been investigated, largely from a scientific perspective. As a result, we have a better understanding of several important aspects pertaining to the care and appreciation of works of art made with these paints, including typical paint constituents, physical properties and how these may change with age. These new options are based on modifications to aqueous and non-polar solvents, as well as water-in-oil micro emulsions where the continuous ‘oil’ phase is either a mineral spirit or silicone solvent.
See more
https://goo.gl/AS74iY
https://goo.gl/XWFKLA
https://goo.gl/JGLAe2
Contact us:
Niir Project Consultancy Services
An ISO 9001:2015 Company
106-E, Kamla Nagar, Opp. Spark Mall,
New Delhi-110007, India.
Email: npcs.ei@gmail.com , info@entrepreneurindia.co
Tel: +91-11-23843955, 23845654, 23845886, 8800733955
Mobile: +91-9811043595
Website: www.entrepreneurindia.co , www.niir.org
Tags
#Production_of_Acrylic_Emulsion_Paints, #Acrylic_Emulsion_Paint, #Waterbased_Acrylic_Paint_Manufacturing_Process, Emulsion Type Water Paint, #Acrylic Paints, Paint Manufacturing Process, #How_to_Start_a_Paint_Manufacturing_Industry, Acrylic Emulsion Paint Manufacturing, Manufacture of Paint, Acrylic Emulsions for Paints, #Emulsion_Paint_Production_Process, Paint Emulsions, How to Start an Acrylic Emulsion Paints Business, Acrylic Emulsion Paints Business Ideas, Emulsion Paints Business Ideas, #Project_Profile_on_Acrylic_Paints, Raw materials for Production of Emulsion Paints, Paint Manufacturing Process Pdf, Acrylic Emulsion Paint Manufacturing Business, Acrylic Emulsions for Paints, Acrylic Emulsion Manufacturing Process, Paint Manufacturing Plant Layout, #Project Report on Paint Manufacturing Pdf, Paint Manufacturing Process Flow Chart Pdf, Acrylic Paint, Setting up a Paint Factory, Manufacture of Acrylic Emulsion Paints, Acrylic Emulsion Paint for Walls, Interior Emulsion Paint, Paint Industry, Emulsion Paint Production, Paint Making Formula, Start a Paint Production Plant, How to start your Own Paint Production Business, How to Start a Paint Production Business, Emulsion Paint Production, Paint and Coatings Industry, How to Make Acrylic Paint, Detailed Project Report on Acrylic Emulsion Paint Manufacturing, Project Report on Acrylic Emulsion Paint Manufacturing, #Pre_Investment_Feasibility_Study_on_Acrylic_Emulsion_Paint_Manufacturing, #Techno_Economic_feasibility_study_on_Acrylic_Emulsion_Paint_Manufacturing,
This product can provide synergistic processing and cured resin performance advantages relative to simple mixtures of polyetheramines (PEAs) and cycloaliphatic amines.
Effective use of crystalline waterproofing technology will reduce the
porosity and permeability of conventional concrete, and provide the high performance
advantages and benefits that building owners and design professionals have come to rely
upon in design and construction projects.
PAINTINGS OF EXTERIOR AND INTERIOR SURFACESjagrutib22
PAINTINGS OF EXTERIOR AND INTERIOR SURFACES - principal types of coating, Paints - function, purpose, properties, classification, components of paints, different types of paints, why do we need different types of paints, manufacturing procedure, surface preparation for exterior and interior surfaces, defects in paints, cost and everything about paints.
Acrylic Emulsion Paints Manufacturing Industry. Setting up a Paint Factory
Emulsion Paint typically consists of pigment, resin, solvent and additives. Emulsion is water based paint. As compared to oil based paint, working with emulsion paint is far better.
Acrylic paint is a fast-drying paint made of pigment suspended in acrylic polymer emulsion. Acrylic paints are water-soluble, but become water-resistant when dry. Acrylic emulsion paints have now been investigated, largely from a scientific perspective. As a result, we have a better understanding of several important aspects pertaining to the care and appreciation of works of art made with these paints, including typical paint constituents, physical properties and how these may change with age. These new options are based on modifications to aqueous and non-polar solvents, as well as water-in-oil micro emulsions where the continuous ‘oil’ phase is either a mineral spirit or silicone solvent.
See more
https://goo.gl/AS74iY
https://goo.gl/XWFKLA
https://goo.gl/JGLAe2
Contact us:
Niir Project Consultancy Services
An ISO 9001:2015 Company
106-E, Kamla Nagar, Opp. Spark Mall,
New Delhi-110007, India.
Email: npcs.ei@gmail.com , info@entrepreneurindia.co
Tel: +91-11-23843955, 23845654, 23845886, 8800733955
Mobile: +91-9811043595
Website: www.entrepreneurindia.co , www.niir.org
Tags
#Production_of_Acrylic_Emulsion_Paints, #Acrylic_Emulsion_Paint, #Waterbased_Acrylic_Paint_Manufacturing_Process, Emulsion Type Water Paint, #Acrylic Paints, Paint Manufacturing Process, #How_to_Start_a_Paint_Manufacturing_Industry, Acrylic Emulsion Paint Manufacturing, Manufacture of Paint, Acrylic Emulsions for Paints, #Emulsion_Paint_Production_Process, Paint Emulsions, How to Start an Acrylic Emulsion Paints Business, Acrylic Emulsion Paints Business Ideas, Emulsion Paints Business Ideas, #Project_Profile_on_Acrylic_Paints, Raw materials for Production of Emulsion Paints, Paint Manufacturing Process Pdf, Acrylic Emulsion Paint Manufacturing Business, Acrylic Emulsions for Paints, Acrylic Emulsion Manufacturing Process, Paint Manufacturing Plant Layout, #Project Report on Paint Manufacturing Pdf, Paint Manufacturing Process Flow Chart Pdf, Acrylic Paint, Setting up a Paint Factory, Manufacture of Acrylic Emulsion Paints, Acrylic Emulsion Paint for Walls, Interior Emulsion Paint, Paint Industry, Emulsion Paint Production, Paint Making Formula, Start a Paint Production Plant, How to start your Own Paint Production Business, How to Start a Paint Production Business, Emulsion Paint Production, Paint and Coatings Industry, How to Make Acrylic Paint, Detailed Project Report on Acrylic Emulsion Paint Manufacturing, Project Report on Acrylic Emulsion Paint Manufacturing, #Pre_Investment_Feasibility_Study_on_Acrylic_Emulsion_Paint_Manufacturing, #Techno_Economic_feasibility_study_on_Acrylic_Emulsion_Paint_Manufacturing,
This product can provide synergistic processing and cured resin performance advantages relative to simple mixtures of polyetheramines (PEAs) and cycloaliphatic amines.
OPTUM® Technology an innovative barrier solution for polypropylene-based mate...José Luis Feijoo
Ferro, a leading supplier of specialty plastics, has recently developed OPTUM® Barrier masterbatch for a wide range of polymers. This can be incorporated by melt processing in most of the manufacturing processes involved in the developing of single and multi-layer structures in flexible and rigid packaging. In particular this is suitable for food packaging applications in order to increase product protection and shelf-life. Barrier applications can be found, however, in other in market segments such as cosmetics, industrial containers and agricultural films, where barrier to oxygen and other gases is also critical.
NANOFIBER SPINNING OF PAN AND PLA BLEND USING NEEDLELESS ELECTROSPINNING TECH...OUTR, Bhubaneswar
NANOFIBER SPINNING OF PAN AND PLA BLEND USING NEEDLELESS ELECTROSPINNING TECHNIQUE
INTRODUCTION, OBJECTIVES, MATERIALS & METHODS, RESULTS & DISCUSSION, CONCLUSION, REFERENCES
To explore the possibility of replacing hazardous DMF used during spinning with eco-friendly acetone.
To standardise the process parameters to obtain the nanofiber with least possible diameter.
To evaluate the pore size of the Nano fibrous mat prepared at standardised parameter.
To combine the properties of PAN and PLA polymers and prepare a PAN & PLA blend nanofiber.
Characterizing Polymenr Laminates Using IR MicroscopyPerkinElmer, Inc.
Multi-layer polymer films, or laminates, are used in
a wide variety of industries. A major use of these
materials is for packaging of foods and consumer
products.
Other Separations Techniques for Suspensions
PRESSURE-DRIVEN MEMBRANE SEPARATION
PROCESSES
1.1 INTRODUCTION
1.2 MEMBRANES
1.3 OPERATION
1.4 FACTORS AFFECTING PERFORMANCE
1.4.1 Polarization / Fouling
1.4.2 Pressure
1.4.3 Crossflow
1.4.4 Temperature
1.4.5 Concentration
1.4.6 Membrane Pore Size
1.4.7 Particle Size
1.4.8 Particle Charge
1.4.9 Other Factors
1.5 ADVANTAGES / LIMITATIONS
1.6 SUMMARY OF SYMBOLS USED
2 ELECTRO-DIALYSIS
2.1 INTRODUCTION
2.2 EQUIPMENT
2.3 IMPORTANT PARAMETERS IN ED
2.4 EXAMPLES
3 ELECTRODEWATERING AND ELECTRODECANTATION
3.1 INTRODUCTION
3.2 PRINCIPLES AND OPERATION
3.3 EQUIPMENT AND OPERATING PARAMETERS
3.4 EXAMPLES
4 MAGNETIC SEPARATION METHODS
5 REFERENCES
FIGURES
1 APPLICATION RANGES FOR MEMBRANE SEPARATION TECHNIQUES
2 SIMPLE UF / CMF RIG
4 FLUX VERSUS PRESSURE
5 ELECTRODIALYSIS PROCESS
6 ELECTRODIALYSIS PLANT FOR BATCH PROCESS
7 DEPENDENCE OF MEMBRANE AREA AND ENERGY ON
CURRENT DENSITY
8 DIFFUSION ACROSS THE BOUNDARY LAYER
OPTUM® Technology an innovative barrier solution for polypropylene-based mate...José Luis Feijoo
Ferro, a leading supplier of specialty plastics, has recently developed OPTUM® Barrier masterbatch for a wide range of polymers. This can be incorporated by melt processing in most of the manufacturing processes involved in the developing of single and multi-layer structures in flexible and rigid packaging. In particular this is suitable for food packaging applications in order to increase product protection and shelf-life. Barrier applications can be found, however, in other in market segments such as cosmetics, industrial containers and agricultural films, where barrier to oxygen and other gases is also critical.
NANOFIBER SPINNING OF PAN AND PLA BLEND USING NEEDLELESS ELECTROSPINNING TECH...OUTR, Bhubaneswar
NANOFIBER SPINNING OF PAN AND PLA BLEND USING NEEDLELESS ELECTROSPINNING TECHNIQUE
INTRODUCTION, OBJECTIVES, MATERIALS & METHODS, RESULTS & DISCUSSION, CONCLUSION, REFERENCES
To explore the possibility of replacing hazardous DMF used during spinning with eco-friendly acetone.
To standardise the process parameters to obtain the nanofiber with least possible diameter.
To evaluate the pore size of the Nano fibrous mat prepared at standardised parameter.
To combine the properties of PAN and PLA polymers and prepare a PAN & PLA blend nanofiber.
Characterizing Polymenr Laminates Using IR MicroscopyPerkinElmer, Inc.
Multi-layer polymer films, or laminates, are used in
a wide variety of industries. A major use of these
materials is for packaging of foods and consumer
products.
Other Separations Techniques for Suspensions
PRESSURE-DRIVEN MEMBRANE SEPARATION
PROCESSES
1.1 INTRODUCTION
1.2 MEMBRANES
1.3 OPERATION
1.4 FACTORS AFFECTING PERFORMANCE
1.4.1 Polarization / Fouling
1.4.2 Pressure
1.4.3 Crossflow
1.4.4 Temperature
1.4.5 Concentration
1.4.6 Membrane Pore Size
1.4.7 Particle Size
1.4.8 Particle Charge
1.4.9 Other Factors
1.5 ADVANTAGES / LIMITATIONS
1.6 SUMMARY OF SYMBOLS USED
2 ELECTRO-DIALYSIS
2.1 INTRODUCTION
2.2 EQUIPMENT
2.3 IMPORTANT PARAMETERS IN ED
2.4 EXAMPLES
3 ELECTRODEWATERING AND ELECTRODECANTATION
3.1 INTRODUCTION
3.2 PRINCIPLES AND OPERATION
3.3 EQUIPMENT AND OPERATING PARAMETERS
3.4 EXAMPLES
4 MAGNETIC SEPARATION METHODS
5 REFERENCES
FIGURES
1 APPLICATION RANGES FOR MEMBRANE SEPARATION TECHNIQUES
2 SIMPLE UF / CMF RIG
4 FLUX VERSUS PRESSURE
5 ELECTRODIALYSIS PROCESS
6 ELECTRODIALYSIS PLANT FOR BATCH PROCESS
7 DEPENDENCE OF MEMBRANE AREA AND ENERGY ON
CURRENT DENSITY
8 DIFFUSION ACROSS THE BOUNDARY LAYER
What is a liposome Extruder? - working principle -usageJennifer Genizer
Genizer Liposome Extruders
Also knowns as: Exosomes Extruders, Artificial Cell Membrane Extruders; Liposomes Preparation devices by extrusion
Advantages: Liposome extruders are mainly used for the liposome formulation and achieving uniform size distributions. It is an ideal instrument to generate nanoscale liposome formulations, and to prepare exosomes and artificial cell membranes. By utilizing the tracked-etched filter membranes, the liposome extruders are capable of capturing large particles, precipitation and achieving sterile filtration.
Application: Research and Development for the liposomal drug delivery system, vaccine, gene delivery, and cosmetics
Liposome extruders are instruments used for liposome formulation and achieving uniform size distributions. They are beneficial in research and development for liposomal drug delivery systems, vaccines, gene delivery, and cosmetics. Liposome extrusion technology involves the use of liposomal phospholipid bilayers and specific pore-sized polycarbonate membranes to achieve uniform liposome sizes. There are different types of liposome extruders, such as hand-driven, jacketed, online, and multiple extruders. The selection of polycarbonate membranes is crucial for successful extrusion, and different pore sizes can be used to obtain desired particle sizes. A High-pressure homogenizer can also be combined with a liposome extruder for optimal results.
Genizer LLC provides microfluidics mixers, high pressure homogenizers, liposome extruders, nano particle analyzers and nano formulation services for pharmaceutical, biochemical, cosmetics and food industries.
Bi-axially oriented Poly polypropylene films JayaVerma28
This presentation is about Bi-axially oriented poly - polypropylene films, it describes about its properties, processing parameters, methods, industrial manufacturing, Applications, advantages, disadvantages and references are added at the end.
Elevating Tactical DDD Patterns Through Object CalisthenicsDorra BARTAGUIZ
After immersing yourself in the blue book and its red counterpart, attending DDD-focused conferences, and applying tactical patterns, you're left with a crucial question: How do I ensure my design is effective? Tactical patterns within Domain-Driven Design (DDD) serve as guiding principles for creating clear and manageable domain models. However, achieving success with these patterns requires additional guidance. Interestingly, we've observed that a set of constraints initially designed for training purposes remarkably aligns with effective pattern implementation, offering a more ‘mechanical’ approach. Let's explore together how Object Calisthenics can elevate the design of your tactical DDD patterns, offering concrete help for those venturing into DDD for the first time!
A tale of scale & speed: How the US Navy is enabling software delivery from l...sonjaschweigert1
Rapid and secure feature delivery is a goal across every application team and every branch of the DoD. The Navy’s DevSecOps platform, Party Barge, has achieved:
- Reduction in onboarding time from 5 weeks to 1 day
- Improved developer experience and productivity through actionable findings and reduction of false positives
- Maintenance of superior security standards and inherent policy enforcement with Authorization to Operate (ATO)
Development teams can ship efficiently and ensure applications are cyber ready for Navy Authorizing Officials (AOs). In this webinar, Sigma Defense and Anchore will give attendees a look behind the scenes and demo secure pipeline automation and security artifacts that speed up application ATO and time to production.
We will cover:
- How to remove silos in DevSecOps
- How to build efficient development pipeline roles and component templates
- How to deliver security artifacts that matter for ATO’s (SBOMs, vulnerability reports, and policy evidence)
- How to streamline operations with automated policy checks on container images
LF Energy Webinar: Electrical Grid Modelling and Simulation Through PowSyBl -...DanBrown980551
Do you want to learn how to model and simulate an electrical network from scratch in under an hour?
Then welcome to this PowSyBl workshop, hosted by Rte, the French Transmission System Operator (TSO)!
During the webinar, you will discover the PowSyBl ecosystem as well as handle and study an electrical network through an interactive Python notebook.
PowSyBl is an open source project hosted by LF Energy, which offers a comprehensive set of features for electrical grid modelling and simulation. Among other advanced features, PowSyBl provides:
- A fully editable and extendable library for grid component modelling;
- Visualization tools to display your network;
- Grid simulation tools, such as power flows, security analyses (with or without remedial actions) and sensitivity analyses;
The framework is mostly written in Java, with a Python binding so that Python developers can access PowSyBl functionalities as well.
What you will learn during the webinar:
- For beginners: discover PowSyBl's functionalities through a quick general presentation and the notebook, without needing any expert coding skills;
- For advanced developers: master the skills to efficiently apply PowSyBl functionalities to your real-world scenarios.
GraphRAG is All You need? LLM & Knowledge GraphGuy Korland
Guy Korland, CEO and Co-founder of FalkorDB, will review two articles on the integration of language models with knowledge graphs.
1. Unifying Large Language Models and Knowledge Graphs: A Roadmap.
https://arxiv.org/abs/2306.08302
2. Microsoft Research's GraphRAG paper and a review paper on various uses of knowledge graphs:
https://www.microsoft.com/en-us/research/blog/graphrag-unlocking-llm-discovery-on-narrative-private-data/
UiPath Test Automation using UiPath Test Suite series, part 4DianaGray10
Welcome to UiPath Test Automation using UiPath Test Suite series part 4. In this session, we will cover Test Manager overview along with SAP heatmap.
The UiPath Test Manager overview with SAP heatmap webinar offers a concise yet comprehensive exploration of the role of a Test Manager within SAP environments, coupled with the utilization of heatmaps for effective testing strategies.
Participants will gain insights into the responsibilities, challenges, and best practices associated with test management in SAP projects. Additionally, the webinar delves into the significance of heatmaps as a visual aid for identifying testing priorities, areas of risk, and resource allocation within SAP landscapes. Through this session, attendees can expect to enhance their understanding of test management principles while learning practical approaches to optimize testing processes in SAP environments using heatmap visualization techniques
What will you get from this session?
1. Insights into SAP testing best practices
2. Heatmap utilization for testing
3. Optimization of testing processes
4. Demo
Topics covered:
Execution from the test manager
Orchestrator execution result
Defect reporting
SAP heatmap example with demo
Speaker:
Deepak Rai, Automation Practice Lead, Boundaryless Group and UiPath MVP
DevOps and Testing slides at DASA ConnectKari Kakkonen
My and Rik Marselis slides at 30.5.2024 DASA Connect conference. We discuss about what is testing, then what is agile testing and finally what is Testing in DevOps. Finally we had lovely workshop with the participants trying to find out different ways to think about quality and testing in different parts of the DevOps infinity loop.
Generative AI Deep Dive: Advancing from Proof of Concept to ProductionAggregage
Join Maher Hanafi, VP of Engineering at Betterworks, in this new session where he'll share a practical framework to transform Gen AI prototypes into impactful products! He'll delve into the complexities of data collection and management, model selection and optimization, and ensuring security, scalability, and responsible use.
Accelerate your Kubernetes clusters with Varnish CachingThijs Feryn
A presentation about the usage and availability of Varnish on Kubernetes. This talk explores the capabilities of Varnish caching and shows how to use the Varnish Helm chart to deploy it to Kubernetes.
This presentation was delivered at K8SUG Singapore. See https://feryn.eu/presentations/accelerate-your-kubernetes-clusters-with-varnish-caching-k8sug-singapore-28-2024 for more details.
UiPath Test Automation using UiPath Test Suite series, part 3DianaGray10
Welcome to UiPath Test Automation using UiPath Test Suite series part 3. In this session, we will cover desktop automation along with UI automation.
Topics covered:
UI automation Introduction,
UI automation Sample
Desktop automation flow
Pradeep Chinnala, Senior Consultant Automation Developer @WonderBotz and UiPath MVP
Deepak Rai, Automation Practice Lead, Boundaryless Group and UiPath MVP
The Art of the Pitch: WordPress Relationships and SalesLaura Byrne
Clients don’t know what they don’t know. What web solutions are right for them? How does WordPress come into the picture? How do you make sure you understand scope and timeline? What do you do if sometime changes?
All these questions and more will be explored as we talk about matching clients’ needs with what your agency offers without pulling teeth or pulling your hair out. Practical tips, and strategies for successful relationship building that leads to closing the deal.
GDG Cloud Southlake #33: Boule & Rebala: Effective AppSec in SDLC using Deplo...James Anderson
Effective Application Security in Software Delivery lifecycle using Deployment Firewall and DBOM
The modern software delivery process (or the CI/CD process) includes many tools, distributed teams, open-source code, and cloud platforms. Constant focus on speed to release software to market, along with the traditional slow and manual security checks has caused gaps in continuous security as an important piece in the software supply chain. Today organizations feel more susceptible to external and internal cyber threats due to the vast attack surface in their applications supply chain and the lack of end-to-end governance and risk management.
The software team must secure its software delivery process to avoid vulnerability and security breaches. This needs to be achieved with existing tool chains and without extensive rework of the delivery processes. This talk will present strategies and techniques for providing visibility into the true risk of the existing vulnerabilities, preventing the introduction of security issues in the software, resolving vulnerabilities in production environments quickly, and capturing the deployment bill of materials (DBOM).
Speakers:
Bob Boule
Robert Boule is a technology enthusiast with PASSION for technology and making things work along with a knack for helping others understand how things work. He comes with around 20 years of solution engineering experience in application security, software continuous delivery, and SaaS platforms. He is known for his dynamic presentations in CI/CD and application security integrated in software delivery lifecycle.
Gopinath Rebala
Gopinath Rebala is the CTO of OpsMx, where he has overall responsibility for the machine learning and data processing architectures for Secure Software Delivery. Gopi also has a strong connection with our customers, leading design and architecture for strategic implementations. Gopi is a frequent speaker and well-known leader in continuous delivery and integrating security into software delivery.
State of ICS and IoT Cyber Threat Landscape Report 2024 previewPrayukth K V
The IoT and OT threat landscape report has been prepared by the Threat Research Team at Sectrio using data from Sectrio, cyber threat intelligence farming facilities spread across over 85 cities around the world. In addition, Sectrio also runs AI-based advanced threat and payload engagement facilities that serve as sinks to attract and engage sophisticated threat actors, and newer malware including new variants and latent threats that are at an earlier stage of development.
The latest edition of the OT/ICS and IoT security Threat Landscape Report 2024 also covers:
State of global ICS asset and network exposure
Sectoral targets and attacks as well as the cost of ransom
Global APT activity, AI usage, actor and tactic profiles, and implications
Rise in volumes of AI-powered cyberattacks
Major cyber events in 2024
Malware and malicious payload trends
Cyberattack types and targets
Vulnerability exploit attempts on CVEs
Attacks on counties – USA
Expansion of bot farms – how, where, and why
In-depth analysis of the cyber threat landscape across North America, South America, Europe, APAC, and the Middle East
Why are attacks on smart factories rising?
Cyber risk predictions
Axis of attacks – Europe
Systemic attacks in the Middle East
Download the full report from here:
https://sectrio.com/resources/ot-threat-landscape-reports/sectrio-releases-ot-ics-and-iot-security-threat-landscape-report-2024/
PHP Frameworks: I want to break free (IPC Berlin 2024)Ralf Eggert
In this presentation, we examine the challenges and limitations of relying too heavily on PHP frameworks in web development. We discuss the history of PHP and its frameworks to understand how this dependence has evolved. The focus will be on providing concrete tips and strategies to reduce reliance on these frameworks, based on real-world examples and practical considerations. The goal is to equip developers with the skills and knowledge to create more flexible and future-proof web applications. We'll explore the importance of maintaining autonomy in a rapidly changing tech landscape and how to make informed decisions in PHP development.
This talk is aimed at encouraging a more independent approach to using PHP frameworks, moving towards a more flexible and future-proof approach to PHP development.
PHP Frameworks: I want to break free (IPC Berlin 2024)
Improving Advanced Lithography Process Defectivity with a Highly Retentive 5nm Asymmetric UPE Filter
1. AppLIcAtIon note
ImprovIng AdvAnced LIthogrAphy
process defectIvIty wIth A hIghLy
retentIve 5 nm AsymmetrIc Upe fILter
Authors: Aiwen Wu and Jennifer Braggin
Introduction Design of 5 nm Asymmetric
Semiconductors require ever increasing purity UPE Filter
in fluids that come in contact with the devices to
Various polymer materials could be used to manu
reduce the defectivity during the manufacturing
facture particle filters for photochemical filtration,
process. Defect control is extremely critical and
such as UPE, PTFE and polyamide. Traditionally,
continues to be one of the biggest challenges in
all these materialbased filters have symmetric
lithography processes for integrated device manu
membranes, where pore size is constant across
facturers (IDMs) as the critical dimension (CD) the membrane thickness. In contrast, Entegris
size shrinks.1 Any defect could result in an unusable developed a new asymmetric UPE membrane using
device, resulting in a financial loss for the IDMs. its proprietary coextrusion technology, where
Particularly in 193 nm lithography processes, pore size changes across the membrane thickness.
there have been widespread occurrences of various The upstream surface of the asymmetric membrane
defects in the coated films, and many factors has a larger pore size than on the downstream.
could play a role in defect formation. For example, This type of pore structure provides the improved
photoresist and BARC coating defects could be retention efficiency and capacity of the micro
affected by the dispense process, cleanliness of porous membrane without sacrificing the flow.
the materials, and filtration process. This optimized asymmetric structure is specifi
Particle removal filters are used in almost every cally designed to meet the unique requirements
process step where a liquid comes in contact with of advanced lithography processes below 65 nm
a wafer. Implementation of polymer membrane technology node, where pressure drop might be
based microfiltration in the photochemical a limiting factor in decreasing retention rating.
manufacturing process effectively improves the It allows for a wider window of operation on
cleanliness of the materials. Furthermore, in photochemical dispense pumps. Figure 1 shows
the scanning electron microscope (SEM) image of
today’s stateoftheart semiconductor fabs, an
the crosssection of asymmetric UPE membrane.
extra filtration step at the point of dispense on
the coater module is adopted to further minimize
coating defects by providing particle/bubblefree
photochemical dispense on the wafer.
With the continuous demands for defect reduction
and high productivity, Entegris has developed a
new, highly retentive 5 nm rated asymmetric ultra
high molecular weight polyethylene (UPE) filter
to address these demands particularly in advanced
lithography processes. The purpose of this applica
tion note is to provide data to show the performance
of 5 nm asymmetric UPE filters and its effectiveness
of reducing the wafer defects for various litho
graphic processes.
Open layer Intermediate layer Highly retentive layer
For increased flow High loading capacity Hard particle retention
Increased gel retention 5 nm removal
Increased impurity
residence time
Figure 1. Asymmetric membrane cross-section
entegrIs, Inc. 1
2. ImprovIng AdvAnced LIthogrAphy process defectIvIty
Improved Particle Retention well controlled. The experimental data shows
that using smaller 26 nm fluorescent particles to
Bubble point (BP) pressure is a common parameter challenge the filters results in more differentiation
to characterize microporous membranes and is among the filters. Figure 2 provides a correlation
defined as the minimum pressure required to begin between particle removal efficiency and bubble
displacing wetting liquid from the pores of a wetted point for Entegris UPE membranes. As membrane
membrane. This pressure is related to the largest pore size shrinks (BP increases), particle reten
size pore in that membrane and is often determined tion increases.
by visual detection of “bubble” as applied differen Retention vs. Bubble Point
tial pressure is increased across the membrane.
The equation for bubble point shows an inversely Retention
BP
Membrane Bubble Point
proportional relationship between the pore
Membrane Retention
diameter and the bubble point value. 2
UPE UPE UPE UPE UPE UPE
5 nm 10 nm 10 nm 20 nm 30 nm 50 nm
Asym- Asym-
metric metric
Figure 2. Correlation between 26 nm PSL bead retention for
UPE membranes
While 5 nm asymmetric UPE membrane greatly
improves particle retention performance compared
to 10 nm rating UPE, it doesn’t sacrifice the flow
Filters with 20 nm and 10 nm retention ratings have performance. With pore size greatly shrinking and
become the standard for 193 nm photoresist filtra thickness increasing, the pressure drop of 5 nm
tion. These filters were tested for particle retention asymmetric UPE membrane does not significantly
with monodispersed 33 nm polystyrene latex (PSL) increase. Figure 3 presents the flow comparison of
beads and optical particle counters (OPC) using Entegris pointofuse (POU) photochemical filter
a modified SEMATECH® test method.3 However, Impact® 2 V2.
one of the issues with using an OPC to measure PSL 25
particles down to 33 nm in size is that it is difficult
to differentiate very tight filters from one another. 20
Recently a new method has been developed by
Pressure Drop (PSI)
Entegris to measure particle removal efficiencies 15 Impact 2 V2 5 nm asymmetric
for sub30 nm pore size rated filters using fluo
rescence spectroscopy. In this method, a filter is 10
challenged with fluorescent particles, which are Impact 2 V2 20 nm
then counted by measuring fluorescent signals of
5
upstream and downstream solutions. Retention can Impact 2 V2 10 nm
be calculated by comparing the fluorescent signals
0
of the two solutions. There are several advantages 0 5 10 15 20
to the fluorescence method compared to traditional Flow Rate for 1 cp Fluid (cc/sec)
OPC techniques, including high sensitivity, easy Figure 3. Flow performance comparison of point-of-use filters
spectral measurement and ability to detect fluores
cent PSL particles whose size has been relatively
entegrIs, Inc. 2
3. ImprovIng AdvAnced LIthogrAphy process defectIvIty
Wafer Defect Reduction of ofuse filtration methods on microbridging
defectivity.6 This study focused on the ability of
5 nm Asymmetric UPE Filter pointofuse filtration on the lithography track to
reduce the level of microbridging defectivity in a
The decrease of critical line widths is requiring 45 nm line/space pattern created through immer
the use of tighter filtration for critical photochem sion lithography. A design of experiment method
icals. Filters rated at 10 nm and 20 nm filtration ology was used to determine the effect of filter
have been implemented in both the photochemical retention rating, filtration rate and controlled
manufacturing process and in the pointofuse filtration pressure on microbridging defectivity.
spincoating process in track systems, and have
been shown to be effective in reducing defects.4, 5 In the experiment, wafers were coated and
However, the implementation of finer filtration exposed on the Sokudo™ RF 3Si/ASML™
raises concerns as high differential pressure across XT:1900Gi cluster. Entegris’ IntelliGen® Mini
the filter causes possible outgassing of the photo dispense system was used with Entegris’ Impact
chemical and finer pore size approaches the size Mini pointofuse UPE filters with various pore
of large molecular weight polymers in the photo sizes. IMEC’s Defect 45 mask was used for the expo
chemical. These conditions can cause polymer sures. The Defect 45 mask is designed to print nine
shearing, micro bubble formation and gel particle uniform subdies of 45 nm lines with 90 nm pitch.
formation. Filter materials with finer pore size may The resist stack for this experiment consisted of 95
have affinity with certain species in the photo nm BARC and 105 nm TOK TARF Pi6 001ME resist
chemical formulations, causing photochemical which intentionally contaminated high levels of
changes to occur before it reaches the wafer. To microbridging defects. A postsoak step was added
address all these concerns and demonstrate the after the exposure, and development was done
benefits of highly retentive 5 nm asymmetric UPE with the slitscan nozzle. In a particular test, an
filter, a series of evaluations have been conducted intentionally contaminated resist with 10 times
under actual production conditions at a number of the microbridging levels of the process of record
different customer sites. (POR) resist chemistry was used to determine the
effect of filtration parameters on defect density.
Case 1: Reducing Microbridging Defects for Figure 4 shows the best results for combination of
193 nm Top-coatless Immersion Photoresist filtration rate and pressure applied to the filtrate
Microbridging was recognized as one of the critical for 5 nm asymmetric UPE and 20 nm symmetric
patterning defects that were frequently observed in UPE filters. Further analysis of the experimental
193 nm lithographic process in different formula data suggests that filter pore size is statistically
tions from different manufacturers. The problem significant for reducing microbridging defects. The
becomes remarkable particularly in dense line/ data also indicates that different filter designs will
space patterns and seriously damages the pro require different, optimized filtration rates and
duction yield. Entegris has engaged with the applied pressures to further reduce microbridging
Interuniversity Microelectronics Center (IMEC) defect density.
in Leuven, Belgium, to study the effects of point
Normalized Defect Data Defective Chemistry Sample
120%
No filter (Medium rate/ 20 nm (Low rate/ 5 nm (High rate/
Medium pressure) High pressure) High pressure)
100%
80%
60%
40%
20%
0
Total Irregular Embedded Burst Bubble Line
Microbridging Bridging Contaminant Defect Nodule
Figure 4. Results of 5 nm asymmetric UPE evaluation under best conditions at IMEC
entegrIs, Inc. 3
4. ImprovIng AdvAnced LIthogrAphy process defectIvIty
Case 2: Reducing Overall Coating Defects for Case 3: Reducing Residue-type Defects for
193 nm BARC Process 193 nm Top-coatless Immersion Photoresist
The implementation of BARC processes in 193 nm A study had been started to reduce residuetype
dry and immersion lithography has been accom defects for the latest 193 nm topcoatless immersion
panied by defect reduction challenges on fine resist. To reduce this residuetype defect, 10 nm
patterns. In a joint study with AZ Electronic asymmetric and 5 nm asymmetric UPE filters were
Materials, the efficiency and performance of compared. The tested resist was well controlled for
Entegris’ Impact 2 UPE filters with various pore elimination of microbridgingtype defect. The focus
sizes in reducing BARC process related defects was on eliminating residuetype defects. Table 1
was examined. AZ® ArF1C5D BARC coating was is the brief summary of testing condition. The eval
employed in this study. The testing was accom uation results in Figure 6 showed that the 5 nm
plished using an Entegris IntelliGen Mini dispense asymmetric UPE filter reduced the residuetype
pump integrated in the coating module of a defects by over 70% compared to the 10 nm
TEL® CLEAN TRACK ACT 8. BARC was coated on asymmetric UPE filter.
an unprimed silicon wafer. The dispense recipe and
coat recipe were kept constant as the filter pore tAbLe 1. brIef sUmmAry of testIng condItIon
size changed. Spin speed was adjusted such that Substrate 200 mm bare Si with BARC
37 nm BARC film thickness was achieved. The
softbake condition was 200°C for 60 seconds. Top coat None
Three ACI wafers were coated and the wafers were Mask 75 nm L/S
measured for defects. A KLATencor® 2360 High Exposure Dry ArF scanner
Resolution Imaging Inspection System was used
with a 0.20 µm pixel size under bright field imaging Dispense pump Single stage
mode to count defects on the coated wafers. Then Inspection KLA 2360
the defect review was carried out using an Applied
Materials® SEMVision™ cX defect review tool. 100
10 nm UPE
Figure 5 shows the total defect results for the 5 nm UPE
Normalized Defect Count (%)
80
tested filters. In the first run, 3 pointofuse
UPE filters with various pore sizes were tested.
60
Compared to a 20 nm rating filter, smaller pore size
filters significantly improved the BARC defectivity.
40
Furthermore, 5 nm asymmetric filter performed
the best, with the lowest number of total defects.
20
Then a confirmation run was conducted using
20 nm and 5 nm asymmetric filters to confirm the
findings in the first round of testing. The defect 0
Fall on Residue
results were very similar to the first round of Figure 6. Effect of filter pore size on residue-type defect
testing as shown in Figure 6. The 5 nm asymmetric reduction in ArF immersion resist
filter showed much lower defect counts than the
20 nm filter.
First run
Confirmation run
Total Defects
Impact 2 V2 20 nm Impact 2 V2 10 nm Impact 2 V2 5 nm
symmetric symmetric asymmetric
Figure 5. Total defectivity comparison by filter
entegrIs, Inc. 4
5. ImprovIng AdvAnced LIthogrAphy process defectIvIty
Filter Priming 0.2 µm. This OPC was installed on the outlet line
of the dispense system, monitoring the entire
The most noticeable attribute of photochemical downstream of the testing filters. The effluent was
POU filters is the ability to purge air and contami recycled to the reservoir. The filters were primed
nants introduced during system maintenance or with the solvent ethyl lactate and the dispense
filter changeout. Customers continue to have issues recipe was continually performed until particle
with filter priming and associated tool downtime. counts leveled off. Since each new testing filter
As the finer feature size of advanced lithography was installed after the particle counts reached very
processes requires even finer filtration for photo low background with a filter in place, the particle
chemicals, there is more concern on the finer levels shown by the counter indicated the level
filter priming speed. The unique design of 5 nm of microbubbles in the dispense line during the
asymmetric UPE membrane ensures a high level of testing. While optical particle counters are not
retention to reduce advance process defects while designed to count bubbles, the results can be used
also maintaining the ability of fast priming during in a semiquantitative manner to see differences
filter changeout. in filter performance.
Laboratory experiments were conducted to examine The result of filter priming testing is shown in
the priming performance of Impact 2 V2 5 nm Figure 7. The priming speed of Impact 2 V2 5 nm
asymmetric UPE filter and compare to a standard asymmetric UPE filters is slightly better or equal
Impact 2 V2 10 nm symmetric UPE filter on an to a standard Impact 2 V2 10 nm symmetric UPE
Entegris twostagetechnology IntelliGen Mini filter. This result shows that when the membrane
dispense pump. A recirculating chemical test structure is optimized correctly, the 5 nm asym
stand was assembled using a chemical reservoir, metric filter can maintain the fast priming speed.
a dispense pump, a filter manifold, a test filter As a result, the chemical waste and dispensepoint
and an OPC. The OPC is a PMS LiQuilaz® SO2, downtime are reduced.
capable of detecting and sizing particles down to
Bubble Cleanup Testing on IntelliGen Mini Pump with Ethyl Lactate
(Dispense Volume = 5 mL; Dispense Rate = 1 mL/sec; Filtration Rate = 1 mL/sec
14
12 Impact 2 V2 10 nm symmetric UPE
Impact 2 V2 5 nm asymmetric UPE #1
Impact 2 V2 5 nm aymmetric UPE #2
10
Particles/mL ≥0.2 µm
8
6
4
2
0
0 50 100 150 200 250 300 350 400 450
Dispense Cycle
Figure 7. Bubble flushup of Impact 2 V2 5 nm asymmetric UPE filter
entegrIs, Inc. 5