The document is a presentation on atomic layer deposition (ALD) given by Riikka Puurunen at the IUPAC|CHAINS2023 World Chemistry Congress. The presentation provides an introduction to ALD, including its history dating back to 1974 with its independent inventions in Finland and Russia. It discusses the fundamentals and typical process conditions of ALD as well as examples of its applications. The presentation emphasizes ALD's ability to conformally coat substrates and provides examples of Puurunen's own research on ALD catalyst synthesis and modeling ALD growth. It concludes by discussing opportunities for future ALD research and the importance of open science practices.