Global Photolithography Equipment Market stood at USD 15,904.02 million in 2021 and is forecast to register a CAGR of 16.70% by 2027. The demand for photolithography equipment is primarily drive by the high demand for smaller electronic devices, increasing internet of things penetration and the expansion of the semiconductor industry. Moreover, the factors such as high equipment operational and maintenance cost, limitation for curved surfaces hinder the growth of Global Photolithography Equipment Market. A type of lithography equipment called photolithography uses light to imprint patterns on a substrate. By etching away material with minute details, this patterning can be used to make goods such as circuit boards or microchips. The semiconductor and microelectronics industries employ photolithography equipment to pattern thin sheets of material on a substrate. The capability of photolithography equipment to fabricate incredibly tiny objects on a substrate is its main benefit. Explore Global Market and Key Players Insights: http://tinyurl.com/yc48fdhb Market Segmentation Global Photolithography Equipment Market can is segmented on the basis of type, DUV type, wavelength, device wavelength, end-use, application, and region. By Type, the market is segmented into EUV (Extreme Ultraviolet) and DUV (Deep Ultraviolet). By DUV Type, market is segmented into ArFi (Argon Fluoride Immersion), KrF (Krypton Fluoride), ArF (Argon Fluoride) and I-Line. By wavelength, the market is segmented into 1nm-170nm, 170nm-270nm and 270nm-370nm. By device wavelength, the market is segmented into mercury lamps, fluorine lamps, excimer lasers and laser produced plasma. By end-use, the market is segmented into IDMs (Integrated Device Manufacturer) and foundries. By application, the market is segmented into back-end and front-end. By region, the market is segmented into Asia-Pacific, North America, Europe, South America, Middle East and Africa. 🔑 Key Market Players are ASML Holding N.V., Canon Inc., EV Group (EVG), GlobalFoundries Inc., Nikon Corporation, Veeco Instruments Inc., SUSS MicroTec SE, Taiwan Semiconductor Manufacturing Company Limited, Eulitha AG, NuFlare Technology Inc. are among the major market players in the Global Photolithography Equipment Market. Download Free Sample Report: http://tinyurl.com/2b39t9da

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2015 – 2025
MARKET INTELLIGENCE . CONSULTING
www.techsciresearch.com
GLOBAL PHOTOLITHOGRAPHY
EQUIPMENT MARKET – FORECAST
AND OPPORTUNITIES
2017 – 2027

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Table of Contents
S. No. Contents Page No.
1. Product Overview
2. Research Methodology
3. Executive Summary
4. Impact of COVID-19 on Global Photolithography Equipment Market
5. Voice of Customer
5.1. Brand Awareness
5.2. Preference for Photolithography Equipment, By Type
5.3. Key Satisfaction Level
5.4. Challenges Related to Photolithography Equipment
6. Global Photolithography Equipment Market Outlook
6.1. Market Size & Forecast
6.1.1. By Value
6.2. Market Share & Forecast
6.2.1. By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet))
6.2.1.1
BY DUV Type (ArFi (Argon Flouride Immersion, KrF (Krypton Flouride), ArF (Argon
Flouride), I-Line))
6.2.2. By Wavelength (1nm-170nm, 170nm-270nm, 270nm-370nm)
6.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Laser Produced
Plasma)
6.2.4. By End-Use (IDMs (Integrated Device Manufacturer), Foundries )
6.2.5. By Application (Back-End, Front-End)
6.2.5. By Region (North America, Europe, Asia-Pacific, Middle East & Africa and South America)
6.2.5.1. Key takeaways
6.2.6. By Company (2021)
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6.3.
Product Market Map (By Type, By Wavelength, By Device Wavelength, By End-Use, By Application, By
Region)
7. Asia-Pacific Photolithography Equipment Market Outlook
7.1. Market Size & Forecast
7.1.1. By Value
7.2. Market Share & Forecast
7.2.1. By Type
7.2.1.1 By DUV Type
7.2.2. By Wavelength
7.2.3. By Device Wavelength
7.2.4. By End-Use
7.2.5. By Application
7.2.6. By Country
7.3. Asia-Pacific Photolithography Equipment Market Country Analysis
7.3.1. China Photolithography Equipment Market Outlook
7.3.1.1. Market Size & Forecast
7.3.1.1.1. By Value
7.3.1.2. Market Share & Forecast
7.3.1.2.1. By Type
7.3.1.2.1.1 By DUV Type
7.3.1.2.2. By Wavelength
7.3.1.2.3. By Device Wavelength
7.3.1.2.4. By End-Use
7.3.1.2.5. By Application
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7.3.2. South Korea Photolithography Equipment Market Outlook
7.3.2.1. Market Size & Forecast
7.3.2.1.1. By Value
7.3.2.2. Market Share & Forecast
7.3.2.2.1. By Type
7.3.2.2.1.1. By DUV Type
7.3.2.2.2. By Wavelength
7.3.2.2.3. By Device Wavelength
7.3.2.2.4. By End-Use
7.3.2.2.5. By Application
7.3.3. Japan Photolithography Equipment Market Outlook
7.3.3.1. Market Size & Forecast
7.3.3.1.1. By Value
7.3.3.2. Market Share & Forecast
7.3.3.2.1. By Type
7.3.3.2.1.1. By DUV Type
7.3.3.2.2. By Wavelength
7.3.3.2.3. By Device Wavelength
7.3.3.2.4. By End-Use
7.3.3.2.5. By Application
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7.3.4. Singapore Photolithography Equipment Market Outlook
7.3.4.1. Market Size & Forecast
7.3.4.1.1. By Value
7.3.4.2. Market Share & Forecast
7.3.4.2.1. By Type
7.3.4.2.1.1. By DUV Type
7.3.4.2.2. By Wavelength
7.3.4.2.3. By Device Wavelength
7.3.4.2.4. By End-Use
7.3.4.2.5. By Application
7.3.5. India Photolithography Equipment Market Outlook
7.3.5.1. Market Size & Forecast
7.3.5.1.1. By Value
7.3.5.2. Market Share & Forecast
7.3.5.2.1. By Type
7.3.5.2.1.1. By DUV Type
7.3.5.2.2. By Wavelength
7.3.5.2.3. By Device Wavelength
7.3.5.2.4. By End-Use
7.3.5.2.5. By Application
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8. North America Photolithography Equipment Market Outlook
8.1. Market Size & Forecast
8.1.1. By Value
8.2. Market Share & Forecast
8.2.1. By Type
8.2.1.1 By DUV Type
8.2.2. By Wavelength
8.2.3. By Device Wavelength
8.2.4. By End-Use
8.2.5. By Application
8.2.6. By Country
8.3. North America Photolithography Equipment Market Country Analysis
8.3.1. United States Photolithography Equipment Market Outlook
8.3.1.1. Market Size & Forecast
8.3.1.1.1. By Value
8.3.1.2. Market Share & Forecast
8.3.1.2.1. By Type
8.3.1.2.1.1 By DUV Type
8.3.1.2.2. By Wavelength
8.3.1.2.3. By Device Wavelength
8.3.1.2.4. By End-Use
8.3.1.2.5. By Application
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8.3.2. Canada Photolithography Equipment Market Outlook
8.3.2.1. Market Size & Forecast
8.3.2.1.1. By Value
8.3.2.2. Market Share & Forecast
8.3.2.2.1. By Type
8.3.2.2.1.1. By DUV Type
8.3.2.2.2. By Wavelength
8.3.2.2.3. By Device Wavelength
8.3.2.2.4. By End-Use
8.3.2.2.5. By Application
8.3.3. Mexico Photolithography Equipment Market Outlook
8.3.3.1. Market Size & Forecast
8.3.3.1.1. By Value
8.3.3.2. Market Share & Forecast
8.3.3.2.1. By Type
8.3.3.2.1.1. By DUV Type
8.3.3.2.2. By Wavelength
8.3.3.2.3. By Device Wavelength
8.3.3.2.4. By End-Use
8.3.3.2.5. By Application
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9. Europe Photolithography Equipment Market Outlook
9.1. Market Size & Forecast
9.1.1. By Value
9.2. Market Share & Forecast
9.2.1. By Type
9.2.1.1 By DUV Type
9.2.2. By Wavelength
9.2.3. By Device Wavelength
9.2.4. By End-Use
9.2.5. By Application
9.2.6. By Country
9.3. Europe Photolithography Equipment Market Country Analysis
9.3.1. Netherlands Photolithography Equipment Market Outlook
9.3.1.1. Market Size & Forecast
9.3.1.1.1. By Value
9.3.1.2. Market Share & Forecast
9.3.1.2.1. By Type
9.3.1.2.1.1 By DUV Type
9.3.1.2.2. By Wavelength
9.3.1.2.3. By Device Wavelength
9.3.1.2.4. By End-Use
9.3.1.2.5. By Application
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9.3.2. Germany Photolithography Equipment Market Outlook
9.3.2.1. Market Size & Forecast
9.3.2.1.1. By Value
9.3.2.2. Market Share & Forecast
9.3.2.2.1. By Type
9.3.2.2.1.1. By DUV Type
9.3.2.2.2. By Wavelength
9.3.2.2.3. By Device Wavelength
9.3.2.2.4. By End-Use
9.3.2.2.5. By Application
9.3.3. France Photolithography Equipment Market Outlook
9.3.3.1. Market Size & Forecast
9.3.3.1.1. By Value
9.3.3.2. Market Share & Forecast
9.3.3.2.1. By Type
9.3.3.2.1.1. By DUV Type
9.3.3.2.2. By Wavelength
9.3.3.2.3. By Device Wavelength
9.3.3.2.4. By End-Use
9.3.3.2.5. By Application
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9.3.4. United Kingdom Photolithography Equipment Market Outlook
9.3.4.1. Market Size & Forecast
9.3.4.1.1. By Value
9.3.4.2. Market Share & Forecast
9.3.4.2.1. By Type
9.3.4.2.1.1. By DUV Type
9.3.4.2.2. By Wavelength
9.3.4.2.3. By Device Wavelength
9.3.4.2.4. By End-Use
9.3.4.2.5. By Application
9.3.5. Italy Photolithography Equipment Market Outlook
9.3.5.1. Market Size & Forecast
9.3.5.1.1. By Value
9.3.5.2. Market Share & Forecast
9.3.5.2.1. By Type
9.3.5.2.1.1. By DUV Type
9.3.5.2.2. By Wavelength
9.3.5.2.3. By Device Wavelength
9.3.5.2.4. By End-Use
9.3.5.2.5. By Application
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9.3.6. Spain Photolithography Equipment Market Outlook
9.3.6.1. Market Size & Forecast
9.3.6.1.1. By Value
9.3.6.2. Market Share & Forecast
9.3.6.2.1. By Type
9.3.6.2.1.1. By DUV Type
9.3.6.2.2. By Wavelength
9.3.6.2.3. By Device Wavelength
9.3.6.2.4. By End-Use
9.3.6.2.5. By Application
10. South America Photolithography Equipment Market Outlook
10.1. Market Size & Forecast
10.1.1. By Value
10.2. Market Share & Forecast
10.2.1. By Type
10.2.1.1 By DUV Type
10.2.2. By Wavelength
10.2.3. By Device Wavelength
10.2.4. By End-Use
10.2.5. By Application
10.2.6. By Country
10.3. South America Photolithography Equipment Market Country Analysis
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10.3.1. Brazil Photolithography Equipment Market Outlook
10.3.1.1. Market Size & Forecast
10.3.1.1.1. By Value
10.3.1.2. Market Share & Forecast
10.3.1.2.1. By Type
10.3.1.2.1.1. By DUV Type
10.3.1.2.2. By Wavelength
10.3.1.2.3. By Device Wavelength
10.3.1.2.4. By End-Use
10.3.1.2.5. By Application
10.3.2. Argentina Photolithography Equipment Market Outlook
10.3.2.1. Market Size & Forecast
10.3.2.1.1. By Value
10.3.2.2. Market Share & Forecast
10.3.2.2.1. By Type
10.3.2.2.1.1. By DUV Type
10.3.2.2.2. By Wavelength
10.3.2.2.3. By Device Wavelength
10.3.2.2.4. By End-Use
10.3.2.2.5. By Application
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10.3.3. Colombia Photolithography Equipment Market Outlook
10.3.3.1. Market Size & Forecast
10.3.3.1.1. By Value
10.3.3.2. Market Share & Forecast
10.3.3.2.1. By Type
10.3.3.2.1.1. By DUV Type
10.3.3.2.2. By Wavelength
10.3.3.2.3. By Device Wavelength
10.3.3.2.4. By End-Use
10.3.3.2.5. By Application
11. Middle East & Africa Photolithography Equipment Market Outlook
11.1. Market Size & Forecast
11.1.1. By Value
11.2. Market Share & Forecast
11.2.1. By Type
11.2.1.1 By DUV Type
11.2.2. By Wavelength
11.2.3. By Device Wavelength
11.2.4. By End-Use
11.2.5. By Application
11.2.6. By Country
11.3. Middle East & Africa Photolithography Equipment Market Country Analysis
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11.3.1. Israel Photolithography Equipment Market Outlook
11.3.1.1. Market Size & Forecast
11.3.1.1.1. By Value
11.3.1.2. Market Share & Forecast
11.3.1.2.1. By Type
11.3.1.2.1.1. By DUV Type
11.3.1.2.2. By Wavelength
11.3.1.2.3. By Device Wavelength
11.3.1.2.4. By End-Use
11.3.1.2.5. By Application
11.3.2. UAE Photolithography Equipment Market Outlook
11.3.2.1. Market Size & Forecast
11.3.2.1.1. By Value
11.3.2.2. Market Share & Forecast
11.3.2.2.1. By Type
11.3.2.2.1.1. By DUV Type
11.3.2.2.2. By Wavelength
11.3.2.2.3. By Device Wavelength
11.3.2.2.4. By End-Use
11.3.2.2.5. By Application
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11.3.3. Saudi Arabia Photolithography Equipment Market Outlook
11.3.3.1. Market Size & Forecast
11.3.3.1.1. By Value
11.3.3.2. Market Share & Forecast
11.3.3.2.1. By Type
11.3.3.2.1.1. By DUV Type
11.3.3.2.2. By Wavelength
11.3.3.2.3. By Device Wavelength
11.3.3.2.4. By End-Use
11.3.3.2.5. By Application
11.3.4. South Africa Photolithography Equipment Market Outlook
11.3.4.1. Market Size & Forecast
11.3.4.1.1. By Value
11.3.4.2. Market Share & Forecast
11.3.4.2.1. By Type
11.3.4.2.1. By DUV Type
11.3.4.2.2. By Wavelength
11.3.4.2.3. By Device Wavelength
11.3.4.2.4. By End-Use
11.3.4.2.5. By Application
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12. Market Dynamics
12.1. Drivers
12.2. Challenges
13. Market Trends and Developments
14. Company Profiles
14.1. ASML Holding N.V.
14.2. Canon Inc.
14.3. EV Group (EVG)
14.4. GlobalFoundries Inc.
14.5. Nikon Corporation
14.6. Veeco Instruments Inc.
14.7. SUSS MicroTec SE
14.8. Taiwan Semiconductor Manufacturing Company Limited
14.9. Eulitha AG
14.10. NuFlare Technology Inc.
15. Strategic Recommendations
16. About Us & Disclaimer
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17. Product Overview

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Product Overview
Product of Interest: Photolithography Equipment
Review Period
2017 – 2020
Base Year
2021
Estimated Year
2022
Forecast Period
2023 – 2027
Year Range
GLOBAL PHOTOLITHOGRAPHY
EQUIPMENT MARKET
BY TYPE
• EUV (Extreme Ultraviolet)
• DUV (Deep Ultraviolet)
• I-line
• ArF (Argon Fluoride)
• ArFi (Argon Fluoride Immersion)
• KrF (Krypton Fluoride)
BY REGION
• Europe
• North America
• Asia-Pacific
• South America
• Middle East & Africa
Photolithography is a technique in microfabrication used to pattern parts on a thin film or the
bulk of a substrate (also called a wafer). It transfers a geometric pattern using light from a
photomask, also known as an optical mask, to a chemical photoresist that is photosensitive,
or light-sensitive, on the substrate. Photolithography is also termed optical lithography or UV
lithography. The increasing adoption of digital transformation across sectors, rising demand
for smart appliances, burgeoning advancements in automotive, and innovations across the
semiconductor industry are providing impetus to photolithography equipment market growth
across the globe.
Market Segmentation
BY WAVELENGTH
• 1-170 nm
• 170-270nm
• 270-370nm
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BY APPLICATION
• Front End
• Back End
• Mercury Lamps
• Fluorine Lamps
• Excimer Lasers
• Laser Produced Plasma
BY DEVICE WAVELENGTH
• IDMs (Integrated Device
Manufacturer)
• Foundries
BY END-USE

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BY TYPE
• EUV: The Extreme Ultraviolet (EUV) Photolithography technology is an advanced technology with a light source of 13.5 nm, which
is extremely short wavelength and can be applied for beyond the 10 nm node. EUV enables the use of only one mask exposure
instead of multiple exposures. The development of resist material is one of the critical technical issues of EUV. This material is
necessary to have the excellent characteristics that includes high resolution, high sensitivity, low line-edge roughness (LER) and
low outgassing simultaneously.
• DUV: The Deep Ultraviolet (DUV) Photolithography is the process of defining a pattern in a thin photosensitive polymer layer
(photoresist) using controlled 254–193-nm light such that the resulting polymer pattern can be transferred into or onto the
underlying substrate by etching, deposition, or implantation. The exposing light is passed through a chrome-on-quartz photomask,
whose opaque areas act as a stencil of the desired pattern. The exposed polymer is then subjected to a chemical development
process where the unwanted areas of polymer are removed, leaving the target areas unprotected from subsequent processing.
BY DUV TYPE
• ArFi (Argon Fluoride Immersion): The ArF immersion light sources feature a 193 nm wavelength for patterning critical layers
during IC production and for multi-patterning applications that support the world’s most advanced semiconductor production nodes.
• KrF (Krypton Fluoride): The pulse width of KrF laser is generally tens of nanoseconds, much shorter than OH lifetime and
timescale of protein higher order structural motions. The KrF laser emits a wavelength of 248 nm.
• ArF (Argon Fluoride): The ArF laser emits a far-ultraviolet with a wavelength of 193 nm, which permanently removes the most
anterior portion of the corneal stromal tissue in a very precise manner.
• I-line: The I-line lithography uses ultraviolet light with exposure wavelength of 365 nm, for which a high-pressure mercury vapor
lamp is used. This offers superior performance and cost advantage to the manufacturer. I-line lithography equipment are utilized in
industries such as semiconductor manufacturing, and automotive.
BY DEVICE WAVELENGTH
• Mercury Lamps: The Mercury lamps have an inner quartz tube containing the mercury vapor discharge maintaining high-pressure
which is widely used in photolithography due to of its high intensity and reliability.
Product Overview
Product of Interest: Photolithography Equipment
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• Fluorine Lamps: The Fluorine lamp plays a critical role in the development of advanced photolithography. It is widely used as for
the critical dimensions in microelectronic devices which are less than 70 nm, the patterning technology of choice is be based on 157
nm light generated from molecular fluorine laser medium.
• Excimer Lasers: The excimer laser typically contains a mixture of different gases that includes noble gases such as argon,
krypton, or xenon; and halogen gases such as fluorine or chlorine.
• Laser Produced Plasma: The Xenon has been identified as a promising target material for Laser Produced Plasma (LPP) EUV light
sources, with the potential for both high-efficiency EUV generation, and minimal contamination of EUV optics allowing hundreds of
hours of clean operation.
BY END-USE
• IDMs (Integrated Device Manufacturer): The A semiconductor company that designs, manufactures, and sells integrated
circuits (ICs) is an integrated device manufacturer (IDM). A traditional IDM owns its own branded chips and does the design in-
house and has a fabrication plant where it manufactures its ICs.
• Foundries: The factories where semiconductor chips are manufactured are called foundries. Building out a full foundry is an
immensely expensive task, costing somewhere between USD10-USD20 billion in investment (source). A modern foundry has many
sophisticated instruments in addition to EUV lithography machines.
BY APPLICATION
• Front-End: The Front-end semiconductor manufacturing refers to the fabrication from a blank wafer to a completed wafer in which
the microchips are created but kept on the wafer only. Many front-end processes involve spinning the wafer. The semiconductor
industry has some of the most demanding applications in motion control. A combination of extreme accuracy and precision
combined with high throughput, makes for exciting technology.
• Back-End: The Back-end semiconductor manufacturing refers to the fabrication processes after all of the features/circuits have
been created on the wafer. A combination of extreme accuracy and precision combined with high throughput, makes for exciting
technology. Servo drives are used in many processes in back-end semiconductor manufacturing because they provide excellent
performance and repeatability; exactly what's needed in high-end semiconductor fabrication.
Product Overview
Product of Interest: Photolithography Equipment
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21. Research Methodology

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Research Methodology
 Identifying Key Opinion
Leaders
 Questionnaire Design
 In-depth Interviews
Data
Collection
Developing List
of Respondents
Formulating
Questionnaire
Market
Profiling
Data
Validation
Data
Analysis
In-depth secondary
research was
conducted to determine
overall market size,
segmental market size
and top companies in
Global
Photolithography
Equipment Market.
In order to conduct
industry experts’
interviews, TechSci
formulated a
detailed discussion
guide.
List of industry
players and
industry
specialists was
developed.
TechSci conducted
interviews with
industry experts
and industry
players for data
collection and
verification.
Data obtained as
a result of
primary and
secondary
research was
validated through
rigorous
triangulation.
The data was
scrutinized using MS-
Excel, statistical tools
and internal proprietary
database to obtain
qualitative and
quantitative insights
about Global
Photolithography
Equipment Market.
Data
Collection
Data Filter
& Analysis
Research &
Intelligence
Actionable
Insights
Business
Solution
Primary Research Desk Research Company Analysis
 Recent Developments
 Market Changing
Aspects/Dynamics
 Government Policies
 Conclusion
 Market Participants
 Key Strengths
 LinkedIn
 TechSci Internal
Database
 Factiva
 Hoovers
 EMIS
Paid Sources
 Company Websites
 Company Annual
Reports
 White Paper Study
 Financial Reports
 Investor
Presentations
 Regulatory Body
Secondary Research
Primary Research
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Baseline Methodology
Our dedicated team of industry experts has monitored and analyzed various aspects of the Global Photolithography Equipment
Market. The team has analyzed the outlook of various segments of this market, while considering the major influencing factors
such as advent of advanced semiconductor technologies, increasing government support, and high demand for miniaturized
electronic devices, and speculated a robust growth during the forecast period. The study includes market forecasting, which would
enable our clients to take better decisions while planning their strategy to achieve sustainability in the Global Photolithography
Equipment Market.
Methodology Followed for Calculation of Market Size:
Market Size by Value: Market size, in terms of value, for the year 2021 was calculated based on information collected through
exhaustive secondary research and primary surveys, with various key opinion leaders/stakeholders and industry experts.
The team interviewed around 8 companies, 30 industry experts and other value chain stakeholders in the Global
Photolithography Equipment Market to obtain the overall market size during 2017-2021, which was validated by the Delphi
technique. Taking standard deviation into consideration, the market size was averaged out, to arrive at the market size data for
2017-2021.
Research Methodology

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Respondents were asked about the current and future market growth rates, as well as market shares by type, by wavelength,
by device wavelength, by end-use, by application, by region and by company. Removing the outlier responses, the geometric
mean of growth estimates and provider wise revenue shares generated across various segments were considered, to arrive at
the final revenue shares. Revenue shares generated across various segments were further triangulated from other
stakeholders depending upon the component.
Methodology Followed for Calculation of Market Shares:
Market shares by type, by wavelength, by device wavelength, by end-use, by application, by region and by company were
calculated based on the responses received through primary surveys with industry experts, in which the respondents were
asked about the market shares of the leading photolithography equipment market players. The final shares were calculated by
taking the geometric mean of the responses gathered from key opinion leaders after eliminating the outliers. Moreover,
respondents were asked about the leading companies operating in the Global Photolithography Equipment Market.
Methodology Followed for Forecasting:
TechSci Research performed periodical checks on data collected through the surveys with logical checks and analyzed the
survey results.
Research Methodology

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Data triangulation techniques were applied to fill the gaps and to present a more meaningful picture of the market. To forecast
the Global Photolithography Equipment Market, TechSci Research used various forecast techniques such as:
o Moving Average
o Time Series Analysis
o Regression Analysis
o Econometric and Judgmental Analysis
TechSci Research used its own forecast tool, which is based on the growth of various allied industries in respective regions.
TechSci Research also used the impact analysis during short, medium and long term period to estimate and analyze market
demand scenario.
Note: (a): Sum of some shares may not be 100% due to round off till two decimal places.
Partial List of Companies
Interviewed
ASML Holding N.V., Canon Inc., EV Group (EVG), GlobalFoundries Inc., Nikon Corporation,
Veeco Instruments Inc., SUSS MicroTec SE, Taiwan Semiconductor Manufacturing Company
Limited, Eulitha AG, NuFlare Technology Inc. among others
Partial List of Secondary
Sources
Company Annual Reports, Press Releases, Industry Magazines, Semiconductor Industry
Association, SEMI, Industry Reports, Company Websites, TechSci Research Proprietary
Database & Knowledge Repository, etc.
Research Methodology

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Industry Brief
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4
Ongoing numerous technological advancements, growing semiconductor industry and huge investments in research & developments
is likely to boost the Global Photolithography Equipment Market through the forecast period.
According to TechSci Research report, “Photolithography Equipment Market - Global Industry Size, Share, Trends, Opportunity, and
Forecast, 2017-2027” Global Photolithography Equipment Market stood at USD 15,904.02 million in 2021 and is expected to register
a CAGR of 16.70% during the forecast period. In 2021, two significant multinational corporations, International Business Machine
Corporation (IBM), a technology multinational with its headquarters in the United States, and Samsung, a semiconductor
multinational with its headquarters in South Korea, announced a new semiconductor design that prioritises efficiency and power
while also satisfying the demand for new semiconductor technology on a global scale. The innovative design employs a unique
vertical transistor architecture that provides a way to scale beyond nanosheet and has the potential to use 85% less energy than a
scaled fin field-effect transistor (finFET)1.
The new technology, according to IBM, also emphasises the crucial role that spending on chip research plays in the semiconductor
industry, along with how it is later developed for application in a variety of sectors. Among the places where technology is used are
essential infrastructure, transportation systems, communication devices, and appliances. The company anticipates that the new
design will help in advancing these fields in the upcoming years.
Global Photolithography Equipment Market can is segmented on the basis of type, DUV type, wavelength, device wavelength, end-
use, application, and region. In terms of type, DUV is the leading segment in the Global Photolithography Equipment Market
accounting for share of 67.45% in 2021 and register a CAGR of 15.49% during the forecast period. DUV processes have the
potential to significantly improve cloud performance and deploy innovations in AI applications. Improvement in chip performance and
reduction in power requirements are being preferred in cloud and AI applications. Moreover, DUV provides better features than
others such as advancements in critical dimension uniformity, better overlay control, lower sensitivity to incoming wafer topography,
higher reliability with less tool maintenance, and higher throughput.
Major market players operating in the global photolithography equipment market are ASML Holding N.V., Canon Inc., EV Group
(EVG), GlobalFoundries Inc., Nikon Corporation, Veeco Instruments Inc., SUSS MicroTec SE, Taiwan Semiconductor Manufacturing
Company Limited, Eulitha AG, NuFlare Technology Inc.
“In terms of device wavelength, excimer laser is the leading segment in the Global Photolithography Equipment Market accounting
for a share of 62.55% in 2021 and the segment is also expected to register a CAGR of 15.96%, during the forecast period. Excimer
layers have higher pulse energy, shorter pulse duration and shorter wavelengths than other layers. Moreover, in healthcare industry,
excimer layers ensure safety because they are capable of power levels of several hundred watts and are easily capable of
considerable damage to an operator's eyes or skin.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research-
based global management consulting firm.

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Sample Data- Snapshot
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4
2017 2018 2019 2020 2021 2022E 2023F 2024F 2025F 2026F 2027F
Value (USD Million)
Global Photolithography Equipment Market Size, By Value (USD Million), 2017-2027F
CAGR 2017-2021
By Value: XX%
CAGR 2022E-2027F
By Value: XX%
Asia-Pacific Photolithography Equipment Market Share, By Type, By Value, 2017-2027F
2017 2018 2019 2020 2021 2022E 2023F 2024F 2025F 2026F 2027F
DUV (Deep Ultraviolet) 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00%
EUV (Extreme Ultraviolet) 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00% 50.00%
China Photolithography Equipment Market Share, By Device Wavelength, By Value, 2017-2027F
2017 2018 2019 2020 2021 2022E 2023F 2024F 2025F 2026F 2027F
Excimer Lasers 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00%
Laser Produced Plasma 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00%
Fluorine Lamps 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00%
Mercury Lamps 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00% 25.00%

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Report Order
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Report Name: GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET –
FORECAST AND OPPORTUNITIES
2017 – 2027
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29. About Us & Disclaimer
TechSci Research is a global market research and consulting company with offices in the US, UK and India. TechSci Research provides market research reports in
number of areas to organizations. The company uses innovative business models that focus on improving productivity, while ensuring creation of high-quality
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company activity and industry trends, the result is a uniquely rich evaluation of the opportunities available in the market.
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