The document provides an overview and market segmentation of the global photolithography equipment market from 2016 to 2026. It includes market size and share forecasts by type, wavelength, device wavelength, end-use, application, and region. The market is segmented by EUV, DUV, I-line, ArF, ArFi, and KrF types, 370nm-270nm, 270nm-170nm, and 170nm-1nm wavelengths, mercury lamps, fluorine lamps, excimer lasers, and lased produced plasma device wavelengths, IDMs and foundries end-uses, front end and back end applications, and regional markets including Asia-Pacific, Europe, North America, South America, and Middle

1. MARKET INTELLIGENCE . CONSULTING
www.techsciresearch.com
2016 – 2026
GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET
FORECAST & OPPORTUNITIES

2. 2
Scope of Report
Product of Interest (POI): Photolithography Equipment
Review Period
2016 – 2019
Base Year
2020
Estimated Year
2021
Forecast Period
2022 – 2026
Year Range
APPLICATION
• Front End
• Back End
Photolithography, also called optical lithography or UV lithography, is a process used in
microfabrication to pattern parts on a thin film or the bulk of a substrate (also called a
wafer). It uses light to transfer a geometric pattern from a photomask (also called an optical
mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate.
Market Segmentation
DEVICE WAVELENGTH
• EUV (Extreme Ultraviolet)
• DUV (Deep Ultraviolet)
• I-line
• ArF (Argon fluoride)
• ArFi (Argon fluoride immersion)
• KrF (Krypton fluoride)
TYPE
• Mercury Lamps
• Fluorine Lamps
• Excimer Lasers
• Lased Produced Plasma
REGION
• North America
• Europe
• Asia-Pacific
• Middle East & Africa
• South America
WAVELENGTH
• 370nm-270nm
270nm-170nm
• 170nm-1nm
END-USE
• IDMs (Integrated Device
Manufacturer)
• Foundries

3. 3
Table of Contents
S. No. Contents Page No.
1. Product Overview (Definition of product and major terminologies used in the report)
2.
Research Methodology Detailed description of the methodology used to conduct the research, Raw
data backup, list of all secondary sources, List of respondents for primary surveys)
3. Impact of COVID-19 on Global Photolithography Equipment Market
4. Executive Summary (This chapter covers summary of the complete study.)
5. Voice of Customer
6.
Global Photolithography Equipment Market Outlook, 2016-2026F (This chapter includes a brief overview of
the product of interest market such as total market’s growth rate, expected growth rate, key growth levers,
leading region, top grossing product types, etc. It includes more of a qualitative information about the market.)
6.1. Market Size & Forecast
6.1.1. By Value
6.2. Market Share & Forecast
6.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
6.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
6.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
6.2.4. By End-Use (IDMs, Foundries)
6.2.5. By Application (Front End, Back End)
6.2.6. By Region
6.2.7. By Company (2020)
6.3. Product Market Map

4. 4
Table of Contents
S. No. Contents Page No.
7. Asia-Pacific Photolithography Equipment Market Outlook
7.1. Market Size & Forecast
7.1.1. By Value
7.2. Market Share & Forecast
7.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
7.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
7.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
7.2.4. By End-Use (IDMs, Foundries)
7.2.5. By Application (Front End, Back End)
7.2.6. By Country
7.3. Asia-Pacific: Country Analysis
7.3.1. China Photolithography Equipment Market Outlook
7.3.1.1. Market Size & Forecast
7.3.1.1.1. By Value
7.3.1.2. Market Share & Forecast
7.3.1.2.1. By Type
7.3.1.2.2. By Wavelength
7.3.1.2.3. By Device Wavelength
7.3.1.2.4. By End User
7.3.1.2.5. By Application

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Table of Contents
S. No. Contents Page No.
7.3.2. India Photolithography Equipment Market Outlook
7.3.2.1. Market Size & Forecast
7.3.2.1.1. By Value
7.3.2.2. Market Share & Forecast
7.3.2.2.1. By Type
7.3.2.2.2. By Wavelength
7.3.2.2.3. By Device Wavelength
7.3.2.2.4. By End User
7.3.2.2.5. By Application
7.3.3. Singapore Photolithography Equipment Market Outlook
7.3.3.1. Market Size & Forecast
7.3.3.1.1. By Value
7.3.3.2. Market Share & Forecast
7.3.3.2.1. By Type
7.3.3.2.2. By Wavelength
7.3.3.2.3. By Device Wavelength
7.3.3.2.4. By End User
7.3.3.2.5 By Application

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Table of Contents
S. No. Contents Page No.
7.3.4. Japan Photolithography Equipment Market Outlook
7.3.4.1. Market Size & Forecast
7.3.4.1.1. By Value
7.3.4.2. Market Share & Forecast
7.3.4.2.1. By Type
7.3.4.2.2. By Wavelength
7.3.4.2.3. By Device Wavelength
7.3.4.2.4. By End User
7.3.4.2.5. By Application
7.3.5. South Korea Photolithography Equipment Market Outlook
7.3.5.1. Market Size & Forecast
7.3.5.1.1. By Value
7.3.5.2. Market Share & Forecast
7.3.5.2.1. By Type
7.3.5.2.2. By Wavelength
7.3.5.2.3. By Device Wavelength
7.3.5.2.4. By End User
7.3.5.2.5. By Application

7. 7
Table of Contents
S. No. Contents Page No.
8. Europe Photolithography Equipment Market Outlook
8.1. Market Size & Forecast
8.1.1. By Value
8.2. Market Share & Forecast
8.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
8.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
8.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
8.2.4. By End-Use (IDMs, Foundries)
8.2.5. By Application (Front End, Back End)
8.2.6. By Country
8.3. Europe: Country Analysis
8.3.1. France Photolithography Equipment Market Outlook
8.3.1.1. Market Size & Forecast
8.3.1.1.1. By Value
8.3.1.2. Market Share & Forecast
8.3.1.2.1. By Type
8.3.1.2.2. By Wavelength
8.3.1.2.3. By Device Wavelength
8.3.1.2.4. By End User
8.3.1.2.5. By Application

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Table of Contents
S. No. Contents Page No.
8.3.2. Germany Photolithography Equipment Market Outlook
8.3.2.1. Market Size & Forecast
8.3.2.1.1. By Value
8.3.2.2. Market Share & Forecast
8.3.2.2.1. By Type
8.3.2.2.2. By Wavelength
8.3.2.2.3. By Device Wavelength
8.3.2.2.4. By End User
8.3.2.2.5. By Application
8.3.3. United Kingdom Photolithography Equipment Market Outlook
8.3.3.1. Market Size & Forecast
8.3.3.1.1. By Value
8.3.3.2. Market Share & Forecast
8.3.3.2.1. By Type
8.3.3.2.2. By Wavelength
8.3.3.2.3. By Device Wavelength
8.3.3.2.4. By End User
8.3.3.2.5. By Application

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S. No. Contents Page No.
8.3.4. Italy Photolithography Equipment Market Outlook
8.3.4.1. Market Size & Forecast
8.3.4.1.1. By Value
8.3.4.2. Market Share & Forecast
8.3.4.2.1. By Type
8.3.4.2.2. By Wavelength
8.3.4.2.3. By Device Wavelength
8.3.4.2.4. By End User
8.3.4.2.5. By Application
8.3.5. Spain Photolithography Equipment Market Outlook
8.3.5.1. Market Size & Forecast
8.3.5.1.1. By Value
8.3.5.2. Market Share & Forecast
8.3.5.2.1. By Type
8.3.5.2.2. By Wavelength
8.3.5.2.3. By Device Wavelength
8.3.5.2.4. By End User
8.3.5.2.5. By Application

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9. North America Photolithography Equipment Market Outlook
9.1. Market Size & Forecast
9.1.1. By Value
9.2. Market Share & Forecast
9.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
9.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
9.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
9.2.4. By End-Use (IDMs, Foundries)
9.2.5. By Application (Front End, Back End)
9.2.6. By Country
9.3. North America: Country Analysis
9.3.1. United States Photolithography Equipment Market Outlook
9.3.1.1. Market Size & Forecast
9.3.1.1.1. By Value
9.3.1.2. Market Share & Forecast
9.3.1.2.1. By Type
9.3.1.2.2. By Wavelength
9.3.1.2.3. By Device Wavelength
9.3.1.2.4. By End User
9.3.1.2.5. By Application

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S. No. Contents Page No.
9.3.2. Mexico Photolithography Equipment Market Outlook
9.3.2.1. Market Size & Forecast
9.3.2.1.1. By Value
9.3.2.2. Market Share & Forecast
9.3.2.2.1. By Type
9.3.2.2.2. By Wavelength
9.3.2.2.3. By Device Wavelength
9.3.2.2.4. By End User
9.3.2.2.5. By Application
9.3.3. Canada Photolithography Equipment Market Outlook
9.3.3.1. Market Size & Forecast
9.3.3.1.1. By Value
9.3.3.2. Market Share & Forecast
9.3.3.2.1. By Type
9.3.3.2.2. By Wavelength
9.3.3.2.3. By Device Wavelength
9.3.3.2.4. By End User
9.3.3.2.5. By Application
10. South America Photolithography Equipment Market Outlook
10.1. Market Size & Forecast
10.1.1. By Value
10.2. Market Share & Forecast
10.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)

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Table of Contents
S. No. Contents Page No.
10.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
10.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
10.2.4. By End-Use (IDMs, Foundries)
10.2.5. By Application (Front End, Back End)
10.2.6. By Country
10.3. South America: Country Analysis
10.3.1. Brazil Photolithography Equipment Market Outlook
10.3.1.1. Market Size & Forecast
10.3.1.1.1 By Value
10.3.1.2. Market Share & Forecast
10.3.1.2.1. By Type
10.3.1.2.2. By Wavelength
10.3.1.2.3. By Device Wavelength
10.3.1.2.4. By End User
10.3.1.2.5. By Application
10.3.2. Argentina Photolithography Equipment Market Outlook
10.3.2.1. Market Size & Forecast
10.3.2.1.1 By Value
10.3.2.2. Market Share & Forecast
10.3.2.2.1. By Type
10.3.2.2.2. By Wavelength
10.3.2.2.3. By Device Wavelength
10.3.2.2.4. By End User

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Table of Contents
S. No. Contents Page No.
10.3.2.2.5. By Application
10.3.3. Colombia Photolithography Equipment Market Outlook
10.3.3.1. Market Size & Forecast
10.3.3.1.1 By Value
10.3.3.2. Market Share & Forecast
10.3.3.2.1. By Type
10.3.2.2.2. By Wavelength
10.3.2.2.3. By Device Wavelength
10.3.2.2.4. By End User
10.3.3.2.5. By Application
11. Middle East & Africa Photolithography Equipment Market Outlook
11.1. Market Size & Forecast
11.1.1. By Value
11.2. Market Share & Forecast
11.2.1. By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
11.2.2. By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
11.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced
Plasma)
11.2.4. By End-Use (IDMs, Foundries)
11.2.5. By Application (Front End, Back End)
11.2.7. By Country
11.3. Middle East & Africa : Country Analysis

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Table of Contents
S. No. Contents Page No.
11.3.1. South Africa Photolithography Equipment Market Outlook
11.3.1.1. Market Size & Forecast
11.3.1.1.1. By Value
11.3.1.2. Market Share & Forecast
11.3.1.2.1. By Type
11.3.1.2.2. By Wavelength
11.3.1.2.3. By Device Wavelength
11.3.1.2.4. By End User
11.3.1.2.5. By Application
11.3.2. Saudi Arabia Photolithography Equipment Market Outlook
11.3.2.1. Market Size & Forecast
11.3.2.1.1. By Value
11.3.2.2. Market Share & Forecast
11.3.2.2.1. By Type
11.3.2.2.2. By Wavelength
11.3.2.2.3. By Device Wavelength
11.3.2.2.4. By End User
11.3.2.2.5. By Application
11.3.3. UAE Photolithography Equipment Market Outlook
11.3.3.1. Market Size & Forecast
11.3.3.1.1. By Value

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Table of Contents
S. No. Contents Page No.
11.3.3.2. Market Share & Forecast
11.3.3.2.1. By Type
11.3.3.2.2. By Wavelength
11.3.3.2.3. By Device Wavelength
11.3.3.2.4. By End User
11.3.3.2.5. By Application
12. Market Dynamics (This chapter assesses the major demand drivers and restraints.)
12.1. Drivers
12.2. Challenges
13.
Market Trends & Developments (This section captures recent trends pertaining to manufacturing or
consumption, market movements in terms of points of production and consumption, advancements and
development)
14. Competitive Landscape
14.1. Company details
14.2. Financials (As Reported)
14.3. Product & Services
14.4. Key market focus and geographical presence
14.5. Expansion Strategies
14.6. Key Management Personnel
15.
Strategic Recommendations (Based on the findings of the report strategic recommendations on how to enter and expand
market share)
16. About Us & Disclaimer

16. RESEARCH
METHODOLOGY

17. 17
Research Methodology
 Identifying Key Opinion
Leaders
 Questionnaire Design
 In-depth Interviews
Data
Collection
Developing List
of Respondents
Formulating
Questionnaire
Market
Profiling
Data
Validation
Data
Analysis
In-depth secondary
research was conducted to
determine top players in
the global
photolithography
equipment market, overall
market size and segmental
market size.
In order to conduct
industry experts’
interviews, TechSci
formulated a detailed
discussion guide.
List of industry
players and industry
specialists was
developed.
TechSci conducted
interviews with
industry experts and
industry players for
data collection and
verification.
Data obtained as a
result of primary
and secondary
research was
validated through
rigorous
triangulation.
The data was scrutinized
using MS-Excel, statistical
tools and internal
proprietary database to
obtain qualitative and
quantitative insights about
the global photolithography
equipment market.
Data
Collection
Data Filter
& Analysis
Research &
Intelligence
Actionable
Insights
Business
Solution
Primary Research Desk Research Company Analysis
 Recent Developments
 Market Changing
Aspects/Dynamics
 Government Policies
 Final Conclusion
 Market Participants
 Key Strengths
 LinkedIn
 TechSci Internal
Database
 Factiva
 Hoovers
Paid Sources
 Company Websites
 Company Annual
Reports
 White Paper Study
 Financial Reports
 Investor
Presentations
 Regulatory Body
 Associations, etc.
Secondary
Research
Primary Research

18. 18
Research Methodology
Baseline Methodology
Our dedicated team of industry experts has monitored and analyzed various aspects of the global photolithography equipment market.
segments of this market, while considering the major influencing factors such as growing demand from the semiconductor market. The
enable our clients to take better decisions while planning their strategy to achieve sustainability in the global photolithography
Methodology Followed for Calculation of Market Size:
• Market Size By Value: Market size, in terms of Value, for the year 2020 was calculated based on information collected through
exhaustive secondary research and primary surveys, with various key opinion leaders/stakeholders, such as as photolithography
influencers & end users, industry experts, and other industry participants.
• The team interviewed more than 15 – 20 as photolithography equipment companies, 45 – 50 channel partners, 80 – 100 end users,
chain stakeholders in the global photolithography equipment market to obtain the overall market size for 2016-2020, which was
deviation into consideration, the market size was averaged out, to arrive at the market size data during 2016-2020.

19. 19
Research Methodology
• Respondents were asked about the current and future market growth rates, market shares by type, by wavelength, by device wavelength, by end use, by application, by each region
and by company. Removing the outlier responses, the geometric mean of growth estimates and supplier wise revenue shares generated across various segments were considered,
to arrive at the final revenue shares. Revenue shares generated across various segments were further triangulated from other stakeholders.
Methodology Followed for Calculation of Market Shares:
Market shares by type, by wavelength, by device wavelength, by end use, by application, by each region and by company were calculated based on the responses received through
primary surveys with industry experts, in which the respondents were asked about the market shares or revenue generated from various segments of global photolithography equipment
market. The final shares were calculated by taking the geometric mean of the responses gathered from key opinion leaders after eliminating the outliers.
Methodology Followed for Forecasting:
• TechSci Research performed periodical checks on data collected through the surveys with logic checks and analyzed the survey results in SPSS/Tableau Software.
• Data triangulation techniques were applied to fill the gaps and to present a more meaningful picture of the market. To forecast global photolithography equipment market, TechSci
Research used various forecast techniques such as:
 Moving Average
 Time Series Analysis
 Regression Analysis
 Econometric and Judgmental Analysis

20. 20
Research Methodology
TechSci Research used its own forecast tool, which is based on the growth of various allied industries in respective regions. TechSci Research also used the impact analysis during
short, medium and long term period to estimate the demand and to reach accurate market numbers. It should be noted that the figures compiled are only for the organized market
including market share data.
Partial List of Companies Interviewed Key Secondary Sources
 ASML Holding N.V.
 Canon Inc.
 Eolith AG
 EV Group
 GlobalFoundries Inc.
 World Bank
 TechSci Research Proprietary Database & Knowledge Repository
 Company Annual Reports
 Industry Magazines
 Industry Reports
 News Dailies
 Credible Paid Databases

21. 21
Industry Brief
According to TechSci Research report, “Global Photolithography Equipment Market By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), I-line, ArF
(Argon fluoride), ArFi (Argon fluoride immersion), KrF (Krypton fluoride)), By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm), By Device Wavelength
(Mercury Lamps, Flourine Lamps, Excimer Lasers, Lased Produced Plasma), By End-Use (IDMs (Integrated Device Manufacturer), Foundries), By Application
(Front End, Back End), By Region, Competition, Forecast & Opportunities, 2026”, Global photolithography equipment market was valued at USD11.26 billion in
2020 and is projected to grow at a CAGR of around 8.56% during the forecast period, owing to the mounting demands of IC chips from the semiconductor
industry, budding adoption of digital distribution, high demand from IoT sector, and increased government support for carrying out these advancements.
Additionally, expansion in the demand from the semiconductor market and requirement in the IT and automobile sector is also expected to drive the market. To
meet the rising technological demands across the globe, ASML has been a continuous market leader for the past ten years and the company proves to be a
boon for the photolithography equipment market on the account of its high reliability. However, high manufacturing and R&D costs and costs for equipment, raw
material, maintenance, facilities, and labor charges can hamper the growth of the market. Additionally, market manufacturers rely on raw materials and labor for
efficient production so process overheads can further restrict the evolution of the market. The global photolithography equipment market is segmented based on
Type, Wavelength, Device Wavelength, End-Use, Application, Region, and Company. Based on region, the market can be fragmented into Asia Pacific, Europe,
North America, South America, and Middle East & Africa. Europe contributes the highest share of 35.99% in the market and is expected to grow at a significant
pace on account of its high technological ventures’ new user engagement and because of high consumer demands.
Based on wavelength, the market can be divided into 370nm-270nm, 270-170nm,170-1nm. The 170nm-1nm segment dominates the market with a share of
41.27% in 2020, primarily due to its special feature that can implement structures minutely with full accuracy and precision and due to the increasing number of
smartphones and PCs, etc., as photolithography is used when it comes to the production of IC chips. Based on device wavelength, the market can be
apportioned into Mercury Lamps, Flourine Lamps, Excimer Lasers, Laser Produced Plasma. The Laser produced plasma segment dominates the market with a
share of 36.42% in 2020 due to its firing high-intensity beams of light, and because they have been used to create short bursts of x-rays to accelerate particles
which are called plasma-based accelerators. Based on end-use, the market can be split up into IDMs, and Foundries. The IDM segment dominates the market
with a share of 54.99% in 2020 as they perform both the functions, design as well as manufacture the IC chips. Based on application, the market can be
apportioned into Front-end and Back-end. The Front-end segment dominates the market with a share of 51.73% in 2020 because in the frontend type, the
construction of the components of the IC is directly done inside the wafer without covering the wafer, which makes the pattern more precise.
ASML, Canon, Nikon, EV Group, Global Foundries, Eulithia AG are some of the leading players which are operating in the global photolithography equipment
market. ASML here plays a role of a monopoly market contributing to the highest share of 91.6% in the market with its major customers being Samsung, Intel,
and TSMC. ASML has been the key market player for the past 10 years and is expected to lead the market in the future as well on account of its high reliability
and importer satisfaction. These companies are launching highly reliable, photolithography techniques with progressive instruction sets, technologically
advanced light beam techniques with high frequency, accuracy, and precision. The companies operating in the market are using organic strategies such as new
product launches and merges & collaborations to boost their shares in the market and meet consumer demands.
“Global photolithography equipment market is anticipated to grow at a significant pace during the forecast period due to the increasing technological
advancements, new customer engagement, need of semiconductor IC chips in numerous sectors, increased government investments for photolithography
equipment.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research based global management consulting firm.

22. 22
Sample Data - Snapshot
5.00 6.00 7.00 8.00 9.00 10.00 11.00 12.00 13.00 14.00 15.00
2016 2020 2021E 2026F
2016
2020 2021E
2026F
Global Photolithography Equipment Market Size, By Value (USD Million), 2016–2026F
CAGR By Value
XX%
CAGR By Value
YY%
Europe Photolithography Equipment Market Share, By Type, By Value, 2016–2026F
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
25%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
20%
20%
20%
20%
20%
20%
20%
20%
20%
20%
20%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
10%
2016
2017
2018
2019
2020
2021E
2022F
2023F
2024F
2025F
2026F
EUV DUV I-line ArF ArFi KrF
Germany Photolithography Equipment Market Share, By Wavelength, By Value, 2016–2026F
30%
30%
30%
30%
30%
30%
30%
30%
30%
30%
30%
40%
40%
40%
40%
40%
40%
40%
40%
40%
40%
40%
30%
30%
30%
30%
30%
30%
30%
30%
30%
30%
30%
2016
2017
2018
2019
2020
2021E
2022F
2023F
2024F
2025F
2026F
370nm-270nm 270nm-170nm 170nm-1nm

23. 23
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Report Name: GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET
FORECAST & OPPORTUNITIES
2016 – 2026
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24. About Us & Disclaimer
TechSci Research is a global market research and consulting company with offices in the US, UK and India. TechSci Research provides market research reports in
number of areas to organizations. The company uses innovative business models that focus on improving productivity, while ensuring creation of high-quality
analyses of both industry-specific and macroeconomic variables on a state-by-state basis to produce a unique ‘bottom-up’ model of a country, regional and global
company activity and industry trends, the result is a uniquely rich evaluation of the opportunities available in the market.
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accurate or complete. TechSci Research has taken due care and caution in compilation of data as this has been obtained from various sources including which it
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