SlideShare a Scribd company logo
Xuan (Cher) Zhang
TEL: 615-975-8864 xuan.zhang@vanderbilt.edu
Skills Summary
Familiar with LCR meter, Keithley® and HP parameter analyzer Agilent 4156, 4140, 1/f noise measurement
system, PNA RF Network analyzer, wire bonder for packaging devices, probe station and Raman spectroscopy.
 Wafer-level/device-level characterization
 Sentaurus TCAD device modeling
 Automated data acquisition by Python
coding
 Low frequency flicker-noise noise
characterization
 High frequency RF testing
 Bias-temperature instabilities
Highlights
 Extensive hands-on project experience involving semiconductor characterization (IV/CV) using Python
coding
 Experience on sentaurus TCAD simulation of semiconductor device
 Experience working with commercial semiconductor companies, ie. Cree Inc., TriQuint Inc.
 Strong background in semiconductor device physics and semiconductor technology
 Outstanding communication skill and strong organizational skills
Research Experience
Postdoctoral Research Scholar 2013/05 – 2015/08
Reliability and Radiation Effects Group, EECS Department, Nashville, TN
• Obtained significant insights into radiation effects and reliability issues on 2-D materials and devices
(graphene non-volatile memory, carbon-nanotube memory devices, IGZO and MoS2 transistors)
• Set up python-coded automatic measurement system with HP parameter analyzer Agilent 4156 and
E5810A gateway
• High frequency RF testing on GaN HEMTs using PNA RF Network analyzer with high-speed packages
• Experience with both wafer-level probing and device wire-bonding package tests
Research Assistant 2009/06 - 2013/05
Reliability and Radiation Effects Group, EECS Department, Nashville, TN
• Set up low frequency 1/f noise system and identified the dominant defects that responsible for
low-frequency noise and interface traps in 4H-SiC MOSFETs
• Demonstrated a model for the interface of SiC/SiO2 through both sentaurus TCAD simulation and 1/f
noise measurements
• Completed an extensive investigation of bias-temperature instabilities on 4H-SiC MOS devices
• Analyzed the effects of halo implant doses and the number of Si monolayers on the reliability of Ge
pMOSFETs
• Investigated junction leakage current in X-ray irradiated Ge pMOSFETs
Education
 Doctor of Philosophy in Electrical Engineering, Vanderbilt University, May 2013
Dissertation Title: Reliability and Irradiation Effects of 4H-SiC MOS Devices
 Master of Science in Electrical Engineering, Vanderbilt University, May 2011
Thesis Title: Total Ionizing Dose Radiation Effects on Germanium pMOS Devices
Awards
 Co-authored paper won “NSREC 2013 Outstanding Conference Paper Award” & “Outstanding
Student Paper Award”
 In recognition of outstanding performance as a graduate student performing research in NPSS
2012 IEEE NPSS Graduate Scholarship Award & 2012 Paul Phelps Continuing Education Grant
Selected Publications
1. C. X. Zhang, E. X. Zhang, S. A. Francis, T. Roy, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S.-H. Ryu, X. Shen, S. T.
Pantelides, “Temperature dependence and post-irradiation annealing response of the 1/f noise of 4H-SiC MOSFETs,”
IEEE Trans. Electron Dev., vol. 60, no. 7, pp. 2361-2367, July 2013.
2. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S.-H. Ryu, X. Shen, S. T. Pantelides, “Origin of
low-frequency noise and interface traps in 4H-SiC MOSFETs,” IEEE Electron Dev. Lett., vol. 34, no. 1, pp. 117-119, Jan.
2013.
3. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, E. B. Song, S. M. Kim, K. Galatsis, K. L. Wang,
“Electrical stress and total ionizing dose effects on Graphene-based non-volatile memory devices,” IEEE Trans. Nucl. Sci.,
vol. 59, no. 6, pp. 2974-2978, Aug. 2012.
4. C. X. Zhang, S. A. Francis, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, K. F. Galloway, E. Simoen, J. Mitard, and C.
Claeys, “Effects of ionizing radiation on defects and 1/f noise in Ge pMOSFETs,” IEEE Trans. Nucl. Sci., vol. 58, no. 3,
pp. 764-769, June 2011.
5. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S. H. Ryu, X. Shen, and S. T. Pantelides, “Effects
of bias on the irradiation and annealing responses of 4H-SiC MOS devices,” IEEE Trans. Nucl. Sci., vol. 58, no. 6, pp.
2925-2929, Dec. 2011.
6. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, K. F. Galloway, E. Simoen, J. Mitard, and C. Claeys,
“Effects of processing and radiation bias on leakage currents in Ge pMOSFETs,” IEEE Trans. Nucl. Sci., vol. 57, no. 6, pp.
3066-3070, Dec. 2010.
7. C. X. Zhang, A.K.M. Newaz, B. Wang, E. X. Zhang, G. X. Duan, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, K. I.
Bolotin, S. T. Pantelides, “Electrical stress and total ionizing dose effects on MoS2 transistors,” IEEE Trans. Nucl. Sci.,
vol. 61, no. 6, pp. 2862-2867, Dec. 2014.
8. C. X. Zhang, B. Wang, G. X. Duan, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, K. Khestanova, G.
Auton, R. V. Gorbachev, S. J. Haigh, S. T. Pantelides, “Total ionizing dose effects on encapsulated graphene-hBN
devices,” IEEE Trans. Nucl. Sci., vol. 51, no. 6, pp. 2868-2873, Dec. 2014.
9. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, C. Rutherglen, K. Galatsis, “Total ionizing dose
effects and reliability of carbon nanotube FET devices,” Microelectronics Reliability, vol. 54, no. 11, Nov. 2014.
Presentations
1. Cher Xuan Zhang, et al., “Effects of processing and radiation bias on leakage currents in Ge pMOSFETs,” poster
presentation, IEEE NSREC, Denver, CO, July 2010.
2. Cher Xuan Zhang, et al., “Effects of ionizing radiation on defects and 1/f noise in Ge pMOSFETs,” oral presentation,
RADECS, Austria, 2010.
3. Cher Xuan Zhang, et al., “Effects of bias on the irradiation and annealing responses of 4H-SiC MOS devices,” oral
presentation, IEEE NSREC, Las Vegas, NV, July 2011.
4. Cher Xuan Zhang, et al., “Total ionizing dose effects on graphene-based non-volatile memory devices,” oral
presentation, IEEE NSREC, Miami, FL, July 2012.
5. Cher Xuan Zhang, et al., “Total ionizing dose effects and reliability on graphene-based non-volatile memory
(NVM),” oral presentation, IEEE Aerospace conference, Big sky, MT, Mar. 2013.

More Related Content

Similar to cher_2

Eldad CV August 2016
Eldad CV August 2016Eldad CV August 2016
Eldad CV August 2016Eldad Peretz
 
Resume_Hui_Zhang_Rice_University
Resume_Hui_Zhang_Rice_UniversityResume_Hui_Zhang_Rice_University
Resume_Hui_Zhang_Rice_UniversityHui Zhang
 
Neetesh1
Neetesh1Neetesh1
Neetesh1
Ashish Duvey
 
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
Louwrens van Schalkwyk
 
2017 International Electrostatic Discharge Workshop
2017 International Electrostatic Discharge Workshop2017 International Electrostatic Discharge Workshop
2017 International Electrostatic Discharge Workshop
EOS/ESD Association
 
Joint DoA and Offset Frequency estimator
Joint DoA and Offset Frequency estimatorJoint DoA and Offset Frequency estimator
Joint DoA and Offset Frequency estimator
Jason Fernandes
 
Business World
Business WorldBusiness World
Business World
Kristi Anderson
 
Curriculum_Vitae_Final Version_2015_10_12
Curriculum_Vitae_Final Version_2015_10_12Curriculum_Vitae_Final Version_2015_10_12
Curriculum_Vitae_Final Version_2015_10_12SangHoon Shin
 
Askar Syrlybekov's updated CV
Askar Syrlybekov's updated CVAskar Syrlybekov's updated CV
Askar Syrlybekov's updated CVAskar Syrlybekov
 

Similar to cher_2 (20)

JingLi_Resume
JingLi_ResumeJingLi_Resume
JingLi_Resume
 
Resume_RBFe
Resume_RBFeResume_RBFe
Resume_RBFe
 
1604DrydenCV
1604DrydenCV1604DrydenCV
1604DrydenCV
 
CV-JaebumPark
CV-JaebumParkCV-JaebumPark
CV-JaebumPark
 
Eldad CV August 2016
Eldad CV August 2016Eldad CV August 2016
Eldad CV August 2016
 
Resume_Hui_Zhang_Rice_University
Resume_Hui_Zhang_Rice_UniversityResume_Hui_Zhang_Rice_University
Resume_Hui_Zhang_Rice_University
 
C.V Dr sabah M thahah
C.V  Dr sabah M thahah C.V  Dr sabah M thahah
C.V Dr sabah M thahah
 
Neetesh1
Neetesh1Neetesh1
Neetesh1
 
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
Development and characterization of a tuneable AlGaN-based solar-blind UV-sen...
 
2017 International Electrostatic Discharge Workshop
2017 International Electrostatic Discharge Workshop2017 International Electrostatic Discharge Workshop
2017 International Electrostatic Discharge Workshop
 
Ryan Stillwell CV
Ryan Stillwell CVRyan Stillwell CV
Ryan Stillwell CV
 
Joint DoA and Offset Frequency estimator
Joint DoA and Offset Frequency estimatorJoint DoA and Offset Frequency estimator
Joint DoA and Offset Frequency estimator
 
Business World
Business WorldBusiness World
Business World
 
Curriculum_Vitae_Final Version_2015_10_12
Curriculum_Vitae_Final Version_2015_10_12Curriculum_Vitae_Final Version_2015_10_12
Curriculum_Vitae_Final Version_2015_10_12
 
GiacomettiResume
GiacomettiResumeGiacomettiResume
GiacomettiResume
 
CVSingh_R
CVSingh_RCVSingh_R
CVSingh_R
 
BonnieEWeir_CV
BonnieEWeir_CVBonnieEWeir_CV
BonnieEWeir_CV
 
Muhammad_Alam_CV
Muhammad_Alam_CVMuhammad_Alam_CV
Muhammad_Alam_CV
 
ECT2
ECT2ECT2
ECT2
 
Askar Syrlybekov's updated CV
Askar Syrlybekov's updated CVAskar Syrlybekov's updated CV
Askar Syrlybekov's updated CV
 

cher_2

  • 1. Xuan (Cher) Zhang TEL: 615-975-8864 xuan.zhang@vanderbilt.edu Skills Summary Familiar with LCR meter, Keithley® and HP parameter analyzer Agilent 4156, 4140, 1/f noise measurement system, PNA RF Network analyzer, wire bonder for packaging devices, probe station and Raman spectroscopy.  Wafer-level/device-level characterization  Sentaurus TCAD device modeling  Automated data acquisition by Python coding  Low frequency flicker-noise noise characterization  High frequency RF testing  Bias-temperature instabilities Highlights  Extensive hands-on project experience involving semiconductor characterization (IV/CV) using Python coding  Experience on sentaurus TCAD simulation of semiconductor device  Experience working with commercial semiconductor companies, ie. Cree Inc., TriQuint Inc.  Strong background in semiconductor device physics and semiconductor technology  Outstanding communication skill and strong organizational skills Research Experience Postdoctoral Research Scholar 2013/05 – 2015/08 Reliability and Radiation Effects Group, EECS Department, Nashville, TN • Obtained significant insights into radiation effects and reliability issues on 2-D materials and devices (graphene non-volatile memory, carbon-nanotube memory devices, IGZO and MoS2 transistors) • Set up python-coded automatic measurement system with HP parameter analyzer Agilent 4156 and E5810A gateway • High frequency RF testing on GaN HEMTs using PNA RF Network analyzer with high-speed packages • Experience with both wafer-level probing and device wire-bonding package tests Research Assistant 2009/06 - 2013/05 Reliability and Radiation Effects Group, EECS Department, Nashville, TN • Set up low frequency 1/f noise system and identified the dominant defects that responsible for low-frequency noise and interface traps in 4H-SiC MOSFETs • Demonstrated a model for the interface of SiC/SiO2 through both sentaurus TCAD simulation and 1/f noise measurements • Completed an extensive investigation of bias-temperature instabilities on 4H-SiC MOS devices • Analyzed the effects of halo implant doses and the number of Si monolayers on the reliability of Ge pMOSFETs • Investigated junction leakage current in X-ray irradiated Ge pMOSFETs Education  Doctor of Philosophy in Electrical Engineering, Vanderbilt University, May 2013 Dissertation Title: Reliability and Irradiation Effects of 4H-SiC MOS Devices  Master of Science in Electrical Engineering, Vanderbilt University, May 2011 Thesis Title: Total Ionizing Dose Radiation Effects on Germanium pMOS Devices Awards  Co-authored paper won “NSREC 2013 Outstanding Conference Paper Award” & “Outstanding Student Paper Award”  In recognition of outstanding performance as a graduate student performing research in NPSS
  • 2. 2012 IEEE NPSS Graduate Scholarship Award & 2012 Paul Phelps Continuing Education Grant Selected Publications 1. C. X. Zhang, E. X. Zhang, S. A. Francis, T. Roy, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S.-H. Ryu, X. Shen, S. T. Pantelides, “Temperature dependence and post-irradiation annealing response of the 1/f noise of 4H-SiC MOSFETs,” IEEE Trans. Electron Dev., vol. 60, no. 7, pp. 2361-2367, July 2013. 2. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S.-H. Ryu, X. Shen, S. T. Pantelides, “Origin of low-frequency noise and interface traps in 4H-SiC MOSFETs,” IEEE Electron Dev. Lett., vol. 34, no. 1, pp. 117-119, Jan. 2013. 3. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, E. B. Song, S. M. Kim, K. Galatsis, K. L. Wang, “Electrical stress and total ionizing dose effects on Graphene-based non-volatile memory devices,” IEEE Trans. Nucl. Sci., vol. 59, no. 6, pp. 2974-2978, Aug. 2012. 4. C. X. Zhang, S. A. Francis, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, K. F. Galloway, E. Simoen, J. Mitard, and C. Claeys, “Effects of ionizing radiation on defects and 1/f noise in Ge pMOSFETs,” IEEE Trans. Nucl. Sci., vol. 58, no. 3, pp. 764-769, June 2011. 5. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, S. Dhar, S. H. Ryu, X. Shen, and S. T. Pantelides, “Effects of bias on the irradiation and annealing responses of 4H-SiC MOS devices,” IEEE Trans. Nucl. Sci., vol. 58, no. 6, pp. 2925-2929, Dec. 2011. 6. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, R. D. Schrimpf, K. F. Galloway, E. Simoen, J. Mitard, and C. Claeys, “Effects of processing and radiation bias on leakage currents in Ge pMOSFETs,” IEEE Trans. Nucl. Sci., vol. 57, no. 6, pp. 3066-3070, Dec. 2010. 7. C. X. Zhang, A.K.M. Newaz, B. Wang, E. X. Zhang, G. X. Duan, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, K. I. Bolotin, S. T. Pantelides, “Electrical stress and total ionizing dose effects on MoS2 transistors,” IEEE Trans. Nucl. Sci., vol. 61, no. 6, pp. 2862-2867, Dec. 2014. 8. C. X. Zhang, B. Wang, G. X. Duan, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, K. Khestanova, G. Auton, R. V. Gorbachev, S. J. Haigh, S. T. Pantelides, “Total ionizing dose effects on encapsulated graphene-hBN devices,” IEEE Trans. Nucl. Sci., vol. 51, no. 6, pp. 2868-2873, Dec. 2014. 9. C. X. Zhang, E. X. Zhang, D. M. Fleetwood, M. L. Alles, R. D. Schrimpf, C. Rutherglen, K. Galatsis, “Total ionizing dose effects and reliability of carbon nanotube FET devices,” Microelectronics Reliability, vol. 54, no. 11, Nov. 2014. Presentations 1. Cher Xuan Zhang, et al., “Effects of processing and radiation bias on leakage currents in Ge pMOSFETs,” poster presentation, IEEE NSREC, Denver, CO, July 2010. 2. Cher Xuan Zhang, et al., “Effects of ionizing radiation on defects and 1/f noise in Ge pMOSFETs,” oral presentation, RADECS, Austria, 2010. 3. Cher Xuan Zhang, et al., “Effects of bias on the irradiation and annealing responses of 4H-SiC MOS devices,” oral presentation, IEEE NSREC, Las Vegas, NV, July 2011. 4. Cher Xuan Zhang, et al., “Total ionizing dose effects on graphene-based non-volatile memory devices,” oral presentation, IEEE NSREC, Miami, FL, July 2012. 5. Cher Xuan Zhang, et al., “Total ionizing dose effects and reliability on graphene-based non-volatile memory (NVM),” oral presentation, IEEE Aerospace conference, Big sky, MT, Mar. 2013.