The document describes the AccuSputter AW 4450 sputtering deposition system from Perkin-Elmer. It is a brand new system rebuilt with an advanced control system including a touch screen and computer. It features new electronic components, DC control systems, motors, vacuum and gas controls, and an RF generator for high rate sputtering of aluminum and alloys at over 1800 angstroms per minute. The automated system provides high throughput and uniformity of +/-7% for wafer processing.

1. AccuSputter AW 4450-Brand New Perkin-Elmer Sputtering System Page 1 of 73
20 Years Proven True
"Work Horse" Sputter
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Sputtering Equipment AccuSputter AW 4450 Sputtering Deposition Systems-
Brand New
AccuSputter AW 4450 - Brand New
We rebuild brand new AccuSputter AW 4450 Series
Perkin-Elmer 4480 Sputtering Systems with our comparable integrated process
control system with PC, new electronic components to
Perkin-ELmer 4450 achieve the goal of giving our customers a production edge
with right cost.
Perkin-ELmer 4410
AccuSputter AW 4450 Sputtering System Highlights:
Perkin-ELmer 4400
Perkin-ELmer 2400-8SA z NEW Aadvanced Control System including
Perkin-Elmer 2400-8L Touch screen, Computer, proprietary
software package AW 4450 with GUI
z NEW Password control for various levels of
user access.
z NEW Manual, Semi-Automatic and Full-
Automatic one button system operation.
z NEWCustomer programming of recipe for
process parameters.
z NEW Process parameters recorded on
system computer.
z NEW Optional GEM/SECS II functions.
z NEW 24V DC control components instead of
orginal 110V AC control system
z NEW DC gear motors with encoder to run
table rotate/table up&down
z NEW DC gear motors run shutters/pallet
carriage moving
z NEW Vacuum gauge/vacuum control system
z NEW Gas control system
z NEW RF automatically matching network
z NEW DC power/RF generator are mounted in
the frame
z NEW Plumbing system
z NEW Cables/wires harness
z High rate delta DC magnetron sputtering:
Aluminum and aluminum alloys can be
sputter deposited at rates in excess of
1800 ? /min, with loads of thirty 3-inch or
thirteen 4-inch wafers.
z High throughput operation: Automated load
lock and controller sequences provide for
efficient pump-down and pallet transfer to
process chamber, maximizing throughput.
z High uniformity: +/-7% deposition uniformity
http://www.perkin-elmer-sputter.com/accusputter-aw-4450-sputter-system.htm 12/14/2012