The simulation results and the measurement results from a hydrogen plasma in an organic low-K etching reactor are compared. Experimental conditions: - Pressure 5 [Pa] (Fixed at outlet) - Power electrode Vrf=200 [V] ; frequency 60[MHz] - Vdc: Automatically calculated - Flow rate 200[sccm] - Species to be considered H2, H, e-, H+, H2+, H3+, H- - Reactions on the wall H -> 1/2 H2 (Metal surface 15% Insulator surface 7%)

1. Copyright 2002-2013 PEGASUS Software Inc., All rights reserved. 1
Plasma Enhanced materials processing and
rarefied GAS dynamics Unified Simulation tools
P E G A S U S

2. Copyright 2002-2013 PEGASUS Software Inc., All rights reserved. 2
CCP
Hydrogen plasma simulation
Modules ： PIC-MCCM
NMEM

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Purpose
The simulation result and the measurement result in Prof. Hori Lab.
of Nagoya University of the hydrogen plasma in a organic low-K
etching reactor are compared.

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Computational model
V(t)=Vdc + Vrf*sin(2πf t)
Metal
（Ground）
Insulator εr=4.5
Insulator εr=4.5
Outlet
5Pa
～
H2 inlet
Power electrode
Axial
symmetry
30mm
R 167mm
Wall

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Computational conditions
・Pressure 5 [Pa] （Fixed at outlet）
・Power electrode Vrf=200 [V] ; frequency 60[MHz]
・Vdc: Automatically calculated
・Flow rate 200[sccm]
・Species to be considered
H2, H, e-, H+, H2
+, H3
+, H-
・Reactions on the wall
H  1/2H2 （Metal surface 15% Insulator surface 7%）

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Number density
(electron, ions, Hydrogen atom)
e- density[/m3] H+
density[/m3] H2
+
density[/m3]
H3
+
density[/m3] H-
density[/m3] H density[/m3]

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Electron temperature, Electric potential,
Gas pressure, Flow velocity, and H flux
e- temperature[eV] electric potential[V] gas pressure [Pa]
gas velocity [m/sec] H flux [/m2
/sec]

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Simulation result compared with experiment
quantity Simulation(*) experiment
Electron density [/cm3] 1.44E10 1.6E10
H+ density [/cm3] 3.43E8 -
H2
+ density [/cm3] 3.45E9 -
H3
+ density [/cm3] 1.07E10 -
H－ density [/cm3] 1.29E7 -
H density [/cm3] 1.13E13 2.0E13
Electron temperature [eV] 5.17 6.8
Vdc [V] -112 -114
（*）These are mean values over radial direction at the center
of electrodes.