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Merck KGaA
Darmstadt, Germany
Process Development for
Continuous Flow Through
mAb Purification
Meghan Higson, Junyan Zhang, Jeff Barna, Sandeep Mora
The life science business of
Merck KGaA, Darmstadt, Germany
operates as MilliporeSigma
in the U.S. and Canada.
0
0
0Agenda
Flow Through Polishing:
Value Proposition1
Process Development:
The Need to Think Holistically2
A Robust Flow Through Process:
The Importance of CEX3
0
0
0Agenda
Flow Through Polishing:
Value Proposition1
Process Development:
The Need to Think Holistically2
A Robust Flow Through Process:
The Importance of CEX3
Evolutionary Adoption
Business Drivers → Facility-of-the-Future (FoF)
5
Process Batch Intensified Connected Continuous
Format Stainless Steel Hybrid Single-Use
Single-Use
Closed/Sterile
Process Continuum
Process
Analytics
QC Methods
At-Line
On-Line
In-Line
Real Time
Release
Control Unit Op Process Facility
Predictive
Autonomous
Digital Plant Paper-Based Digital Silos Connected Plant
Fully Digital
Adaptive
PAT Continuum
Digital Continuum
Today
Facility of
Future
Current Process
Standard mAb Batch Process
Bioreactor Clarification Affinity
Chrom
Virus
Inactivation
CEX Bind and
Elute
Flow Through AEX Viral
Clearance
Final
Filtration
Concentration &
Diafiltration
Depth
Filtration
Seed TrainInoc Train
Batch
Production Capture VI Polishing UF/DFSeed Train
14.4%
36.9%
13.6%
2.1%
24.7%
8.2%
0
50
100
150
Thousands$
Other
Labor
Consumables
Materials
Capital
Representative Process Economics of mAb Batch Process
Facility-of-the-Future
Batch → Intensified → Connected → Continuous
Bioreactor Clarification Affinity
Chrom
Virus
Inactivation
CEX Bind and
Elute
Flow Through AEX Viral
Clearance
Final
Filtration
Concentration &
Diafiltration
Depth
Filtration
Seed TrainInoc Train
BatchIntensified
Intensified
Seed Train
Intensified
Production
Intensified
Capture
In-Line
VI
Flow Through
Polishing
Continuous
UF/DF
Intensified Flow Through Polishing is a critical step to move towards a continuous process
Properly designed flow through toolbox capable
of delivering robust impurity clearance and high
product yield
Flow Through Polishing
Robust Performance
High monomer yield
▪ 85-95%
Efficient purification
▪ Aggregates: < 1%
▪ Fragments: up to 1 LRV
▪ HCP: < 10 ppm
Integrated process
▪ All flow through
▪ 2 pH changes, no product dilutions
Methodology
▪ Adjust Pro A pool to pH 7.0
▪ Challenge AC @ 0.5 kg/L
▪ Challenge AEX @ 3 kg/L
▪ Adjust pH to ~ 5.0
▪ Challenge CEX @ 0.5-1 kg/L
Activated Carbon Flow Through
CEX
Flow Through
AEX
Move to optimization of flow through condition
Low pH pool pH Adjust to 5 Virus Filter Pool
Properly designed flow-through toolbox capable
of delivering robust impurity clearance and high
product yield
Developed BioSolve Model for integrated flow
through polishing
Flow Through Polishing
Process Modeling
Activated Carbon Flow Through
CEX
Flow Through
AEX
Viral
Clearance
Bioreactor: 2k L fed-batch
Titer: 5 g/L Mab
Properly designed flow-through toolbox capable
of delivering robust impurity clearance and high
product yield
Developed BioSolve Model for integrated flow-
through polishing
Benefits:
1. COGs reduction of ~40%
Flow Through Polishing
Process Modeling
43% COGS reduction
Properly designed flow-through toolbox capable
of delivering robust impurity clearance and high
product yield
Developed BioSolve Model for integrated flow-
through polishing
Benefits:
1. COGs reduction of ~40%
2. Buffer reduction of ~80%
Flow Through Polishing
Process Modeling
Buffer L/g
Total Process Polishing only
Traditional 1.19 0.63
FT Polishing 0.64 0.08
Properly designed flow-through toolbox capable
of delivering robust impurity clearance and high
product yield
Developed BioSolve Model for integrated flow-
through polishing
Benefits:
1. COGs reduction of ~40%
2. Buffer reduction of ~80%
3. Processing time reduction of ~70%
Flow Through Polishing
Process Modeling
Toolbox Approach
Flow Through Polishing
Leached
Protein A
Aggregates
Virus
Host Cell DNA
Host Cell Protein
Others?
(Fragments,
Charge Variants)
Chemistries Matrices Devices
1
4 Flow Through Polishing
Existing Toolbox
▪ Eshmuno® CP-FT resin
Flow through aggregate removal at high
loading
5 – 10X buffer reduction
Easy implementation
Differentiated from existing CEX media
1
5 Flow Through Polishing
Existing Toolbox
▪ Eshmuno® CP-FT resin
Flow through aggregate removal at high loading
5 – 10X buffer reduction
Easy implementation
Differentiated from existing CEX media
▪ NatriFlo® HD-Q AEX membrane
Impurity clearance at high loading
High velocity operation (~1 sec RT)
▪ Eshmuno® Q resin: High viral and HCP clearance
NatriFlo® HD-Q AEX Membrane: HCP and Viral Clearance
0,0
1,0
2,0
3,0
4,0
5,0
6,0
0-150 151-300 301-450 451-600
MVMLogReductionValue(LRV)
Mass Loading ( g/L)
MVM removal using Eshmuno Q [pH 8.5, 5mS/cm]
Feed: 79g/L Post CEX SPTFF mAb02 pool
Device # 1
Device # 2Arrow denotes complete removal of MVM
1
6 Flow Through Polishing
Existing Toolbox
▪ Eshmuno® CP-FT resin
Flow through aggregate removal at high loading
5 – 10X buffer reduction
Easy implementation
Differentiated from existing CEX media
▪ NatriFlo® HD-Q AEX membrane
Impurity clearance at high loading
High velocity operation (~1 sec RT)
▪ Eshmuno® Q resin: High viral and HCP clearance
▪ Millistak+® Pod CR depth filter
Activated carbon media
Binding: van der Waals interactions
Size- and charge-based selectivity
Used in sensitive applications (oral poisoning,
food and beverage, pharmaceuticals,
hemoperfusion, etc.)
Impurity (MW) Capacity
Insulin 60 g/L
Methotrexate 75 g/L
Pluronic® F68
surfactant
75 g/L
Antifoam C > 16 g/L
17
Through the use of process
modeling significant improvements
identified with Flow Through
Polishing:
• COGs reduction of ~ 40% for flow-
through polishing process compared
to bind-elute template
• Significant footprint reduction
through reduced buffer volumes
(~80%) and hold tanks
• ~ 70% reduction in polishing
processing time with connected
flow through train
There is an evolution happening
in bioprocessing
• Focus on process intensification
to reduce COGs
A properly designed flow-through
polishing toolbox can robustly
remove protein A pool impurities:
• Chemistries that work
synergistically
• High capacity → small devices
Summary
0
0
0Agenda
Flow Through Polishing:
Value Proposition1
Process Development:
The Need to Think Holistically2
A Robust Flow Through Process:
The Importance of CEX3
Experimental Plan
Two-Step Process
Step 1: Scouting Step 2: Integration
Activated Carbon
Prototype Carbon
Eshmuno® Q Resin
Prototype AEX
Eshmuno® CP-FT Resin
Prototype CEX
CEX
CEX
Experimental Plan
Scouting
20
mAb Protein A elution pool
Mass Loading
(mg/mL)
pH Range
Conductivity
(mS/cm)
Column Size
(mL)
1000
4 – 8
4, 6
0.2
Carbon
200
6.5 – 8.5
4, 6
0.2
AEX
1000
4 – 6
4, 6, 10*, 15*
0.2/0.5
CEX
*Prototype CEX devices used were designed to work at higher conductivities; therefore higher ranges were also tested
Technology
comparison
Scouting Experiment – Technology Comparison
Activated Carbon vs. Prototype Carbon
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 23 mg/mL HCP: 700 ppm
mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm
YIELD:
mAb1:
- Results insensitive to conductivity
- Yield on Activated Carbon better than on Prototype Carbon
Scouting Experiment – Technology Comparison
Activated Carbon vs. Prototype Carbon
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 23 mg/mL HCP: 700 ppm
mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm
YIELD:
mAb1:
- Results insensitive to conductivity
- Yield on Activated Carbon better than on Prototype Carbon
mAb2:
- Insensitive to pH and conductivity for both technologies
Scouting Experiment – Technology Comparison
Activated Carbon vs. Prototype Carbon
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 23 mg/mL HCP: 700 ppm
mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm
YIELD:
mAb1:
- Results insensitive to conductivity
- Yield on Activated Carbon better than on Prototype Carbon
mAb2:
- Insensitive to pH and conductivity for both technologies
HCP Removal:
mAb1:
- pH dependent performance
- Better HCP clearance on Activated Carbon
Scouting Experiment – Technology Comparison
Activated Carbon vs. Prototype Carbon
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 23 mg/mL HCP: 700 ppm
mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm
YIELD:
mAb1:
- Results insensitive to conductivity
- Yield on Activated Carbon better than on Prototype Carbon
mAb2:
- Insensitive to pH and conductivity for both technologies
HCP Removal:
mAb1:
- pH dependent performance
- Better HCP clearance on Activated Carbon
mAb2:
- Both technologies insensitive to conductivity
- Activated Carbon more robust than Prototype Carbon
Scouting Experiment – Technology Comparison
Activated Carbon vs. Prototype Carbon
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 23 mg/mL HCP: 700 ppm
mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm
Summary:
▪ Both Carbon technologies gave high yield and
robust HCP clearance
▪ Activated Carbon performed better than Prototype
Carbon
YIELD:
mAb1:
- Results insensitive to conductivity
- Yield on Activated Carbon better than on Prototype Carbon
mAb2:
- Insensitive to pH and conductivity for both technologies
HCP Removal:
mAb1:
- pH dependent performance
- Better HCP clearance on Activated Carbon
mAb2:
- Both technologies insensitive to conductivity
- Activated Carbon more robust than Prototype Carbon
Scouting Experiment – Technology Comparison
Eshmuno® Q resin vs. Prototype AEX
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 17 mg/mL HCP: 3300 ppm
mAb2: Titer: 10 mg/mL HCP: 650 ppm
YIELD:
mAb1:
- Eshmuno® Q resin outperformed Prototype AEX
- Prototype AEX expected to have higher yield at higher loading
Scouting Experiment – Technology Comparison
Eshmuno® Q resin vs. Prototype AEX
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 17 mg/mL HCP: 3300 ppm
mAb2: Titer: 10 mg/mL HCP: 650 ppm
YIELD:
mAb1:
- Eshmuno® Q resin outperformed Prototype AEX
- Prototype AEX expected to have higher yield at higher loading
mAb2:
- Comparable results as seen with mAb1
- Eshmuno® Q resin had better yield with mAb2 than mAb1
Scouting Experiment – Technology Comparison
Eshmuno® Q resin vs. Prototype AEX
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 17 mg/mL HCP: 3300 ppm
mAb2: Titer: 10 mg/mL HCP: 650 ppm
YIELD:
mAb1:
- Eshmuno® Q resin outperformed Prototype AEX
- Prototype AEX expected to have higher yield at higher loading
mAb2:
- Comparable results as seen with mAb1
- Eshmuno® Q resin had better yield with mAb2 than mAb1
HCP Removal:
mAb1:
- Both technologies resulted in ~0.5 LRV HCP removal
Scouting Experiment – Technology Comparison
Eshmuno® Q resin vs. Prototype AEX
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 17 mg/mL HCP: 3300 ppm
mAb2: Titer: 10 mg/mL HCP: 650 ppm
YIELD:
mAb1:
- Eshmuno® Q resin outperformed Prototype AEX
- Prototype AEX expected to have higher yield at higher loading
mAb2:
- Comparable results as seen with mAb1
- Eshmuno® Q resin had better yield with mAb2 than mAb1
HCP Removal:
mAb1:
- Both technologies resulted in ~0.5 LRV HCP removal
mAb2:
- More robust HCP clearance
- HCP removal independent of conductivity
Scouting Experiment – Technology Comparison
Eshmuno® Q resin vs. Prototype AEX
Title of Presentation | DD.MM.YYYY
mAb1: Titer: 17 mg/mL HCP: 3300 ppm
mAb2: Titer: 10 mg/mL HCP: 650 ppm
Summary:
▪ Higher yield on Eshmuno® Q resin
▪ HCP clearance strong function of pH but
essentially independent of conductivity
YIELD:
mAb1:
- Eshmuno® Q resin outperformed Prototype AEX
- Prototype AEX expected to have higher yield at higher loading
mAb2:
- Comparable results as seen with mAb1
- Eshmuno® Q resin had better yield with mAb2 than mAb1
HCP Removal:
mAb1:
- Both technologies resulted in ~0.5 LRV HCP removal
mAb2:
- More robust HCP clearance
- HCP removal independent of conductivity
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
HCP Removal:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1:
- Robust HCP clearance over entire pH/conductivity window
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
HCP Removal:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1:
- Robust HCP clearance over entire pH/conductivity window
mAb2:
- HCP clearance strong function of pH
- HCP clearance independent of conductivity
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
HCP Removal:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1:
- Robust HCP clearance over entire pH/conductivity window
mAb2:
- HCP clearance strong function of pH
- HCP clearance independent of conductivity
Aggregate Removal:
mAb1:
- Higher aggregate removal at lower pH for Eshmuno® CP-FT resin
- Aggregate clearance optimized at higher conductivity for
Prototype CEX
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
HCP Removal:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1:
- Robust HCP clearance over entire pH/conductivity window
mAb2:
- HCP clearance strong function of pH
- HCP clearance independent of conductivity
Aggregate Removal:
mAb1:
- Higher aggregate removal at lower pH for Eshmuno® CP-FT resin
- Aggregate clearance optimized at higher conductivity for
Prototype CEX
mAb2:
- Eshmuno® CP-FT resin performance similar to that of mAb1
- Broad operating window with Prototype CEX
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Scouting Experiment – Technology Comparison
Eshmuno® CP-FT resin vs. Prototype CEX
Monomer Yield:
HCP Removal:
mAb2:
- Eshmuno® CP-FT resin has higher monomer yield at higher pH
- Prototype CEX able to achieve monomer yield >90% at
higher conductivities
mAb1:
- Robust HCP clearance over entire pH/conductivity window
mAb2:
- HCP clearance strong function of pH
- HCP clearance independent of conductivity
Aggregate Removal:
mAb1:
- Higher aggregate removal at lower pH for Eshmuno® CP-FT resin
- Aggregate clearance optimized at higher conductivity for
Prototype CEX
mAb2:
- Eshmuno® CP-FT resin performance similar to that of mAb1
- Broad operating window with Prototype CEX
mAb1: Titer: 17 mg/mL HCP: 650 ppm
Aggregates: 3%
mAb2: Titer: 10 mg/mL HCP: 3700 ppm
Aggregates: 3%
mAb1:
- Better performance with Eshmuno® CP-FT resin
Summary:
▪ Eshmuno® CP-FT resin achieved high yield and
robust HCP and aggregate removal
▪ Prototype CEX performs better at higher
conductivities
Molecule
comparison
Scouting Experiment – Molecule Comparison
mAb1 vs. mAb2
Title of Presentation | DD.MM.YYYY
mAb1 Starting HCP: 700 ppm
mAb2 Starting HCP: 650 ppm
Prototype Carbon – HCP Removal:
mAb1 vs. mAb2:
- Prototype Carbon has much better HCP removal for mAb1
Scouting Experiment – Molecule Comparison
mAb1 vs. mAb2
Title of Presentation | DD.MM.YYYY
mAb1 Starting HCP: 3300 ppm
mAb2 Starting HCP: 650 ppm
Prototype Carbon – HCP Removal:
mAb1 vs. mAb2:
- Prototype Carbon has much better HCP removal for mAb1
Prototype AEX – HCP Removal:
mAb1 vs. mAb2:
- Prototype AEX has broader operating window for mAb2
Scouting Experiment – Molecule Comparison
mAb1 vs. mAb2
Title of Presentation | DD.MM.YYYY
Prototype Carbon – HCP Removal:
mAb1 vs. mAb2:
- Prototype Carbon has much better HCP removal for mAb1
Prototype AEX – HCP Removal:
mAb1 vs. mAb2:
- Prototype AEX has broader operating window for mAb2
Prototype CEX – Aggregate Removal:
mAb1 vs. mAb2:
- Prototype CEX has a broader operating window for mAb2
mAb1 Starting Aggregate Level: 3%
mAb2 Starting Aggregate Level: 3%
Scouting Experiment – Molecule Comparison
mAb1 vs. mAb2
Title of Presentation | DD.MM.YYYY
Prototype Carbon – HCP Removal:
mAb1 vs. mAb2:
- Prototype Carbon has much better HCP removal for mAb1
Prototype AEX – HCP Removal:
mAb1 vs. mAb2:
- Prototype AEX has broader operating window for mAb2
Prototype CEX – Aggregate Removal:
mAb1 vs. mAb2:
- Prototype CEX has a broader operating window for mAb2
Summary:
▪ Optimal conditions are molecule dependent
mAb1 Starting Aggregate Level: 3%
mAb2 Starting Aggregate Level: 3%
Summary
Scouting is important
• Every molecule is different
• Need to determine optimal operating window to maximize product yield
and impurity
Select technologies with broad operating windows
▪ Activated Carbon
▪ Eshmuno® Q resin
▪ Eshmuno® CP-FT resin
Select technologies that work synergistically
▪ Different mechanisms of removal
▪ Work under comparable solutions
4444
0
0
0Agenda
Flow Through Polishing:
Value Proposition1
Process Development:
The Need to Think Holistically2
A Robust Flow Through Process:
The Importance of CEX3
Linked Process
Selection Criteria
Title of Presentation | DD.MM.YYYY
1: Technology Selection – Robust window and work synergistically
• Activated Carbon
• Eshmuno® Q resin
• Eshmuno® CP-FT resin
2: Process Conditions (pH and Conductivity)
• Conductivity Aggregate clearance optimized at lower conductivity for Eshmuno® CP-FT resin
3: Process Unit order
• pH Carbon: Results independent of pH/conductivity; to be linked with AEX; conditions to match AEX conditions
AEX: pH chosen from scouting for highest HCP removal; higher pH chosen to aid in virus removal
CEX: pH chosen from scouting with highest HCP removal and lowest aggregate level in the pool
mAb1
pH 6.5 - 4 mS/cm 42%
pH 6.5 - 6 mS/cm 40%
pH 7 - 4 mS/cm 50%
pH 7 - 6 mS/cm 51%
pH 7.5 - 4 mS/cm 41%
pH 7.5 - 6 mS/cm 42%
pH 8 - 4 mS/cm 44%
pH 8 - 6 mS/cm 39%
pH 8.5 - 4 mS/cm 45%
pH 8.5 - 6 mS/cm 47%
Eshmuno® Q resin
HCP Removal (Pool) @ 200 mg/ml Loading
• Eshmuno® Q resin Remove impurities that increase the robustness/loading capacity of Eshmuno® CP-FT resin
• Eshmuno® CP-FT resin Protect Viresolve® Pro Solution to increase loading capacity
Agg in Pool HCP Removal
pH 4 - 4 mS/cm 0.2% 90%
pH 4 - 6 mS/cm 0.2% 87%
pH 5 - 4 mS/cm 0.3% 93%
pH 5 - 6 mS/cm 0.2% 93%
pH 6 - 4 mS/cm 1.2% 90%
pH 6 - 6 mS/cm 1.9% 82%
Eshmuno® CP-FT resin @ 1000 mg/mL Loading
mAb1• Activated Carbon Increase loading on Eshmuno® Q resin
Experimental Plan
Linked Experiment
mAb Protein A elution pool – Aggregates 4-5%
Eshmuno®
CP-FT Resin
Evaluate
Eshmuno® CP-FT resin
Load: 1000 g/L
pH 5, 4 mS/cm
Eshmuno®
Q Resin
Eshmuno®
CP-FT Resin
Activated
Carbon
Eshmuno®
Q Resin
Eshmuno®
CP-FT Resin
Eshmuno® Q resin
Load: 300 g/L
pH 7, 4 mS/cm
Evaluate
Eshmuno® Q → Eshmuno® CP-FT resin
Load: 2000 g/L
pH 5, 4 mS/cm
Activated Carbon
Load: 1000 g/L
pH 7, 4 mS/cm
Evaluate
Activated Carbon → Eshmuno® Q resin
Load: 2000 g/L
pH 7, 4 mS/cm
Evaluate
Activated Carbon → Eshmuno® Q resin →
Eshmuno® CP-FT resin
Load: 2000 g/L
pH 5, 4 mS/cm
Linked Process Experiment
mAb1
Titer: 18 mg/mL
HCP: 3100 ppm
Leached ProA: 9 ppm
Aggregates: 4.5%
Eshmuno® CP-FT resin:
Yield: ≥90%
Leached ProA Removal: ≥96% (0.32 ppm)
HCP Removal: ≥97% (96 ppm)
Aggregate Removal: ≥92% (0.31% in pool)
Leached ProA Removal: ≥92% (0.68 ppm)
HCP Removal: ≥98% (73 ppm)
Aggregate Removal: ≥79% (0.95% in pool)
Leached ProA Removal: ≥50% (4.2 ppm)
HCP Removal: ≥98% (73 ppm)
Aggregate Removal: <1% removal (4.27% in pool)
Leached ProA Removal: ≥94% (0.45 ppm)
HCP Removal: ≥99% (6 ppm)
Aggregate Removal: ≥82% (0.80% in pool)
Eshmuno® Q resin → Eshmuno® CP-FT resin:
Yield: ≥94%
Activated Carbon → Eshmuno® Q resin:
Yield: ≥96%
Activated Carbon → Eshmuno® Q resin → Eshmuno® CP-FT resin:
Yield: ≥94%
CEX
(1000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX
(2000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX → CEX
(2000 mg/mL)
CEX
(1000 mg/mL)
CP-FT
(1000 mg/mL)
Q → CP-FT
(2000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX
(2000 mg/mL)
CEX
(1000 mg/mL)
AC → AEX → CEX
(2000 mg/mL)
AEX → CEX
(2000 mg/mL)
CEX
(1000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
CP-FT
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX → CEX
(2000 mg/mL) CEX
(1000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX
(2000 mg/mL)
CEX
(1000 mg/mL)
AEX → CEX
(2000 mg/mL)
AC → AEX → CEX
(2000 mg/mL)
49
A designed-for-purpose cation-
exchange resin (such as Eshmuno®
CP-FT resin) can be a central
component of a polishing toolbox
• Robust aggregate removal at
product loadings > 1 kg/L
• Major contributor to HCP and
leached protein A removal
• Key enabler for connected and
continuous processing
A robust mAb flow through
polishing toolbox can offer
significant economic and facility-
fit benefits without sacrificing
performance
• COGs, buffer volume, process
footprint, process time
Optimization of a flow through
process requires an holistic
perspective
• Maximize performance while
minimizing number and volumes
of buffers
Summary
The vibrant M, Eshmuno, Millistak+, NatriFlo, Viresolve and BioContinuum are trademarks of Merck KGaA, Darmstadt, Germany or its affiliates. All other trademarks
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Continuous Flow mAb Purification with CEX

  • 1. Merck KGaA Darmstadt, Germany Process Development for Continuous Flow Through mAb Purification Meghan Higson, Junyan Zhang, Jeff Barna, Sandeep Mora
  • 2. The life science business of Merck KGaA, Darmstadt, Germany operates as MilliporeSigma in the U.S. and Canada.
  • 3. 0 0 0Agenda Flow Through Polishing: Value Proposition1 Process Development: The Need to Think Holistically2 A Robust Flow Through Process: The Importance of CEX3
  • 4. 0 0 0Agenda Flow Through Polishing: Value Proposition1 Process Development: The Need to Think Holistically2 A Robust Flow Through Process: The Importance of CEX3
  • 5. Evolutionary Adoption Business Drivers → Facility-of-the-Future (FoF) 5 Process Batch Intensified Connected Continuous Format Stainless Steel Hybrid Single-Use Single-Use Closed/Sterile Process Continuum Process Analytics QC Methods At-Line On-Line In-Line Real Time Release Control Unit Op Process Facility Predictive Autonomous Digital Plant Paper-Based Digital Silos Connected Plant Fully Digital Adaptive PAT Continuum Digital Continuum Today Facility of Future
  • 6. Current Process Standard mAb Batch Process Bioreactor Clarification Affinity Chrom Virus Inactivation CEX Bind and Elute Flow Through AEX Viral Clearance Final Filtration Concentration & Diafiltration Depth Filtration Seed TrainInoc Train Batch Production Capture VI Polishing UF/DFSeed Train 14.4% 36.9% 13.6% 2.1% 24.7% 8.2% 0 50 100 150 Thousands$ Other Labor Consumables Materials Capital Representative Process Economics of mAb Batch Process
  • 7. Facility-of-the-Future Batch → Intensified → Connected → Continuous Bioreactor Clarification Affinity Chrom Virus Inactivation CEX Bind and Elute Flow Through AEX Viral Clearance Final Filtration Concentration & Diafiltration Depth Filtration Seed TrainInoc Train BatchIntensified Intensified Seed Train Intensified Production Intensified Capture In-Line VI Flow Through Polishing Continuous UF/DF Intensified Flow Through Polishing is a critical step to move towards a continuous process
  • 8. Properly designed flow through toolbox capable of delivering robust impurity clearance and high product yield Flow Through Polishing Robust Performance High monomer yield ▪ 85-95% Efficient purification ▪ Aggregates: < 1% ▪ Fragments: up to 1 LRV ▪ HCP: < 10 ppm Integrated process ▪ All flow through ▪ 2 pH changes, no product dilutions Methodology ▪ Adjust Pro A pool to pH 7.0 ▪ Challenge AC @ 0.5 kg/L ▪ Challenge AEX @ 3 kg/L ▪ Adjust pH to ~ 5.0 ▪ Challenge CEX @ 0.5-1 kg/L Activated Carbon Flow Through CEX Flow Through AEX Move to optimization of flow through condition Low pH pool pH Adjust to 5 Virus Filter Pool
  • 9. Properly designed flow-through toolbox capable of delivering robust impurity clearance and high product yield Developed BioSolve Model for integrated flow through polishing Flow Through Polishing Process Modeling Activated Carbon Flow Through CEX Flow Through AEX Viral Clearance Bioreactor: 2k L fed-batch Titer: 5 g/L Mab
  • 10. Properly designed flow-through toolbox capable of delivering robust impurity clearance and high product yield Developed BioSolve Model for integrated flow- through polishing Benefits: 1. COGs reduction of ~40% Flow Through Polishing Process Modeling 43% COGS reduction
  • 11. Properly designed flow-through toolbox capable of delivering robust impurity clearance and high product yield Developed BioSolve Model for integrated flow- through polishing Benefits: 1. COGs reduction of ~40% 2. Buffer reduction of ~80% Flow Through Polishing Process Modeling Buffer L/g Total Process Polishing only Traditional 1.19 0.63 FT Polishing 0.64 0.08
  • 12. Properly designed flow-through toolbox capable of delivering robust impurity clearance and high product yield Developed BioSolve Model for integrated flow- through polishing Benefits: 1. COGs reduction of ~40% 2. Buffer reduction of ~80% 3. Processing time reduction of ~70% Flow Through Polishing Process Modeling
  • 13. Toolbox Approach Flow Through Polishing Leached Protein A Aggregates Virus Host Cell DNA Host Cell Protein Others? (Fragments, Charge Variants) Chemistries Matrices Devices
  • 14. 1 4 Flow Through Polishing Existing Toolbox ▪ Eshmuno® CP-FT resin Flow through aggregate removal at high loading 5 – 10X buffer reduction Easy implementation Differentiated from existing CEX media
  • 15. 1 5 Flow Through Polishing Existing Toolbox ▪ Eshmuno® CP-FT resin Flow through aggregate removal at high loading 5 – 10X buffer reduction Easy implementation Differentiated from existing CEX media ▪ NatriFlo® HD-Q AEX membrane Impurity clearance at high loading High velocity operation (~1 sec RT) ▪ Eshmuno® Q resin: High viral and HCP clearance NatriFlo® HD-Q AEX Membrane: HCP and Viral Clearance 0,0 1,0 2,0 3,0 4,0 5,0 6,0 0-150 151-300 301-450 451-600 MVMLogReductionValue(LRV) Mass Loading ( g/L) MVM removal using Eshmuno Q [pH 8.5, 5mS/cm] Feed: 79g/L Post CEX SPTFF mAb02 pool Device # 1 Device # 2Arrow denotes complete removal of MVM
  • 16. 1 6 Flow Through Polishing Existing Toolbox ▪ Eshmuno® CP-FT resin Flow through aggregate removal at high loading 5 – 10X buffer reduction Easy implementation Differentiated from existing CEX media ▪ NatriFlo® HD-Q AEX membrane Impurity clearance at high loading High velocity operation (~1 sec RT) ▪ Eshmuno® Q resin: High viral and HCP clearance ▪ Millistak+® Pod CR depth filter Activated carbon media Binding: van der Waals interactions Size- and charge-based selectivity Used in sensitive applications (oral poisoning, food and beverage, pharmaceuticals, hemoperfusion, etc.) Impurity (MW) Capacity Insulin 60 g/L Methotrexate 75 g/L Pluronic® F68 surfactant 75 g/L Antifoam C > 16 g/L
  • 17. 17 Through the use of process modeling significant improvements identified with Flow Through Polishing: • COGs reduction of ~ 40% for flow- through polishing process compared to bind-elute template • Significant footprint reduction through reduced buffer volumes (~80%) and hold tanks • ~ 70% reduction in polishing processing time with connected flow through train There is an evolution happening in bioprocessing • Focus on process intensification to reduce COGs A properly designed flow-through polishing toolbox can robustly remove protein A pool impurities: • Chemistries that work synergistically • High capacity → small devices Summary
  • 18. 0 0 0Agenda Flow Through Polishing: Value Proposition1 Process Development: The Need to Think Holistically2 A Robust Flow Through Process: The Importance of CEX3
  • 19. Experimental Plan Two-Step Process Step 1: Scouting Step 2: Integration Activated Carbon Prototype Carbon Eshmuno® Q Resin Prototype AEX Eshmuno® CP-FT Resin Prototype CEX CEX CEX
  • 20. Experimental Plan Scouting 20 mAb Protein A elution pool Mass Loading (mg/mL) pH Range Conductivity (mS/cm) Column Size (mL) 1000 4 – 8 4, 6 0.2 Carbon 200 6.5 – 8.5 4, 6 0.2 AEX 1000 4 – 6 4, 6, 10*, 15* 0.2/0.5 CEX *Prototype CEX devices used were designed to work at higher conductivities; therefore higher ranges were also tested
  • 22. Scouting Experiment – Technology Comparison Activated Carbon vs. Prototype Carbon Title of Presentation | DD.MM.YYYY mAb1: Titer: 23 mg/mL HCP: 700 ppm mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm YIELD: mAb1: - Results insensitive to conductivity - Yield on Activated Carbon better than on Prototype Carbon
  • 23. Scouting Experiment – Technology Comparison Activated Carbon vs. Prototype Carbon Title of Presentation | DD.MM.YYYY mAb1: Titer: 23 mg/mL HCP: 700 ppm mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm YIELD: mAb1: - Results insensitive to conductivity - Yield on Activated Carbon better than on Prototype Carbon mAb2: - Insensitive to pH and conductivity for both technologies
  • 24. Scouting Experiment – Technology Comparison Activated Carbon vs. Prototype Carbon Title of Presentation | DD.MM.YYYY mAb1: Titer: 23 mg/mL HCP: 700 ppm mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm YIELD: mAb1: - Results insensitive to conductivity - Yield on Activated Carbon better than on Prototype Carbon mAb2: - Insensitive to pH and conductivity for both technologies HCP Removal: mAb1: - pH dependent performance - Better HCP clearance on Activated Carbon
  • 25. Scouting Experiment – Technology Comparison Activated Carbon vs. Prototype Carbon Title of Presentation | DD.MM.YYYY mAb1: Titer: 23 mg/mL HCP: 700 ppm mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm YIELD: mAb1: - Results insensitive to conductivity - Yield on Activated Carbon better than on Prototype Carbon mAb2: - Insensitive to pH and conductivity for both technologies HCP Removal: mAb1: - pH dependent performance - Better HCP clearance on Activated Carbon mAb2: - Both technologies insensitive to conductivity - Activated Carbon more robust than Prototype Carbon
  • 26. Scouting Experiment – Technology Comparison Activated Carbon vs. Prototype Carbon Title of Presentation | DD.MM.YYYY mAb1: Titer: 23 mg/mL HCP: 700 ppm mAb2: Titer: 9.5 mg/mL HCP: 1600 ppm Summary: ▪ Both Carbon technologies gave high yield and robust HCP clearance ▪ Activated Carbon performed better than Prototype Carbon YIELD: mAb1: - Results insensitive to conductivity - Yield on Activated Carbon better than on Prototype Carbon mAb2: - Insensitive to pH and conductivity for both technologies HCP Removal: mAb1: - pH dependent performance - Better HCP clearance on Activated Carbon mAb2: - Both technologies insensitive to conductivity - Activated Carbon more robust than Prototype Carbon
  • 27. Scouting Experiment – Technology Comparison Eshmuno® Q resin vs. Prototype AEX Title of Presentation | DD.MM.YYYY mAb1: Titer: 17 mg/mL HCP: 3300 ppm mAb2: Titer: 10 mg/mL HCP: 650 ppm YIELD: mAb1: - Eshmuno® Q resin outperformed Prototype AEX - Prototype AEX expected to have higher yield at higher loading
  • 28. Scouting Experiment – Technology Comparison Eshmuno® Q resin vs. Prototype AEX Title of Presentation | DD.MM.YYYY mAb1: Titer: 17 mg/mL HCP: 3300 ppm mAb2: Titer: 10 mg/mL HCP: 650 ppm YIELD: mAb1: - Eshmuno® Q resin outperformed Prototype AEX - Prototype AEX expected to have higher yield at higher loading mAb2: - Comparable results as seen with mAb1 - Eshmuno® Q resin had better yield with mAb2 than mAb1
  • 29. Scouting Experiment – Technology Comparison Eshmuno® Q resin vs. Prototype AEX Title of Presentation | DD.MM.YYYY mAb1: Titer: 17 mg/mL HCP: 3300 ppm mAb2: Titer: 10 mg/mL HCP: 650 ppm YIELD: mAb1: - Eshmuno® Q resin outperformed Prototype AEX - Prototype AEX expected to have higher yield at higher loading mAb2: - Comparable results as seen with mAb1 - Eshmuno® Q resin had better yield with mAb2 than mAb1 HCP Removal: mAb1: - Both technologies resulted in ~0.5 LRV HCP removal
  • 30. Scouting Experiment – Technology Comparison Eshmuno® Q resin vs. Prototype AEX Title of Presentation | DD.MM.YYYY mAb1: Titer: 17 mg/mL HCP: 3300 ppm mAb2: Titer: 10 mg/mL HCP: 650 ppm YIELD: mAb1: - Eshmuno® Q resin outperformed Prototype AEX - Prototype AEX expected to have higher yield at higher loading mAb2: - Comparable results as seen with mAb1 - Eshmuno® Q resin had better yield with mAb2 than mAb1 HCP Removal: mAb1: - Both technologies resulted in ~0.5 LRV HCP removal mAb2: - More robust HCP clearance - HCP removal independent of conductivity
  • 31. Scouting Experiment – Technology Comparison Eshmuno® Q resin vs. Prototype AEX Title of Presentation | DD.MM.YYYY mAb1: Titer: 17 mg/mL HCP: 3300 ppm mAb2: Titer: 10 mg/mL HCP: 650 ppm Summary: ▪ Higher yield on Eshmuno® Q resin ▪ HCP clearance strong function of pH but essentially independent of conductivity YIELD: mAb1: - Eshmuno® Q resin outperformed Prototype AEX - Prototype AEX expected to have higher yield at higher loading mAb2: - Comparable results as seen with mAb1 - Eshmuno® Q resin had better yield with mAb2 than mAb1 HCP Removal: mAb1: - Both technologies resulted in ~0.5 LRV HCP removal mAb2: - More robust HCP clearance - HCP removal independent of conductivity
  • 32. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 33. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 34. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: HCP Removal: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: - Robust HCP clearance over entire pH/conductivity window mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 35. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: HCP Removal: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: - Robust HCP clearance over entire pH/conductivity window mAb2: - HCP clearance strong function of pH - HCP clearance independent of conductivity mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 36. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: HCP Removal: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: - Robust HCP clearance over entire pH/conductivity window mAb2: - HCP clearance strong function of pH - HCP clearance independent of conductivity Aggregate Removal: mAb1: - Higher aggregate removal at lower pH for Eshmuno® CP-FT resin - Aggregate clearance optimized at higher conductivity for Prototype CEX mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 37. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: HCP Removal: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: - Robust HCP clearance over entire pH/conductivity window mAb2: - HCP clearance strong function of pH - HCP clearance independent of conductivity Aggregate Removal: mAb1: - Higher aggregate removal at lower pH for Eshmuno® CP-FT resin - Aggregate clearance optimized at higher conductivity for Prototype CEX mAb2: - Eshmuno® CP-FT resin performance similar to that of mAb1 - Broad operating window with Prototype CEX mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin
  • 38. Scouting Experiment – Technology Comparison Eshmuno® CP-FT resin vs. Prototype CEX Monomer Yield: HCP Removal: mAb2: - Eshmuno® CP-FT resin has higher monomer yield at higher pH - Prototype CEX able to achieve monomer yield >90% at higher conductivities mAb1: - Robust HCP clearance over entire pH/conductivity window mAb2: - HCP clearance strong function of pH - HCP clearance independent of conductivity Aggregate Removal: mAb1: - Higher aggregate removal at lower pH for Eshmuno® CP-FT resin - Aggregate clearance optimized at higher conductivity for Prototype CEX mAb2: - Eshmuno® CP-FT resin performance similar to that of mAb1 - Broad operating window with Prototype CEX mAb1: Titer: 17 mg/mL HCP: 650 ppm Aggregates: 3% mAb2: Titer: 10 mg/mL HCP: 3700 ppm Aggregates: 3% mAb1: - Better performance with Eshmuno® CP-FT resin Summary: ▪ Eshmuno® CP-FT resin achieved high yield and robust HCP and aggregate removal ▪ Prototype CEX performs better at higher conductivities
  • 40. Scouting Experiment – Molecule Comparison mAb1 vs. mAb2 Title of Presentation | DD.MM.YYYY mAb1 Starting HCP: 700 ppm mAb2 Starting HCP: 650 ppm Prototype Carbon – HCP Removal: mAb1 vs. mAb2: - Prototype Carbon has much better HCP removal for mAb1
  • 41. Scouting Experiment – Molecule Comparison mAb1 vs. mAb2 Title of Presentation | DD.MM.YYYY mAb1 Starting HCP: 3300 ppm mAb2 Starting HCP: 650 ppm Prototype Carbon – HCP Removal: mAb1 vs. mAb2: - Prototype Carbon has much better HCP removal for mAb1 Prototype AEX – HCP Removal: mAb1 vs. mAb2: - Prototype AEX has broader operating window for mAb2
  • 42. Scouting Experiment – Molecule Comparison mAb1 vs. mAb2 Title of Presentation | DD.MM.YYYY Prototype Carbon – HCP Removal: mAb1 vs. mAb2: - Prototype Carbon has much better HCP removal for mAb1 Prototype AEX – HCP Removal: mAb1 vs. mAb2: - Prototype AEX has broader operating window for mAb2 Prototype CEX – Aggregate Removal: mAb1 vs. mAb2: - Prototype CEX has a broader operating window for mAb2 mAb1 Starting Aggregate Level: 3% mAb2 Starting Aggregate Level: 3%
  • 43. Scouting Experiment – Molecule Comparison mAb1 vs. mAb2 Title of Presentation | DD.MM.YYYY Prototype Carbon – HCP Removal: mAb1 vs. mAb2: - Prototype Carbon has much better HCP removal for mAb1 Prototype AEX – HCP Removal: mAb1 vs. mAb2: - Prototype AEX has broader operating window for mAb2 Prototype CEX – Aggregate Removal: mAb1 vs. mAb2: - Prototype CEX has a broader operating window for mAb2 Summary: ▪ Optimal conditions are molecule dependent mAb1 Starting Aggregate Level: 3% mAb2 Starting Aggregate Level: 3%
  • 44. Summary Scouting is important • Every molecule is different • Need to determine optimal operating window to maximize product yield and impurity Select technologies with broad operating windows ▪ Activated Carbon ▪ Eshmuno® Q resin ▪ Eshmuno® CP-FT resin Select technologies that work synergistically ▪ Different mechanisms of removal ▪ Work under comparable solutions 4444
  • 45. 0 0 0Agenda Flow Through Polishing: Value Proposition1 Process Development: The Need to Think Holistically2 A Robust Flow Through Process: The Importance of CEX3
  • 46. Linked Process Selection Criteria Title of Presentation | DD.MM.YYYY 1: Technology Selection – Robust window and work synergistically • Activated Carbon • Eshmuno® Q resin • Eshmuno® CP-FT resin 2: Process Conditions (pH and Conductivity) • Conductivity Aggregate clearance optimized at lower conductivity for Eshmuno® CP-FT resin 3: Process Unit order • pH Carbon: Results independent of pH/conductivity; to be linked with AEX; conditions to match AEX conditions AEX: pH chosen from scouting for highest HCP removal; higher pH chosen to aid in virus removal CEX: pH chosen from scouting with highest HCP removal and lowest aggregate level in the pool mAb1 pH 6.5 - 4 mS/cm 42% pH 6.5 - 6 mS/cm 40% pH 7 - 4 mS/cm 50% pH 7 - 6 mS/cm 51% pH 7.5 - 4 mS/cm 41% pH 7.5 - 6 mS/cm 42% pH 8 - 4 mS/cm 44% pH 8 - 6 mS/cm 39% pH 8.5 - 4 mS/cm 45% pH 8.5 - 6 mS/cm 47% Eshmuno® Q resin HCP Removal (Pool) @ 200 mg/ml Loading • Eshmuno® Q resin Remove impurities that increase the robustness/loading capacity of Eshmuno® CP-FT resin • Eshmuno® CP-FT resin Protect Viresolve® Pro Solution to increase loading capacity Agg in Pool HCP Removal pH 4 - 4 mS/cm 0.2% 90% pH 4 - 6 mS/cm 0.2% 87% pH 5 - 4 mS/cm 0.3% 93% pH 5 - 6 mS/cm 0.2% 93% pH 6 - 4 mS/cm 1.2% 90% pH 6 - 6 mS/cm 1.9% 82% Eshmuno® CP-FT resin @ 1000 mg/mL Loading mAb1• Activated Carbon Increase loading on Eshmuno® Q resin
  • 47. Experimental Plan Linked Experiment mAb Protein A elution pool – Aggregates 4-5% Eshmuno® CP-FT Resin Evaluate Eshmuno® CP-FT resin Load: 1000 g/L pH 5, 4 mS/cm Eshmuno® Q Resin Eshmuno® CP-FT Resin Activated Carbon Eshmuno® Q Resin Eshmuno® CP-FT Resin Eshmuno® Q resin Load: 300 g/L pH 7, 4 mS/cm Evaluate Eshmuno® Q → Eshmuno® CP-FT resin Load: 2000 g/L pH 5, 4 mS/cm Activated Carbon Load: 1000 g/L pH 7, 4 mS/cm Evaluate Activated Carbon → Eshmuno® Q resin Load: 2000 g/L pH 7, 4 mS/cm Evaluate Activated Carbon → Eshmuno® Q resin → Eshmuno® CP-FT resin Load: 2000 g/L pH 5, 4 mS/cm
  • 48. Linked Process Experiment mAb1 Titer: 18 mg/mL HCP: 3100 ppm Leached ProA: 9 ppm Aggregates: 4.5% Eshmuno® CP-FT resin: Yield: ≥90% Leached ProA Removal: ≥96% (0.32 ppm) HCP Removal: ≥97% (96 ppm) Aggregate Removal: ≥92% (0.31% in pool) Leached ProA Removal: ≥92% (0.68 ppm) HCP Removal: ≥98% (73 ppm) Aggregate Removal: ≥79% (0.95% in pool) Leached ProA Removal: ≥50% (4.2 ppm) HCP Removal: ≥98% (73 ppm) Aggregate Removal: <1% removal (4.27% in pool) Leached ProA Removal: ≥94% (0.45 ppm) HCP Removal: ≥99% (6 ppm) Aggregate Removal: ≥82% (0.80% in pool) Eshmuno® Q resin → Eshmuno® CP-FT resin: Yield: ≥94% Activated Carbon → Eshmuno® Q resin: Yield: ≥96% Activated Carbon → Eshmuno® Q resin → Eshmuno® CP-FT resin: Yield: ≥94% CEX (1000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX (2000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX → CEX (2000 mg/mL) CEX (1000 mg/mL) CP-FT (1000 mg/mL) Q → CP-FT (2000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX (2000 mg/mL) CEX (1000 mg/mL) AC → AEX → CEX (2000 mg/mL) AEX → CEX (2000 mg/mL) CEX (1000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) CP-FT (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX → CEX (2000 mg/mL) CEX (1000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX (2000 mg/mL) CEX (1000 mg/mL) AEX → CEX (2000 mg/mL) AC → AEX → CEX (2000 mg/mL)
  • 49. 49 A designed-for-purpose cation- exchange resin (such as Eshmuno® CP-FT resin) can be a central component of a polishing toolbox • Robust aggregate removal at product loadings > 1 kg/L • Major contributor to HCP and leached protein A removal • Key enabler for connected and continuous processing A robust mAb flow through polishing toolbox can offer significant economic and facility- fit benefits without sacrificing performance • COGs, buffer volume, process footprint, process time Optimization of a flow through process requires an holistic perspective • Maximize performance while minimizing number and volumes of buffers Summary
  • 50. The vibrant M, Eshmuno, Millistak+, NatriFlo, Viresolve and BioContinuum are trademarks of Merck KGaA, Darmstadt, Germany or its affiliates. All other trademarks are the property of their respective owners. Detailed information on trademarks is available via publicly accessible resources. © 2019 Merck KGaA, Darmstadt, Germany and/or its affiliates. All Rights Reserved.